Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
08/2013
08/07/2013EP2622626A1 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
08/07/2013EP2622625A2 Compact rf antenna for an inductively coupled plasma ion source
08/07/2013EP2622330A1 Deconvolution of time-gated cathodoluminescence images
08/07/2013EP2622113A1 Coating substrates with an alloy by means of cathode sputtering
08/07/2013CN203118903U Ion convergence device and ion implantation machine
08/07/2013CN203118902U Transmission electron microscope sample bearing apparatus
08/07/2013CN203118901U Cooling chamber for sputtering line of heterojunction solar cell
08/07/2013CN203112919U Gas phase processing device
08/07/2013CN103238202A Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
08/07/2013CN103237918A Method and device for ion implantation
08/07/2013CN103236393A Method for processing silicon carbide sealing ring part by single electrode air plasma
08/07/2013CN103236392A Method for processing rotary part by forming electrode air plasma
08/07/2013CN103236391A Device for processing rotary part by forming electrode air plasma
08/06/2013US8502175 Charged particle beam pattern forming apparatus and charged particle beam pattern forming method
08/06/2013US8502173 System and method for ion implantation with improved productivity and uniformity
08/06/2013US8502172 Three dimensional fiducial
08/06/2013US8502163 Charged particle beam device, vacuum valve therefor and operation thereof
08/06/2013US8502144 Tool-to-tool matching control method and its system for scanning electron microscope
08/06/2013US8500967 Vacuum arc evaporation apparatus and method, and magnetic recording medium formed thereby
08/01/2013WO2013112041A1 Device for spot size measurement at wafer level using a knife edge and a method for manufacturing such a device
08/01/2013WO2013111453A1 Sample holder for electron microscope
08/01/2013WO2013110963A1 Apparatus and method for coating a moving metal substrate
08/01/2013WO2013110502A1 Controlled radical assisted polymerization
08/01/2013WO2013087702A3 Large area optical quality synthetic polycrystalline diamond window
08/01/2013WO2013043794A3 Liquid metal ion source, system and method
08/01/2013WO2013019814A3 System and method for tissue construction using an electric field applicator
08/01/2013US20130196510 Slotted electrostatic shield modification for improved etch and cvd process uniformity
08/01/2013US20130193343 Sample device for charged particle beam
08/01/2013US20130193341 Methods, devices, and systems for manipulating charged particle streams
08/01/2013US20130193322 Phase plate
08/01/2013US20130193321 Systems and Methods for Investigating a Characteristic of a Material Using Electron Microscopy
07/2013
07/31/2013EP2620519A1 Vacuum deposition apparatus
07/31/2013EP2619787A2 Adapter ring for silicon electrode
07/31/2013EP2619541A1 Method of preparing a biological sample for inspection with electron microscopy and fluorescent light microscopy
07/31/2013EP2619346A1 Unit for the treatment of an object, in particular the surface of a polymer object
07/31/2013CN203103262U Electron beam current control system of electron gun
07/31/2013CN203103261U Magnetic focusing device of electron beam processing equipment
07/31/2013CN203103260U Vibration isolation device used between vacuum pump and electron microscope
07/31/2013CN1839349B Method for high-resolution processing of thin layers with electron beams
07/31/2013CN103229288A Integrated shadow mask/carrier for pattern ion implantation
07/31/2013CN103229278A Method for treating metal film and treatment device
07/31/2013CN103229272A Plasma processing apparatus
07/31/2013CN103229271A Hydrogen co-gas for carbon implant
07/31/2013CN103229270A Using beam blockers to perform a patterned implant of a workpiece
07/31/2013CN103227093A Atmosphere plasma processing device suitable for aspheric optical element with large calibre
07/31/2013CN103227092A Atmosphere plasma processing method of free-form surface microstructure optical part
07/31/2013CN103227091A 等离子体处理装置 The plasma processing apparatus
07/31/2013CN103227090A Linear plasma source
07/31/2013CN103227089A Microwave emitting device and surface wave plasma processing apparatus
07/31/2013CN103227088A Slide holder for plasma processing device
07/31/2013CN103227087A Ion implantation method and ion implantation apparatus
07/31/2013CN103227086A Slide holder for plasma processing device
07/31/2013CN103227085A Slide holder for plasma processing device
07/31/2013CN103227084A Film spool conveying system of plasma etcher
07/31/2013CN103227083A Slide holder for plasma processing device
