| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
|---|
| 01/08/2013 | US8352889 Beam dose computing method and writing method and record carrier body and writing apparatus |
| 01/08/2013 | US8350237 Automated slice milling for viewing a feature |
| 01/08/2013 | US8350213 Charged particle beam detection unit with multi type detection subunits |
| 01/08/2013 | CA2587747C System and method for focused ion beam data analysis |
| 01/03/2013 | WO2013001700A1 Sample creation device, creation method, and charged particle beam device using same |
| 01/03/2013 | WO2013000990A1 Cathodic arc deposition |
| 01/03/2013 | WO2013000918A1 Generating, a highly ionized plasma in a plasma chamber |
| 01/03/2013 | WO2012148274A4 Charged particle system for processing a target surface |
| 01/03/2013 | WO2012148267A4 Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams |
| 01/03/2013 | WO2011081921A3 Atomic layer etching with pulsed plasmas |
| 01/03/2013 | US20130001420 Composite Charged-Particle-Beam Apparatus |
| 01/03/2013 | US20130001419 System and method for electromagnetic interferece shielding for critical dimension-scanning electron microscope |
| 01/03/2013 | US20130001418 Multiple-column electron beam apparatus and methods |
| 01/03/2013 | DE112010002981T5 Gasfeldionisations-Ionenquellenvorrichtung und damit ausgestattetesRasterladungsteilchenmikroskop Gasfeldionisations ion source device and thus ausgestattetesRasterladungsteilchenmikroskop |
| 01/03/2013 | DE102011056555B3 Hollow cathode with emission pipe is obtained from lanthanum hexaboride, and contains specified amount of ceramic material and element of specific group |
| 01/02/2013 | EP2541584A1 Generating a highly ionized plasma in a plasma chamber |
| 01/02/2013 | EP2541583A1 Electron microscope and sample holder |
| 01/02/2013 | EP2540859A1 Vacuum processing device |
| 01/02/2013 | EP2540858A1 Cathodic arc deposition |
| 01/02/2013 | EP2539923A2 Method and apparatus for enhanced lifetime and performance of ion source in an ion implantation system |
| 01/02/2013 | EP2539921A1 Apparatus and method for reactive ion etching |
| 01/02/2013 | EP2539916A2 High-frequency supply of a load without impedance matching |
| 01/02/2013 | EP2539484A1 Method and device for layer deposition |
| 01/02/2013 | CN202651058U Assembly for controlling temperature of focusing ring at outer edge of foundation support |
| 01/02/2013 | CN202651057U PECVD quartz tube locking device |
| 01/02/2013 | CN202651056U Vacuum cavity electrode pulling apparatus |
| 01/02/2013 | CN1924553B Method for determining lens errors in a particle-optical device |
| 01/02/2013 | CN102859647A Apparatus and method for reactive ion etching |
| 01/02/2013 | CN102859639A Magnetron source and method of manufacturing |
| 01/02/2013 | CN102859638A Electrode for a DBD plasma process |
| 01/02/2013 | CN102859637A Sensing of plasma process parameters |
| 01/02/2013 | CN102859636A Magnetic scanning system with improved efficiency |
| 01/02/2013 | CN102859635A Molecular ion generation |
| 01/02/2013 | CN102859634A Apparatus for generating electron beams, and method for manufacturing same |
| 01/02/2013 | CN102859027A Method for spark deposition using ceramic targets |
| 01/02/2013 | CN102856243A Electrostatic chucks, substrate treating apparatuses including the same, and substrate treating methods |
| 01/02/2013 | CN102856241A Static chuck and plasma processing equipment |
| 01/02/2013 | CN102856151A Plasma reaction cabinet |
| 01/02/2013 | CN102856150A Plasma reaction cavity cleaning device and plasma reaction cavity cleaning method thereof |
| 01/02/2013 | CN102856149A Anomaly detection device and anomaly detection method |
| 01/02/2013 | CN102856148A 成膜装置 Film forming apparatus |
| 01/02/2013 | CN102856147A Beam current transmission system and beam current transmission method thereof |
| 01/02/2013 | CN102856146A Gas backflow prevention device |
| 01/02/2013 | CN102856145A Method for manufacturing silicon part and silicon part for etching treatment device |
| 01/02/2013 | CN101916740B In-situ dry clean chamber for front end of line fabrication |
| 01/02/2013 | CN101903971B Method for manufacturing large-area vacuum plasma treated substrates and vacuum plasma treatment apparatus |
| 01/02/2013 | CN101896636B Application of hipims to through silicon via metallization in three-dimensional wafer packaging |
| 01/02/2013 | CN101578388B Film deposition of amorphous films with a graded bandgap by electron cyclotron resonance |
| 01/02/2013 | CN101553074B 顶板 Roof |
| 01/02/2013 | CN101361159B Ion sources, systems and methods |
| 01/02/2013 | CN101277580B Plasma processing apparatus of substrate and plasma processing method thereof |
