| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 03/01/2012 | US20120049063 Sample surface inspection apparatus and method |
| 03/01/2012 | US20120049062 Phase contrast electron microscope |
| 03/01/2012 | US20120049061 Detector System for Transmission Electron Microscope |
| 03/01/2012 | DE102010053363A1 Device for treating a substrate using plasma, comprises plasma units for generating plasma in a plasma area of the plasma units, and a control arrangement to control the first and second plasma units independent from one another |
| 03/01/2012 | DE102010035593A1 Verfahren und Vorrichtung zum Behandeln eines Substrats mittels eines Plasmas Method and apparatus for treating a substrate by means of a plasma |
| 02/29/2012 | EP2423944A1 Plasma processing method and plasma processing apparatus |
| 02/29/2012 | EP2423943A1 Detector system for use with transmission electron microscope spectroscopy |
| 02/29/2012 | EP2423942A2 Detector system for transmission electron microscope |
| 02/29/2012 | EP2423676A1 Probe apparatus |
| 02/29/2012 | EP2422359A2 Enhanced scavenging of residual fluorine radicals using silicon coating on process chamber walls |
| 02/29/2012 | EP2422352A1 Rf-plasma glow discharge sputtering |
| 02/29/2012 | EP2422351A1 Method and device for monitoring the intensity of an electron beam |
| 02/29/2012 | EP2422100A2 A magnetic bearing, a rotary stage, and a reflective electron beam lithography apparatus |
| 02/29/2012 | CN1715863B Method for the removal of a microscopic sample from a substrate |
| 02/29/2012 | CN102365705A Method and apparatus of providing power to ignite and sustain a plasma in a reactive gas generator |
| 02/29/2012 | CN102364659A Ion sources, systems and methods |
| 02/29/2012 | CN101847558B Plasma processing device and plasma processing method |
| 02/29/2012 | CN101322217B Technique for shaping a ribbon-shaped ion beam |
| 02/29/2012 | CN101101269B Energy dispersion type radiation detecting system and method of measuring content of object element |
| 02/28/2012 | US8125155 Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities |
| 02/28/2012 | US8124947 Ion implanter having combined hybrid and double mechanical scan architecture |
| 02/28/2012 | US8124946 Post-decel magnetic energy filter for ion implantation systems |
| 02/28/2012 | US8124941 Increasing current in charged particle sources and systems |
| 02/28/2012 | US8124933 Mapping-projection-type electron beam apparatus for inspecting sample by using electrons emitted from the sample |
| 02/28/2012 | US8123860 Apparatus for cyclical depositing of thin films |
| 02/23/2012 | WO2012024173A2 Mechanism and method for aligning a workpiece to a shadow mask |
| 02/23/2012 | WO2012023858A1 An apparatus, a system and a method for producing hydrogen |
| 02/23/2012 | WO2012023354A1 Electron beam apparatus |
| 02/23/2012 | WO2012022738A1 Plasma processes at atmospheric pressure |
| 02/23/2012 | WO2012021932A1 A method of forming a structure in a material |
| 02/23/2012 | US20120047475 Semiconductor device |
| 02/23/2012 | US20120045615 Method and apparatus for neutral beam processing based on gas cluster ion beam technology |
| 02/23/2012 | US20120045593 Plasma cvd apparatus |
| 02/23/2012 | US20120043463 Composite charged particle radiation device |
| 02/23/2012 | US20120043457 Optical switching in a lithography system |
| 02/23/2012 | DE102011079806A1 Halbleiterwafer-Kühlvorrichtung A semiconductor wafer cooling device |
| 02/23/2012 | DE102009049787B4 Verfahren zur Bestimmung von Parametern einer Proximity-Funktion, insbesondere für die Korrektur des Proximity-Effekts bei der Elektronenstrahllithografie A method of determining parameters of a proximity function, in particular for the correction of the proximity effect in electron beam lithography |
| 02/22/2012 | EP2421022A2 Production of nanoparticles |
| 02/22/2012 | EP2420592A1 Method for manufacturing gas barrier thin film-coated plastic container |
| 02/22/2012 | EP2420589A1 Hollow target assembly |
| 02/22/2012 | EP2419215A1 Optical probing in electron microscopes |
| 02/22/2012 | EP2176877B1 Device for providing a high energy x-ray beam |
| 02/22/2012 | EP1774562B1 System for low-energy plasma-enhanced chemical vapor deposition |
| 02/22/2012 | EP1683163B1 Charged particle extraction device and method |
| 02/22/2012 | CN202150441U 扫描电镜样品台操纵杆辅助定位装置 SEM sample stage auxiliary lever positioning device |
| 02/22/2012 | CN102361002A Electron beam control method and device using same, electron beam generating device and transmitter |
| 02/22/2012 | CN101630623B 基于带电粒子束的检查装置及采用了该检查装置的器件制造方法 Based on the charged particle beam inspection apparatus and a device manufacturing method using the inspection apparatus |
| 02/22/2012 | CN101414125B 电子束曝光系统 Electron beam exposure system |
| 02/22/2012 | CN101174107B 用于光掩模等离子体蚀刻的方法和装置 A method and apparatus for plasma etching photomasks |
| 02/21/2012 | US8119994 Apparatus and method for inspecting sample |
