| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
|---|
| 08/01/2012 | CN102623287A Device and method for detecting ion current of vacuum discharge plasma |
| 08/01/2012 | CN102623286A Coaxial optical pumping device and manufacturing method thereof |
| 08/01/2012 | CN102623285A Silicon electrode plate for plasma etching |
| 08/01/2012 | CN101584256B Device for forming a film by deposition from a plasma |
| 07/31/2012 | US8232712 Small electron gun |
| 07/31/2012 | US8232536 Particle beam irradiation system and method for controlling the particle beam irradiation system |
| 07/31/2012 | US8232522 Semiconductor inspecting apparatus |
| 07/31/2012 | US8231800 Plasma processing apparatus and method |
| 07/31/2012 | US8231759 Plasma processing apparatus |
| 07/31/2012 | US8230807 Coatings, and methods and devices for the manufacture thereof |
| 07/26/2012 | WO2012099548A1 Device for high-frequency gas plasma excitation |
| 07/26/2012 | WO2012099547A1 Method for a dynamic control of density of neutral atoms in a plasma vacuum chamber and a device for the processing of solid materials by using this method |
| 07/26/2012 | WO2012099190A1 Charged particle beam device, and image analysis device |
| 07/26/2012 | WO2012097987A1 Apparatus for plasma treatment of hollow bodies |
| 07/26/2012 | WO2012097972A1 Plasma treatment device for producing coatings |
| 07/26/2012 | WO2012074292A3 Method for blanking a particle beam in a particle beam column |
| 07/26/2012 | WO2012037007A3 Method for extending lifetime of an ion source |
| 07/26/2012 | WO2012033697A3 Using beam blockers to perform a patterned implant of a workpiece |
| 07/26/2012 | WO2012013544A3 Ignition circuit for igniting a plasma fed with alternating power |
| 07/26/2012 | US20120190183 Using multiple masks to form independent features on a workpiece |
| 07/26/2012 | US20120187293 Transmission Electron Microscope |
| 07/26/2012 | US20120187292 Charged Particle Beam Apparatus and Film Thickness Measurement Method |
| 07/26/2012 | US20120187285 Measurement and endpointing of sample thickness |
| 07/26/2012 | DE102011009488A1 Electron-beam system for processing of component e.g. turbine blade, has beam director that directs deflected electron beam to construction material layer surface at preset incident angle |
| 07/26/2012 | CA2824074A1 Plasma treatment apparatus for producing coatings |
| 07/25/2012 | EP2479784A2 Plasma processing apparatus and method |
| 07/25/2012 | EP2479783A2 Plasma processing apparatus and method |
| 07/25/2012 | EP2479782A2 Plasma processing apparatus and method |
| 07/25/2012 | EP2479781A1 Plasma etching apparatus |
| 07/25/2012 | EP2479780A1 Film formation apparatus |
| 07/25/2012 | EP2478548A1 Charged particle optical system with multiple beams |
| 07/25/2012 | EP2478546A2 Distributed ion source acceleration column |
| 07/25/2012 | EP2257853B1 Method for processing an object with miniaturized structures |
| 07/25/2012 | EP1682445B1 Method for patterning structures on a substrate |
| 07/25/2012 | CN202352611U Cathode uniformity correcting baffle |
| 07/25/2012 | CN202352610U Manual lifting device |
| 07/25/2012 | CN202352609U Gas distribution device and plasma machining equipment |
| 07/25/2012 | CN202352478U Inductively coupled plasma coil and plasma injection device |
| 07/25/2012 | CN202351192U Sample observation platform used for electron microscope |
| 07/25/2012 | CN102612731A Method and apparatus for cleaning residue from an ion source component |
| 07/25/2012 | CN102610481A Apparatus and plasma ashing process for increasing photoresist removal rate |
| 07/25/2012 | CN102610480A Vacuum discharge plasma parameter measuring device and method |
| 07/25/2012 | CN102610479A Particle beam device with deflection system |
| 07/25/2012 | CN102610478A Charged particle beam measurement device |
| 07/25/2012 | CN102610477A Film bonding agent for semiconductor vacuum treatment device |
| 07/25/2012 | CN102610476A Electrostatic chuck |
| 07/25/2012 | CN102610470A Magnetron and semiconductor equipment |
| 07/25/2012 | CN102184830B Plasma processing apparatus and plasma processing method |
| 07/25/2012 | CN102163529B Movable diaphragm device for condensing mirror of electron microscope |
| 07/25/2012 | CN102074446B Magnetron with adjustable compound trace |
