| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 03/06/2013 | CN102956427A Motion control system for broadband beam ion source extraction electrode |
| 03/06/2013 | CN102956426A Extraction inhibiting surge protector |
| 03/06/2013 | CN102956425A Method for quickly finding out largest beam value |
| 03/06/2013 | CN102956424A Honeycomb beam homogeneity detecting device |
| 03/06/2013 | CN102956423A Negative-pressure detection interlocking method |
| 03/06/2013 | CN102956422A Charged particle beam forming aperture and charged particle beam exposure apparatus |
| 03/06/2013 | CN102956421A Ion source filament and clamping device therefor |
| 03/06/2013 | CN102956420A Electronic radiation source generating device and method for generating low-dosage-rate electronic rays |
| 03/06/2013 | CN102027565B A rotatable sputtering magnetron with high stiffness |
| 03/06/2013 | CN101297244B 光刻系统和投影方法 Projection lithography system and method |
| 03/05/2013 | USRE44035 Apparatus for correlating an optical image and a SEM image and method of use thereof |
| 03/05/2013 | US8391619 Structure determination system, structure determination method, and program |
| 03/05/2013 | US8389965 Method and device of irradiation of logs with electron beams as a phytosanitary treatment |
| 03/05/2013 | US8389964 Ion implanting apparatus and deflecting electrode |
| 03/05/2013 | US8389953 Focused ion beam apparatus |
| 03/05/2013 | US8389951 Spherical aberration corrector and method of spherical aberration correction |
| 03/05/2013 | US8388397 Liquid crystal cell manufacturing device and method thereof |
| 03/05/2013 | US8387562 Plasma processor and plasma processing method |
| 02/28/2013 | WO2013028782A1 Electrochemically-grown nanowires and uses thereof |
| 02/28/2013 | WO2013028663A1 Methods and apparatus for employing an accelerated neutral beam for improved surface analysis |
| 02/28/2013 | WO2013028227A2 Improved uniformity of a scanned ion beam |
| 02/28/2013 | WO2013027644A1 Charged particle beam device |
| 02/28/2013 | WO2013027453A1 Method for estimating shape before shrink, and cd-sem apparatus |
| 02/28/2013 | WO2013027448A1 Electron gun and charged particle beam device |
| 02/28/2013 | WO2013026707A1 Method and device for the preparation of a sample for microstructure diagnostics |
| 02/28/2013 | WO2013026537A2 Device and method for measuring the beam deflection by means of frequency analysis |
| 02/28/2013 | WO2013026491A1 Sputtering apparatus and method |
| 02/28/2013 | WO2013003371A3 Multiple-column electron beam apparatus and methods |
| 02/28/2013 | US20130054153 Method and apparatus for material analysis by a focused electron beam using characteristic x-rays and back-scattered electrons |
| 02/28/2013 | US20130051656 Method for analyzing rubber compound with filler particles |
| 02/28/2013 | US20130048854 Scanning electron microscope |
| 02/28/2013 | DE102011111686A1 Processing substrate using ion beam, comprises generating ion beam from ion beam source, and directing ion beam on surface for processing substrate, in which ion beam is passed through aperture that is made of carbon-containing material |
| 02/28/2013 | DE102011111613A1 Sensoranordnung zur Charakterisierung von Plasmabeschichtungs-, Plasmaätz- und Plasmabehandlungsprozessen sowie Verfahren zur Ermittlung von Kenngrößen in diesen Prozessen Sensor arrangement for the characterization of plasma coating, plasma etching and plasma treatment processes and procedures for the determination of parameters in these processes |
| 02/28/2013 | DE102011111190A1 Verfahren und Vorrichtung zur Präparation einer Probe für die Mikrostrukturdiagnostik Method and apparatus for preparation of a sample for microstructure diagnostics |
| 02/28/2013 | DE102011052924A1 Vorrichtung und Verfahren zur Messung der Strahlablenkung mittels Frequenzanalyse Apparatus and method for measuring the beam deflection by means of frequency analysis |
| 02/28/2013 | DE102009025422B9 Verfahren und Anordnung zur Steuerung eines RF-Generators für Magnetrons in Vakuumbeschichtungsanlagen Method and apparatus for controlling an RF generator for magnetron vacuum coating systems |
| 02/27/2013 | EP2562796A2 Photoresist strip processes for improved device integrity |
| 02/27/2013 | EP2562784A2 Sensor assembly for characterization of plasma coating, plasma etching and plasma treatment processes and method for determining characteristic parameters in these processes |
| 02/27/2013 | EP2562765A2 Charged particle beam forming aperture and charged particle beam exposure apparatus |
| 02/27/2013 | EP2562289A1 Method for forming DLC film on spline shaft and hot cathode PIG plasma CVD device |
| 02/27/2013 | EP2561543A1 Sensing of plasma process parameters |
| 02/27/2013 | EP2561542A1 Characteristic determination |
| 02/27/2013 | EP2561541A1 Manipulator carrier for electron microscopes |
| 02/27/2013 | EP2561540A1 Improved ion source |
| 02/27/2013 | EP2561114A2 Apparatus and method for coating substrates using the eb/pvd process |
| 02/27/2013 | EP2561113A1 Apparatus for coating substrates using the eb/pvd method |
