| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 10/17/1984 | EP0122182A1 Cathode for an electron gun |
| 10/17/1984 | EP0121818A1 Method and device for metallizing the internal surface of a hollow object |
| 10/16/1984 | US4477855 Protecting system for transmission lines |
| 10/16/1984 | US4477729 Continuously writing electron beam stitched pattern exposure system |
| 10/16/1984 | US4477311 Hydrogen-plasma etching, molecular beam epitaxy and forming a protective layer all under unbroken vacuum |
| 10/11/1984 | WO1984003943A1 Ion implantation control system |
| 10/10/1984 | EP0121412A2 Method of forming by projection an integrated circuit pattern on a semiconductor wafer |
| 10/10/1984 | EP0121309A2 Scan line type dynamic observation apparatus |
| 10/10/1984 | EP0121019A2 Rapid rate reactive sputtering of a group 4A metal |
| 10/10/1984 | EP0027497B1 Projection system for corpuscular beams |
| 10/09/1984 | US4476393 Ion implantation apparatus |
| 10/09/1984 | US4476386 Method and apparatus for material analysis |
| 10/09/1984 | US4476373 Control system and method of controlling ion nitriding apparatus |
| 10/09/1984 | US4476151 Method and device for attaching disc-or plate-shaped target bodies to cooling plates for sputtering systems |
| 10/03/1984 | EP0120576A2 Atomic mass measurement system |
| 10/03/1984 | EP0120535A1 Beam exposure apparatus comprising a diaphragm drive for an object carrier |
| 10/03/1984 | EP0120307A2 Apparatus and method for plasma treatment of resin material |
| 10/03/1984 | EP0120089A1 Automatically adjustable chip design method |
| 10/02/1984 | US4475045 Rapid pumpdown for high vacuum processing |
| 10/02/1984 | US4475044 Apparatus for focus-deflecting a charged particle beam |
| 10/02/1984 | US4475037 Method of inspecting a mask using an electron beam vector scan system |
| 09/27/1984 | WO1984003798A1 Reactive ion etching apparatus |
| 09/26/1984 | EP0119631A2 Magnetron cathode sputtering apparatus |
| 09/26/1984 | EP0119455A2 Etching method and apparatus |
| 09/25/1984 | US4473777 Electron emitter assembly |
| 09/25/1984 | US4473771 Thermionic emitter for electron microscopy |
| 09/19/1984 | EP0119058A2 Method and apparatus for forming thin film |
| 09/19/1984 | EP0118644A1 Cathode assembly for glow discharge deposition apparatus |
| 09/19/1984 | EP0118643A1 Cathode assembly for glow discharge deposition apparatus |
| 09/18/1984 | US4472636 For electron irradiation of a target |
| 09/18/1984 | US4472453 Vapor deposition, semiconductors, shields |
| 09/18/1984 | US4472259 Low pressure chemical vapor deposition |
| 09/14/1984 | EP0104235A4 Electron beam-optical hybrid lithographic resist process. |
| 09/11/1984 | US4471205 Electron beam engraving method and device for execution |
| 09/11/1984 | US4471003 Magnetoplasmadynamic apparatus and process for the separation and deposition of materials |
| 09/11/1984 | US4470484 Braking system for use with an arbor of a microscope |
| 09/11/1984 | CA1174137A1 Ion beam sputter-etched ventricular catheter for hydrocephalus shunt |
| 09/05/1984 | EP0117541A2 Apparatus for plasma treatment of resin material |
| 09/05/1984 | EP0117523A2 Reduced vacuum cryopump |
| 09/05/1984 | EP0117365A1 Electron beam exposure apparatus |
| 09/04/1984 | US4469950 Charged particle beam exposure system utilizing variable line scan |
| 09/04/1984 | US4469949 Electron beam pattern transfer device and method for aligning mask and semiconductor wafer |
| 09/04/1984 | US4469948 Composite concentric-gap magnetic lens |
| 08/29/1984 | EP0029857B1 Electron beam projecting system |
| 08/28/1984 | US4468586 Shaped electron emission from single crystal lanthanum hexaboride with intensity distribution |
| 08/28/1984 | US4468566 Corpuscular beam control circuit arrangement |
| 08/28/1984 | US4468565 Automatic focus and deflection correction in E-beam system using optical target height measurements |
| 08/28/1984 | US4468564 Ion source |
| 08/28/1984 | US4468563 Electron lens |
| 08/28/1984 | US4468560 Electron microscope equipped with measuring facility |
| 08/28/1984 | US4468313 Sputtering target |
| 08/21/1984 | US4467240 Ion beam source |