| 07/25/2012 | CN102064076B Eccentricity-variable magnetron |
| 07/25/2012 | CN102024669B Method for reducing reflection power in plasma etching |
| 07/25/2012 | CN101807509B Plasma treating apparatus and focus ring |
| 07/25/2012 | CN101754566B Impedance matching device, impedance matching method and plasma processing system |
| 07/25/2012 | CN101754565B Electrode component and plasma treatment equipment using electrode component |
| 07/25/2012 | CN101740298B Plasma processing apparatus and constituent part thereof |
| 07/25/2012 | CN101172859B Method and device for preparing plasma reaction parts |
| 07/24/2012 | US8227773 Versatile beam glitch detection system |
| 07/24/2012 | US8227764 YTTRIA-metal thermionic filaments |
| 07/24/2012 | US8227753 Multiple current charged particle methods |
| 07/24/2012 | US8227752 Method of operating a scanning electron microscope |
| 07/24/2012 | US8227521 Fluoropolymer foams prepared with the use of blowing agents and applications thereof |
| 07/24/2012 | US8226255 Key button with anti-bacterial light source |
| 07/19/2012 | WO2012096959A1 Technique and apparatus for monitoring ion mass, energy, and angle in processing systems |
| 07/19/2012 | WO2012095915A1 Charged particle beam device |
| 07/19/2012 | WO2012095911A1 Scanning electron microscope |
| 07/19/2012 | WO2012044977A4 Compact rf antenna for an inductively coupled plasma ion source |
| 07/19/2012 | DE112010002063T5 Elektronenkanone Electron gun |
| 07/18/2012 | EP2477207A2 Apparatus for generating high-current electrical discharges |
| 07/18/2012 | EP2477206A2 Particle beam device and method for processing and/or analyzing a sample |
| 07/18/2012 | EP2369031A9 Coating on a NiAL2O4 basis in spinel structure |
| 07/18/2012 | CN202339899U 一种等离子体表面改性装置 A surface modification apparatus of a plasma |
| 07/18/2012 | CN102598219A A technique for processing a substrate having a non-planar surface |
| 07/18/2012 | CN102598202A Tuning hardware for plasma ashing apparatus and methods of use thereof |
| 07/18/2012 | CN102598201A Penetrating plasma generating apparatus for high vacuum chambers |
| 07/18/2012 | CN102598200A Sensor for measuring plasma parameters |
| 07/18/2012 | CN102598199A Charged particle optical system with multiple beams |
| 07/18/2012 | CN102598195A Distributed ion source acceleration column |
| 07/18/2012 | CN102597306A Cleaning of a process chamber |
| 07/18/2012 | CN102595761A RF power amplifier stability network |
| 07/18/2012 | CN102592936A Focus ring and substrate processing apparatus having same |
| 07/18/2012 | CN102592935A Plasma processing apparatus |
| 07/18/2012 | CN102592934A Ion source device for ultra-shallow junction injection |
| 07/18/2012 | CN102592933A Particle beam device and method for processing and/or analyzing a sample |
| 07/18/2012 | CN102592932A Semiconductor back scattering electronic detector |
| 07/18/2012 | CN102592931A Scanning device and plasma processing equipment |
| 07/18/2012 | CN102592930A Ion source |
| 07/18/2012 | CN102592929A Electron gun device for generating high-brightness femtosecond electronic pulse |
| 07/18/2012 | CN102586890A Device for preparing black silicon |
| 07/18/2012 | CN102148122B Laminated low-aberration converging lens for transmission electron microscope |
| 07/18/2012 | CN102024656B System and method for improving beam current intensity distribution after leading ion beam out |
| 07/18/2012 | CN101924006B Shield usable in a sputtering plasma reactor |
| 07/18/2012 | CN101901734B Multimode ion implantation machine system and implantation regulating method |
| 07/18/2012 | CN101901733B Ion implanter and method for adjusting ion beam |
| 07/18/2012 | CN101714491B Apparatus for investigating or modifying a surface with a beam of charged particles |
| 07/18/2012 | CN101553897B New and improved beam line architecture for ion implanter |
| 07/18/2012 | CN101057309B Microreactor for a transmission electron microscope and heating element and method for the manufacture thereof |
| 07/17/2012 | USRE43508 Plasma confinement by use of preferred RF return path |
| 07/17/2012 | US8222621 Method for maskless particle-beam exposure |
| 07/17/2012 | US8222618 Method and apparatus for processing a microsample |