| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 01/19/2012 | WO2012009543A2 Improved contrast for scanning confocal electron microscope |
| 01/19/2012 | WO2012008836A2 Inspection apparatus and replaceable door for a vacuum chamber of such an inspection apparatus and a method for operating an inspection apparatus |
| 01/19/2012 | WO2012008512A1 Image processing method, image processing system, and x-ray computed tomography system |
| 01/19/2012 | WO2012008096A1 Charged particle beam device, defect supervision device, and management server |
| 01/19/2012 | WO2012008091A1 Charged particle beam device |
| 01/19/2012 | WO2012008089A1 Apparatus and method for analyzing minute sample |
| 01/19/2012 | WO2012007602A1 Method for manufacturing nanoneedles in areas of interest located inside solid samples on the nanometre scale |
| 01/19/2012 | WO2012007483A1 Plasma processing in a capacitively-coupled reactor with trapezoidal-waveform excitation |
| 01/19/2012 | WO2012007256A1 Magnet arrangement for a target backing tube, target backing tube including the same, cylindrical target assembly and sputtering system |
| 01/19/2012 | WO2012007165A1 Method and device for the plasma treatment of flat substrates |
| 01/19/2012 | WO2011130097A3 Ion beam sample preparation apparatus and methods |
| 01/19/2012 | DE19946447B4 Teilchenoptisches Abbildungssystem für Lithographiezwecke A particle imaging system for lithography purposes |
| 01/19/2012 | DE112009002439T5 4D-Bildgebung in einem ultraschnellen Elektronenmikroskop 4D imaging in an ultrafast electron microscope |
| 01/19/2012 | DE112009002402T5 Raser-Ladungsteilchenmikroskop Raser charged particle |
| 01/19/2012 | DE102010027224A1 Elektrode zur Erzeugung eines Plasmas, Plasmakammer mit dieser Elektrode und Verfahren zur in situ-Analyse oder -in situ-Bearbeitung einer Schicht oder des Plasmas Electrode to generate a plasma, the plasma chamber with this electrode and method for in situ analysis or -in situ processing of a layer or of the plasma |
| 01/19/2012 | DE102008033904B4 Antriebsendblock für eine Magnetronanordnung mit einem rotierenden Target Drive end block for a magnetron with a rotating target |
| 01/19/2012 | DE102008033902B4 Endblock für eine Magnetronanordnung mit einem rotierenden Target und Vakuumbeschichtungsanlage End block for a magnetron with a rotating target and vacuum coating system |
| 01/19/2012 | DE102008018609B4 Antriebsendblock für ein rotierendes Magnetron Drive end block for a rotating magnetron |
| 01/18/2012 | EP2407999A1 Magnet arrangement for a target backing tube, target backing tube including the same, cylindrical target assembly and sputtering system |
| 01/18/2012 | EP2407998A1 Plasma processing in a capacitively-coupled reactor with trapezoidal-waveform excitation |
| 01/18/2012 | EP2406810A2 Electrostatic lens structure |
| 01/18/2012 | EP2406807A1 Method for assembling an electron exit window and an electron exit window assembly |
| 01/18/2012 | CN202120861U Cover for preventing plasma radiation |
| 01/18/2012 | CN202120860U Sample fixing device used for sample stage of scanning electron microscope |
| 01/18/2012 | CN102324451A Method for manufacturing ESD protection circuit on LED chip by sacrificing luminescence area |
| 01/18/2012 | CN102324383A Ion implantation method |
| 01/18/2012 | CN102324368A Sputtering anode cap and sputtering device |
| 01/18/2012 | CN102324367A RF grounding of cathode in process chamber |
| 01/18/2012 | CN102324366A Multi-wafer positioning system for ion implanter and positioning method thereof |
| 01/18/2012 | CN102324365A Ion source, system and method |
| 01/18/2012 | CN101512716B Method and apparatus for extracting ions from an ion source for use in ion implantation |
| 01/18/2012 | CN101461026B Slider bearing for use with an apparatus comprising a vacuum chamber |
| 01/18/2012 | CN101243532B Detector for electron column and method for detecting electrons for electron column |
| 01/17/2012 | US8099793 Scanning probe microscope with automatic probe replacement function |
| 01/17/2012 | US8097860 Multiple nozzle gas cluster ion beam processing system and method of operating |
| 01/17/2012 | US8097849 Electron microscope device |
| 01/17/2012 | US8097848 Scanning electron microscope |
| 01/17/2012 | US8097847 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements |
| 01/17/2012 | US8097846 Metrology and 3D reconstruction of devices in a wafer |
| 01/17/2012 | CA2634313C Point-of-use water treatment system |
| 01/16/2012 | DE202010014176U1 Vorrichtung zum Behandeln von Oberflächen mit Entladungsüberwachung Apparatus for treating surfaces with discharge monitoring |
| 01/16/2012 | DE202008018179U1 Vorrichtung zur räumlichen Darstellung von Proben in Echtzeit Apparatus for spatial representation of samples in real time |
| 01/13/2012 | DE202011106205U1 Substratträger Substrate carrier |
| 01/12/2012 | WO2012006558A2 Charged particle beam processing system with visual and infrared imaging |
| 01/12/2012 | WO2012006168A1 Handling beam glitches during ion implantation of workpieces |
| 01/12/2012 | WO2012005232A1 Charged particle beam device and sample production method |
| 01/12/2012 | WO2012005056A1 Scanning transmission type electron microscope |
| 01/12/2012 | WO2012004495A1 Method for treating a surface of a polymeric part by multi-energy ions |
| 01/12/2012 | WO2012004175A1 Method and device for atmospheric pressure plasma treatment |
| 01/12/2012 | WO2012003994A1 Magnetron sputtering apparatus |
