Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
07/2013
07/03/2013CN103187231A Method utilizing ion implanter to automatically establish beams and high vacuum of target chamber
07/03/2013CN103187230A Nitrogen charging device of vault cavity
07/03/2013CN103187229A Sliding sealplate device used for extraction electrode
07/03/2013CN103187228A Correcting method for analyzer magnetic field data
07/03/2013CN103187227A Integrated analog quantity control method
07/03/2013CN103187226A 100 KVR energy detection device
07/03/2013CN103187225A Plasma processing device capable of monitoring etching process
07/03/2013CN103187224A Substrate holding platform used for plasma processing device
07/03/2013CN103187223A Drift control in charged particle beam system
07/03/2013CN103187222A Spray header and semiconductor processing device
07/03/2013CN103187204A Device of ultra-low energy relay
07/02/2013US8476607 Charged particle beam drawing apparatus and article manufacturing method
07/02/2013US8476602 Magnet for ion beam irradiation apparatus equipped with protective member that covers plurality of magnetic field concentrating members
07/02/2013US8476589 Particle beam microscope
07/02/2013US8476585 Microtome utilizing a movable knife in a retardation field scanning electron microscope and a retardation field scanning electron microscope including the same
07/02/2013US8475891 Embossed release paper and process for producing the same
06/2013
06/27/2013WO2013096956A1 Method and apparatus for providing power
06/27/2013WO2013095811A1 Fixed mask design for improving alignment with respect to an ion beam
06/27/2013WO2013093055A1 Method and device for operating an electron-beam melting furnace
06/27/2013WO2013092981A2 Method for protecting the surface of an optical component and device for processing work pieces
06/27/2013WO2013092764A1 Generation of charged particle vortex waves
06/27/2013WO2013092762A1 Charged particle vortex wave generation
06/27/2013WO2013092735A1 Device and method for sterilising containers with function monitoring
06/27/2013WO2013091927A1 Device for generating a hollow cathode arc discharge plasma
06/27/2013WO2013091802A1 Low temperature arc ion plating coating
06/27/2013WO2013091761A1 Homogeneous hipims coating method
06/27/2013WO2013068524A4 Assembly for feeding in hf current for tubular cathodes
06/27/2013US20130164173 Plasma emitter
06/27/2013US20130161511 Sample observing device and sample observing method
06/27/2013DE102012200702B3 Verfahren zum Phasenabgleich mehrerer HF-Leistungserzeugungseinheiten eines HF-Leistungsversorgungssystems und HF-Leistungsversorgungssystem A method of phase matching a plurality RF power generation units of a RF power supply system and the RF power supply system
06/27/2013DE102011121770A1 Homogenes HIPIMS-Beschichtungsverfahren HIPIMS homogeneous coating method
06/27/2013DE102011056811A1 Verfahren zum Schutz der Oberfläche eines optischen Bauteils sowie Vorrichtung zur Bearbeitung von Werkstücken A method for protecting the surface of an optical component and device for machining of workpieces
06/27/2013DE102010029212B4 Potentialtrennmittel für stromführende Kühlmittelleitungen von Magnetrons Potential release agent for current-carrying coolant lines of the magnetron
06/26/2013EP2607517A1 Low temperature arc ion plating coating
06/26/2013EP2606503A1 Plasma processes at atmospheric pressure
06/26/2013EP2606003A1 An apparatus, a system and a method for producing hydrogen
06/26/2013CN203026481U Hollow cathode tube with water cooling effect
06/26/2013CN103180929A 离子铣削装置 Ion milling device
06/26/2013CN103177954A Etching device adopting temperature-controllable limit ring
06/26/2013CN103177927A Methods and arrangements for plasma processing system with tunable capacitance
06/26/2013CN103177926A Plasma processing devices with corrosion resistant components
06/26/2013CN103177925A Adjustable limiting ring used for plasma processing device
06/26/2013CN103177924A Substrate processing device and substrate processing system having the same
06/26/2013CN103177923A Gas distribution system applied to plasma treatment device and verification method thereof
06/26/2013CN103177922A Centering device for electric microscope
06/26/2013CN103177921A Electron beam control system and method for electronic gun
06/26/2013CN103177920A Etching device with rectangular inductive coupling coil
06/26/2013CN103177918A Magnetron and plasma processing equipment
06/26/2013CN103177917A Magnetron and magnetron sputtering device where magnetron is applied
06/26/2013CN103177916A Magnetron and magnetron sputtering device
