Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
12/2012
12/05/2012EP2529386A1 Coating apparatus having a hipims power source
12/05/2012CN202585324U Plasma processing device, gathering device and electrostatic chuck thereof
12/05/2012CN202585323U High valence ion generation device
12/05/2012CN102812533A Combination laser and charged particle beam system
12/05/2012CN102810770A Grounding device for realizing electric connection between plasma etching cavity and cathode
12/05/2012CN102810447A Apparatus for treating substrate
12/05/2012CN102810446A Antenna unit, substrate treating apparatus and substrate treating method
12/05/2012CN102810445A Plasma processing apparatus and gas supply method therefor
12/05/2012CN102810444A Field-enhanced inductive coupling plasma processing apparatus and plasma forming method
12/05/2012CN101997057B Method and equipment for manufacturing solar cell
12/05/2012CN101919022B Deposition of active films
12/05/2012CN101903960B Insulated conducting device with multiple insulation segments
12/05/2012CN101740329B Plasma processing method
12/05/2012CN101461027B Dose close loop control for ion implantation
12/05/2012CN101379583B Flourine based cleaning of an ion source
12/04/2012US8324599 Ion implantation apparatus
12/04/2012US8324574 Aberration-correcting dark-field electron microscopy
12/04/2012US8323414 Particle removal apparatus and method and plasma processing apparatus
11/2012
11/30/2012DE202011051113U1 Lift-Out-Probenhalter Lift-out sample holder
11/30/2012DE202006021107U1 Sputtering Target und Mittel zum Kühlen des Targets Sputtering target, and means for cooling the target
11/29/2012WO2012161874A2 Contour-based defect detection using an inspection apparatus
11/29/2012WO2012161745A2 Mass analysis variable exit aperture
11/29/2012WO2012161128A1 Charged particle beam apparatus and electrostatic chuck apparatus
11/29/2012WO2012119009A3 Electron beam source system and method
11/29/2012WO2012110649A3 Holding arrangement for holding phase contrast units in a phase contrast electron microscope
11/29/2012US20120298883 Flow Cells for Electron Microscope Imaging With Multiple Flow Streams
11/29/2012US20120298865 Scanning electron microscope
11/29/2012US20120298864 Charged Particle Beam Apparatus
11/29/2012US20120298862 Contour-based defect detection using an inspection apparatus
11/29/2012DE19959845B4 Plasmagenerator Plasma generator
11/29/2012DE102011108187B3 Teilchenstrahlgenerator mit verbessertem Vakuum Charged particle with improved vacuum
11/29/2012DE102011102970A1 Strahler mit einer eisenhaltigen Metallkomponente Emitter with a ferrous metal component
11/29/2012DE102011076404A1 Verfahren zur Impedanzanpassung der Ausgangsimpedanz einer Hochfrequenzleistungsversorgungsanordnung an die Impedanz einer Plasmalast und Hochfrequenzleistungsversorgungsanordnung A method of impedance matching of the output impedance of a high frequency power supply arrangement of the impedance of a plasma load and high-frequency power supply arrangement
11/29/2012DE102011050324A1 Substrattransportmodul, Belade- und Entladesystem und Transportverfahren für Substrate in einer Substratbearbeitungsanlage Substrate transport module loading and unloading and transport method for substrates in a substrate processing system
11/28/2012EP2528082A2 Plasma treatment apparatus with an atmospheric pressure glow discharge electrode configuration
11/28/2012EP2527487A1 Separated target apparatus for sputtering and sputtering method using the same
11/28/2012EP2526561A1 Lithography system with lens rotation
11/28/2012EP2526462A1 Method for controlling the electron beam exposure of wafers and masks using proximity correction
11/28/2012EP2526218A1 Plasma- or ion-based system for producing coatings on fluoropolymers, said coatings having good adhesion
11/28/2012EP2525922A1 Method for the application of a conformal nanocoating by means of a low pressure plasma process
11/28/2012DE202010017875U1 Anode für Funkenverdampfung Anode arc vaporization
11/28/2012CN202564171U Monitoring device for magnetic field analyzing device inner cavity protective layer and magnetic field analyzing device
11/28/2012CN1945807B Apparatus for controlling temperature of a substrate
11/28/2012CN102804329A Plasma grid implant system for use in solar cell fabrications
11/28/2012CN102804328A Ion implantation apparatus and method
11/28/2012CN102800562A Pulse-plasma etching method and pulse-plasma etching apparatus
11/28/2012CN102800552A Substrate processing method
11/28/2012CN102800551A Plasma etching method and plasma etching apparatus for preparing high-aspect-ratio structures
11/28/2012CN102800550A Ion implantation device
