Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
10/2012
10/31/2012CN102760649A Processing system
10/31/2012CN102760634A Semiconductor manufacture system
10/31/2012CN102760633A Plasma processing apparatus and plasma processing method
10/31/2012CN102760632A Plasma processing apparatus
10/31/2012CN102760631A A grounding assembly for vacuum processing apparatus
10/31/2012CN102760630A Scanning electron microscope and imaging method using the same
10/31/2012CN102760629A Method for determining a reconstructed image using a particle-optical apparatus
10/31/2012CN102760628A In-column detector for particle-optical column
10/31/2012CN102758171A A physical vapor deposition plasma reactor with RF source power applied to the target
10/31/2012CN102755976A Substrate cleaning chamber and cleaning and conditioning methods
10/31/2012CN101740303B Plasma processing apparatus
10/31/2012CN101626656B Radio frequency matching method and plasma processor
10/31/2012CN101506839B Method and electron microscope for measuring the similarity of two-dimensional images
10/30/2012US8299431 Method for examining a sample by using a charged particle beam
10/30/2012US8299430 Electron microscope and observation method
10/26/2012WO2012145751A2 Automated sample preparation
10/26/2012WO2012144544A1 Reflection high-energy electron diffraction method
10/26/2012WO2012144543A1 Reflection high-energy electron diffraction method
10/26/2012WO2012143555A2 Network architecture for lithography machine cluster
10/26/2012WO2012143548A2 Network architecture and protocol for cluster of lithography machines
10/26/2012WO2012143541A1 Arrangement of optical fibers, and a method of forming such arrangement
10/26/2012WO2012143110A1 High power impulse magnetron sputtering method providing enhanced ionization of the sputtered particles and apparatus for its implementation
10/26/2012WO2012143091A1 Method for supplying sequential power impulses
10/26/2012WO2012143087A1 High-power sputtering source
10/26/2012WO2012143001A1 Method and device for impedance matching
10/26/2012WO2012142998A1 Method for impedance matching and high frequency power supply
10/26/2012WO2012142963A1 Sputtering chamber, pre-wash chamber and plasma processing device
10/26/2012CA2833927A1 High power impulse magnetron sputtering method providing enhanced ionization of the sputtered particles and apparatus for its implementation
10/26/2012CA2833796A1 Method for supplying sequential power impulses
10/26/2012CA2833795A1 High-power sputtering source
10/26/2012CA2831405A1 Automated sample preparation
10/25/2012US20120267529 Electron microscope system and method for evaluating film thickness reduction of resist patterns
10/25/2012US20120267528 Pattern Measuring Apparatus and Computer Program
10/25/2012US20120267527 A method of detecting contamination of titanium alloys of two-phase type having an alpha and a beta phase
10/25/2012US20120267346 Support assembly
10/25/2012DE112011100306T5 Ladungsteilchenstrahlvorrichtung Charged particle
10/25/2012DE102011018460A1 Prozessierungssystem Processing system
10/24/2012EP2515321A1 Charged particle beam processing system with pivoting annular gas delivery system
10/24/2012EP2513945A1 Method for operating an industrial process
10/24/2012EP2513944A2 Support and positioning structure, semiconductor equipment system and method for positioning
10/24/2012CN102752950A Surface treatment method of low temperature plasma of granular material and device thereof
10/24/2012CN102751399A Facility for manufacturing vertical GaN-based LED chips by metal substrates
10/24/2012CN102751160A Etching device and corresponding etching method
10/24/2012CN102751159A Plasma processing equipment
10/24/2012CN102751158A Processing apparatus
10/24/2012CN102751157A Inductively coupled plasma processing apparatus
10/24/2012CN102751156A Inductive coupling plasma processing apparatus
10/24/2012CN102751155A Beam transmission system and beam transmission method
10/24/2012CN102751154A Real-time detection and control device for ion implantation
10/24/2012CN102747336A Cleaning method and apparatus of semiconductor processing systems
10/24/2012CN102747330A Method for the production of a directional layer by means of cathode sputtering, and a device for carrying out the method
10/24/2012CN101853767B Substrate processing apparatus
10/24/2012CN101682090B Circuit and method for reducing electrical energy stored in a lead inductance for fast extinction of plasma arcs
