| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 05/16/2012 | CN102460631A Dual pass scanning |
| 05/16/2012 | CN102460630A Charged particle optical system comprising an electrostatic deflector |
| 05/16/2012 | CN102460629A 在不利条件下执行均匀的剂量注入的系统和方法 System and method for performing a uniform dose injected under adverse conditions |
| 05/16/2012 | CN102458031A 用于等离子体应用和/或感应加热应用的功率供给系统 For plasma application and / or application of induction heating power supply system |
| 05/16/2012 | CN102456597A 基板处理设备以及拆分和组装所述基板处理设备的方法 The substrate processing apparatus and method of splitting and assembling the substrate processing apparatus |
| 05/16/2012 | CN102456533A 等离子体处理装置及等离子体cvd装置 Plasma processing apparatus and plasma cvd apparatus |
| 05/16/2012 | CN102456532A 基板处理装置及方法 Substrate processing apparatus and method |
| 05/16/2012 | CN102456531A 等离子体处理装置 Plasma processing apparatus |
| 05/16/2012 | CN102456530A Ion implantation system and ion implantation method using the same |
| 05/16/2012 | CN102456529A Improvements in and relating to charged particle beam devices |
| 05/16/2012 | CN101866804B TEM micro grid |
| 05/16/2012 | CN101692369B Mass analyzing magnet for broadband ion beam and implanter system |
| 05/16/2012 | CN101413113B Vertical plasma processing apparatus and use method thereof |
| 05/15/2012 | US8178856 Charged particle beam writing apparatus and method thereof |
| 05/15/2012 | US8178840 Specimen inspection equipment and how to make the electron beam absorbed current images |
| 05/15/2012 | US8178836 Electrostatic charge measurement method, focus adjustment method, and scanning electron microscope |
| 05/15/2012 | US8177948 Device for carbon deposition |
| 05/10/2012 | WO2012061621A2 Electron flow generation |
| 05/10/2012 | WO2012061043A1 Scanning incremental focus microscopy |
| 05/10/2012 | WO2012060416A1 Ion milling device |
| 05/10/2012 | WO2012060226A1 Apparatus for swinging substrate in longitudinal-direction, substrate stage apparatus, and ion implantation apparatus |
| 05/10/2012 | WO2012060056A1 Sampling device |
| 05/10/2012 | WO2012059203A1 Apparatus for treatment of substrates |
| 05/10/2012 | WO2012058785A1 Variable eccentricity type magnetron |
| 05/10/2012 | WO2012040482A3 Adapter ring for silicon electrode |
| 05/10/2012 | WO2011156421A3 Incoherent transmission electron microscopy |
| 05/10/2012 | US20120115306 Deflector array, charged particle beam drawing apparatus, device manufacturing method, and deflector array manufacturing method |
| 05/10/2012 | US20120112067 Scanning electron microscope system and method for measuring dimensions of patterns formed on semiconductor device by using the system |
| 05/10/2012 | US20120112066 Defect review apparatus and defect review method |
| 05/10/2012 | US20120112065 Apparatus and method for estimating change of status of particle beams |
| 05/10/2012 | US20120112064 Sample holder, method for use of the sample holder, and charged particle device |
| 05/10/2012 | US20120112063 Method and apparatus for generating three-dimensional image data |
| 05/10/2012 | DE102010043463A1 Verfahren zum Herstellen einer Elektrode für eine Hochdruckentladungslampe und Hochdruckentladungslampe mit mindestens einer derart hergestellten Elektrode A method of manufacturing an electrode for a high pressure discharge lamp and high-pressure discharge lamp with at least one electrode so prepared |
| 05/10/2012 | DE102010040324B3 Ionenstrahlvorrichtung zur Bearbeitung eines Substrats Ion beam apparatus of processing a substrate |
| 05/10/2012 | DE102008006032B4 Ionenabtastvorrichtungen in eine Polarität schnell umschaltenden Ionenquellen Ionenabtastvorrichtungen in a fast switching polarity ion sources |
| 05/09/2012 | EP2450937A2 Magnetic circuit for sputtering apparatus |
| 05/09/2012 | EP2450936A1 Microscope system, method for operating a charged-particle microscope |
| 05/09/2012 | EP2450935A2 Environmental cell for charged particle beam system |
| 05/09/2012 | EP2450934A2 Environmental cell for charged particle beam system |
| 05/09/2012 | EP1738392B1 Illumination condenser for a particle optical projection system |
| 05/09/2012 | CN202217638U Fixture used for scanning of scanning electron microscope |
| 05/09/2012 | CN1905135B Plasma etching apparatus |
| 05/09/2012 | CN102449726A Plasma deposition source and method for depositing thin films |
| 05/09/2012 | CN102449721A Device for generating plasma and for directing an flow of electrons towards a target |
| 05/09/2012 | CN102446738A Plasma etching device |
| 05/09/2012 | CN102446737A Substrate processing method and substrate processing apparatus |
| 05/09/2012 | CN102446691A Pre-analyzer for ion implanter |
| 05/09/2012 | CN102446690A Mechanical device for correcting uniformity of ion beams |
| 05/09/2012 | CN102446689A In-vacuum electrode inlet device |
| 05/09/2012 | CN102446688A Two-dimensional scanning method for controlling uniform implantation of ions |