| 01/01/2013 | US8344340 Inner gantry |
| 01/01/2013 | US8344339 Source-collector module with GIC mirror and tin rod EUV LPP target system |
| 01/01/2013 | US8344336 Apparatus and method for doping |
| 01/01/2013 | US8344320 Electron microscope with electron spectrometer |
| 01/01/2013 | US8343307 Showerhead assembly |
| 12/27/2012 | WO2012178175A1 Closed loop process control of plasma processed materials |
| 12/27/2012 | WO2012177890A2 High voltage isolation of an inductively coupled plasma ion source with a liquid that is not actively pumped |
| 12/27/2012 | WO2012177561A2 Method for generating electron beams in a hybrid laser-plasma accelerator |
| 12/27/2012 | WO2012176948A1 Fusion measurement apparatus |
| 12/27/2012 | WO2012176574A1 Electrode for a charged particle beam lens |
| 12/27/2012 | WO2012174993A1 Particle source and manufacturing method therefor |
| 12/27/2012 | WO2012174890A1 Plasma microwave cavity |
| 12/27/2012 | WO2012143555A3 Network architecture for lithography machine cluster |
| 12/27/2012 | WO2012110465A4 System for magnetic shielding |
| 12/27/2012 | US20120326033 Method for superimposing and displaying electron microscope image and optical image |
| 12/27/2012 | US20120326032 Particle Beam Microscope |
| 12/27/2012 | US20120326031 Method and device for applying dual energy imaging |
| 12/27/2012 | US20120326030 Particle Beam Microscope |
| 12/27/2012 | DE112011100476T5 Ladungsteilchenmikroskop und Ionenmikroskop Charged particle and ion microscope |
| 12/27/2012 | DE112011100397T5 Vorrichtung zum erzeugen von elektronenstrahlen und verfahren zum herstellen derselben An apparatus for generating electron beams and methods of making the same |
| 12/27/2012 | DE10319154B4 Maskenloses Lithographiesystem Maskless lithography system |
| 12/27/2012 | DE102011106044A1 Verfahren zur gezielten Einstellung einer Tropfenkondensation auf einer Oberfläche eines Substrats mittels Ionenimplantation Method for selective adjustment of dropwise condensation on a surface of a substrate by ion implantation |
| 12/27/2012 | DE102011105713A1 Elektrodenanordnung für eine dielektrisch behinderte Gasentladung Electrode assembly for a dielectric barrier discharge gas |
| 12/27/2012 | DE10122598B4 Verfahren für die Ionisierung eines Arbeitsgases zur Oberflächenbehandlung eines Werkstückes A process for the ionization of a working gas for the surface treatment of a workpiece |
| 12/26/2012 | EP2538432A2 Plasma processing apparatus |
| 12/26/2012 | EP2537304A1 Substrate support structure, clamp preparation unit, and lithography system |
| 12/26/2012 | EP2537174A1 Image processing method for mass spectrum image, program, and apparatus |
| 12/26/2012 | EP2537017A1 Method and apparatus for ion beam polishing |
| 12/26/2012 | CN202633250U Top improving ring and etching cavity |
| 12/26/2012 | CN202633210U Plasma etching equipment |
| 12/26/2012 | CN202633209U Plasma processing device |
| 12/26/2012 | CN102842478A Non-bonded rotary semiconducting targets and methods of their sputtering |
| 12/26/2012 | CN102842474A 粒子源及其制造方法 The particle source and the manufacturing method |
| 12/26/2012 | CN102163606B Charge-detecting chip and manufacturing method thereof |
| 12/26/2012 | CN102082063B Electrode plate and reaction chamber for medium and low frequency plasma processing equipment |
| 12/26/2012 | CN101960554B 离子源 Ion source |
| 12/26/2012 | CN101842868B Method for manufacturing a treated surface and vacuum plasma sources |
| 12/26/2012 | CN101521143B Lining mechanism for semiconductor processing equipment and manufacturing method thereof |
| 12/26/2012 | CN101421814B Ion beam scanning control methods and systems for ion implantation uniformity |
| 12/26/2012 | CN101303963B Method and apparatus for eliminating migration of etching pattern |
| 12/25/2012 | US8338805 Reticle manufacturing method, surface shape measuring apparatus and signal processor |
| 12/25/2012 | US8338804 Sample dimension inspecting/measuring method and sample dimension inspecting/measuring apparatus |
| 12/25/2012 | US8338803 Device for testing an integrated circuit and method for implementing same |
| 12/25/2012 | US8338798 Sample holder for electron microscope |
| 12/25/2012 | US8338782 Detector system for transmission electron microscope |
| 12/25/2012 | US8338781 Charged particle beam scanning method and charged particle beam apparatus |
| 12/25/2012 | US8337713 Methods for RF pulsing of a narrow gap capacitively coupled reactor |
| 12/20/2012 | WO2012174173A2 Multi-color nanoscale imaging based on nanoparticle cathodoluminescence |
| 12/20/2012 | WO2012173007A1 Spin rotation device |