07/31/2013CN103226292A Drawing method and method of manufacturing article
07/30/2013US8499361 Prototyping station for atomic force microscope-assisted deposition of nanostructures
07/30/2013US8497488 Bell-shaped protection system for a device for treating electron-beam containers
07/30/2013US8497487 Sample holder with optical features
07/30/2013US8497486 Ion source having a shutter assembly
07/25/2013WO2013109406A1 Apparatus and method for producing specimens for electron microscopy
07/25/2013WO2013109405A1 Preparation of specimen arrays on an em grid
07/25/2013WO2013108711A1 Charged particle beam microscope, sample holder for charged particle beam microscope, and charged particle beam microscopy
07/25/2013WO2013108529A1 Charged particle beam device and arithmetic device
07/25/2013WO2013107675A1 Device and method for the plasma treatment of surfaces
07/25/2013US20130187547 Apparatus and Method for Removal of Surface Oxides Via Fluxless Technique Involving Electron Attachment
07/25/2013US20130187046 Particle-Optical Systems and Arrangements and Particle-Optical Components for such Systems and Arrangements
07/25/2013US20130187045 Electron beam irradiation method and scanning electronic microscope
07/25/2013US20130186747 Glancing Angle Mill
07/25/2013DE102012200905A1 Vacuum-substrate treatment plant for plate-shaped substrates, has vacuum chamber with valve for inserting substrate in vacuum chamber, where guiding unit is arranged at outer side of vacuum chamber in area of valve with guiding elements
07/25/2013DE102012200820A1 Arrangement for ventilation of inlet lock in vacuum treatment system, has air circulation unit designed as air stream channel made of heat conducting material and standing in heat conducting connection with wall for vacuum treatment system
07/25/2013DE102012001267A1 Partikelstrahlsystem mit Zuführung von Prozessgas zu einem Bearbeitungsort A particle beam system with delivery of process gas to a processing site
07/25/2013DE102011108634B4 Substrat-Bearbeitungs-Vorrichtung Substrate processing apparatus
07/25/2013DE102010003056B4 Verfahren zur Erzeugung von Bildern einer Probe A method of generating images of a specimen
07/24/2013EP2618366A2 Etching method and etching apparatus
07/24/2013EP2618361A2 Particle beam system including a supply of process gas to a processing location
07/24/2013EP2617050A2 Method for extending lifetime of an ion source
07/24/2013EP2617049A1 Electron gun emitting under high voltage, in particular for electron microscopy
07/24/2013EP2616566A1 Improved method of co-sputtering alloys and compounds using a dual c-mag cathode arrangement and corresponding apparatus
07/24/2013CN203085499U Novel plasma etching machine and air inlet mechanism thereof
07/24/2013CN203085485U A vacuum plasma etching reaction cavity device
07/24/2013CN103222029A Implementation of co-gases for germanium and boron ion implants
07/24/2013CN103222028A Improved simultaneous multiple ion implantation process and apparatus semiconductor structure made using same
07/24/2013CN103222027A Semiconductor structure made using improved pseudo-simultaneous multiple ion implantation process
07/24/2013CN103219260A Etching device using extreme-edge gas pipeline
07/24/2013CN103219234A Etching method and etching apparatus
07/24/2013CN103219218A Plasma etcher loading system
07/24/2013CN103219217A Faraday system for ion implanter target chamber and method for detecting ion beam current quality
07/24/2013CN103219216A Plasma processing apparatus
07/24/2013CN103219215A Novel coherent multiple side electromagnets
07/24/2013CN103219214A In-line cavity process equipment capable of controlling bias voltage of plasma on substrate
07/24/2013CN103219213A Upper electrode for etching device
07/24/2013CN103215570A Method and apparatus for photo-excitation of chemicals for atomic layer deposition of dielectric film
07/24/2013CN101828246B Method of treating a surface of at least one part by means of individual sources of an electron cyclotron resonance plasma
07/24/2013CN101300656B Lithography system, sensor and measuring method
07/23/2013US8492735 Method for optimization radiotherapy particle beams
07/23/2013US8492732 Multi charged particle beam writing apparatus and multi charged particle beam writing method
07/18/2013WO2013106220A1 Beam line design to reduce energy contamination
07/18/2013US20130181379 Method of Electron-Beam Lithography with Correction of Corner Roundings
07/18/2013US20130180844 Switchable gas cluster and atomic ion gun, and method of surface processing using the gun
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