Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
02/2013
02/14/2013US20130037716 Scanning electron microscope and sample observation method
02/14/2013US20130037715 Charged-particle microscope providing depth-resolved imagery
02/14/2013US20130037714 Charged-Particle Microscopy Imaging Method
02/14/2013US20130037713 Method for processing samples held by a nanomanipulator
02/14/2013US20130037712 Optical-cavity phase plate for transmission electron microscopy
02/14/2013US20130037706 Devices and methods for cryo lift-out with in situ probe
02/14/2013DE102011080898A1 Einglättende Schicht für metallische Werkstücke Einglättende layer for metal workpieces
02/14/2013DE102011080810A1 Long term stable coating of substrates, comprises evaporating an evaporating material arranged in a crucible, using an electron beam, and depositing on the substrate in a coating window
02/13/2013EP2557588A1 Compound microscope device
02/13/2013EP2557587A2 Charged-particle microscope providing depth-resolved imagery
02/13/2013EP2557586A2 Charged-particle microscopy imaging method
02/13/2013EP2557585A1 Charged-particle microscope providing depth-resolved imagery
02/13/2013EP2557584A1 Charged-particle microscopy imaging method
02/13/2013EP2557416A2 Sample surface inspection apparatus and method
02/13/2013EP2556527A1 Charged particle detection system and multi-beamlet inspection system
02/13/2013EP2556526A2 Combination laser and charged particle beam system
02/13/2013CN1715442B Gas diffusion shower head design for large area plasma enhanced chemical vapor deposition
02/13/2013CN102934197A Systems and methods for forming a layer of sputtered material
02/13/2013CN102934196A Effective algorithm for warming a twist axis for cold ion implantations
02/13/2013CN102934195A Small form factor plasma source for high density wide ribbon ion beam generation
02/13/2013CN102931056A Surface processing method, a member made of silicon carbide, and a plasma processing apparatus
02/13/2013CN102931045A Method for processing etching process monitoring signal and etching end-point control method
02/13/2013CN102931044A Charged-particle microscopy imaging method
02/13/2013CN102103968B Particle beam passable nonmetal vacuum isolation window
02/13/2013CN101802259B Device for very high frequency plasma assisted CVD under atmospheric pressure, and applications thereof
02/13/2013CN101604610B Chamber and treating device
02/12/2013US8374830 Grid transparency and grid hole pattern control for ion beam uniformity
02/12/2013US8373138 Vessel sterilization apparatus
02/12/2013US8373113 Calibration standard member, method for manufacturing the member and scanning electronic microscope using the member
02/12/2013US8372205 Reducing electrostatic charge by roughening the susceptor
02/07/2013WO2013019810A2 Method and device for controlling pattern and structure formation by an electric field
02/07/2013WO2013019432A2 Method for uninterrupted production of a polyatomic boron molecular ion beam with self-cleaning
02/07/2013WO2013019425A2 Sputter-etch tool and liners
02/07/2013WO2013018594A1 Charged particle beam apparatus
02/07/2013WO2013017495A1 Tool and process for treating an object by plasma generators
02/07/2013US20130032716 Electron beam apparatus and a device manufacturing method by using said electron beam apparatus
02/07/2013US20130032714 Ion beam apparatus and ion-beam processing method
02/07/2013US20130032713 Electron detector including one or more intimately-coupled scintillator-photomultiplier combinations, and electron microscope employing same
02/07/2013DE102011080341A1 Verfahren und Teilchenstrahlgerät zur Erzeugung eines Bildes eines Objekts Particle beam device and method for forming an image of an object
02/06/2013EP2555222A1 Electron microscope
02/06/2013EP2555221A1 Method of studying a sample in an ETEM
02/06/2013EP2555220A1 Charged particle detector system comprising a conversion electrode
02/06/2013EP2555219A1 Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus
02/06/2013EP2553707A1 Multi-channel radio frequency generator
02/06/2013EP2553140A1 Process and apparatus for deposition of multicomponent semiconductor layers
02/06/2013CN102918623A Device for supporting a rotatable target and sputtering installation
02/06/2013CN102918622A Chamber for physical vapor deposition
02/06/2013CN102918621A Active dew point sensing and load lock venting to prevent condensation of workpieces
02/06/2013CN102918605A Coated graphite article and reactive ion etch manufacturing and refurbishment of graphite article
