Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
04/2013
04/04/2013US20130082175 Method and particle beam device for producing an image of an object
04/04/2013DE69428698C5 System und vorrichtung zur elektronenstrahlbehandlung während einer operation System and device for electron beam treatment during surgery
04/04/2013CA2849938A1 Method of fabricating nano-tips with controlled profile
04/03/2013EP2575159A1 Particle beam system and method for operating the same
04/03/2013EP2575144A1 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
04/03/2013EP2575143A1 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
04/03/2013CN202855705U Wireless electronic microscope
04/03/2013CN103026452A Arc quenching assembly and method for quenching arcs
04/03/2013CN103026451A Reactor box chamber cleaning using molecular fluorine
04/03/2013CN103026450A Versatile beam glitch detection system
04/03/2013CN103023452A Filter circuit and dual-frequency plasma processing device including same
04/03/2013CN103022272A Device preparing non-crystalline silicon/non-crystalline germanium-silicon laminated solar cell thin films
04/03/2013CN103021922A Cover plate, loading device as well as plasma processing device
04/03/2013CN103021912A Semiconductor etching device and etching method of semiconductor structure
04/03/2013CN103021834A Etching method, etching apparatus, and storage medium
04/03/2013CN103021784A Hollow cathode graft polymerization and plasma treatment unit for large-area film material
04/03/2013CN103021783A Etching method of semiconductor structure
04/03/2013CN103021782A Ion implantation system
04/03/2013CN103021781A Apparatus for measuring a set of electrical characteristics in a plasma
04/03/2013CN103021780A EB (electron beam) gun air flow rate control method during EB furnace smelting process
04/03/2013CN103021779A 等离子体反应器 Plasma reactor
04/03/2013CN103021778A Airflow balancing plate, chamber device and substrate processing device
04/03/2013CN103021777A Ion implantation method and device
04/03/2013CN103021776A Transmission electron microscope with near-field optical scanning function
04/03/2013CN103021775A A beam monitoring device, method and system
04/03/2013CN103021774A Rapid automatic precision radio frequency matching device
04/03/2013CN103021773A Porous composite ceramic portion, preparing method thereof and plasma treating cavity
04/03/2013CN103021772A Electrode frame and charged particle beam generator with the same
04/03/2013CN103014677A Plasma monitoring and minimizing stray capacitance
04/03/2013CN102169912B Mo/Ag laminated metal matrix composite for solar cell interconnected sheet and preparation process thereof
04/03/2013CN102027563B Reactive sputtering with HIPIMS
04/03/2013CN101681781B Ion sources and methods of operating an electromagnet of an ion source
04/02/2013US8410459 Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ions
04/02/2013US8410439 X-ray detector for electron microscope
04/02/2013US8409400 Inductive plasma chamber having multi discharge tube bridge
03/2013
03/28/2013WO2013043794A2 Liquid metal ion source, system and method
03/28/2013WO2013043749A1 Method and apparatus for high brightness superconducting radio frequency (rf) photoinjector gun cavity (srf gun)
03/28/2013WO2013042425A1 Charged particle beam device, method for adjusting charged particle beam device, and method for observing sample or inspecting sample
03/28/2013WO2013041569A1 Method and apparatus for predicting a growth rate of deposited contaminants
03/28/2013WO2013041413A1 Method and alignment of a phase plate in an electron microscope
03/28/2013WO2012174173A3 Multi-color nanoscale imaging based on nanoparticle cathodoluminescence
03/28/2013WO2011100434A8 Aberration-correcting dark-field electron microscopy
03/28/2013US20130075606 Composite charged particle beam apparatus
03/28/2013US20130075604 Particle beam system having a hollow light guide
03/28/2013DE102011087159B3 Haftgrundvorbereitung für das Kaltgasspritzen und Kaltgasspritzvorrichtung Primer preparation for the cold gas spraying and cold spraying device
03/28/2013DE102004059664B4 Gerät zur automatischen Fokussierung und Verfahren dazu Device for automatic focus and method therefor
03/27/2013EP2573798A2 Microwave processing apparatus and method for processing object
03/27/2013EP2573797A2 Microwave processing apparatus and method for processing object to be processed
03/27/2013EP2573796A1 Particle beam system having a hollow light guide
03/27/2013EP2573795A1 Scanning electron microscope
03/27/2013EP2573794A1 Scanning electron microscope
03/27/2013EP2573793A1 Electron microscope
