Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
08/2012
08/22/2012CN101459051B Exhaust ring for plasma apparatus
08/22/2012CN101256937B Method and apparatus for controlling gas flow to a processing chamber
08/21/2012US8247785 Particle beam device and method for use in a particle beam device
08/21/2012US8247783 Method of determining main deflection settling time for charged particle beam writing, method of writing with charged particle beam, and apparatus for writing with charged particle beam
08/16/2012WO2012108161A1 Cold cathode device and method for manufacturing same
08/16/2012WO2012107723A1 A plasma based surface augmentation method
08/16/2012WO2012107674A1 Device and method for ion beam sputtering
08/16/2012WO2012084655A3 Microwave plasma reactors and substrates for synthetic diamond manufacture
08/16/2012WO2012051138A9 Use of cryogenic ion chemistry to add a structural characterization capability to mass spectrometry through linear action spectroscopy
08/16/2012WO2012028330A3 Detection module for detecting radiation
08/16/2012WO2012027406A3 Vacuum chamber assembly for supporting a workpiece
08/16/2012US20120205539 Detector for Use in Charged-Particle Microscopy
08/16/2012US20120205538 Particle beam device and method for processing and/or analyzing a sample
08/16/2012US20120205537 Multiple-pole electrostatic deflector for improving throughput of focused electron beam instruments
08/16/2012DE102008037698B4 Elektronenmikroskop mit ringförmiger Beleuchtungsapertur Electron microscope with an annular illumination
08/16/2012CA2826856A1 A plasma based surface augmentation method
08/15/2012EP2487704A2 Detection method for use in charged-particle microscopy
08/15/2012EP2487703A1 Detector for use in charged-particle microscopy
08/15/2012EP2487479A2 Device and method for preparing samples
08/15/2012EP2487275A1 Composite shielding
08/15/2012EP2486581A1 Enhanced integrity projection lens assembly
08/15/2012EP2486580A2 High voltage shielding arrangement
08/15/2012CN202384293U Inductively-coupled plasma coil and plasma injection device
08/15/2012CN202384292U Cooling water circulating system of ion implanter
08/15/2012CN202384291U Cooling water circulating system of ion implanter
08/15/2012CN102640032A Motorized stage
08/15/2012CN102637622A Substrate processing apparatus and substrate processing method
08/15/2012CN102637573A Semiconductor processing device and manufacture method thereof
08/15/2012CN102637572A Ion implantion device
08/15/2012CN102637571A Detector for use in charged-particle microscopy
08/15/2012CN102637570A Digital imaging device for transmission electron microscope with coupled side-mounted lens
08/15/2012CN102634761A Method for magnetic filtration of strip-sectional vacuum cathodic arc plasma
08/15/2012CN101720493B Multitarget sputter source and method for the deposition of multi-layers
08/14/2012US8242470 Optical switching in a lithography system
08/14/2012US8242469 Adjustable louvered plasma electron flood enclosure
08/14/2012US8242468 Ion implanter for photovoltaic cell fabrication
08/14/2012US8242460 Ultraviolet treatment apparatus
08/14/2012US8242443 Semiconductor device inspection apparatus
08/09/2012WO2012104942A1 Charged particle beam apparatus
08/09/2012WO2012075992A3 Process and apparatus for applying layers to a component
08/09/2012US20120199994 Apparatus and method for a sub microscopic and optically variable image carrying device
08/09/2012US20120199740 Particle Beam System
08/09/2012US20120199739 Scanning charged particle beam device and method for correcting chromatic spherical combination aberration
08/09/2012US20120199738 In-chamber electron detector
08/09/2012DE112009004435T5 Verfahren und Vorrichtung zum Bereitstellen von Eneregie zum Zünden und Aufrechterhalten eines Plasmas in einem reaktiven Gasgenerator Method and apparatus for providing Eneregie for igniting and maintaining a plasma in a reactive gas generator
08/08/2012EP2485242A1 Filter for arc source
08/08/2012EP2485241A1 Magnet array for a physical vapor deposition system
08/08/2012EP2485240A2 Method for centering an optical element in a TEM comprising a contrast enhancing element
