| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 12/21/2011 | CN101730921B 基板清洁腔室与其部件 Substrate cleaning chamber and its components |
| 12/21/2011 | CN101587815B 双面离子源 Sided ion source |
| 12/21/2011 | CN101572219B 一种腔室状态监控系统、方法以及半导体处理设备 One kind of chamber condition monitoring systems, methods, and semiconductor processing equipment |
| 12/21/2011 | CN101042977B 碳纳米管场发射电子源及其制造方法以及一场发射阵列 Carbon nanotube field emission electron source and its manufacturing method, and field emission arrays |
| 12/20/2011 | US8080930 Self-regenerating nanotips for low-power electric propulsion (EP) cathodes |
| 12/20/2011 | US8080814 Method for improving implant uniformity during photoresist outgassing |
| 12/20/2011 | US8080813 Ion implanter, internal structure of ion implanter and method of forming a coating layer in the ion implanter |
| 12/20/2011 | US8080791 X-ray detector for electron microscope |
| 12/20/2011 | US8080790 Scanning electron microscope |
| 12/20/2011 | US8080789 Sample dimension measuring method and scanning electron microscope |
| 12/20/2011 | US8080126 Plasma processing apparatus |
| 12/20/2011 | US8080107 Showerhead electrode assembly for plasma processing apparatuses |
| 12/16/2011 | DE202011105201U1 Verbindungsring und Anbauteilaufnahmevorrichtung Connecting ring and attachment recording device |
| 12/15/2011 | WO2011156813A1 Techniques for plasma processing a substrate |
| 12/15/2011 | WO2011156421A2 Incoherent transmission electron microscopy |
| 12/15/2011 | WO2011155917A1 Ion source |
| 12/15/2011 | WO2011153993A1 Device for plasma treatment of workpieces |
| 12/15/2011 | WO2011153673A1 Surface feed-in electrode for deposition of thin film solar battery and signal feed-in method thereof |
| 12/15/2011 | WO2011153670A1 Clamping unit for depositing thin film solar cell and signal feed-in method |
| 12/15/2011 | WO2011074962A4 Support and positioning structure, semiconductor equipment system and method for positioning |
| 12/15/2011 | WO2010147872A4 Cooled charged particle systems and methods |
| 12/15/2011 | US20110303845 Electron beam device and sample holding device for electron beam device |
| 12/15/2011 | US20110303844 Electron microscope, and specimen holding method |
| 12/15/2011 | US20110303843 Sample observing method and scanning electron microscope |
| 12/15/2011 | DE102010010981B4 Verfahren und Analyseanordnung zur Analyse der Elektronen-Spinpolarisation A method and analyzing system for analyzing the electron spin polarization |
| 12/15/2011 | DE102010003056A1 Verfahren zur Erzeugung von Bildern einer Probe A method of generating images of a specimen |
| 12/15/2011 | DE102009057334B4 Elektronenstrahleinheit mit Strahlfeldbegrenzung Electron beam unit with field boundary |
| 12/15/2011 | DE102009052392A1 SACP-Verfahren und teilchenoptisches System zur Ausführung eines solchen Verfahrens SACP method and particle-optical system for carrying out such a method |
| 12/15/2011 | DE102009032759B4 Vorrichtung zur Vermeidung von parasitären Schwingungen in Elektronenstrahlröhren Device for avoiding parasitic oscillations in electron tubes |
| 12/15/2011 | DE102008024486B4 Plasmastempel, Plasmabehandlungsvorrichtung, Verfahren zur Plasmabehandlung und Herstellungsverfahren für einen Plasmastempel Temple plasma, plasma treating apparatus, process for plasma treatment and manufacturing method for a plasma Temple |
| 12/14/2011 | EP2394497A1 Plasma coating system and method for coating or treating the surface of a substrate |
| 12/14/2011 | EP2394288A1 Modifiable magnet configuration for arc vaporization sources |