| 01/12/2012 | US20120009829 Electrical joint member for reducing an electrical resistance between conductive members in a plasma processing apparatus |
| 01/12/2012 | US20120009692 System and Method of Dosage Profile Control |
| 01/12/2012 | US20120006984 Method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging system |
| 01/12/2012 | US20120006492 Plasma processor and plasma processing method |
| 01/12/2012 | DE202011106761U1 Vakuum-Substratbehandlungsanlage Vacuum substrate treatment plant |
| 01/12/2012 | DE112008003986T5 Elektronenerfassungsgerät und Rasterelektronenmikroskop Electron capture device and scanning electron microscope |
| 01/12/2012 | DE10240859B4 Differentielles Kontrasttransmissionselektronenmikroskop und Verfahren zur Verarbeitung von elektronenmikroskopischen Bilddaten Differential contrast transmission electron microscope and method for processing electron microscopic image data |
| 01/12/2012 | DE102010031259A1 Supporting device for a magnetron arrangement having a rotating target, comprises a drive shaft, at which a first end for connecting to the rotating target is formed and a second end for introducing a torque is formed, and a drive unit |
| 01/12/2012 | DE102010031205A1 Magnetron device, has magnet system arranged inside pipe target and extended with coating material, where outer side of coating material-free end region of support tube is made from reduced sputteringability material |
| 01/12/2012 | DE102010026722A1 Device for modifying surface area of e.g. sheet goods, has plasma generation device whose electrodes are arranged at front side, gap formed between electrodes, and another gap formed between electrodes and goods |
| 01/12/2012 | DE102010026169A1 Particle beam system for e.g. detecting electrons from object to be examined, has electron receiving surface, where area maximum expansion is smaller than distance between object plane at surface nearest arranged location and oriented plane |
| 01/11/2012 | EP2405566A1 Alternating current power supply for sputtering apparatus |
| 01/11/2012 | EP2405462A1 Method and system for preparing a sample |
| 01/11/2012 | EP2405461A1 Method and system for preparing a lamella |
| 01/11/2012 | EP2405460A1 Electron beam device with tilting and dispersion compensation, and method of operating same |
| 01/11/2012 | EP2405459A1 A multiple beam charged particle optical system |
| 01/11/2012 | EP2405458A1 A multiple beam charged particle optical system |
| 01/11/2012 | CN102318034A Apparatus for large area plasma processing |
| 01/11/2012 | CN102318033A Method and device for plasma treatment of a flat substrate |
| 01/11/2012 | CN102318032A Method and apparatus for plasma process performance matching in multiple wafer chambers |
| 01/11/2012 | CN102315150A Movable ground ring for a plasma processing chamber |
| 01/11/2012 | CN102315085A Uniform ring inclination warning device for reaction cavity of plasma body etching machine |
| 01/11/2012 | CN102315073A Methods of arc detection and suppression during RF sputtering of a thin film on a substrate |
| 01/11/2012 | CN102315072A Plasma treatment apparatus and plasma treatment method |
| 01/11/2012 | CN102315071A Power supplying means having shielding means for shielding feeding line and apparatus for treating substrate including the same |
| 01/11/2012 | CN102315070A Apparatus and method for plasma texturing of solar cell |
| 01/11/2012 | CN102315069A Method for detecting ion implantation machine |
| 01/11/2012 | CN102315068A Separation plate device for double-cavity structure plasma body soaking ion injection |
| 01/11/2012 | CN102315067A Magnifying Observation Apparatus |
| 01/11/2012 | CN102315066A Charged particle beam apparatus and sample processing method |
| 01/11/2012 | CN102315065A Beam current transmission system and method |
| 01/11/2012 | CN102315064A Magnetron and thin film deposition treatment equipment applying same |
| 01/11/2012 | CN102315058A Transmission electron microscope microgrid and preparation method thereof |
| 01/11/2012 | CN101783281B Plasma etching device and etching method of grid electrode |
| 01/11/2012 | CN101627454B Plasma source with liner for reducing metal contamination |
| 01/11/2012 | CN101617422B Electrode active material and manufacturing method of the same |
| 01/11/2012 | CN101061563B Improved ion beam utilization during scanned ion implantation |
| 01/10/2012 | US8094298 Method for detecting particles and defects and inspection equipment thereof |
| 01/10/2012 | US8093567 Method and system for counting secondary particles |
| 01/10/2012 | US8093556 Device and method for analyzing a sample |
| 01/10/2012 | US8091506 High velocity method for depositing diamond films from a gaseous phase in SHF discharge plasma and a plasma reactor for carrying out said method |
| 01/05/2012 | WO2012003445A1 Plasma uniformity system and method |
| 01/05/2012 | WO2012003339A1 Control apparatus for plasma immersion ion implantation of a dielectric substrate |
| 01/05/2012 | WO2012003327A1 Glitch control during implantation |
| 01/05/2012 | WO2012003154A1 Deceleration lens |
| 01/05/2012 | WO2012001883A1 Electron beam irradiation method and scanning electronic microscope |
| 01/05/2012 | WO2012001876A1 Pattern matching method, image processing device, and computer program |
| 01/05/2012 | WO2012001330A2 Method for the surface treatment of a fluid product dispensing device |
| 01/05/2012 | WO2012001328A2 Method for the surface treatment of a fluid product dispensing device |
| 01/05/2012 | WO2012001326A2 Method for treating a surface of a device for dispensing a fluid product |