| 02/27/2013 | CN202758844U Gas conveying system |
| 02/27/2013 | CN102947916A Heated rotary seal and bearing for chilled ion implantation system |
| 02/27/2013 | CN102947479A Method and device for coating a surface |
| 02/27/2013 | CN102945784A Dry etching uniformity optimization device and method |
| 02/27/2013 | CN102945783A Gas filling device and plasma processing equipment |
| 02/27/2013 | CN102943233A Novel ion bombardment furnace |
| 02/27/2013 | CN101924002B Heating device and plasma treatment equipment using same |
| 02/27/2013 | CN101866807B Plasma processor responsive to multiple RF frequencies |
| 02/27/2013 | CN101853766B Plasma processing apparatus and plasma processing method |
| 02/27/2013 | CN101826434B Plasma processing apparatus and electrode for same |
| 02/27/2013 | CN101636813B Novel plasma system for improved process capability |
| 02/27/2013 | CN101373731B Electrostatic chuck apparatus and temperature control method thereof |
| 02/26/2013 | US8384050 Ion beam sample preparation thermal management apparatus and methods |
| 02/26/2013 | US8382942 Method and apparatus for reducing substrate backside deposition during processing |
| 02/21/2013 | WO2013026006A2 Passive detectors for imaging systems |
| 02/21/2013 | WO2013025816A1 Apparatus and method for three dimensional ion processing |
| 02/21/2013 | WO2013024315A1 Reaction chamber for deposition of a semiconductor layer on the plurality substrates in batches |
| 02/21/2013 | WO2013024313A1 Electrode structure for use in a reaction chamber |
| 02/21/2013 | WO2013024298A2 Time-dependent label |
| 02/21/2013 | WO2013024235A1 Plasma processing apparatus |
| 02/21/2013 | WO2013024234A1 Plasma processing apparatus |
| 02/21/2013 | WO2013023802A1 Smoothing layer for metal workpieces |
| 02/21/2013 | US20130043389 Method for correcting electronic proximity effects using off-center scattering functions |
| 02/21/2013 | US20130043388 Charged particle radiation device |
| 02/21/2013 | US20130043387 Aberration-correcting dark-field electron microscopy |
| 02/21/2013 | US20130043386 Image processing apparatus, an image generating method, and a system |
| 02/21/2013 | US20130043130 Ammunition and weapon type identification based on gunshot residue analysis |
| 02/21/2013 | DE102007057950B4 Vorrichtung zur Halterung von Werkstücken, insbesondere bei der Oberflächenbearbeitung von Linsen, Halbleitern und dergleichen unter Vakuum oder Atmosphäre, mittels Ionenstrahlen, Verwendung der Vorrichtung sowie Bearbeitungsvorrichtung A device for holding workpieces, in particular for surface treatment of lenses, semiconductors and the like under vacuum or atmosphere by means of ion beams, use of the apparatus and processing apparatus |
| 02/20/2013 | EP2560187A1 Method for correcting electronic proximity effects using off-centre scattering functions |
| 02/20/2013 | EP2560186A1 Ion beam apparatus and ion-beam processing method |
| 02/20/2013 | EP2560185A2 Charged particle beam device with dark field detector |
| 02/20/2013 | EP2559054A1 Lithography method with combined optimisation of radiated energy and design geometry |
| 02/20/2013 | EP2559053A1 Large-mesh cell- projection electron-beam lithography method |
| 02/20/2013 | EP2559052A1 Electron-beam lithography method with correction of line ends by insertion of contrast patterns |
| 02/20/2013 | EP2559051A1 Method of electron-beam lithography with correction of corner roundings |
| 02/20/2013 | EP2559050A1 Target for spark vaporization with physical limiting of the propogation of the spark |
| 02/20/2013 | EP2558839A2 Ion beam sample preparation apparatus and methods |
| 02/20/2013 | EP2558838A2 Ion beam sample preparation apparatus and methods |
| 02/20/2013 | EP2558837A2 Ion beam sample preparation thermal management apparatus and methods |
| 02/20/2013 | EP2558836A2 Ion beam sample preparation apparatus and methods |
| 02/20/2013 | EP2558835A1 Device analysis |
| 02/20/2013 | EP2558609A1 Device for coating a substrate inside a vacuum chamber by means of plasma-assisted chemical vapor deposition |
| 02/20/2013 | EP2558608A1 Coating source and process for the production thereof |
| 02/20/2013 | CN202749334U Side-installed lens-coupling transmission electron microscope digital imaging apparatus |
| 02/20/2013 | CN202749333U Objective table |
| 02/20/2013 | CN202749332U Electric mirror dual-use electrode |
| 02/20/2013 | CN102939403A Coating source and process for the production thereof |
| 02/20/2013 | CN102938358A Magnetron, sputtering cavity device and sputtering device |
| 02/20/2013 | CN101801518B Methods and apparatus for the production of group IV nanoparticles in a flow-through plasma reactor |
| 02/19/2013 | US8378319 System and method for generating direct-write pattern |
| 02/19/2013 | US8378318 Fixed mask design improvements |
| 02/19/2013 | US8378313 Uniformity of a scanned ion beam |
| 02/14/2013 | WO2013022917A2 Method for processing samples held by a nanomanipulator |
| 02/14/2013 | WO2012153987A3 High-precision vacuum electrostatic lens for vacuum |