| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 02/08/2012 | CN202142496U 离子注入机的分析器 Ion implanter analyzer |
| 02/08/2012 | CN102347402A Plasma processing apparatus, plasma processing method and photoelectric conversion element |
| 02/08/2012 | CN102347224A Wafer gap positioning device used in implanter |
| 02/08/2012 | CN102347207A System for plasma process |
| 02/08/2012 | CN102347197A Method for dynamically detecting etched end point |
| 02/08/2012 | CN102347196A Structure of charge neutralization system for filament-free plasma overflow gun |
| 02/08/2012 | CN102347195A Method for improving stability and repeatability of extraction beam current of ion implanter |
| 02/08/2012 | CN102347194A Method for accurately controlling ion implantation distribution uniformity |
| 02/08/2012 | CN102347193A Optimization algorithm for quickly adjusting beam of large-angle ion implantation machine |
| 02/08/2012 | CN102347192A High-power electronic gun |
| 02/08/2012 | CN102347191A Split type ion source extraction electrode system |
| 02/08/2012 | CN102347190A Split type ion source extraction electrode system |
| 02/08/2012 | CN101473403B 用于检测和分类发弧的基于电流的方法和设备 For the detection and classification of the arcing current-based method and apparatus |
| 02/08/2012 | CN101472384B 大气压等离子反应器 An atmospheric pressure plasma reactor |
| 02/07/2012 | US8110820 Ion beam apparatus and method for ion implantation |
| 02/07/2012 | US8110818 Method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging system |
| 02/07/2012 | US8110815 Vapor delivery to devices under vacuum |
| 02/07/2012 | US8110813 Charged particle optical system comprising an electrostatic deflector |
| 02/07/2012 | US8110801 Layered scanning charged particle microscope package for a charged particle and radiation detector |
| 02/07/2012 | US8110800 Scanning electron microscope system and method for measuring dimensions of patterns formed on semiconductor device by using the system |
| 02/07/2012 | US8110086 Method of manufacturing a process chamber component having yttrium-aluminum coating |
| 02/07/2012 | CA2442040C Apparatus and method for imaging small objects in a flow stream using optical tomography |
| 02/03/2012 | DE202011109467U1 Plasmastromversorungssystem Plasma current Verso reasoning system |
| 02/02/2012 | WO2012016198A2 Electron detector including an intimately-coupled scintillator-photomultiplier combination, and electron microscope and x-ray detector employing same |
| 02/02/2012 | WO2012016055A1 Improved cryogenic specimen holder |
| 02/02/2012 | WO2012015474A1 Versatile beam glitch detection system |
| 02/02/2012 | WO2012014870A1 Aberration correction device and charged particle beam device employing same |
| 02/02/2012 | WO2012014665A1 Scanning transmission electron microscope and axial adjustment method thereof |
| 02/02/2012 | WO2012014373A1 Charged particle beam device |
| 02/02/2012 | WO2012014371A1 Stage apparatus |
| 02/02/2012 | WO2012014370A1 Charged particle beam emitting device |
| 02/02/2012 | WO2012014363A1 Device for setting image acquisition conditions, and computer program |
| 02/02/2012 | WO2012014362A1 Charged particle beam device |
| 02/02/2012 | WO2012014356A1 Pattern dimension measurement method using electron microscope, pattern dimension measurement system, and method for monitoring changes in electron microscope equipment over time |
| 02/02/2012 | WO2011151165A3 Control and/or regulatory device, control path, computer program, computer-readable storage medium and method for downloading the computer program |
| 02/02/2012 | WO2011130098A3 Ion beam sample preparation thermal management apparatus and methods |
| 02/02/2012 | WO2011127327A3 Combination laser and charged particle beam system |
| 02/02/2012 | US20120027681 Low-Aspect Ratio Carbon Nanostructures |
| 02/02/2012 | US20120025078 Particle Beam System |
| 02/02/2012 | US20120025077 Particle Beam System |
| 02/02/2012 | US20120025074 Electron detector including an intimately-coupled scintillator-photomultiplier combination, and electron microscope and x-ray detector employing same |
| 02/02/2012 | DE202008018196U1 Versorgungsendblock Supply terminal block |
| 02/02/2012 | DE19802848B4 Verfahren und Vorrichtung zum Testen eines Substrats Method and apparatus for testing a substrate |
| 02/02/2012 | DE10262340B4 Korrektureinrichtung zur Korrektur der sphärischen Aberration Correction means for correcting the spherical aberration |
| 02/02/2012 | DE102011108634A1 Substrat-Bearbeitungs-Vorrichtung Substrate processing apparatus |
| 02/02/2012 | DE102010038605A1 Zündschaltung zum Zünden eines mit Wechselleistung gespeisten Plasmas Ignition to ignite a plasma fed with AC power |
| 02/02/2012 | DE102010038603A1 Direct current plasma system, has direct current power supply connected to cathode and anode of plasma chamber, and switch connected between anode potential and plasma chamber potential |
| 02/02/2012 | DE102010032338A1 Microfocus X-ray tube of computed tomography system used for non-destructive testing of e.g. printed circuit board, has coil arrangement with cooling device for discharging cooling medium through flow channel |
| 02/01/2012 | EP2413345A1 Charged particle beam system |