| 02/21/2012 | US8119016 Removal of surface oxides by electron attachment for wafer bumping applications |
| 02/21/2012 | US8118936 Method and apparatus for an improved baffle plate in a plasma processing system |
| 02/21/2012 | US8117986 Apparatus for an improved deposition shield in a plasma processing system |
| 02/17/2012 | DE202012100160U1 Arclöschanordnung Arclöschanordnung |
| 02/16/2012 | WO2012021652A2 Charged particle detector |
| 02/16/2012 | US20120037815 Tem phase plate loading system |
| 02/16/2012 | US20120037802 Distributed Potential Charged Particle Detector |
| 02/16/2012 | US20120037182 Particle removal apparatus and method and plasma processing apparatus |
| 02/16/2012 | DE102010039365A1 Plasma-Prozesse bei Atmosphärendruck Plasma processes at atmospheric pressure |
| 02/16/2012 | DE102010030372B4 Vorrichtung zur Strukturierung von Festkörperflächen mit Ionenstrahlen aus einem Ionenstrahlspektrum Device for patterning of solid surfaces with ion beams from an ion beam spectrum |
| 02/16/2012 | DE102010029689B4 Elektronenstrahlverdampfer und dazugehöriges Betriebsverfahren Electron beam evaporator and associated operational procedures |
| 02/15/2012 | EP2418674A2 Ion sources, systems and methods |
| 02/15/2012 | EP2418673A2 Lens for an electron microscope system and electron microscope system |
| 02/15/2012 | EP2418672A1 Multi-axis lens, beam system making use of the compound lens, and method of manufacturing the compound lens |
| 02/15/2012 | EP2417626A2 Multifrequency capacitively coupled plasma etch chamber |
| 02/15/2012 | EP2417624A2 Techniques for processing a substrate |
| 02/15/2012 | EP2417623A2 Techniques for processing a substrate |
| 02/15/2012 | EP2417622A2 Techniques for processing a substrate |
| 02/15/2012 | EP2417619A1 Process chamber having modulated plasma supply |
| 02/15/2012 | EP2417618A1 Detector, device, and method for the simultaneous, energy-dispersive recording of backscattered electrons and x-ray quanta |
| 02/15/2012 | EP2417280A2 Production method with thermal projection of a target |
| 02/15/2012 | EP2174337B1 Plasma supply device |
| 02/15/2012 | CN1930652B 溅射涂覆基片的制造方法、磁控管源和具有这种源的溅射室 Sputter coating a substrate manufacturing method, the magnetron sputtering source and the chamber having the source |
| 02/15/2012 | CN102354647A Device for prolonging service life of filament of scanning electron microscope |
| 02/15/2012 | CN101414126B 电子束曝光系统 Electron beam exposure system |
| 02/14/2012 | US8115168 Layered scanning charged particle apparatus package having an embedded heater |
| 02/14/2012 | US8114525 Process chamber component having electroplated yttrium containing coating |
| 02/14/2012 | US8114247 Plasma processing apparatus and focus ring |
| 02/14/2012 | US8114246 Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same |
| 02/14/2012 | US8114245 Plasma etching device |
| 02/09/2012 | WO2012018860A2 Methods and devices for preparing microscopy samples |
| 02/09/2012 | WO2012018827A2 Electron microscope sample holder for forming a gas or liquid cell with two semiconductor devices |
| 02/09/2012 | WO2012018800A2 Method for acquiring simultaneous and overlapping optical and charged particle beam images |
| 02/09/2012 | WO2012017789A1 Gas field ionization ion source and method for using same, ion beam device, and emitter chip and method for manufacturing same |
| 02/09/2012 | WO2011130100A3 Ion beam sample preparation apparatus and methods |
| 02/09/2012 | WO2011130099A3 Ion beam sample preparation apparatus and methods |
| 02/09/2012 | US20120032079 Inspection system by charged particle beam and method of manufacturing devices using the system |
| 02/09/2012 | DE102011052530A1 Strukturmessgerät und Strukturmessverfahren Structure gauge and structure measurement method |
| 02/09/2012 | DE102010039030A1 Ion mirror/reflectron for flight time mass spectrometer, has reflectron stage for generating electric field, where reflectron stage includes sets of electrodes having different thicknesses and arranged alternating to each other |
| 02/09/2012 | DE102006043895B9 Elektronenmikroskop zum Inspizieren und Bearbeiten eines Objekts mit miniaturisierten Strukturen Electron microscope for inspecting and editing of an object with miniaturized structures |
| 02/08/2012 | EP2416344A2 Ion sources, systems and methods |
| 02/08/2012 | EP2416343A2 Ion sources, systems and methods |
| 02/08/2012 | EP2416342A2 Ion sources, systems and methods |
| 02/08/2012 | EP2416165A1 Method of forming a 3D reconstruction of a sample using a scanning probe microscope |
| 02/08/2012 | EP2415900A1 Formation method of coating |
| 02/08/2012 | EP2415899A1 Lanthanum target for sputtering |
| 02/08/2012 | EP2415066A2 Method and apparatus for producing three dimensional nano and micro scale structures |
| 02/08/2012 | EP1943661B1 Charged particle inspection method and charged particle system |
| 02/08/2012 | EP1518255B1 Thermal sprayed yttria-containing coating for plasma reactor |
| 02/08/2012 | EP1145277B1 Gas injection system for plasma processing |