| 12/14/2011 | EP2027594B1 Apparatus and method for controlled particle beam manufacturing of semiconductors |
| 12/14/2011 | EP1949409B1 Method and installation for the vacuum colouring of a metal strip by means of magnetron sputtering |
| 12/14/2011 | EP1651378B1 Method for non-vacuum electron beam welding metallic materials |
| 12/14/2011 | EP1484788B1 High-frequency power supply structure and plasma cvd device using the same |
| 12/14/2011 | EP1451849B1 Information acquisition apparatus, cross section evaluating apparatus, and cross section evaluating method |
| 12/14/2011 | EP1425777B1 Plasma processor coil |
| 12/14/2011 | EP1171900B1 Large area atmospheric-pressure plasma jet |
| 12/14/2011 | CN202076225U 等离子体处理室及具有倾斜上表面的热边缘环 The plasma processing chamber and the hot edge ring having an inclined upper surface |
| 12/14/2011 | CN1950921B 在介电基片的基础上制造片状工件的方法和用于该制造方法的真空处理设备 Methods based on the dielectric substrate and the vacuum producing a workpiece sheet processing apparatus used for the manufacturing method |
| 12/14/2011 | CN1806310B 局部除去玻璃板涂层的方法及装置 Method and apparatus for removing a partial coating of the glass sheet |
| 12/14/2011 | CN102282642A 用于监测电子束强度的方法和装置 Monitoring the intensity of the electron beam method and apparatus for |
| 12/14/2011 | CN102280342A 等离子体处理装置 Plasma processing apparatus |
| 12/14/2011 | CN102280341A 稳定等离子体处理的方法和设备 Stabilization method and apparatus for plasma treatment |
| 12/14/2011 | CN102280340A 干蚀刻设备及干蚀刻方法 Dry etching equipment and dry etching method |
| 12/14/2011 | CN102280339A 基板处理方法和基板处理装置 Substrate processing method and substrate processing apparatus |
| 12/14/2011 | CN102280338A 等离子体处理装置及其电介质窗结构 The plasma processing apparatus and a dielectric window structure |
| 12/14/2011 | CN102280337A 反应离子刻蚀设备及方法 Reactive ion etching apparatus and method |
| 12/14/2011 | CN101740300B 等离子反应器的静电夹头装置 Plasma reactor electrostatic chuck apparatus |
| 12/14/2011 | CN101699613B 在等离子体反应装置中以均匀温度冷却晶片支撑的方法 In the plasma reaction apparatus at a uniform temperature of the cooling method of the wafer support |
| 12/14/2011 | CN101675495B 用于测量等离子体刻蚀工艺的工艺参数的方法和装置 Methods and apparatus for measuring plasma etching process process parameters |
| 12/14/2011 | CN101645386B 用于对中空体进行等离子体处理的设备和方法 Apparatus and method for performing plasma treatment of hollow |
| 12/14/2011 | CN101485006B 相变合金蚀刻 Phase change alloy etching |
| 12/14/2011 | CN101437352B 等离子体接力装置 Plasma relay device |
| 12/14/2011 | CN101015033B 测量垂直扫描束或带状束平面的束角和散度的装置和方法 Measure the vertical beam scanning apparatus and method or ribbon beam divergence angle and beam plane |
| 12/13/2011 | US8076651 Specimen stage apparatus and specimen stage positioning control method |
| 12/13/2011 | US8076649 Charged particle beam writing apparatus and optical axis deviation correcting method for charged particle beam |
| 12/13/2011 | US8076642 Electron beam apparatus and method of operating the same |
| 12/13/2011 | US8076641 Method and device for producing an image |
| 12/13/2011 | US8075789 Remote plasma cleaning source having reduced reactivity with a substrate processing chamber |
| 12/12/2011 | DE202011106157U1 Subtratbehandlungsanlage mit Kammerdeckel Subtratbehandlungsanlage with chamber lid |
| 12/08/2011 | WO2011153228A2 Reduction of copper or trace metal contaminants in plasma electrolytic oxidation coatings |
| 12/08/2011 | WO2011152866A1 Effective algorithm for warming a twist axis for cold ion implantations |
| 12/08/2011 | WO2011152303A1 Charged particle beam device provided with automatic aberration correction method |
