| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 05/30/2012 | CN102484027A Charged-particle Energy Analyzer |
| 05/30/2012 | CN102484026A Pattern modification schemes for improved FIB patterning |
| 05/30/2012 | CN102484025A Charged particle beam device and image display method |
| 05/30/2012 | CN102484024A 电子枪、真空处理装置 An electron gun, the vacuum processing apparatus |
| 05/30/2012 | CN102479658A 等离子体处理装置及处理系统 The plasma processing apparatus and processing system |
| 05/30/2012 | CN102479657A 一种多段式匹配器 A multi-stage matcher |
| 05/30/2012 | CN102479656A Vacuum pipeline type beam current regulator |
| 05/30/2012 | CN102479655A Ion implantation method and ion implanter |
| 05/30/2012 | CN102479654A 离子注入设备及方法 Ion implantation apparatus and method |
| 05/30/2012 | CN102479653A 一种剥离原子核外电子的方法及其装置 A release atom method and apparatus extranuclear |
| 05/30/2012 | CN102479652A 采用紫外或深紫外激光源的高空间分辨光发射电子显微镜 UV or deep UV laser source emitting light with high spatial resolution electron microscopy |
| 05/30/2012 | CN102479651A 一种用于深紫外激光器与光发射电子显微镜连接的连接杆 A connecting rod DUV laser light emission electron microscope for the connection |
| 05/30/2012 | CN102157372B Plasma processing apparatus and method |
| 05/30/2012 | CN102005362B Calibration system and calibration method for dual-Faraday cup measuring ratios of ion implantation machine |
| 05/30/2012 | CN101964289B Method for manufacturing acceleration pole for transmission electron microscope and ceramic rings thereof |
| 05/30/2012 | CN101785080B Plasma processing device |
| 05/30/2012 | CN101764040B Control method for plasma etching |
| 05/30/2012 | CN101719457B Superconducting coil-based high-intensity magnetic field magnetic control sputtering cathode |
| 05/30/2012 | CN101689488B Cathode having electron production and focusing grooves, ion source and related method |
| 05/30/2012 | CN101667527B Method for repairing display device and apparatus for same |
| 05/30/2012 | CN101484966B Apparatus for electron beam evaporation |
| 05/30/2012 | CN101473406B Method for controlling a reactive high-power pulsed magnetron sputter process and corresponding device |
| 05/30/2012 | CN101401187B Technique for monitoring and controlling a plasma process |
| 05/30/2012 | CN101015034B Faraday dose and uniformity monitor for plasma based ion implantion |
| 05/29/2012 | US8188445 Ion source |
| 05/29/2012 | US8188429 Scanning electron microscope for determining quality of a semiconductor pattern |
| 05/29/2012 | US8188428 Scanning electron microscope |
| 05/29/2012 | US8187521 Method and device for producing three-dimensional objects |
| 05/24/2012 | WO2012068401A1 Sub-nanosecond ion beam pulse radio frequency quadrupole (rfq) linear accelerator system |
| 05/24/2012 | WO2012068322A1 Semiconductor structure made using improved pseudo-simultaneous multiple ion implantation process |
| 05/24/2012 | WO2012068039A1 Improved simultaneous multiple ion implantation process and apparatus semiconductor structure made using same |
| 05/24/2012 | WO2012068034A1 Semiconductor structure made using improved multiple ion implantation process |
| 05/24/2012 | WO2012067653A1 Implementation of co-gases for germanium and boron ion implants |
| 05/24/2012 | WO2012067652A1 Hydrogen cogas for carbon implant |
| 05/24/2012 | WO2012066080A1 Sputtering apparatus and method |
| 05/24/2012 | WO2012066079A1 Soft sputtering magnetron system |
| 05/24/2012 | WO2012065980A1 Microwave icp resonator |
| 05/24/2012 | WO2012065941A1 Charged particle lithography system with aperture array cooling |
| 05/24/2012 | WO2012065312A1 Method for generating electrons in electron source, electron generation device and manufacturing method thereof |
| 05/24/2012 | US20120129948 Medical implant producing wear particles with benign body response |
| 05/24/2012 | US20120126459 Drawing apparatus, method of manufacturing article, method of manufacturing deflecting apparatus, and method of manufacturing drawing apparatus |
| 05/24/2012 | US20120126119 Charged-Particle-Beam Device |
| 05/24/2012 | US20120126118 Charged particle beam apparatus and method for stably obtaining charged particle beam image |
| 05/24/2012 | US20120126117 Scanning electron microscope and method for processing an image obtained by the scanning electron microscope |
| 05/24/2012 | US20120126116 Pattern shape selection method and pattern measuring device |
| 05/24/2012 | DE102011081410A1 Probenhalter mit einer dreiachsigen Beweglichkeit zur dreidimensionalen Analyse mit einem Transmissionselektronenmikroskop Sample holder with a tri-axial mobility for three-dimensional analysis with a transmission electron microscope |
| 05/24/2012 | DE102010060762A1 Plasmabearbeitungsvorrichtung The plasma processing apparatus |
| 05/23/2012 | EP2454749A2 Charged-particle energy analyzer |
| 05/23/2012 | EP2454748A1 Device for preventing parasitic oscillations in electron beam tubes |