11/28/2012CN102800549A Ion implantation machine and ion implantation method
11/28/2012CN102800548A Semiconductor manufacturing device and maintenance method thereof
11/28/2012CN102800547A Modulable focus ring and method for adjusting plasma processor by using focus ring
11/28/2012CN102797012A Etching equipment and upper part electrode thereof
11/28/2012CN102017057B Plasma treatment apparatus and method for plasma-assisted treatment of substrates
11/28/2012CN101916715B In-situ dry clean chamber for front end of line fabrication
11/28/2012CN101866801B Plasma arrestor insert
11/28/2012CN101414129B 电子束曝光系统 Electron beam exposure system
11/28/2012CN101138065B Gas baffle and distributor for semiconductor processing chamber
11/27/2012US8319196 Technique for low-temperature ion implantation
11/27/2012US8319192 Charged particle apparatus
11/27/2012US8319181 System and method for localization of large numbers of fluorescent markers in biological samples
11/27/2012US8318327 Low contamination components for semiconductor processing apparatus and methods for making components
11/27/2012US8317968 Apparatus including gas distribution member supplying process gas and radio frequency (RF) power for plasma processing
11/22/2012WO2012158805A2 Plasma attentuation for uniformity control
11/22/2012WO2012158714A1 Ion-assisted direct growth of porous materials
11/22/2012WO2012156510A1 Method for splitting a pattern for use in a multi-beamlet lithography apparatus
11/22/2012WO2012156062A1 Method for plasma-treating a substrate in a plasma device
11/22/2012WO2012155792A1 Particle source and apparatus using particle source
11/22/2012WO2012155791A1 Particle source and manufacturing method thereof
11/22/2012WO2012155395A1 Hot cathode ion source system for generating a ribbon ion beam
11/22/2012WO2012155267A1 Microscopy imaging method and system
11/22/2012US20120293791 Sample Holder with Optical Features for Holding a Sample in an Analytical Device for Research Purposes
11/22/2012US20120292528 Micro electro-mechanical heater
11/22/2012US20120292509 Structure for discharging extreme ultraviolet mask
11/22/2012US20120292506 Sample observation method using electron beams and electron microscope
11/22/2012US20120292505 Methods of using temperature control devices in electron microscopy
11/22/2012US20120292504 Method and system of evaluating distribution of lattice strain on crystal material
11/22/2012US20120292503 Charged-particle microscopy with occlusion detection
11/22/2012US20120291952 Method and system for monitoring an etch process
11/22/2012DE112010004145T5 Vorrichtung zur Abtastung mit einem geladenen Teilchenstrahl und Vefahren zur Korrektur der chromatischen und sphärischen Aberration in Kombination Apparatus for scanning with a charged particle and Vefahren to correct the chromatic and spherical aberration in combination
11/22/2012DE102011107072B3 Verfahren zum ausbilden einer oxidschicht auf einem substrat bei tiefen temperaturen A method of forming an oxide layer on a substrate at low temperatures
11/22/2012DE102008047198B4 Verfahren und Vorrichtung zum Betreiben einer Hohlkathoden-Bogenentladung Method and apparatus for operating a hollow cathode arc discharge
11/22/2012CA2835713A1 Microscopy imaging method and system
11/21/2012EP2525388A2 Large area ICP source for plasma application
11/21/2012EP2525387A1 Process for plasma treatment employing ceramic-filled polyamideimide composite parts
11/21/2012EP2525386A1 Charged-particle microscopy with occlusion detection
11/21/2012EP2525385A1 Charged-particle microscope
11/21/2012EP2525384A2 Method and structure for controlling magnetic field distributions in an ExB wien filter
11/21/2012CN102789951A Plasma processing method and plasma processing apparatus
11/21/2012CN102789950A Large area icp source for plasma application
11/21/2012CN102789949A Plasma reactor
11/21/2012CN102789948A Method and structure for controlling magnetic field distributions in an exb wien filter
11/21/2012CN102789947A Particle source and manufacture method thereof
11/21/2012CN102789946A Particle source and preparation method thereof
11/21/2012CN102789945A Hot-cathode ion source system for generating strip-shaped beam
11/21/2012CN102789944A Charged-particle microscopy with occlusion detection
11/21/2012CN102789941A Magnetron, manufacturing method of magnetron and physical deposition room
11/21/2012CN102788916A Plasma monitoring system
11/21/2012CN101884086B Method and device for plasma treatment of moving substrates
11/21/2012CN101866809B Plasma processor responsive to multiple RF frequencies
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