06/26/2013CN103177912A Stacked assembly for plasma reaction chamber and production method thereof
06/26/2013CN103171186A Laminated type assembly used for plasma reaction chamber and manufacture method
06/26/2013CN102324366B Multi-wafer positioning system for ion implanter and positioning method thereof
06/26/2013CN101772253B Plasma generating device
06/26/2013CN101432841B Methods and systems for trapping ion beam particles and focusing an ion beam
06/26/2013CN101296881B Graphite member for beam-line internal member of ion implantation apparatus
06/25/2013US8471476 Inductively coupled plasma flood gun using an immersed low inductance FR coil and multicusp magnetic arrangement
06/20/2013WO2013089807A1 System and method for ion implantation with improved productivity and uniformity
06/20/2013WO2013088944A1 Scanning electron beam device and dimension measurement method using same
06/20/2013WO2013087797A1 Large area optical quality synthetic polycrystalline diamond window
06/20/2013WO2013087702A2 Large area optical quality synthetic polycrystalline diamond window
06/20/2013WO2013019810A9 Method and device for controlling pattern and structure formation by an electric field
06/20/2013WO2012177890A4 High voltage isolation of an inductively coupled plasma ion source with a liquid that is not actively pumped
06/20/2013US20130153785 Method and apparatus for sample extraction and handling
06/20/2013DE102012209678A1 Kryotransfer-Halter mit einer erneuten Struktur für ein Transmissionselektronenmikroskop Cryotransfer holder with a new structure for a transmission electron microscope
06/19/2013EP2605267A2 An apparatus for performing a plasma chemical vapour deposition process
06/19/2013EP2605266A2 Converter of orbital momentum into spin momentum for the polarization of particle beams
06/19/2013EP2605005A1 Clustering of multi-modal data
06/19/2013EP2603926A2 Charged particle detector
06/19/2013CN203013674U Plasma etching processing apparatus
06/19/2013CN203013673U Signal filtering structure used for inductive coupling plasma etcher
06/19/2013CN203013672U Atmospheric-pressure plasma processing system
06/19/2013CN203013668U Cathode preparation pretreatment device
06/19/2013CN103168338A Sputtering sources for high-pressure sputtering with large targets and sputtering method
06/19/2013CN103168337A Plasma processing in a capacitively-coupled reactor with trapezoidal-waveform excitation
06/19/2013CN103168221A Method for examining specimen floating on surface of liquid with scanning electron microscope
06/19/2013CN103167716A Vertical type plasma generating device
06/19/2013CN103165494A Cleaning device and method of polymer on reverse side of wafer
06/19/2013CN103165393A Producing device of high valence ions
06/19/2013CN103165384A Plasma etching chamber
06/19/2013CN103165383A Inductive coupling plasma coil and plasma injection device
06/19/2013CN103165382A Inductive coupling plasma coil and plasma injection device
06/19/2013CN103165381A Electrostatic chuck for controlling loaded substrate temperature and plasma processing device
06/19/2013CN103165380A Plasma processing device for reducing radio frequency coupling and carrying platform
06/19/2013CN103165379A Liner structure of plasma cavity
06/19/2013CN103165378A Dose detection method used for plasma immersion injection
06/19/2013CN103165377A Plasma immersion injection electrode structure
06/19/2013CN103165376A Plasma immersion injection structure
06/19/2013CN103165375A Preforming device for semiconductor cavity
06/19/2013CN103165374A Plasma processing device and edge ring applied to the same
06/19/2013CN103165373A Ion implantation method and ion implantation apparatus
06/19/2013CN103165372A Method of controlling distribution gradient of filled elements in soaking and filling of plasm
06/19/2013CN103165371A Dose detection device used for plasma immersion injection
06/19/2013CN103165370A Carrying platform of plasma device for reducing radio frequency coupling and plasma device
06/19/2013CN103165369A Bottom electrode mechanism and plasma processing equipment with the same
06/19/2013CN103165368A Temperature adjustable plasma restriction device
06/19/2013CN102315069B Method for detecting ion implantation machine
06/19/2013CN102208321B Method and apparatus for laser to induce plasma to inject into substrate
06/19/2013CN101971091B Method for processing an object with miniaturized structures
06/19/2013CN101894720B Preparation method for micro-grids of transmission electron microscope (TEM)
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