Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
09/2012
09/06/2012US20120224155 Direct write lithography system
09/06/2012US20120223228 Microtome utilizing a movable knife in a retardation field scanning electron microscope and a retardation field scanning electron microscope including the same
09/06/2012US20120222617 Plasma system and method of producing a functional coating
09/06/2012DE102011011751A1 Halteanordnung zum Halten von Phasenkontrasteinheiten in einem Phasenkontrast-Elektronenmikroskop Holding means for holding phase contrast units in a phase contrast electron
09/06/2012DE102009015178B4 Vorrichtung und Verfahren für die plasmagestützte Oberflächenmodifizierung von Substraten im Vakuum Device and method for the plasma-assisted surface modification of substrates in vacuum
09/06/2012DE10018143C5 DLC-Schichtsystem sowie Verfahren und Vorrichtung zur Herstellung eines derartigen Schichtsystems DLC layer system and method and apparatus for producing such a layer system
09/05/2012EP2495749A1 Surface wave plasma generating antenna and surface wave plasma processing apparatus
09/05/2012EP2495748A1 Charged particle radiation apparatus, and method for displaying three-dimensional information in charged particle radiation apparatus
09/05/2012EP2495350A2 Microwave plasma processing device with a plasma processing gas supply member
09/05/2012EP2494581A2 Ion implantation system and method
09/05/2012EP2494580A1 Modulation device and charged particle multi-beamlet lithography system using the same
09/05/2012EP2494579A1 Charged particle multi-beamlet lithography system, modulation device, and method of manufacturing thereof
09/05/2012EP2494578A1 Charged particle multi-beamlet lithography system, with modulation device
09/05/2012CN202423238U Spraying head for improving processing uniformity of wafer
09/05/2012CN202423214U Device for leading radio frequency power supply electrode into vacuum cavity
09/05/2012CN202423213U Plasma restraining device
09/05/2012CN202423212U Section sample table of scanning electron microscope
09/05/2012CN102656661A Method for operating an industrial process
09/05/2012CN102655708A Surface wave plasma generating antenna and surface wave plasma processing apparatus
09/05/2012CN102655073A Ion beam illumination method and device
09/05/2012CN102655072A Ion implantation equipment
09/05/2012CN102652946A Plasma cleaning device and plasma cleaning method
09/05/2012CN102024658B Plasma processing equipment and method
09/05/2012CN101989524B Impedance matcher and plasma processing equipment
09/05/2012CN101971288B Plasma system
09/05/2012CN101924005B Homogeneous beam spot method for electron beam surface treatment
09/05/2012CN101748393B Heating control method of production line equipment and device
09/05/2012CN101221356B Mask etch plasma reactor with backside optical sensors and multiple frequency control of etch distribution
09/05/2012CN101159228B Processing gas supplying mechanism, supplying method and gas processing unit
09/04/2012US8261368 Nanomanufacturing devices and methods
09/04/2012US8258489 Transmission energy contamination detector
09/04/2012US8258485 Source-collector module with GIC mirror and xenon liquid EUV LPP target system
09/04/2012US8258484 Beamlet blanker arrangement
09/04/2012US8258475 Charged particle radiation device provided with aberration corrector
09/04/2012US8258474 Compact arrangement for dual-beam low energy electron microscope
09/04/2012US8258473 Method and apparatus for rapid preparation of multiple specimens for transmission electron microscopy
09/04/2012US8258472 Charged particle radiation device and image capturing condition determining method using charged particle radiation device
09/04/2012US8258471 Pattern measuring apparatus and pattern measuring method
09/04/2012US8258464 Mass spectrometer and methods for detecting large biomolecules
09/04/2012US8257546 Method and system for monitoring an etch process
08/2012
08/30/2012WO2012114521A1 Electron gun and electron beam device
08/30/2012WO2012114411A1 Pattern dimensions measurement method and charged particle beam apparatus
08/30/2012WO2012091851A3 System and method for producing a mass analyzed ion beam
08/30/2012WO2012031049A4 Navigation and sample processing using an ion source containing both low-mass and high-mass species
08/30/2012WO2012023858A8 An apparatus, a system and a method for producing hydrogen
08/30/2012US20120217393 Electron Microscope
08/30/2012US20120217392 Pattern-height measuring apparatus and pattern-height measuring method
08/30/2012US20120217391 Charged particle microscope
08/30/2012DE112010002934T5 Mikroskop mit einem Strahl geladener Teilchen und Messverfahren dafür Microscope having a charged-particle beam and the measuring method thereof