| 08/21/1984 | US4467211 Method and apparatus for exposing multi-level registered patterns interchangeably between stations of a multi-station electron-beam array lithography (EBAL) system |
| 08/21/1984 | US4467210 Electron-beam image transfer device |
| 08/21/1984 | US4467205 Highly-steady beam generating for charged particles |
| 08/21/1984 | US4466877 For laying down metal films |
| 08/21/1984 | US4466380 Plasma deposition apparatus for photoconductive drums |
| 08/21/1984 | US4466258 Apparatus for low-temperature plasma treatment of a textile product |
| 08/21/1984 | CA1173178A1 Tridimensional display method and device for an electron microscope |
| 08/21/1984 | CA1172993A1 Microwave plasma etching |
| 08/15/1984 | EP0115970A1 Vessel for the processing and particularly etching of substrates by the reactive plasma method |
| 08/15/1984 | EP0115952A1 Electron beam exposure method and apparatus |
| 08/14/1984 | US4465935 Electrically conductive sample support-mounting for secondary ion mass spectrometer analysis |
| 08/14/1984 | US4465934 Parallel charged particle beam exposure system |
| 08/08/1984 | EP0115378A2 Manufacturing process for selenium photoreceptors |
| 08/08/1984 | EP0115119A2 Shaped field magnetron electrode |
| 08/07/1984 | US4464573 Charged particle beam focussing device |
| 08/07/1984 | US4464571 Opposing field spectrometer for electron beam mensuration technology |
| 08/07/1984 | US4464564 Current controller for heating stage on leitz microscope |
| 08/07/1984 | US4464223 Plasma reactor apparatus and method |
| 08/01/1984 | EP0114765A2 Process and device for the ion analysis of non-conducting specimen |
| 08/01/1984 | EP0114496A2 Liquid metal ion source |
| 07/31/1984 | US4463265 Electron beam proximity effect correction by reverse field pattern exposure |
| 07/31/1984 | US4463257 In a measurement device |
| 07/31/1984 | US4463255 Apparatus for enhanced neutralization of positively charged ion beam |
| 07/31/1984 | US4462863 Microwave plasma etching |
| 07/31/1984 | US4462580 Hydraulically driven X-Y stage |
| 07/31/1984 | US4462333 Process gas introduction, confinement and evacuation system for glow discharge deposition apparatus |
| 07/25/1984 | EP0113983A1 Fabricating a semiconductor device by means of molecular beam epitaxy |
| 07/25/1984 | EP0027142B1 Treating multilayer printed wiring boards |
| 07/24/1984 | US4461954 Ion-processing method and apparatus |
| 07/24/1984 | US4461783 Non-single-crystalline semiconductor layer on a substrate and method of making same |
| 07/24/1984 | US4461688 Plurity of magnetic field sources to enhance uniformity |
| 07/24/1984 | US4461239 Reduced capacitance electrode assembly |
| 07/24/1984 | US4461237 Plasma reactor for etching and coating substrates |
| 07/24/1984 | CA1171551A1 Load-lock vacuum chamber |
| 07/17/1984 | USRE31630 Electron beam exposure system |
| 07/17/1984 | US4460831 Laser stimulated high current density photoelectron generator and method of manufacture |
| 07/17/1984 | US4460827 Scanning electron microscope or similar equipment with tiltable microscope column |
| 07/10/1984 | US4459482 Auger spectroscopic technique measuring the number of electrons emitted from a surface as a function of the energy level of those electrons |
| 07/10/1984 | US4458746 Optimum surface contour for conductive heat transfer with a thin flexible workpiece |
| 07/10/1984 | CA1170726A1 Electron beam welding process with absorbed or traversing power regulation, and means for application of said process |
| 07/03/1984 | US4458151 Electron microscope of a scanning type |
| 07/03/1984 | US4457825 Sputter target for use in a sputter coating source |
| 07/03/1984 | US4457803 Semiconductors |
| 07/03/1984 | US4457359 Apparatus for gas-assisted, solid-to-solid thermal transfer with a semiconductor wafer |
| 07/03/1984 | CA1170375A1 Method and apparatus for material analysis |
| 07/03/1984 | CA1170315A1 Vacuum-arc plasma apparatus for producing coatings |
| 06/27/1984 | EP0112238A2 Process and apparatus for particle implantation in solids |
| 06/27/1984 | EP0112230A1 Method and apparatus for obtaining particle beams the density of which is spatially modulated, application to etching and to ion implantation |