Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
01/1984
01/03/1984US4424102 Reactor for reactive ion etching and etching method
01/03/1984US4424101 Method of depositing doped refractory metal silicides using DC magnetron/RF diode mode co-sputtering techniques
01/03/1984US4424096 Radio frequency
01/03/1984US4423701 Glow discharge deposition apparatus including a non-horizontally disposed cathode
12/1983
12/28/1983EP0097117A2 Cylindrical cathode for magnetically-enhanced sputtering
12/28/1983EP0097016A2 Electron beam exposure apparatus
12/27/1983US4423305 Method and apparatus for controlling alignment of an electron beam of a variable shape
12/27/1983US4422916 Magnetron cathode sputtering apparatus
12/27/1983US4422896 Encapsulation support electrode in hermetic sealed chamber with magnetic field, applying voltage to produce glow discharge
12/20/1983US4422002 Piezo-electric travelling support
12/20/1983US4421988 Beam scanning method and apparatus for ion implantation
12/20/1983US4421628 Rectangular target plate for cathode sputtering apparatus
12/20/1983CA1159161A1 Method and apparatus for conducting heat to or from an article being treated under vacuum
12/20/1983CA1159012A1 Plasma deposition apparatus
12/13/1983US4420691 Method of aligning electron beam apparatus
12/13/1983US4420686 Scanning electron microscope or similar equipment capable of displaying simultaneously a plurality of images of specimen
12/13/1983US4420386 Vacuum deposition
12/13/1983US4420385 Wear resistant dielectric coatings
12/07/1983EP0095969A1 Electron gun with a field emission cathode and magnetic lens
12/07/1983EP0095887A1 Apparatus for plasma chemical vapour deposition
12/07/1983EP0095879A2 Apparatus and method for working surfaces with a low energy high intensity ion beam
12/07/1983EP0095864A1 IC tester using an electron beam capable of easily setting a probe card unit for wafers & packaged IC's to be tested
12/06/1983US4419584 Treating workpiece with beams
12/06/1983US4419581 Magnetic objective lens for use in a scanning electron microscope
12/06/1983US4419580 Electron beam array alignment means
12/06/1983US4419561 Metal wire cathode for electron beam apparatus
12/06/1983US4419203 Apparatus and method for neutralizing ion beams
12/06/1983US4419201 Apparatus and method for plasma-assisted etching of wafers
12/06/1983US4419182 Integrated circuits
12/06/1983US4418645 Glow discharge apparatus with squirrel cage electrode
11/1983
11/30/1983EP0095372A2 Optimum surface contour for conductive heat transfer with a thin flexible workpiece
11/30/1983EP0095371A2 Missing or broken wafer sensor
11/30/1983EP0095370A2 Wafer orientation system
11/30/1983EP0095369A2 Air lock vacuum pumping methods and apparatus
11/30/1983EP0095367A2 Rapid pumpdown for high vacuum processing
11/30/1983EP0095366A2 Compact plug connectable ion source
11/30/1983EP0095211A2 Magnetron cathode sputtering system
11/30/1983EP0095200A2 Plasma reactor removeable insert
11/29/1983US4418283 Microlithographic system using a charged particle beam
11/29/1983US4417968 Magnetron cathode sputtering apparatus
11/29/1983US4417770 High vacuum compatible air bearing stage
11/29/1983CA1157914A1 Methods and apparatus for improving an rf excited reactive gas plasma
11/23/1983EP0094501A2 Methods of inspecting pattern masks
11/22/1983US4417145 Apparatus for controlling magnetic field intensity
11/22/1983US4416760 Apparatus for asymmetrically contouring the thickness of sputter coated layers
11/22/1983US4416759 Sputter system incorporating an improved blocking shield for contouring the thickness of sputter coated layers
11/22/1983US4416755 Apparatus and method for producing semiconducting films
11/16/1983EP0094053A1 Plasma method for making a dielectric rod
11/16/1983EP0093868A2 Electron beam apparatus