10/23/2012USRE43757 Rotational stage for high speed, large area scanning in focused beam systems
10/23/2012US8295584 Pattern measurement methods and pattern measurement equipment
10/23/2012US8294125 High-sensitivity and high-throughput electron beam inspection column enabled by adjustable beam-limiting aperture
10/23/2012US8294118 Method for adjusting optical axis of charged particle radiation and charged particle radiation device
10/23/2012US8294098 Transmission electron microscope micro-grid
10/23/2012US8294097 Charged particle radiation device
10/23/2012US8293335 Yttria-coated ceramic components of semiconductor material processing apparatuses and methods of manufacturing the components
10/23/2012US8293184 Falling film plasma reactor
10/18/2012WO2012142038A1 E-beam enhanced decoupled source for semiconductor processing
10/18/2012WO2012141396A1 Combine apparatus of scanning electron microscope and energy dispersive x-ray spectroscopy
10/18/2012WO2012140874A1 Charged particle microscope device and image capturing method
10/18/2012WO2012140822A1 Charged particle beam apparatus
10/18/2012WO2012139997A1 Process for plasma treatment employing ceramic-filled polymer composite parts
10/18/2012WO2012139707A1 Carbon spark evaporation
10/18/2012WO2012089286A8 Coating apparatus having a hipims power source
10/18/2012US20120261589 Semiconductor inspecting apparatus
10/18/2012US20120261588 Transmission electron microscope micro-grid
10/18/2012US20120261574 Electron Beam Apparatus and Electron Beam Inspection Method
10/18/2012US20120261573 Arrangement and method for the contrast improvement in a charged particle beam device for inspecting a specimen
10/18/2012DE112010002774T5 Ionenmikroskop Ion microscope
10/18/2012DE112010002767T5 Kanone für geladene Teilchen und Vorrichtung für einen Strahl geladener Teilchen Gun for charged particles and apparatus for a charged particle beam
10/18/2012DE102011007215A1 Elektronenquelle zur Erzeugung eines Elektronenstrahls sowie Röntgenquelle zur Erzeugung von Röntgenstrahlung An electron source for generating an electron beam and X-ray source for generating X-radiation
10/18/2012DE10083204B3 Plasmaprozesskammer und Bearbeitungsverfahren darin Plasma processing chamber and processing method is
10/18/2012CA2833048A1 Carbon spark evaporation
10/17/2012EP2511940A2 Method for operating a plasma supply device and plasma supply device
10/17/2012EP2511939A1 Arrangement and method for the contrast improvement in a charged particle beam device for inspecting a specimen
10/17/2012EP2511938A1 Transmission electron microscope and test sample observation method
10/17/2012EP2511937A1 Electron microscope
10/17/2012EP2511936A1 Distortion free stigmation of a TEM
10/17/2012EP2511935A1 Aberration-corrected wien ExB mass filter with removal of neutrals from the beam
10/17/2012EP2511934A1 Wide aperture Wien ExB mass filter
10/17/2012EP2511764A1 Method for processing an object with miniaturized structures
10/17/2012EP2510536A1 X-ray analyser
10/17/2012EP2510535A1 Deflecting device for electron beams, magnetic deflecting unit for such a deflecting device, and device for vapor coating a planar substrate using such a deflecting device
10/17/2012EP2510534A2 Device and method for the ion beam modification of a semiconductor substrate
10/17/2012EP2510523A1 A multi-axis magnetic lens
10/17/2012CN202495419U Gas conveyer used in inductively-coupled plasma etching chamber
10/17/2012CN202495418U Current induction apparatus
10/17/2012CN202495417U Sample holder for scanning electron microscope
10/17/2012CN102741968A Support and positioning structure, semiconductor equipment system and method for positioning
10/17/2012CN102738041A Ceiling electrode plate and substrate processing apparatus
10/17/2012CN102738039A Measuring apparatus and plasma processing apparatus
10/17/2012CN102737950A Integrated anode and activated reactive gas source for use in a magnetron sputtering device
10/17/2012CN102737949A RF choke for gas delivery to an RF driven electrode in a plasma processing apparatus
10/17/2012CN102737948A Cleaning method of plasma processing apparatus and plasma processing method
10/17/2012CN102737947A Plasma processing apparatus and microwave introduction device
10/17/2012CN102737946A 等离子体处理方法 The plasma processing method
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