02/06/2013CN102915903A Apparatus and method for removal of surface oxides via fluxless technique involving electron attachment
02/06/2013CN102915902A Capacitive coupling type plasma processing device and substrate processing method thereof
02/06/2013CN102915901A Ion implantation device and method for controlling the ion implantation device
02/06/2013CN102915900A Focusing ion beam device
02/06/2013CN102915899A Method and equipment for regulating parallelism of ion beams in ion implantation device
02/06/2013CN102912311A Vacuum system applied in production of metal hardmask titanium nitride process sputtering chamber
02/06/2013CN102184828B Second condenser lens for electron microscope
02/06/2013CN102103967B Particle-optical component
02/06/2013CN102103966B Particle-optical component
02/06/2013CN101996840B Plasma processing equipment and method and method for washing chamber
02/05/2013US8368309 Method and apparatus for extracting ions from an ion source for use in ion implantation
02/05/2013US8368036 Ion implantation method and ion implantation apparatus
02/05/2013US8368032 Radiation source, lithographic apparatus, and device manufacturing method
02/05/2013US8368031 Inspection system by charged particle beam and method of manufacturing devices using the system
02/05/2013US8368020 Particle beam system
02/05/2013US8368019 Particle beam system
02/05/2013US8368018 Method and apparatus for charged particle beam inspection
02/05/2013US8368016 Electron beam apparatus and a device manufacturing method by using said electron beam apparatus
02/05/2013US8366870 Method and apparatus for plasma processing
01/2013
01/31/2013WO2013016619A1 Ion energy control system for advanced plasma energy processing systems
01/31/2013WO2013015311A1 Electromagnetic lens and charged particle device
01/31/2013WO2013015102A1 Charged particle beam device
01/31/2013WO2013015040A1 Charged particle beam apparatus and measuring method
01/31/2013WO2013015019A1 Charged particle device
01/31/2013WO2013014410A1 Electron beam evaporation apparatus
01/31/2013WO2012163860A3 Methods and systems for material characterization
01/31/2013WO2012138738A3 Method for extracting frozen specimens and manufacture of specimen assemblies
01/31/2013WO2012119114A3 E-petri dishes, devices, and systems
01/31/2013US20130026917 Ion focusing in a hall effect thruster
01/31/2013US20130026361 Pattern evaluation method, device therefor, and electron beam device
01/31/2013DE19943064B4 Verfahren zur epitaktischen Abscheidung von Atomen oder Molekülen aus einem Reaktivgas auf einer Abscheidungsoberfläche eines Substrats Process for epitaxial deposition of atoms or molecules from a reactive gas on a deposition surface of a substrate
01/31/2013DE112011100597T5 Feldmissions-Elektronenkanone und Verfahren zu deren Steuerung Field emission electron gun and method for controlling same
01/31/2013DE10000364B4 Merkmalbasierende Feststellung von Fehlern Feature-based detection of faults
01/30/2013EP2551890A1 System and method of treating an object by a plasma generator
01/30/2013EP2551889A1 Shielding member having a charge control electrode, and a charged particle beam apparatus
01/30/2013EP2550671A1 Lithography system, sensor, converter element and method of manufacture
01/30/2013EP2550517A1 Active thermoprobe
01/30/2013CN202712119U Gas phase etching equipment with multiple cavities
01/30/2013CN202712118U 离子分离装置 Ion separation device
01/30/2013CN202712117U Specimen holder used for SEM/FIB failure analysis
01/30/2013CN102906850A Lithography system, sensor, converter element and method of manufacture
01/30/2013CN102906300A Non-continuous bonding of sputtering target to backing material
01/30/2013CN102903592A Baffle and substrate treating apparatus including the same
01/30/2013CN102903591A Ultrafast lens-free coherent electron diffraction imaging method and device
01/30/2013CN101483146B Bonding structure and semiconductor device manufacturing apparatus
01/29/2013US8362442 Corrector
01/29/2013US8362441 Enhanced integrity projection lens assembly
01/29/2013US8362427 Electron beam irradiation apparatus and electron beam drawing apparatus
01/29/2013CA2485675C Optical projection imaging system and method for automatically detecting cells with molecular marker compartmentalization associated with disease
01/24/2013WO2013013086A1 Current limiter for high voltage power supply used with ion implantation system
01/24/2013WO2013012637A1 Sputter gun
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