Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
11/2012
11/21/2012CN101322219B Means to establish orientation of ion beam to wafer and correct angle errors
11/20/2012US8314411 Particle beam therapy system
11/20/2012US8314410 Combination laser and charged particle beam system
11/20/2012US8314358 Thermal material-processing method
11/20/2012US8313635 Bare aluminum baffles for resist stripping chambers
11/15/2012WO2012155044A1 Cooled manipulator tip for removal of frozen material
11/15/2012WO2012154217A1 Rf coupled plasma abatement system comprising an integrated power oscillator
11/15/2012WO2012153987A2 High-precision vacuum electrostatic lens for vacuum
11/15/2012WO2012153456A1 Defect review apparatus
11/15/2012WO2012153449A1 Electron microscope
11/15/2012WO2012152642A1 Glow discharge apparatus and method with lateral rotating arc cathodes
11/15/2012WO2012073142A3 Method and device for ion implantation
11/15/2012US20120289397 Method of fabrication of nano particle complex catalyst by plasma ion implantation and device for the same
11/15/2012US20120286160 Charged particle instrument
11/15/2012US20120286159 Particle beam device having a detector arrangement
11/15/2012US20120286158 Scanning electron microscope and inspection method using same
11/15/2012US20120285623 Plasma processing apparatus and method
11/15/2012DE102011075543A1 Cooling arrangement used for cooling elongated magnetron used in continuous coating system for coating target material onto substrate, has coolant inlet and outlet that are provided at ends of magnetron
11/14/2012EP2523207A2 Electron beam generator
11/14/2012EP2522992A2 Testing apparatus using charged particles and device manufacturing method using the testing apparatus
11/14/2012EP2522026A2 Method and apparatus for high resolution photon detection based on extraordinary optoconductance (eoc) effects
11/14/2012EP2521804A1 Inline coating installation
11/14/2012CN1957437B Vacuum plasma processor including control in response to DC bias voltage
11/14/2012CN102782798A Lithography system with lens rotation
11/14/2012CN102782797A System and method for controlling deflection of a charged particle beam within a graded electrostatic lens
11/14/2012CN102779715A Plasma generating electrode and plasma processing device
11/14/2012CN102779714A Bivalent boron ion implantation technology in bipolar circuit
11/14/2012CN102779713A Particle beam device having a detector arrangement
11/14/2012CN102779712A Thermally driven transmission electron microscope grid made of intelligent composite material
11/14/2012CN102779711A Ion source with ultra-large ion beam divergence angle
11/14/2012CN101787519B Process kit for substrate processing chamber
11/14/2012CN101740297B Ring-shaped member and method for manufacturing same
11/14/2012CN101510492B Tem with aberration corrector and phase plate
11/14/2012CN101378003B Alternate gas delivery and evacuation system for plasma processing apparatuses
11/14/2012CN101231252B Method and device for eliminating energy jitter of electronic microscope electron energy loss spectrum
11/14/2012CN101175867B 硬材料层 Hard material layer
11/13/2012US8309938 Ion beam incident angle detection assembly and method
11/13/2012US8309937 Grid providing beamlet steering
11/13/2012US8309923 Sample observing method and scanning electron microscope
11/13/2012US8309922 Semiconductor inspection method and device that consider the effects of electron beams
11/13/2012US8309921 Compact scanning electron microscope
11/13/2012US8309920 Sample milling/observing apparatus and method of observing sample
11/13/2012US8308897 Plasma processing apparatus and plasma processing method
11/08/2012WO2012151108A1 Method and system for controlling critical dimension and roughness in resist features
11/08/2012WO2012112894A3 Focusing a charged particle imaging system
11/08/2012US20120280126 Charged particle beam apparatus permitting high resolution and high-contrast observation
11/08/2012DE112010000799T5 Ionenstrahlvorrichtung Ion beam apparatus
11/08/2012DE112010000687T5 Elektronenmikroskop Electron microscope
11/08/2012DE102011075350A1 Energy filter assembly for ion implantation system used in fabrication of silicon wafer, has filter elements that are arranged in opening of energy filter which is vibrated vertical to propagation direction of ion beam
11/08/2012DE102008020145B4 Ionenstrahlbearbeitungs- und Betrachtungsvorrichtung und Verfahren zum Bearbeiten und Betrachten einer Probe Ionenstrahlbearbeitungs- and viewing device and method for editing and viewing a sample
