Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
01/2013
01/24/2013WO2013012522A1 Permanent magnet lens array
01/24/2013WO2013012041A1 Scanning electron microscope and scanning tunneling electron microscope
01/24/2013WO2013011792A1 Method for automatically determining inspection conditions and measurement conditions of sample, and scanning microscope
01/24/2013WO2013011657A1 Ion beam generating apparatus, and ion beam plasma processing apparatus
01/24/2013WO2013011612A1 Electron microscope
01/24/2013WO2013011149A1 Method and device for producing low-particle layers on substrates
01/24/2013WO2013011147A2 Plasma immersion ion implantation into a non-conductive substrate
01/24/2013WO2013010990A1 Apparatus and method for the pretreatment and/or for the coating of an article in a vacuum chamber with a hipims power source
01/24/2013WO2012165955A3 Charged particle multi-beamlet apparatus
01/24/2013WO2011100434A9 Aberration-correcting dark-field electron microscopy
01/24/2013DE19936199B4 Magnetronreaktor zum Bereitstellen einer hochdichten, induktiv gekoppelten Plasmaquelle zum Sputtern von Metallfilmen und Dielektrischen Filmen Magnetronreaktor for providing a high-density, inductively coupled plasma source for sputtering of metal films and Dielectric films
01/24/2013DE112010005353T5 Verfahren zum Überlagern und Anzeigen einer elektronenoptischen Abbildung und einer optischen Abbildung A method of storing and displaying an electron-optical imaging and optical imaging
01/24/2013DE102011079382A1 Verfahren und Vorrichtung zum Analysieren und zum Beseitigen eines Defekts einer EUV Maske Method and apparatus for analyzing and eliminating a defect of an EUV mask
01/24/2013DE102011052029A1 Plasmaimmersions-Ionenimplantation in nicht leitfähiges Substrat Plasma immersion ion implantation in non-conductive substrate
01/24/2013CA2842253A1 Method and apparatus for producing low-particle layers on substrates
01/23/2013EP2549521A1 Method and device for producing low-particle layers on substrates
01/23/2013EP2549520A1 Particle beam generator with improved vacuum
01/23/2013EP2548992A1 Vacuum deposition apparatus
01/23/2013EP2547805A1 Coating based on nial2o4 in spinel structure
01/23/2013CN202695519U Equipment for preparing vertical GaN (gallium nitride) based LED (light emitting-diode) chip by using metal substrate
01/23/2013CN202695373U Cam-locked showerhead electrode and assembly thereof
01/23/2013CN102891207A Beam conveying system used for solar wafer doping
01/23/2013CN102891061A 等离子体处理方法及等离子体灰化装置 The plasma processing method and a plasma ashing apparatus
01/23/2013CN102891060A Hot cathode ion source system
01/23/2013CN101853765B Plasma processing apparatus and plasma processing method
01/22/2013US8357912 Techniques for providing a multimode ion source
01/22/2013US8357897 Charged particle beam device
01/22/2013US8357895 Defect inspection apparatus, defect inspection method, and semiconductor device manufacturing method
01/22/2013CA2629333C Charged particle radiation therapy
01/22/2013CA2522058C High-frequency plasma beam source and method for the irradiation of a surface
01/17/2013WO2013009941A1 Inductively coupled rf plasma source with magnetic confinement and faraday shielding
01/17/2013WO2013008561A1 Charged particle beam device
01/17/2013WO2012145751A3 Automated sample preparation
01/17/2013US20130017686 Plasma processing apparatus and plasma processing method
01/17/2013US20130015350 Electron-Beam Image Reconstruction
01/17/2013DE112007003640B4 Vorrichtung zur Erzeugung eines Plasmas mittels einer dielektrischen Barrierenentladung An apparatus for generating a plasma by means of a dielectric barrier discharge
01/17/2013DE102012211595A1 Transfervorrichtung zwischen Gaschromatograph und Massenspektrometer Transfer mechanism between gas chromatograph and mass spectrometry
01/17/2013DE102012211594A1 Bogenförmige beheizte Ionenübertragungsoptik Arcuate heated ion transfer optics
01/17/2013DE102012207512A1 Pyrometeranordnung an einer Vakuumbehandlungsanlage und Verfahren zur Montage desselben The same pyrometer at a vacuum treatment system and method for mounting
01/17/2013DE102012207510A1 Pyrometer arrangement for use in vacuum treatment plant, has slide valve arranged in tube outer side of vacuum chamber between chamber wall and pyrometer and vacuum-tightly locking vacuum chamber before pyrometer
01/17/2013DE102012201061A1 Method for calibration of pyrometer, involves detecting thermal radiation emitted from measuring object in measuring direction with pyrometer, where pyrometer is aligned on object receiver of measuring object in measuring direction
01/17/2013DE102011107371A1 Verfahren zur Bestimmung der Übertragungsfunktion eines signalverarbeitenden Systems ohne bekanntes Eingangssignal Method for determining the transfer function of a signal processing system without a known input signal
01/17/2013DE102011079212A1 Preventing litter vapor coatings during sputtering of target, comprises moving substrate through plasma produced by magnetron in vacuum of process chamber, and introducing process gas for sputtering material of targets into process chamber