| 05/09/2012 | CN102446687A Two-dimensional scanning device for controlling uniform ion implantation |
| 05/09/2012 | CN102446686A Two-channel fast aerating air channel |
| 05/09/2012 | CN102446685A Method of controlling crucible in ion source |
| 05/09/2012 | CN102446684A Structure of parallel beam limiting diaphragm based on ion implantation |
| 05/09/2012 | CN102446683A Bottom-mounted lens coupled transmission electron microscope digital imaging device |
| 05/09/2012 | CN102446682A Ion implantation low-energy lens |
| 05/09/2012 | CN102446681A Analytic diaphragm used for ion implantation machine |
| 05/09/2012 | CN102446680A Novel emission electron cathode for effectively increasing multi-charge ion yield |
| 05/09/2012 | CN102446679A Ion optical system of novel monolithic implantation ion implanter with large tilt angle |
| 05/09/2012 | CN102445901A Method for automatically stabilizing arc stream of ion source |
| 05/09/2012 | CN101826435B Plasma etching method, plasma etching apparatus |
| 05/09/2012 | CN101730374B Plasma system |
| 05/09/2012 | CN101681785B Apparatus and methods for improving treatment uniformity in a plasma process |
| 05/09/2012 | CN101587814B A plasma processing apparatus and a processed air supply apparatus used therefor |
| 05/09/2012 | CN101348902B Diffuser plate with slit valve compensation |
| 05/08/2012 | US8173981 Gantry for medical particle therapy facility |
| 05/08/2012 | US8173978 Method for controlling electron beam in multi-microcolumn and multi-microcolumn using the same |
| 05/08/2012 | US8173453 Laser patterning of encapsulated organic light emitting diodes |
| 05/03/2012 | WO2012057230A1 Defect inspection method and device therefor |
| 05/03/2012 | WO2012057166A1 Electron lens and the electron beam device |
| 05/03/2012 | WO2012057107A1 Laser ion source |
| 05/03/2012 | WO2012056639A1 Pattern determination device and computer program |
| 05/03/2012 | WO2012055938A1 Modulation device and charged particle multi-beamlet lithography system using the same |
| 05/03/2012 | WO2012055936A1 Lithography system, modulation device and method of manufacturing a fiber fixation substrate |
| 05/03/2012 | WO2012055458A1 Device for producing an electron beam |
| 05/03/2012 | WO2012021652A3 Charged particle detector |
| 05/03/2012 | WO2012018827A3 Electron microscope sample holder for forming a gas or liquid cell with two semiconductor devices |
| 05/03/2012 | WO2012008836A4 Inspection apparatus and replaceable door for a vacuum chamber of such an inspection apparatus and a method for operating an inspection apparatus |
| 05/03/2012 | US20120108063 Beam dose computing method and writing method and record carrier body and writing apparatus |
| 05/03/2012 | US20120104285 Ion implantation method and ion implantation apparatus |
| 05/03/2012 | US20120104254 Charged particle beam device |
| 05/03/2012 | US20120104253 Charged particle beam microscope and measuring method using same |
| 05/03/2012 | US20120104252 Particle-Optical Systems and Arrangements and Particle-Optical Components for such Systems and Arrangements |
| 05/03/2012 | US20120104251 Scanning electron microscope device, evaluation point generating method, and program |
| 05/03/2012 | US20120104250 Microscope System, Method for Operating a Charged-Particle Microscope |
| 05/03/2012 | DE102010050258A1 Vorrichtung zum Behandeln von Substraten Apparatus for processing substrates |
| 05/03/2012 | DE102010043114A1 Magnetron device comprises a unilaterally mounted tube target and a unilaterally mounted magnet system, where the tube target comprises a single-or multi-piece carrier pipe, which is coated with a coating material on its outer side |
| 05/03/2012 | DE102008062450B4 Anordnung zur Beleuchtung eines Substrats mit mehreren individuell geformten Partikelstrahlen zur hochauflösenden Lithographie von Strukturmustern Arrangement for illuminating a substrate having a plurality of individually shaped particle beams for high-resolution lithography of structural patterns |
| 05/03/2012 | DE102008011530B4 Verfahren zum Bearbeiten eines Objekts mit miniaturisierten Strukturen A method for processing an object with miniaturized structures |
| 05/02/2012 | EP2447978A2 Arc source |
| 05/02/2012 | EP2446459A2 Charged particle detectors |
| 05/02/2012 | EP2446458A1 Plasma grid implant system for use in solar cell fabrications |
| 05/02/2012 | EP2446457A1 Method for discrimination of backscattered from incoming electrons in imaging electron detectors with a thin electron-sensitive layer |
| 05/02/2012 | EP2446456A1 Magnetically insulated cold-cathode electron gun |
| 05/02/2012 | EP2062283B1 Enhanced virtual anode |
| 05/02/2012 | EP2044608B1 Ion sources |
| 05/02/2012 | EP1664924B1 Method for high-resolution etching of thin layers with electron beams |
| 05/02/2012 | EP1185248B1 Supercritical fluid-assisted nebulization and bubble drying |
| 05/02/2012 | CN202210507U Plasma reactor |
| 05/02/2012 | CN102439693A Workpiece handling system |