08/08/2012EP2485239A1 Method for centering an optical element in a TEM comprising a contrast enhancing element
08/08/2012EP2485238A1 Rod for electron source, electron source, and electronic appliance
08/08/2012EP2484800A1 Film-forming apparatus and film-forming method
08/08/2012EP2484799A1 Segmented post cathode
08/08/2012EP2484798A1 Physical vapor deposition system
08/08/2012EP2484185A2 Unitized confinement ring arrangements and methods thereof
08/08/2012EP2483907A1 Method for coating a substrate and coater
08/08/2012EP2483906A1 Method for ion source component cleaning
08/08/2012EP2483905A1 Variable energy charged particle systems
08/08/2012EP2297768B1 Arrangement for coating tape-shaped film substrates
08/08/2012EP1951407B1 Microwave plasma abatement apparatus
08/08/2012CN202373565U Reaction cavity heating device
08/08/2012CN202373550U Plugging piece
08/08/2012CN102629543A Ion implantation method and ion implantation apparatus
08/08/2012CN102629542A Electron source device for ultrafast electron diffraction and ultrafast electron microscope
08/08/2012CN102629541A Spray header and producing method thereof
08/08/2012CN102629540A Method for centering an optical element in a tem comprising a contrast enhancing element
08/08/2012CN101109068B Sputtering targets, sputter reactors, methods of forming cast ingots, and methods of forming metallic articles
08/07/2012US8237134 Method and apparatus for enhanced lifetime and performance of ion source in an ion implantation system
08/07/2012US8236105 Apparatus for controlling gas flow in a semiconductor substrate processing chamber
08/02/2012WO2012103534A1 Tem sample preparation
08/02/2012WO2012102301A1 Scanning electron microscope
08/02/2012WO2012102139A1 Method for treating metal film and treatment device
08/02/2012WO2012101927A1 Charged particle beam device
08/02/2012WO2012101704A1 Charged particle beam apparatus
08/02/2012WO2012100971A1 Device for supporting a rotatable target and sputtering apparatus
08/02/2012WO2012100847A1 Sliding element, in particular piston ring, having a coating and process for producing a sliding element
08/02/2012US20120194080 Illumination device
08/02/2012US20120193532 Semiconductor structure and fault location detecting system
08/02/2012DE102011009954A1 Korrektor Proofreader
08/02/2012DE10159454B4 Korrektor zur Korrektion von Farbfehlern erster Ordnung, ersten Grades Corrector for correcting chromatic aberration of the first order, first degree
08/01/2012EP2482305A1 Device for supporting a rotatable target and sputtering apparatus
08/01/2012EP2482304A1 Plasma Reaction Method and Plasma Reaction Device
08/01/2012EP2482303A2 Deposition apparatus and methods
08/01/2012EP2482302A2 Corrector
08/01/2012EP2482061A2 System and method for localization of large numbers of fluorescent markers in biological samples
08/01/2012EP2481829A2 Beam-induced deposition of low-resistivity material
08/01/2012EP2481076A1 Production of nanoparticles
08/01/2012EP2481075A1 Production of nanoparticles
08/01/2012EP2481074A1 Sensor for measuring plasma parameters
08/01/2012EP2481073A2 Methods of using temperature control devices in electron microscopy
08/01/2012EP2481072A1 Imaging energy filter for electrically charged particles and spectroscope having the same
08/01/2012EP2480925A1 System for mechanical characterization of materials and biological samples in the sub-millinewton force range
08/01/2012EP2272080B1 Device and method for pretreating and coating bodies
08/01/2012EP2245647B1 Method for treatment of a substrate with atmospheric pressure glow discharge electrode configuration
08/01/2012EP1765540B1 Apparatus for fast arc extinction with early shunting of arc current in plasma
08/01/2012CN202363440U Sample table used by induction ion coupling etching machine to bear etched epitaxial wafer
08/01/2012CN202363410U Ion beam aperture adjustment device
08/01/2012CN202363409U Resistor loading device
08/01/2012CN202363408U 法拉第杯 Faraday cup
08/01/2012CN102623289A Determining relative scan velocity to control ion implantation of work piece
08/01/2012CN102623288A Secondary electron device and ion implanter machine using the same
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