Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
03/2012
03/22/2012WO2012010146A3 Electrode for producing a plasma, plasma chamber having said electrode, and method for analyzing or processing a layer or the plasma in situ
03/22/2012WO2012001321A3 Method for treating an elastomeric surface of a device for dispensing a fluid product
03/22/2012WO2011151541A3 Detector for energetic secondary electrons
03/22/2012US20120068089 Charged particle beam writing apparatus and charged particle beam writing method
03/22/2012US20120068081 Ion beam tuning
03/22/2012US20120068068 Charged particle detectors
03/22/2012US20120068067 Gas field ion microscopes having multiple operation modes
03/22/2012US20120068065 Pattern defect inspection apparatus and pattern defect inspection method
03/22/2012DE102010041156A1 Diaphragm unit for e.g. scanning electron microscope, for examination of samples, has support unit protruding into body from side of body and arranged at distance from edge of aperture, where body and/or aperture are provided with coating
03/21/2012EP2432008A1 Replaceable substrate masking on carrier and method for processing a substrate
03/21/2012EP2431995A1 Ionisation device
03/21/2012EP2431494A1 Barrier film for semiconductor wiring, sintered sputtering target, and method of manufacturing sputtering targets
03/21/2012EP2430637A1 Ecr particle beam source apparatus, system and method
03/21/2012EP2430490A1 Microscopy of an object using a sequence of optical microscopy and particle beam microscopy
03/21/2012EP2430432A1 Electron microscope with integrated detector(s)
03/21/2012EP1690279B1 Plasma source with segmented magnetron cathode
03/21/2012CN1658331B Optical device of particle source with selectable beam current and energy spread
03/21/2012CN102388680A Plasma coating system and method for coating or treating the surface of a substrate
03/21/2012CN102386047A Objective lens coil for transmission electron microscope
03/21/2012CN102383108A Furnace for carrying out plasma chemical vapour deposition
03/21/2012CN101855698B Device for the plasma treatment of workpieces
03/21/2012CN101752170B Discharging electrode of combined type discharging plasma reactor and method for regulating structure thereof
03/21/2012CN101499399B Substrate plasma processing apparatus and plasma processing method
03/21/2012CN101208767B A module for coating both sides of a substrate in a single pass
03/20/2012US8139847 Defect inspection tool and method of parameter tuning for defect inspection tool
03/20/2012US8137510 Coater with a large-area assembly of rotatable magnetrons
03/20/2012US8136479 Plasma treatment apparatus and plasma treatment method
03/20/2012US8136389 Probe tip assembly for scanning probe microscopes
03/15/2012WO2012033698A1 Uniformity control using ion beam blockers
03/15/2012WO2012033697A2 Using beam blockers to perform a patterned implant of a workpiece
03/15/2012US20120061566 Scanning electron microscope
03/15/2012US20120061565 Charged particle beam device and sample observation method
03/15/2012US20120061564 Surface analyzer of object to be measured and analyzing method
03/15/2012US20120061560 Ion implanting system
03/15/2012US20120060759 Falling film plasma reactor
03/15/2012DE112008004172T5 Strukturmessgerät und Strukturmessverfahren Structure gauge and structure measurement method
03/15/2012DE102010040759A1 Cooling system for cooling target of e.g. planar magnetron used for applying materials on substrate in high vacuum, has cooling channel including cross-section, which increasingly varies flow speed of cooling medium along flow of medium
03/15/2012DE102009028013B4 Teilchenstrahlgerät mit einer Blendeneinheit und Verfahren zur Einstellung eines Strahlstroms in einem Teilchenstrahlgerät Particle beam with a diaphragm unit and method for adjusting a beam current in a particle beam
03/14/2012EP2428975A2 Plasma texturing reaction apparatus
03/14/2012EP2427902A1 Apparatus and method for plasma treatment of containers
03/14/2012EP2427586A1 Method for the production of oxide and nitride coatings and its use
03/14/2012CN202167451U 栅栏式扫描电镜样品台 Barrier SEM sample stage
03/14/2012CN202167450U 一种扫描电子显微镜用可以扭转试样的样品台 A scanning electron microscope specimen sample stage can be reversed
03/14/2012CN202167449U 双束离子源 Dual-beam ion source
03/14/2012CN102376559A Plasma processing method and plasma processing apparatus
03/14/2012CN102376521A Plasma processing apparatus and plasma control method
03/14/2012CN102376520A Ion implantation dose detection control apparatus of plasma immersion ion implanter