03/27/2013EP2573792A1 Electron microscope, and method for adjusting optical axis of electron microscope
03/27/2013EP2572013A1 Non-continuous bonding of sputtering target to backing material
03/27/2013CN202839719U Ion implantation device for crystalline silicon solar cell production
03/27/2013CN202839532U Plasma processing system possessing airflow limitation mechanism
03/27/2013CN202839531U Plasma processing device and Faraday shielding device thereof
03/27/2013CN202839530U Magnetic lens focusing device of e type electronic gun
03/27/2013CN202839529U Dustproof vacuum plasma chamber
03/27/2013CN202830168U Reactant gas supply device
03/27/2013CN103003915A Magnet arrangement for a target backing tube, target backing tube including the same, cylindrical target assembly and sputtering system
03/27/2013CN103003914A Method and system for modifying substrate patterned features using ion implantation
03/27/2013CN103003913A Device for generating plasma by means of microwaves
03/27/2013CN103003912A Dose measurement device for plasma-immersion ion implantation
03/27/2013CN103003911A Detector for energetic secondary electrons
03/27/2013CN103000482A Etching method and apparatus
03/27/2013CN103000481A Apparatus for monitoring ion implantation
03/27/2013CN103000480A Transmission electron microscope sample rod capable of being added with optical fibers
03/27/2013CN103000479A Novel electronic gun
03/27/2013CN101971289B A method of magnetron sputtering and a method for determining a power modulation compensation function for a power supply applied to a magnetron sputtering source
03/27/2013CN101740336B Cavity window and plasma process cavity
03/27/2013CN101378007B Plasma processing apparatus
03/27/2013CN101303956B Ion beam detection device, ion beam detection method, semiconductor manufacturing device and ion source device
03/27/2013CN101151701B A method for operating a pulsed arc evaporation source and a vacuum processing equipment with the pulsed arc evaporation source
03/27/2013CN101002294B Ion beam scanning systems and methods for improved ion implantation uniformity
03/26/2013US8405054 Multi-source plasma focused ion beam system
03/26/2013US8405053 Method and apparatus for specimen fabrication
03/26/2013US8405052 Ion implanter provided with beam deflector and asymmetrical einzel lens
03/26/2013US8405043 Charged particle extraction device and method of design there for
03/26/2013US8404050 Plasma processing apparatus and method
03/21/2013WO2013040369A1 Technique for ion implanting a target
03/21/2013WO2013039891A1 Glancing angle mill
03/21/2013WO2013039386A1 Assembly and a method for lifting a module of a lithography system in vertical direction and a lithography system comprising such assembly
03/21/2013WO2013038961A1 Scanning electron microscope
03/21/2013WO2013038910A1 Sample heating holder for microscope or analysis equipment that uses electron beam, and sample heating method that uses sample heating holder
03/21/2013WO2013037788A1 Method for correcting the effects of electronic proximity using the deconvolution of the pattern to be exposed by means of a probabilistic method
03/21/2013WO2013037486A2 Assembly for providing an aligned stack of two or more modules and a lithography system or a microscopy system comprising such an assembly
03/21/2013WO2013037423A1 Vacuum substrate treatment system having an emergency cooling device
03/21/2013WO2012168709A3 Improvements to the application of coating materials
03/21/2013WO2012168303A3 Method and device for generating an arc detection signal and arc detection arrangement
03/21/2013WO2012161874A3 Contour-based defect detection using an inspection apparatus
03/21/2013WO2012158805A3 Plasma attentuation for uniformity control
03/21/2013US20130072002 Batch-Type Remote Plasma Processing Apparatus
03/21/2013US20130071297 Arrays of metal and metal oxide microplasma devices with defect free oxide
03/21/2013US20130068949 Charged particle beam device provided with automatic aberration correction method
03/21/2013US20130068947 Pattern inspection apparatus and pattern inspection method
03/21/2013DE112011101910T5 Reduzieren von Kupfer- oder Spurenmetallverunreinigungen bei elektrolytischen Plasmaoxidationsbeschichtungen Reducing copper or trace metal contamination in electrolytic plasma oxidation coatings
03/21/2013DE102012108823A1 Zusammengesetzte Ladungsteilchenstrahlvorrichtung Compound A charged
03/21/2013DE102012108788A1 Zusammengesetzte Ladungsteilchenstrahlvorrichtung Compound A charged
03/21/2013DE102011113645A1 Verfahren zur Ausrichtung einer Phasenplatte in einem Elektronenmikroskop A method of aligning a phase plate in an electron microscope
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