08/30/2012DE112010002551T5 Geladene teilchen abstrahlende vorrichtung Charged particles emitting device
08/30/2012DE112010001712T5 Probenhalter, verfahren zur verwendung des probenhalters und ladungsteilchenstrahlvorrichtung Sample holder, procedures for use of the sample holder and charged particle beam
08/30/2012DE102012101391A1 Strukturhöhenmessgerät und Strukturhöhenmessverfahren Structure height gauge and structure height measurement method
08/30/2012DE102009004392B9 Datenerzeugungsverfahren für Halbleitervorrichtung und Elektronenstrahlbelichtungssystem Data forming method for the semiconductor device and electron beam exposure system
08/29/2012EP2492950A2 Method for rapid switching between a high current mode and a low current mode in a charged particle beam system
08/29/2012EP2492949A2 Stable cold field emission electron source
08/29/2012EP2492368A1 Tubular sputter target
08/29/2012CN202405228U Focusing ring for plasma processing device
08/29/2012CN202405227U PECVD (Plasma Enhanced Chemical Vapor Deposition) equipment and sealing piece in reaction chamber applied to PECVD equipment
08/29/2012CN1836063B Method for the production of polymer moulded bodies
08/29/2012CN102651300A Two-dimensional array type plasma parameter detecting device
08/29/2012CN102651299A Method for rapid switching between a high current mode and a low current mode in a charged particle beam system
08/29/2012CN102651295A Stable cold field emission electron source
08/29/2012CN102110569B Device for mechanically scanning workpiece
08/29/2012CN101523546B Sensor for ion implanter
08/29/2012CN101351865B Method of manufacturing at least one sputter-coated substrate and sputter source
08/28/2012US8253100 Electron microscope
08/28/2012US8253099 Methods and devices for high throughput crystal structure analysis by electron diffraction
08/28/2012US8251011 Plasma processing apparatus
08/23/2012WO2012112894A2 Focusing a charged particle imaging system
08/23/2012WO2012112376A1 Diffusion-bonded sputtering target assembly and method of manufacturing
08/23/2012WO2012112284A2 Multiple-pole electrostatic deflector for improving throughput of focused electron beam instruments
08/23/2012WO2012111054A1 Charged particle beam microscope, and method for correcting measured image using same
08/23/2012WO2012110649A2 Holding arrangement for holding phase contrast units in a phase contrast electron microscope
08/23/2012WO2012110105A1 Sputtering magnetron assembly
08/23/2012WO2012091908A3 Method and apparatus for controlling an electrostatic lens about a central ray trajectory of an ion beam
08/23/2012WO2012084659A3 A microwave plasma reactor for manufacturing synthetic diamond material
08/23/2012US20120213335 Method for identifying nano textile
08/23/2012US20120212136 Penetrating plasma generating apparatus for high vacuum chambers
08/23/2012US20120211926 Method and device for producing three-dimensional objects
08/23/2012US20120211654 Scanning electron microscope
08/23/2012US20120211653 Pattern measuring method and pattern measuring device
08/23/2012US20120211652 Charged Particle Beam Device, Position Specification Method Used for Charged Particle Beam Device, and Program
08/22/2012EP2490245A2 Upper electrode and plasma processing apparatus
08/22/2012EP2489757A2 Plasma grid implant system for use in solar cell fabrications
08/22/2012EP2488911A1 Motorized stage
08/22/2012EP2142681B1 Arrangement for producing coatings on substrates in vacuo
08/22/2012EP1969613B1 Method of manufacturing at least one sputter-coated substrate and sputter source
08/22/2012DE202012007108U1 Vakuum-Vorrichtung Vacuum device
08/22/2012CN202394833U Cover plate for crystalline silicon solar battery PECVD process chamber
08/22/2012CN102648509A Enhanced integrity projection lens assembly
08/22/2012CN102647847A Plasma processing device
08/22/2012CN102646569A Plasma processing apparatus
08/22/2012CN102646568A Direct-current and low-frequency alternating-current signal combination amplifying device for beam motion control of electron beam equipment
08/22/2012CN102646567A Ion beam monitoring device for ion implanter
08/22/2012CN102646566A Scanning electron microscope (SEM) sample fixture used in on line SEM observing and SEM sample observing method
08/22/2012CN102644053A Tube-shaped sputtering target
08/22/2012CN102074444B Method for preparing microporous membrane for transmittance analysis
08/22/2012CN101930891B Reaction chamber and lining device
08/22/2012CN101764044B Method for pretreating technical cavity of plasma device
08/22/2012CN101541140B Plasma treatment equipment and shielding ring thereof
1 ... 50 51 52 53 54 55 56 57 58 59 60 61 62 63 64 65 66 67 68 69 70 ... 469