03/14/2012CN102376519A Ion implantation dosage detection control method
03/14/2012CN102376518A Ion implantation system and methods
03/14/2012CN102376517A Detector system for transmission electron microscope
03/14/2012CN102376516A Backscatter reduction in thin electron detectors
03/14/2012CN102376515A Objective pole shoe of transmission electron microscope
03/14/2012CN102376513A Cleaning method of ion source electrode
03/14/2012CN101866805B Preparation method of TEM micro grid
03/13/2012US8134135 Multiple beam charged particle optical system
03/13/2012US8134130 Ion source with corner cathode
03/13/2012US8134125 Method and apparatus of an inspection system using an electron beam
03/08/2012WO2012031049A2 Navigation and sample processing using an ion source containing both low-mass and high-mass species
03/08/2012WO2012029846A1 Image forming device and computer program
03/08/2012WO2012028515A1 Sputtering device with a tubular target
03/08/2012US20120056088 Navigation and Sample Processing Using an Ion Source Containing both Low-Mass and High-Mass Species
03/08/2012DE102010040267A1 Sputtereinrichtung mit rohrförmigem Target Sputtering with a tubular target
03/07/2012EP2426696A2 Method for processing a substrate using an ion beam and ion beam device for processing a substrate
03/07/2012EP2426695A1 Composite charged particle radiation device
03/07/2012EP2426694A1 Apparatus and method including a direct bombardment detector and a secondary detector for use in electron microscopy
03/07/2012EP2426693A2 Ion source
03/07/2012EP2426692A2 Ion source
03/07/2012EP2426232A2 Sputtering apparatus
03/07/2012EP2425445A1 Method for producing a plasma jet and plasma source
03/07/2012EP2425444A1 Charged particle optical system comprising an electrostatic deflector
03/07/2012EP1769521B1 Electron beam applying apparatus for recording information
03/07/2012EP1692715B1 Umbilical cord facilities connection for an ion beam implanter
03/07/2012CN102368475A Device for etching rigid inorganic material substrate by dry method
03/07/2012CN102368474A Chip transporting system of plasma etcher for carrying out dry etching on inorganic material substrate
03/07/2012CN102368467A Plasma processing apparatus and protection ring thereof
03/07/2012CN102368466A Electrode of plasma etcher for carrying out dry etching on hard inorganic material substrate
03/07/2012CN102368465A Etching chamber of dry method etching hard inorganic material substrate ICP etching machine
03/07/2012CN101908458B Rectangular etching ion gun
03/07/2012CN101872731B Lifting device and plasma processing equipment applying same
03/07/2012CN101681782B Techniques for improving the performance and extending the lifetime of an ion source with gas mixing
03/07/2012CN101641764B Method for multi-step plasma doping for substrate
03/07/2012CN101589451B RF substrate bias with high power impulse magnetron sputtering (HIPIMS)
03/07/2012CN101440484B Induction coupling plasma processing apparatus and method
03/07/2012CN101435074B Substrate processing apparatus
03/07/2012CN101414124B 电子束曝光系统 Electron beam exposure system
03/06/2012US8130382 Determining endpoint in a substrate process
03/06/2012US8129693 Charged particle beam column and method of operating same
03/06/2012US8129679 Method for discrimination of backscattered from incoming electrons in imaging electron detectors with a thin electron-sensitive layer
03/06/2012US8128751 Film-forming apparatus
03/01/2012WO2012027123A1 Sputter target feed system
03/01/2012WO2012027118A1 Reactor box chamber cleaning using molecular fluorine
03/01/2012WO2012026365A1 Specimen holder for charged-particle device
03/01/2012WO2012026291A1 Charged particle beam device and sample observation method
03/01/2012WO2012025947A1 Device for generating plasma and for directing a flow of electrons towards a target
03/01/2012WO2012025546A1 Control grid design for an electron beam generating device
03/01/2012WO2012025249A1 Method and control device for cleaning a plasma treatment device and/or a substrate accommodated in a plasma treatment device
03/01/2012WO2012025248A1 Method and device for treating a substrate by means of a plasma
03/01/2012WO2012008836A3 Inspection apparatus and replaceable door for a vacuum chamber of such an inspection apparatus and a method for operating an inspection apparatus
03/01/2012WO2011131172A3 Apparatus and method for coating substrates using the eb/pvd process
03/01/2012US20120049064 Charged Particle Apparatus
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