| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 07/17/2012 | US8222614 Electron beam irradiation apparatus for open-mouthed containers |
| 07/17/2012 | US8222601 Scanning electron microscope and method of imaging an object by using the scanning electron microscope |
| 07/17/2012 | US8222600 Charged particle detection system and method |
| 07/17/2012 | US8222599 Precise metrology with adaptive milling |
| 07/12/2012 | WO2012094634A2 Functionalized carbon membranes |
| 07/12/2012 | WO2012093593A1 Charged particle beam device and method for correcting detected signal thereof |
| 07/12/2012 | WO2012093474A1 Multiple light source microscope |
| 07/12/2012 | WO2012092950A1 Spark detection in coating installations |
| 07/12/2012 | WO2012031049A3 Navigation and sample processing using an ion source containing both low-mass and high-mass species |
| 07/12/2012 | DE102011002583A1 Teilchenstrahlgerät und Verfahren zur Bearbeitung und/oder Analyse einer Probe Particle beam device and method for processing and / or analysis of a sample |
| 07/12/2012 | DE102010063685B4 Magnetronanordnung mit einem Hohltarget Magnetron with a hollow target |
| 07/12/2012 | DE102010038385B4 Anordnung zur Belüftung einer Ausgangsschleuse in einer Vakuumbehandlungsanlage Arrangement for a ventilation outlet lock in a vacuum treatment plant |
| 07/12/2012 | DE102010031259B4 Stützeinrichtung für eine Magnetronanordnung mit einem rotierenden Target Support device for a magnetron with a rotating target |
| 07/12/2012 | DE102010002754B4 Plasmaversorgungsanordnung mit Quadraturkoppler Plasma supply arrangement with quadrature |
| 07/12/2012 | DE102009056241B4 Stützeinrichtung für eine Magnetronanordnung mit einem rotierenden Target Support device for a magnetron with a rotating target |
| 07/12/2012 | DE102008053180B4 Teilchenstrahlschreibverfahren, Teilchenstrahlschreibvorrichtung und Wartungsverfahren für selbige Teilchenstrahlschreibverfahren, Teilchenstrahlschreibvorrichtung and maintenance procedures for selbige |
| 07/12/2012 | CA2823660A1 Spark detection in coating installations |
| 07/11/2012 | EP2474019A2 Particle beam processing device such as an electron beam processing device |
| 07/11/2012 | EP2474018A2 High-probability heralded single-photon source and related method |
| 07/11/2012 | CN202332783U 一种低刻蚀率等离子体刻蚀室 A low etch rate of plasma etch chamber |
| 07/11/2012 | CN202332782U 等离子体喷头及应用该喷头的大幅面等离子体表面处理机 Large format plasma nozzle and application nozzle of the plasma surface processor |
| 07/11/2012 | CN202332781U 高吸附拼接式碳纤维u型槽 High adsorption carbon fiber splicing u-groove |
| 07/11/2012 | CN202332780U 离子注入电弧反应室 Arc ion implantation chamber |
| 07/11/2012 | CN202332779U 一种可调式电子显微镜 An adjustable electron microscope |
| 07/11/2012 | CN102576642A Production of nanoparticles |
| 07/11/2012 | CN102576641A Production of nanoparticles |
| 07/11/2012 | CN102576640A A Mask health monitor using a faraday probe |
| 07/11/2012 | CN102576639A Use of beam scanning to improve uniformity and productivity of a 2D mechanical scan implantation system |
| 07/11/2012 | CN102576635A Filament for electron gun and method for producing same |
| 07/11/2012 | CN102575900A Ion plasma electron emitters for a melting furnace |
| 07/11/2012 | CN102573429A Shielding apparatus, processing method and device, semiconductor device |
| 07/11/2012 | CN102573265A 用于产生均匀的处理速率的方法和设备 Method and apparatus for producing uniform processing rate |
| 07/11/2012 | CN102569130A Substrate processing apparatus and substrate processing method |
| 07/11/2012 | CN102569117A Ion implantation beam line Faraday |
| 07/11/2012 | CN102568993A Adjustable capacitor, plasma impedance matching device, plasma impedance matching method, and substrate treating apparatus |
| 07/11/2012 | CN102568992A Plasma processing apparatus |
| 07/11/2012 | CN102568991A Gas pipeline system of reaction chamber and control method of gas pipeline system |
| 07/11/2012 | CN102568990A Ion bombardment plate mechanism for vacuum coating film |
| 07/11/2012 | CN102568989A Charged particle source with multiple selectable particle emitters |
| 07/11/2012 | CN102568974A Discharging electrode and plasma generating device utilizing same |
| 07/11/2012 | CN102564654A Laser force-measuring system used in scanning electron microscope |
| 07/11/2012 | CN101796213B Sputtering system |
| 07/10/2012 | US8217372 Gas-cluster-jet generator and gas-cluster ion-beam apparatus utilizing an improved gas-cluster-jet generator |
| 07/10/2012 | US8217351 Pattern inspection method and pattern inspection system |
| 07/10/2012 | US8217350 Particle optical arrangement |
| 07/10/2012 | US8217349 Method for inspecting EUV reticle and apparatus thereof |
| 07/10/2012 | US8216421 Plasma stabilization method and plasma apparatus |
| 07/05/2012 | WO2012091908A2 Method and apparatus for controlling an electrostatic lens about a central ray trajectory of an ion beam |
| 07/05/2012 | WO2012091851A2 System and method for producing a mass analyzed ion beam |
| 07/05/2012 | WO2012091062A1 Ceramic structure with insulating layer, ceramic structure with metal layer, charged particle beam emitter, and method of the manufacturing ceramic structure with insulating layer |
| 07/05/2012 | WO2012090858A1 Electrostatic chuck device |
