Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
04/2012
04/11/2012CN102414777A 真空腔中产生真空的带电粒子光刻设备及方法 Vacuum producing charged particles of the lithographic apparatus and method for the vacuum chamber
04/11/2012CN102414776A Lithography machine and substrate handling arrangement
04/11/2012CN102414775A Method and arrangement for realizing vacuum in vacuum chamber
04/11/2012CN102414463A A magnetic bearing, a rotary stage, and a reflective electron beam lithography apparatus
04/11/2012CN102412144A Plasma etching method, device thereof and plasma etching method for diffusion barrier layers
04/11/2012CN102412137A 制作均匀的细微图案等离子体刻蚀方法 Produce a uniform pattern of plasma etching fine
04/11/2012CN102412108A 高吸附拼接式碳纤维u型槽 High adsorption stitching and carbon-fiber u-groove
04/11/2012CN101689462B 防止离子注入机中因三重接面击穿的不稳定的高压绝缘体 An ion implanter to prevent junction breakdown due to the unstable triplet high-voltage insulator
04/11/2012CN101685791B 基片支承装置及其静电释放方法 Substrate support apparatus and method for electrostatic discharge
04/10/2012US8154210 Ion implantation ion source, system and method
04/10/2012US8153996 Pattern forming apparatus and pattern forming method
04/10/2012US8153995 Ion implanting apparatus
04/10/2012US8153993 Front plate for an ion source
04/10/2012US8153991 Direct write lithography system
04/10/2012US8153970 Scanning electron microscope
04/10/2012US8153968 Laser atom probe methods
04/10/2012US8153966 Electrode unit and charged particle beam device
04/10/2012US8153965 Apparatus and method for merging a low energy electron flow into a high energy electron flow
04/05/2012WO2012044977A2 Compact rf antenna for an inductively coupled plasma ion source
04/05/2012WO2012044677A1 Method and system for modifying patterned photoresist using multi-step ion implantion
04/05/2012WO2012044536A1 Method and system for modifying photoresist using electromagnetic radiation and ion implantion
04/05/2012WO2012044533A1 Integrated shadow mask/carrier for pattern ion implantation
04/05/2012WO2012043908A1 Radiation detector and method for detecting radiation
04/05/2012WO2012043475A1 Photo-cathode high-frequency electron-gun cavity apparatus
04/05/2012WO2012043363A1 Charged particle beam device, thin film forming method, defect correction method and device fabrication method
04/05/2012WO2012042738A1 Scanning electron microscope
04/05/2012WO2012041920A1 Coating substrates with an alloy by means of cathode sputtering
04/05/2012WO2012041721A1 Deconvolution of time-gated cathodoluminescence images
04/05/2012WO2012041557A1 Systems and methods for forming a layer of sputtered material
04/05/2012WO2012041464A1 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
04/05/2012WO2012040986A1 Plasma processing apparatus
04/05/2012WO2012001325A3 Method for the surface treatment of a fluid product dispensing device
04/05/2012US20120083102 Integrated Shadow Mask/Carrier for Pattern Ion Implantation
04/05/2012US20120081532 Illumination apparatus and examination system
04/05/2012US20120080609 Grid providing beamlet steering
04/05/2012US20120080596 Laser Atom Probe and Laser Atom Probe Analysis Methods
04/05/2012DE212009000140U1 Plasmaversorgungseinrichtung Plasma power supply
04/05/2012DE102010047331A1 Ionenstrahlgerät und Verfahren zum Betreiben desselben Of the same ion beam device and method of operating
04/05/2012DE102010041813A1 Teilchenstrahlgerät und Verfahren zur Untersuchung und/oder Bearbeitung eines Objekts Particle beam device and method for the examination and / or machining of an object
04/05/2012DE102010030608B4 Vorrichtung zur plasmagestützten Bearbeitung von Substraten Apparatus for plasma-assisted processing of substrates
04/05/2012DE102009051056B4 Verfahren zum Wiederherstellen des Betriebszustandes der Entladung beim Magnetronsputtern und Schaltung zur Durchführung des Verfahrens A method for restoring the operating state of the discharge in the magnetron sputtering and circuit for carrying out the method
04/04/2012EP2437280A1 Systems and methods for forming a layer of sputtered material
04/04/2012EP2437279A2 Ion beam system and method of operating an ion beam system
04/04/2012EP1401013B1 Plasma processing device
04/04/2012CN102405107A Optical probing in electron microscopes
04/04/2012CN102403183A Plasma etching processing apparatus, plasma etching method, and semiconductor device manufacturing method
04/04/2012CN102403182A 等离子体处理装置及等离子体处理方法 The plasma processing apparatus and plasma processing method
04/04/2012CN102403181A 工艺腔室及应用该工艺腔室的等离子体处理设备 Application of the process chamber and the process chamber, a plasma processing apparatus
04/04/2012CN102400088A Glow large-beam low-voltage plasma activation process for flexible metal substrate
04/04/2012CN101667520B 基板载置机构、基板处理装置和基板载置机构的控制方法 The substrate mounting mechanism and a substrate processing apparatus control method of the base board is set mechanism