| 12/08/2011 | WO2011152106A1 Pattern measurement device, pattern measurement method, and program |
| 12/08/2011 | WO2011151541A2 Detector for energetic secondary electrons |
| 12/08/2011 | WO2011151540A1 Dose measurement device for plasma-immersion ion implantation |
| 12/08/2011 | WO2011151166A1 Electron beam evaporator and associated operating method |
| 12/08/2011 | WO2011151165A2 Control and/or regulatory device, control path, computer program, computer-readable storage medium and method for downloading the computer program |
| 12/08/2011 | WO2011112614A3 Device for holding electron microscope grids and other materials |
| 12/08/2011 | WO2011112038A3 Apparatus for generating electron beams, and method for manufacturing same |
| 12/08/2011 | US20110297827 Charged particle beam device |
| 12/08/2011 | US20110297826 Charged particle beam device and method for correcting position with respect to charged particle beam |
| 12/08/2011 | DE102011050759A1 Steuerung der Geometrie der geerdeten Oberfläche in elektrostatisch verbesserten Stofffiltern Control of the geometry of the grounded surface electrostatically enhanced fuel filters |
| 12/08/2011 | DE102010029690A1 Steuer- und/oder Regeleinrichtung, Steuerstrecke, Computerprogramm, computerlesbares Speichermedium und Verfahren des Herunterladens des Computerprogramms Control and / or regulating device, control path, computer program, computer-readable storage medium and method of downloading the computer program |
| 12/08/2011 | DE102010029689A1 Elektronenstrahlverdampfer und dazugehöriges Betriebsverfahren Electron beam evaporator and associated operational procedures |
| 12/07/2011 | EP2393104A2 Charged particle beam device |
| 12/07/2011 | EP1639619B1 Method and device for removing layers in some areas of glass plates |
| 12/07/2011 | EP1390964B1 Dipole ion source |
| 12/07/2011 | EP1388159B1 Magnetic mirror plasma source |
| 12/07/2011 | DE202010008435U1 Mit einer Beschichtung versehenes Substrat With a coating substrate provided |
| 12/07/2011 | CN202067763U 一种等离子刻蚀用夹紧装置 A plasma etching apparatus with clamping |
| 12/07/2011 | CN202067762U 适用于二次电子发射系数智能测试的一次电子发射装置 Secondary electron emission coefficient applied to intelligent testing once the electron emission devices |
| 12/07/2011 | CN1950534B Msvd涂覆方法 Msvd coating method |
| 12/07/2011 | CN102272878A 样本厚度的测量和端点确定 Measuring the thickness of the sample and endpoint determination |
| 12/07/2011 | CN102270577A 等离子体处理装置和方法 The plasma processing apparatus and method |
| 12/07/2011 | CN102270557A 离子注入装置 Ion implantation apparatus |
| 12/07/2011 | CN101752171B 阴极放电装置 Cathode discharge device |
| 12/07/2011 | CN101634017B Pecvd用硅片载片器的挂钩 Pecvd wafers slide the hook |
| 12/07/2011 | CN101042991B 等离子体处理装置 Plasma processing apparatus |
| 12/06/2011 | US8074293 Defective product inspection apparatus, probe positioning method and probe moving method |
| 12/06/2011 | US8071964 System and method of performing uniform dose implantation under adverse conditions |
| 12/06/2011 | US8071961 Charged particle beam apparatus |
| 12/06/2011 | US8071960 Method and apparatus for producing samples for transmission electron microscopy |
| 12/06/2011 | US8071956 Cleaning of an extraction aperture of an ion source |
| 12/06/2011 | US8071955 Magnetic deflector for an electron column |
| 12/06/2011 | US8071954 Hybrid phase plate |
| 12/06/2011 | US8071943 Mask inspection apparatus and image creation method |
| 12/06/2011 | US8071397 Semiconductor fabricating apparatus with function of determining etching processing state |