| 07/05/2012 | WO2012090670A1 Charged particle beam device and method of manufacture of sample |
| 07/05/2012 | WO2012090464A1 Charged particle beam microscope with diffraction aberration corrector applied thereto |
| 07/05/2012 | WO2012090363A1 Charged particle radiation device with microscale management function |
| 07/05/2012 | WO2012089286A1 Coating apparatus having a hipims power source |
| 07/05/2012 | DE112009003724T5 Elektronenstrahlgerät und damit arbeitendes Elektronenstrahl-Anwendungsgerät Electron beam apparatus and thus working electron device application |
| 07/05/2012 | DE102011112434A1 Treating workpieces in vacuum treatment system comprises applying negative bias to workpiece, avoiding damage such that if current flowing via workpieces from measured average current deviates more than specific value interrupts treatment |
| 07/05/2012 | DE102009045774B4 Kompakte supraleitende Magnetanordnung mit aktiver Abschirmung, wobei die Abschirmspule zur Feldformung eingesetzt wird Compact superconducting magnet assembly with active shield, wherein the shield coil is used for field-shaping |
| 07/05/2012 | DE10025589B4 Bühne für Ladungsteilchen-Mikroskopiesystem Stage for charged particle microscopy system |
| 07/04/2012 | EP2472556A2 Charged particle source with multiple selectable particle emitters |
| 07/04/2012 | EP2471087A1 Penetrating plasma generating apparatus for high vacuum chambers |
| 07/04/2012 | EP2471086A2 Pattern modification schemes for improved fib patterning |
| 07/04/2012 | EP2470847A1 Ion plasma electron emitters for a melting furnace |
| 07/04/2012 | EP2304765B1 Apparatus for measurement of beam angle in ion implantation |
| 07/04/2012 | EP1515362B1 Plasma processing system, plasma processing method, plasma film deposition system, and plasma film deposition method |
| 07/04/2012 | EP1329947B1 Magnetic field generator for magnetron plasma, and plasma etching apparatus and method comprising the magnetic field generator |
| 07/04/2012 | CN202307824U 一种干法刻蚀无机材料基板等离子体刻蚀机的传片系统 Chuan-chip system, a dry etching inorganic material substrate plasma etching machine |
| 07/04/2012 | CN202307823U 一种干法刻蚀坚硬无机材料基板等离子体刻蚀机的电极 A dry etching hard inorganic material substrate electrode plasma etcher |
| 07/04/2012 | CN202307821U Temperature monitoring device and plasma processing device |
| 07/04/2012 | CN202307791U 干刻蚀底部电极及干刻蚀装置 Dry etching and dry etching apparatus bottom electrode |
| 07/04/2012 | CN202307790U 一种聚焦环 One kind of the focus ring |
| 07/04/2012 | CN202307789U 一种新型icp刻蚀机预真空腔的盖子 A new pre-icp etching machine vacuum chamber lid |
| 07/04/2012 | CN202307788U 可调间隔电容耦合等离子体处理室的耗材隔离环 Adjustable spacer capacitively coupled plasma processing chamber isolation ring consumables |
| 07/04/2012 | CN202307787U 用于非标准厚度硅片的离子注入机 For non-standard thickness wafers ion implanter |
| 07/04/2012 | CN202307786U 一种底装镜头耦合透射电镜数字成像装置 One substrate mounted lens coupling TEM digital imaging device |
| 07/04/2012 | CN202307785U 一种制备石墨烯纳米孔的载体台 A vector sets prepared graphene nanopore |
| 07/04/2012 | CN202307784U 一种磁控溅射用平面阴极 One kind of planar cathode magnetron sputtering |
| 07/04/2012 | CN202292944U 木质薄板常压低温等离子体连续处理装置 Wood veneer continuous atmospheric temperature plasma processing apparatus |
| 07/04/2012 | CN1795287B Thin film forming device and thin film forming method |
| 07/04/2012 | CN102549706A Method for coating a substrate and coater |
| 07/04/2012 | CN102549705A Method for ion source component cleaning |
| 07/04/2012 | CN102549704A Imaging energy filter for electrically charged particles and spectroscope having the same |
| 07/04/2012 | CN102545750A Control method and control device of stepping motor, matcher and plasma processing device |
| 07/04/2012 | CN102543798A Apparatus and method for centering a substrate in a process chamber |
| 07/04/2012 | CN102543788A Device for plasma detection |
| 07/04/2012 | CN102543645A Faraday shield and plasma processing device |
| 07/04/2012 | CN102543644A Upper electrode for reaction cavity of dry etching equipment |
| 07/04/2012 | CN102543643A Solid matter gasification device for ion source |
| 07/04/2012 | CN102543642A Two-dimensional scanning synchronization method for controlling uniform injection of ions |
| 07/04/2012 | CN102543641A Connector capable of realizing elastic contact of plasma etching cavity |
| 07/04/2012 | CN102543640A Particle beam microscope and method for operating the particle beam microscope |
| 07/04/2012 | CN102543639A Environmental cell for charged particle beam system |
| 07/04/2012 | CN102543638A Microscope system and method for operating charged-particle microscope |
| 07/04/2012 | CN102543637A Preparation method of in situ double-tilt electronic microscope sample rod |
| 07/04/2012 | CN102543636A Faraday shield and plasma processing equipment |
| 07/04/2012 | CN102534513A Rectangular plane cathode arc evaporation source of combination magnetic fields |
| 07/04/2012 | CN102169790B First collecting mirror of electron microscope |
| 07/04/2012 | CN102136406B Small condenser for electron microscope |
| 07/04/2012 | CN102024659B Cleaning method of PVD (Physical Vapor Deposition) equipment |
| 07/04/2012 | CN101908461B Ion beam surface treatment equipment and method for suppressing secondary electron emission |