04/04/2012CN101414128B 电子束曝光系统 Electron beam exposure system
04/03/2012US8149256 Techniques for changing temperature of a platen
04/03/2012US8148702 Arrangement for the illumination of a substrate with a plurality of individually shaped particle beams for high-resolution lithography of structure patterns
04/03/2012US8148700 Speciman holder and speciman holder movement device
04/03/2012US8148698 Charged particle beam writing apparatus
04/03/2012US8148685 Transmission electron microscope micro-grid
04/03/2012US8148680 Ion transfer arrangement with spatially alternating DC and viscous ion flow
04/03/2012US8148679 Efficient atmospheric pressure interface for mass spectrometers and method
04/03/2012US8147705 Method of operating ion source and ion implanting apparatus
03/2012
03/29/2012WO2012040482A2 Adapter ring for silicon electrode
03/29/2012WO2012040014A1 Ion beam tuning
03/29/2012WO2012039206A1 Charged particle beam microscope
03/29/2012WO2012038926A1 Method of depositing a layer of a material on a substrate
03/29/2012WO2012038484A1 Method of preparing a biological sample for inspection with electron microscopy and fluorescent light microscopy
03/29/2012WO2012038369A1 Unit for the treatment of an object, in particular the surface of a polymer object
03/29/2012WO2012001330A3 Method for the surface treatment of a fluid product dispensing device
03/29/2012WO2012001328A3 Method for the surface treatment of a fluid product dispensing device
03/29/2012WO2012001326A3 Method for treating a surface of a device for dispensing a fluid product
03/29/2012US20120074320 Particle beam device having a sample holder
03/29/2012US20120074319 Method and apparatus for reviewing defects
03/29/2012US20120074317 Particle Beam Microscope and Method for Operating the Particle Beam Microscope
03/29/2012US20120074314 Structure and method for determining a defect in integrated circuit manufacturing process
03/29/2012DE102010046902A1 Operation method of particle beam microscope e.g. electron microscope, involves determining surface model of microscope structure depending on light beams emanating from structure, and position and orientation of surface model
03/29/2012DE102010041678A1 Teilchenstrahlgerät mit einem Probenträger Particle beam with a sample holder
03/29/2012DE102010002753B4 Plasmaversorgungsanordnung mit mehreren Leistungskopplungsstufen Plasma supply arrangement with multiple deliverables coupling steps
03/29/2012DE102007049735B4 Versorgungsendblock für ein Rohrmagnetron Supply terminal block for a tubular magnetron
03/29/2012DE102004054092B4 Zündvorrichtung Primer
03/28/2012EP2434525A1 Method and apparatus for plasma generation
03/28/2012EP2434524A2 Methods of sputtering using a non-bonded semiconducting target
03/28/2012EP2434523A2 Sputtering cathode having a non-bonded semiconducting target
03/28/2012EP2434522A1 Multi-charged beam lens, charged-particle beam exposure apparatus using the same, and device manufacturing method
03/28/2012EP2434521A2 Laser atom probe and laser atom probe analysis methods
03/28/2012EP2433295A2 Dual pass scanning
03/28/2012EP2433294A1 Method of generating a two-level pattern for lithographic processing and pattern generator using the same
03/28/2012EP2433293A1 Scan method
03/28/2012EP2167270B1 Gas distributor comprising a plurality of diffusion-welded panes and a method for the production of such a gas distributor
03/28/2012CN102394211A Control equipment of tungsten growth and method thereof
03/28/2012CN102394210A Device and method used for preparing transparent conducting film of thin film solar cell
03/28/2012CN102394209A Measurement and endpointing of sample thickness
03/28/2012CN102390069A Atmospheric-pressure and low-temperature plasma continuous treatment device of wooden thin plates
03/28/2012CN101964292B Graphene sheet-carbon nanotube film composite structure and preparation method thereof
03/28/2012CN101964291B Micro grid of transmission electron microscope and preparation method thereof
03/27/2012US8143604 Insulator system for a terminal structure of an ion implantation system
03/27/2012US8143593 Transmission electron microscope sample holder with optical features
03/27/2012US8143590 Ion source apparatus
03/27/2012US8143589 Stable emission gas ion source and method for operation thereof
03/27/2012CA2634530C Point-of-use water treatment system
03/22/2012WO2012037007A2 Method for extending lifetime of an ion source
03/22/2012WO2012036718A1 Improved method of co-sputtering alloys and compounds using a dual c-mag cathode arrangement and corresponding apparatus
03/22/2012WO2012035277A1 Electron gun emitting under high voltage, in particular for electron microscopy
1 ... 59 60 61 62 63 64 65 66 67 68 69 70 71 72 73 74 75 76 77 78 79 ... 469