| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 03/21/2013 | DE102011083139A1 Substrate processing system such as vacuum coating equipment, has substrate carriers that mesh with each other in substrate transfer position such that they are pivoted back and forth between two tilt positions, in inclined manner |
| 03/21/2013 | DE102011082956A1 Transfermasken zur lokalen Bedampfung von Substraten und Verfahren zu deren Herstellung Transfer masks for local vapor deposition of substrates and processes for their preparation |
| 03/21/2013 | DE102011082939A1 Microstructured transfer mask for locally differentiated transmission of organic materials on substrate, has intermediate carrier, textured light-reflecting layer, and light absorbing layer having anisotropic thermal conductivity |
| 03/21/2013 | DE102011082900A1 Vacuum coating apparatus useful for coating disc-shaped substrates, comprises a plant chamber limited by chamber walls, having opening that is closable by a vacuum-tight chamber lid, a transport device and coating device with tubular target |
| 03/20/2013 | EP2571041A1 Electron source |
| 03/20/2013 | EP2569798A1 Methods and apparatus for applying periodic voltage using direct current |
| 03/20/2013 | CN202816866U Compound plasma surface treatment device |
| 03/20/2013 | CN202816865U A top electrode in an etching electrode mechanism |
| 03/20/2013 | CN202816864U A bottom electrode device in an etching electrode machine |
| 03/20/2013 | CN102985996A Methods and apparatus for applying periodic voltage using direct current |
| 03/20/2013 | CN102985995A Handling beam glitches during ion implantation of workpieces |
| 03/20/2013 | CN102985590A Method for treating a surface of a polymeric part by multi-energy ions |
| 03/20/2013 | CN102983099A Semiconductor integrated circuit manufacturing method |
| 03/20/2013 | CN102983052A Etch process for 3D flash structures |
| 03/20/2013 | CN102983051A Plasma treatment device with adjustable plasma concentration distribution and processing method thereof |
| 03/20/2013 | CN102983050A Ion injection device |
| 03/20/2013 | CN102983049A Transmission electron microscope sample bearing device |
| 03/20/2013 | CN102983048A Beam current regulating mechanism and ion implantation system |
| 03/20/2013 | CN102148115B Manufacturing method for transmission electron microscope micro-gate |
| 03/20/2013 | CN101528369B Method and apparatus for manufacturing cleaned substrates or clean substrates which are further processed |
| 03/19/2013 | US8399865 Method and apparatus for enhanced lifetime and performance of ion source in an ion implantation system |
| 03/19/2013 | US8399864 Dual beam system |
| 03/19/2013 | US8399863 Charged particle beam apparatus using an electrostatic lens gun |
| 03/19/2013 | US8399854 Combination scale and germicidal sterilization apparatus |
| 03/19/2013 | US8399853 UV sterilizer |
| 03/19/2013 | US8399851 Systems and methods for scanning a beam of charged particles |
| 03/19/2013 | US8399834 Isotope ion microscope methods and systems |
| 03/19/2013 | US8399833 Charged particle beam writing method, method for detecting position of reference mark for charged particle beam writing, and charged particle beam writing apparatus |
| 03/19/2013 | US8399831 Forming an image while milling a work piece |
| 03/19/2013 | US8398813 Processing apparatus and processing method |
| 03/14/2013 | WO2013036125A1 Projection system with flexible coupling |
| 03/14/2013 | WO2013035983A1 Apparatus and method for plasma ion implantation |
| 03/14/2013 | WO2013035866A1 Electron-microscopic examination method for examining biosample while keeping said biosample unchanged, and composition for evaporation inhibition under vacuum, scanning electron microscope, and transmission electron microscope for use in said method |
| 03/14/2013 | WO2013035411A1 Emitter, gas field ionization ion source, and ion beam device |
| 03/14/2013 | WO2013035389A1 Scanning electron microscope |
| 03/14/2013 | WO2013035386A1 Multipole measurement apparatus |
| 03/14/2013 | WO2013035221A1 Ion beam device |
| 03/14/2013 | WO2013035220A1 Charged particle beam apparatus |
| 03/14/2013 | WO2013034920A2 Surface coatings |
| 03/14/2013 | WO2013034258A1 Plasma source |
| 03/14/2013 | WO2013011147A3 Plasma immersion ion implantation into a non-conductive substrate |
| 03/14/2013 | US20130065396 Apparatus including gas distribution member supplying process gas and radio frequency (rf) power for plasma processing |
| 03/14/2013 | US20130062520 Distortion Free Stigmation of a TEM |
| 03/14/2013 | US20130062519 Electron microscope, and method for adjustng optical axis of electron microscope |
| 03/14/2013 | US20130062198 Apparatus for processing work piece by pulsed electric discharges in solid-gas plasma |
| 03/14/2013 | DE102011112759A1 Plasmaquelle Plasma source |
| 03/14/2013 | CA2846679A1 Plasma source |
| 03/13/2013 | EP2568777A1 Microwave processing apparatus and control method thereof |
| 03/13/2013 | EP2567392A1 Plasma reactor |