01/17/2013DE102009025422B4 Verfahren und Anordnung zur Steuerung eines RF-Generators für Magnetrons in Vakuumbeschichtungsanlagen Method and apparatus for controlling an RF generator for magnetron vacuum coating systems
01/17/2013DE10143719B4 Plasmaätzanlage mit einer Lagerungsvorrichtung für einen Wafer Plasma etching with a storage device for a wafer
01/16/2013EP2546863A1 Methods and structures for rapid switching between different process gases in an inductively-coupled plasma (IPC) ion source
01/16/2013EP2546862A1 Particle source and apparatus using particle source
01/16/2013EP2546638A2 Clustering of multi-modal data
01/16/2013EP2546385A1 Sputtering device
01/16/2013EP2545978A1 Exhaust-gas treatment system
01/16/2013EP2545580A1 Image processing method
01/16/2013EP2545579A2 Device for holding electron microscope grids and other materials
01/16/2013EP2545196A1 Method and device for plasma-treating workpieces
01/16/2013CN102884607A Throughput enhancement for scanned beam ion implanters
01/16/2013CN102881551A Plasma processing system with airflow limiting mechanism and method using same
01/16/2013CN102881550A Vapor deposition apparatus, vapor deposition method, and method of manufacturing organic light-emitting display apparatus
01/16/2013CN102881549A Plasma treatment method, plasma treatment apparatus, and semiconductor device manufacturing method
01/16/2013CN102881548A Vapor deposition apparatus and method, and method of manufacturing organic light emitting display apparatus
01/16/2013CN102881547A Positioning device for rotating part in vacuum cavity
01/16/2013CN102881546A Methods and structures for rapid switching between different process gases in an inductively-coupled plasma (ICP) ion source
01/16/2013CN102184829B Ventilation device of high-voltage box for electron microscope
01/16/2013CN101903969B Linear electron source, evaporator using linear electron source, and applications of electron sources
01/15/2013US8354655 Method and system for controlling critical dimension and roughness in resist features
01/15/2013US8354654 Apparatus and method for ion beam implantation using scanning and spot beams with improved high dose beam quality
01/15/2013US8354653 Techniques for manufacturing solar cells
01/10/2013WO2013005490A1 Phase plate, and electron microscope
01/10/2013WO2013004514A1 Field emission cathode structure and driving method thereof
01/10/2013WO2013004440A1 Plasma treatment of hollow bodies
01/10/2013WO2013004439A1 Device and method for plasma treatment of surfaces
01/10/2013WO2012074889A3 Ion implanter system including remote dopant source, and method comprising same
01/10/2013US20130009073 Transmission electron microscope micro-grid
01/10/2013US20130009072 Specimen box for electron microscope
01/10/2013US20130009071 Specimen box for electron microscope
01/10/2013US20130009058 Electron microscope
01/10/2013US20130009057 Electron Beam Irradiation Method and Scanning Electron Microscope
01/10/2013US20130009056 Integrable magnetic field compensation for use in scanning and transmission electron microscopes
01/10/2013DE112010004286T5 Ladungsteilchenmikroskop Charged particle
01/10/2013DE102011106433A1 Integrierbare Magnetfeldkompensation für den Einsatz an Raster- und Transmissionselektronenmikroskopen Integrable magnetic field compensation for use in scanning and transmission electron microscopes
01/09/2013EP2544223A1 Thin film forming apparatus
01/09/2013EP2544215A2 Protective device for electrode holders in CVD reactors
01/09/2013EP2544214A2 Integrating magnetic field compensation for use in scanning and transmission electron microscopes
01/09/2013EP2544026A1 Silicon Drift Detector for use in a charged particle apparatus
01/09/2013EP2544025A1 Silicon Drift Detector for use in a charged particle apparatus
01/09/2013CN202663641U Upper electrode structure of dry-etching machine
01/09/2013CN202660132U Gas supply device and connecting piece thereof
01/09/2013CN102870383A Substrate support structure, clamp preparation unit, and lithography system
01/09/2013CN102867910A Method of manufacturing magnetoresistive device and apparatus for manufacturing the same
01/09/2013CN102867727A Vacuum plasma processor including control in response to DC bias voltage
01/09/2013CN102867726A Plasma confinement ring assemblies having reduced polymer deposition characteristics
01/09/2013CN102867725A Antenna, dielectric window, plasma processing apparatus and plasma processing method
01/09/2013CN102867724A Plasma processing apparatus
01/09/2013CN102867723A Plasma processing device loading table and corresponding plasma processing device
01/09/2013CN102867722A Device for detecting ion beam section density distribution and uniform ion beam distribution in real time
01/09/2013CN102867721A Power control system with banded beam current ion source
01/09/2013CN102867720A Specimen box for electron microscope
01/09/2013CN102867719A Ion source insulation device
01/09/2013CN102867718A Filament clamping and power supply structure for ion shower
01/09/2013CN102866628A Method for closed-loop control of power input
01/09/2013CN101681820B Techniques for forming shallow junctions
01/09/2013CN101523357B Apparatus and method for substrate clamping in a plasma chamber
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