| 05/23/2012 | EP1735810B1 A large-area shower electron beam irradiator with field emitters as an electron source |
| 05/23/2012 | EP1081749B1 Protective member for inner surface of chamber and plasma processing apparatus |
| 05/23/2012 | EP0873431B1 Cylindrical magnetron target structure and apparatus for affixing said target structure to a rotatable spindle |
| 05/23/2012 | CN202231939U 等离子体反应器 Plasma reactor |
| 05/23/2012 | CN202230975U Process chamber capable of uniformly pumping |
| 05/23/2012 | CN1669796B Device for manufacturing display basic board and blow head combination assemblaging therein |
| 05/23/2012 | CN102473578A 溅射系统、可转动筒状靶材组件、衬管、靶材元件和冷却罩 Sputtering system, a rotatable cylindrical target assembly, the liner, the target element and a cooling jacket |
| 05/23/2012 | CN102473577A 扫描电子显微镜 Scanning electron microscopy |
| 05/23/2012 | CN102473576A 离子铣削装置 Ion milling device |
| 05/23/2012 | CN102473575A 可调整的进气口叶片式等离子体电子潮外壳 Adjustable inlet vane plasma electron shell tide |
| 05/23/2012 | CN102471914A Methods and apparatus for protecting plasma chamber surfaces |
| 05/23/2012 | CN102471880A 选择性控制等离子体的离子组成物的系统和方法 Systems and methods for selective control of the ion composition of the plasma |
| 05/23/2012 | CN102468155A 等离子体处理装置 The plasma processing apparatus |
| 05/23/2012 | CN102468143A Plasma doping method and apparatus thereof |
| 05/23/2012 | CN102468107A 绝缘构件及包括绝缘构件的基板处理装置 The insulating member and the substrate processing apparatus comprises an insulating member |
| 05/23/2012 | CN102468106A 等离子体处理装置 The plasma processing apparatus |
| 05/23/2012 | CN102468105A Inductive coupling plasma device |
| 05/23/2012 | CN102468104A 带有集成静电能量过滤器的带电粒子源 Charged particle source with integrated electrostatic energy filter |
| 05/23/2012 | CN101866810B Plasma processor responsive to multiple RF frequencies |
| 05/23/2012 | CN101636811B Method of reducing particle contamination for ion implanters |
| 05/23/2012 | CN101421056B Method for etching substrate, processing chamber for etching substrate and method for cleaning the processing chamber |
| 05/23/2012 | CN101189372B Controlled growth of a nanostructure on a substrate, and electron emission devices based on the same |
| 05/23/2012 | CN101159217B Leak detection barrel of ion implanter |
| 05/22/2012 | US8183547 Dual beam system |
| 05/22/2012 | US8183539 High mass resolution low aberration analyzer magnet for ribbon beams and the system for ribbon beam ion implanter |
| 05/18/2012 | WO2012064311A1 Method and device for transporting vacuum arc plasma |
| 05/18/2012 | WO2012063749A1 Charged particle optical equipment and method for measuring lens aberration |
| 05/18/2012 | WO2012063406A1 Charged particle beam apparatus |
| 05/18/2012 | WO2012062934A1 Charged particle beam modulator |
| 05/18/2012 | WO2012062932A1 Charged particle lithography system with intermediate chamber |
| 05/18/2012 | WO2012062931A1 Method for determining a distance between two beamlets in a multi-beamlet exposure apparatus |
| 05/18/2012 | WO2012062854A1 Lithography system and method of refracting |
| 05/18/2012 | WO2012062727A1 Data path for lithography apparatus |
| 05/18/2012 | WO2012062726A1 Data path for lithography apparatus |
| 05/18/2012 | WO2012062369A1 Apparatus and method for surface processing |
| 05/18/2012 | WO2012062302A1 Arrangement for producing high-energy proton beams and use of said arrangement |
| 05/17/2012 | US20120121794 Deposition quantity measuring apparatus, deposition quantity measuring method, and method for manufacturing electrode for electrochemical element |
| 05/17/2012 | US20120119087 Charged-particle microscope |
| 05/17/2012 | US20120119086 Gas field ion source, charged particle microscope, and apparatus |
| 05/17/2012 | US20120119085 Specimen potential measuring method, and charged particle beam device |
| 05/17/2012 | US20120118857 Plasma Treatment System |
| 05/16/2012 | EP2453463A2 Method of making axial alignment of charged particle beam and charged particle beam system |
| 05/16/2012 | EP2453462A1 Charged particle source with integrated electrostatic energy filter |
| 05/16/2012 | EP2453461A1 Charged particle source with integrated electrostatic energy filter |
| 05/16/2012 | EP2179437B1 Transmission electron microscope |
| 05/16/2012 | DE112009002638T5 Strukturmessgerät und Strukturmessverfahren Structure gauge and structure measurement method |
| 05/16/2012 | CN202221752U Extended electrode and plasma inclined plane etching device having the same |
| 05/16/2012 | CN102460635A 对容器进行等离子体处理的装置和方法 The containers are plasma processing apparatus and method |
| 05/16/2012 | CN102460634A 用于产生等离子体射束的方法以及等离子体源 The method for producing a plasma beam and a plasma source |
| 05/16/2012 | CN102460633A Pattern data conversion for lithography system |
| 05/16/2012 | CN102460632A Method of generating a two-level pattern for lithographic processing and pattern generator using the same |