11/08/2012DE102007051444B4 Verfahren und Vorrichtung zum Trockenätzen von kontinuierlich bewegten Materialien Method and apparatus for dry etching of continuously moving materials
11/08/2012DE10080124B3 Substratverarbeitungssystem, dessen Verwendung sowie Verfahren zur Bearbeitung eines Substrates A substrate processing system, its use and method for processing a substrate
11/07/2012EP2521159A1 Glow discharge apparatus and method with lateral rotating arc cathodes
11/07/2012EP2521158A1 Plasma probe and method for plasma diagnostics
11/07/2012EP2521157A1 Segmented charged particle detector using scintillator material
11/07/2012CN102770936A Coil section assembly for simulating circular coils for vacuum devices
11/07/2012CN102768973A Laser auxiliary device for ion injection and using method for laser auxiliary device
11/07/2012CN102768934A Methods for preventing plasma un-confinement events in a plasma processing chamber
11/07/2012CN102768933A Method for etching
11/07/2012CN102768932A Heating device and plasma processing equipment
11/07/2012CN102184842B Method for patterning sapphire by combining wet etching and dry etching
11/07/2012CN102129971B Method and system for etching graphical sapphire substrate
11/07/2012CN101983413B Ion implanter, ion implantation method
11/07/2012CN101578683B Method and apparatus for forming a film by deposition from a plasma
11/06/2012US8304750 Scanning charged particle beams
11/06/2012US8304749 Charged-particle exposure apparatus with electrostatic zone plate
11/06/2012US8304745 Specimen holder having alignment marks
11/06/2012US8304726 Test apparatus
11/06/2012US8304723 Defect inspection and charged particle beam apparatus
11/06/2012US8304721 Micro cross-section processing method
11/01/2012WO2012148370A1 Substantially non-oxidizing plasma treatment devices and processes
11/01/2012WO2012148274A1 Charged particle system for processing a target surface
11/01/2012WO2012148267A1 Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams
11/01/2012WO2012147632A1 Sample holding apparatus for electron microscope, and electron microscope apparatus
11/01/2012WO2012146870A1 Facility for microwave treatment of a load
11/01/2012WO2012146647A2 Method and apparatus for processing a substrate with a fo-cussed particle beam
11/01/2012WO2012146397A1 Method for forming a layer on a substrate
11/01/2012WO2012112284A3 Multiple-pole electrostatic deflector for improving throughput of focused electron beam instruments
11/01/2012WO2012110465A3 System for magnetic shielding
11/01/2012WO2012094634A3 Functionalized carbon membranes
11/01/2012US20120273692 Method and apparatus for processing a microsample
11/01/2012US20120273679 X-ray analyser
11/01/2012US20120273677 In-column detector for particle-optical column
11/01/2012US20120273676 Method for determining a reconstructed image using a particle-optical apparatus
11/01/2012US20120273136 Plasma Processing Apparatus
11/01/2012US20120273097 Sputtering targets, sputter reactors, methods of forming cast ingots, and methods of forming metallic articles
11/01/2012CA2834304A1 Facility for microwave treatment of a load
10/2012
10/31/2012EP2518763A1 A grounding assembly for vacuum processing apparatus
10/31/2012EP2518756A2 In-column detector for particle-optical column
10/31/2012EP2518755A1 In-column detector for particle-optical column
10/31/2012EP2518687A1 Method for determining a reconstructed image using a particle-optical apparatus
10/31/2012EP2517228A2 Method and apparatus for forming a dielectric layer on a substrate
10/31/2012DE112010005188T5 Vorrichtung zum Bestrahlen mit geladenen Teilchen Apparatus for irradiation with charged particles
10/31/2012DE102011100057A1 Plasma treatment device for treating e.g. semiconductor substrate, has electrodes arranged in pairs with same distance from center plane of chamber such that microwaves of electrodes are partially offset with respect to each other
10/31/2012DE102011081749A1 Substratbehandlungsanlage Substrate treatment plant
10/31/2012DE102011002265A1 Verfahren zur Herstellung von Ausgangsmaterial für einen Technetium-Generator A process for the preparation of starting material for a technetium generator
10/31/2012DE102007039758B4 Einrichtung und Verfahren zur Erzeugung eines Plasmas durch niederfrequente induktive Anregung Apparatus and method for generating a plasma by low-frequency inductive excitation
10/31/2012CN102763189A High-frequency supply of a load without impedance matching
10/31/2012CN102762764A Parallel plate reactor for uniform thin film deposition with reduced tool foot-print
10/31/2012CN102762762A Vacuum processing device
1 ... 46 47 48 49 50 51 52 53 54 55 56 57 58 59 60 61 62 63 64 65 66 ... 469