| 02/01/2012 | EP2413126A2 TEM-lamella, process for its manufacture, and apparatus for executing the process |
| 02/01/2012 | EP2411999A1 Inductive plasma applicator |
| 02/01/2012 | EP2411998A1 Method and apparatus for generating three-dimensional image data |
| 02/01/2012 | EP2411996A2 Device for generating plasma and for directing an flow of electrons towards a target |
| 02/01/2012 | EP2041771B1 Method and device for producing an image |
| 02/01/2012 | EP1088327B1 Transmission electron microscope ccd camera |
| 02/01/2012 | CN202134501U 透射电镜用双轴倾转的原位力、电性能综合测试样品杆 In situ TEM biaxially tilting force, the electrical properties of a comprehensive test sample rod |
| 02/01/2012 | CN102341884A Method for assembling electron exit window and electron exit window assembly |
| 02/01/2012 | CN102339737A Plasma doping apparatus and plasma doping method |
| 02/01/2012 | CN102339718A Plasma ion implantation monitoring systems for fault detection and process control |
| 02/01/2012 | CN102339717A Toroidal low-field reactive gas and plasma source having a dielectric vacuum vessel |
| 02/01/2012 | CN102339716A Toroidal low-field reactive gas and plasma source having a dielectric vacuum vessel |
| 02/01/2012 | CN102339715A Mesh plate for ion neutralization |
| 02/01/2012 | CN102339714A Methods for determining the endpoint of a cleaning or conditioning process in a plasma processing system |
| 02/01/2012 | CN102337522A Method for judging etching ending point through pressure variation |
| 02/01/2012 | CN101675494B 用于确定离子束轮廓的方法和系统 Determining the ion beam profile for a method and system for |
| 02/01/2012 | CN101490792B 离子沉积设备 Ion deposition equipment |
| 02/01/2012 | CN101442872B 电极组件以及包含该电极组件的等离子处理室 The electrode assembly comprising the electrode assembly and a plasma processing chamber |
| 02/01/2012 | CN101383272B 等离子体反应器室中的具有晶片边缘气体注射的阴极衬套 Plasma reactor chamber having a cathode liner of the wafer edge gas injection |
| 01/31/2012 | US8106358 Layered scanning charged particle microscope with differential pumping aperture |
| 01/31/2012 | US8105466 Biased pulse DC reactive sputtering of oxide films |
| 01/30/2012 | DE202011052359U1 Anordnung zur plasmagestützten Beschichtung von Substraten Arrangement for plasma-assisted coating of substrates |
| 01/26/2012 | WO2012012523A1 System and method for controlling plasma deposition uniformity |
| 01/26/2012 | WO2012010374A1 Arc quenching assembly and method for quenching arcs |
| 01/26/2012 | US20120021592 Apparatus and method for doping |
| 01/26/2012 | US20120019648 Electron microscope |
| 01/26/2012 | US20120018630 Nonoparticulate Assisted Nanoscale Molecular Imaging by Mass Spectrometery |
| 01/26/2012 | DE102011108632A1 Substratstage, Substrat-Prozessierungs-Vorichtung und Substrat-Prozessierungs-System Substrate days, substrate Prozessierungs-Vorichtung and substrate Prozessierungs system |
| 01/26/2012 | DE102011054537A1 Apparatus for detecting defect in sample e.g. wafer for semiconductor component, produces subtraction image based on difference between image data of observation region in different directions to detect defect in observation region |
| 01/26/2012 | DE102010038385A1 Exit gate ventilating arrangement for use in vacuum treatment plant, has air guide designed as air stream channel consisting of heat conducting material and in heat-conducting connection with wall for vacuum treatment plant |
| 01/26/2012 | DE102010031568A1 Arclöschanordnung und Verfahren zum Löschen von Arcs Arclöschanordnung and method of erasing Arcs |
| 01/25/2012 | EP2410555A1 Apparatus and method for detecting a state of a deposition apparatus |
| 01/25/2012 | EP2410379A2 Substrate to be processed having laminated thereon resist film for electron beam and organic conductive film, method for manufacturing the same, and resist pattering process |
| 01/25/2012 | EP2410075A2 Methods and apparatus of arc prevention during RF sputtering of a thin film on a substrate |
| 01/25/2012 | EP2409313A1 Substrate processing system and substrate processing method |
| 01/25/2012 | EP2409139A2 Non-coherent light microscopy |
| 01/25/2012 | EP2409132A1 Method for determining the surface radius and/or particle density of a powder |
| 01/25/2012 | EP1656694B1 High aspect ratio etch using modulation of rf powers of various frequencies |
| 01/25/2012 | CN102332385A Mesh plate structure for ion neutralization |
| 01/25/2012 | CN102332384A Device and method for producing neutral particle beams |
| 01/25/2012 | CN102332383A End point monitoring method for plasma etching process |
| 01/25/2012 | CN102332382A Method of processing of an object |
| 01/25/2012 | CN101882647B Movable holder for silicon-based film solar cells |
| 01/25/2012 | CN101882646B Deposition clamp of film solar cell |
| 01/25/2012 | CN101504906B Ion beam guide tube |
| 01/25/2012 | CN101426327B Plasma jet device |
| 01/24/2012 | US8103980 Beam dose computing method and writing method and record carrier body and writing apparatus |
| 01/24/2012 | US8101927 Masking apparatus for an ion implanter |
| 01/24/2012 | US8101924 Object-positioning device for charged-particle beam system |
| 01/24/2012 | US8101911 Method and device for improved alignment of a high brightness charged particle gun |
| 01/24/2012 | US8101246 Device for carrying out a plasma-assisted process |