11/16/1983EP0093831A2 Neutralised low energy ion beam generator, method of producing a neutralised low energy ion beam and method of producing a neutralised high energy ion beam
11/15/1983US4415851 System for contactless testing of multi-layer ceramics
11/15/1983US4415602 Reactive plating method and product
11/15/1983US4415427 Thin film deposition by sputtering
11/15/1983US4415402 End-point detection in plasma etching or phosphosilicate glass
11/09/1983EP0093412A1 Magnetron sputtering apparatusand a method for forming a magnetic thinfilm on the surface of a substrate
11/09/1983EP0093316A2 Reactive ion etching apparatus
11/08/1983US4414487 Superconducting electron beam generator
11/08/1983US4414474 Corrector for axial aberrations in electron optic instruments
11/08/1983US4414087 Magnetically-assisted sputtering method for producing vertical recording media
11/08/1983US4414086 Magnetic targets for use in sputter coating apparatus
11/02/1983EP0092873A2 Charged-particle beam exposure device incorporating beam splitting
11/01/1983US4413302 Structural member made from a metallic material having an upper surface exposed to the danger of electric charge building-up thereon and the use of such structural member
11/01/1983US4413187 Method for exposing an electron beam
11/01/1983US4413186 Method for detecting a position of a micro-mark on a substrate by using an electron beam
11/01/1983US4413181 Arrangement for stroboscopic potential measurements with an electron beam testing device
11/01/1983US4412907 Ferromagnetic high speed sputtering apparatus
11/01/1983US4412905 Vacuum deposition apparatus
10/1983
10/27/1983WO1983003707A1 Low temperature stage for microanalysis
10/25/1983US4412246 Method of adjusting a video microscope system incorporating polarization or interference optics for optimum imaging conditions
10/25/1983US4412153 Dual filament ion source
10/25/1983US4412132 Electron lens equipped with three magnetic pole pieces
10/25/1983US4412131 Monochromator for charged particles
10/25/1983US4411763 Sputtering apparatus
10/25/1983US4411733 SPER Device for material working
10/25/1983US4411575 Sample transfer vessel
10/25/1983CA1155798A1 Reactive deposition method and apparatus
10/19/1983EP0091777A2 Liquid metal ion source
10/18/1983US4410801 Ion implantation equipment
10/18/1983US4410800 Electron beam exposure system
10/18/1983US4410792 Glow discharge heating apparatus
10/18/1983US4410407 Sputtering apparatus and methods
10/18/1983US4410272 Optical spectroscope for scanning electron microscope
10/13/1983WO1983003485A1 Electron beam-optical hybrid lithographic resist process
10/11/1983US4409520 Microwave discharge ion source
10/11/1983US4409487 Electrode arrangement for electrostatic deflection system
10/05/1983EP0090586A1 Gas flow in plasma treatment processes
10/05/1983EP0090067A1 Reactor for reactive ion etching, and etching process
10/04/1983US4408126 Cassette retaining device of electron beam apparatus
10/04/1983US4407933 Alignment marks for electron beam lithography
10/04/1983US4407713 Cylindrical magnetron sputtering cathode and apparatus
10/04/1983US4407712 Hollow cathode discharge source of metal vapor
10/04/1983US4407708 Monitoring temerature to tell when target should be replaced
09/1983
09/28/1983EP0089621A1 Sealed passage
09/28/1983EP0089382A1 Plasma-reactor and its use in etching and coating substrates
09/27/1983US4406765 Glow discharges, high frequency, direct current, pulsation
09/26/1983EP0051635A4 Sputter target and glow discharge coating apparatus.
09/21/1983EP0088890A2 Electron holography microscope
09/20/1983US4405989 Spectral monitoring device for both plasma etching and sputtering
09/20/1983US4405865 Device for adjusting the position and the orientation around an axis of a sample holder for an electron microscope
09/20/1983US4405864 Ion implanter end processing station
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