| 03/13/2013 | EP2567012A1 Methods for improving the bioactivity characteristics of a surface and objects with surfaces improved thereby |
| 03/13/2013 | EP2566999A1 Method for spark deposition using ceramic targets |
| 03/13/2013 | CN202796849U Shielding disc and ion implantation device |
| 03/13/2013 | CN202796848U Power supply circuit for heater |
| 03/13/2013 | CN202796847U Vacuum plasma cavity with dustproof structure |
| 03/13/2013 | CN202796846U Dry etching device |
| 03/13/2013 | CN102971825A Apparatus and method for controllably implanting workpieces |
| 03/13/2013 | CN102971824A Improved contrast for scanning confocal electron microscope |
| 03/13/2013 | CN102971823A Charged particle beam processing system with visual and infrared imaging |
| 03/13/2013 | CN102971822A Manipulator carrier for electron microscopes |
| 03/13/2013 | CN102969216A Etching endpoint detection window, detector and etching chamber |
| 03/13/2013 | CN102969215A Low sloped edge ring for plasma processing chamber |
| 03/13/2013 | CN102969214A Subtrate processing device and substrate processing system equipped with the same |
| 03/13/2013 | CN102965610A Thermal spray powder, method for forming thermal spray coating, and plasma resistant member |
| 03/13/2013 | CN101996842B 等离子蚀刻装置 Plasma etching apparatus |
| 03/13/2013 | CN101908473B Method of manufacturing CMOS devices by the implantation of N- and P-type cluster ions and negative ions |
| 03/13/2013 | CN101887829B Preparation method of transmission electron microscope micro-grid |
| 03/13/2013 | CN101866803B TEM micro grid |
| 03/13/2013 | CN101807507B Ion implanter system with beam decelerator |
| 03/13/2013 | CN101305443B Ion implanter with contaminant collecting surface |
| 03/12/2013 | US8395130 Holder for an electron microscopy sample carrier |
| 03/12/2013 | US8394231 Plasma process device and plasma process method |
| 03/07/2013 | WO2012159620A3 Method for impedance matching the output impedance of a high-frequency power supply arrangement to the impedance of a plasma load, and high frequency power supply arrangement |
| 03/07/2013 | US20130059071 Low contamination components for semiconductor processsing apparatus and methods for making components |
| 03/07/2013 | US20130056636 Scanning electron microscope |
| 03/07/2013 | US20130056635 Xy-coordinate compensation apparatus and method in sample pattern inspection apparatus |
| 03/07/2013 | US20130056634 Charged Particle Detector System Comprising a Conversion Electrode |
| 03/07/2013 | US20130056022 Bare aluminum baffles for resist stripping chambers |
| 03/07/2013 | DE102011113294A1 Vakuumbeschichtungsvorrichtung The vacuum deposition apparatus |
| 03/07/2013 | DE102011113293A1 Vakuumbeschichtungsvorrichtung The vacuum deposition apparatus |
| 03/07/2013 | DE102011113292A1 Vakuumdurchführung und Vakuumbeschichtungsvorrichtung mit Vakuumdurchführungen Vacuum feedthrough and vacuum coating apparatus with vacuum feedthroughs |
| 03/07/2013 | DE102011113274A1 Beschichtungsanlage Coating machine |
| 03/07/2013 | DE102011111613B4 Sensoranordnung zur Charakterisierung von Plasmabeschichtungs-, Plasmaätz- und Plasmabehandlungsprozessen sowie Verfahren zur Ermittlung von Kenngrößen in diesen Prozessen Sensor arrangement for the characterization of plasma coating, plasma etching and plasma treatment processes and procedures for the determination of parameters in these processes |
| 03/07/2013 | DE102006030837B4 Elektronenstrahlschreibverfahren Electron beam writing method |
| 03/06/2013 | EP2565909A1 Method for checking ion implantation state, and method for manufacturing semiconductor wafer |
| 03/06/2013 | EP2565903A2 Plasma generator |
| 03/06/2013 | EP2565902A2 Electron beam exposure system |
| 03/06/2013 | EP2565901A1 Sample observation method and transmission electron microscope |
| 03/06/2013 | EP2565900A2 Beam device and system comprising a particle beam device and an optical microscope |
| 03/06/2013 | EP2565292A1 Apparatus and method for coating substrates using the eb/pvd process |
| 03/06/2013 | EP2565291A1 Vaccum coating apparatus and method for depositing nanocomposite coatings |
| 03/06/2013 | EP2564412A1 Electrode for a dbd plasma process |
| 03/06/2013 | CN202771895U Vacuum treatment device and radio-frequency filter of vacuum treatment device and radio-frequency filter box thereof |
| 03/06/2013 | CN1645548B Charged particle beam device |
| 03/06/2013 | CN102959675A Control apparatus for plasma immersion ion implantation of dielectric substrate |
| 03/06/2013 | CN102956533A Electrostatic chuck and semiconductor/liquid crystal manufacturing equipment |
| 03/06/2013 | CN102956432A Atmospheric-pressure plasma processing device of display substrate |
| 03/06/2013 | CN102956431A Ring-shaped shield member, components thereof and substrate mounting table |
| 03/06/2013 | CN102956430A Method for replacing helium atoms on film layer |
| 03/06/2013 | CN102956429A Extraction electrode system for wide-beam ion implanter |
| 03/06/2013 | CN102956428A Ion implanter |