| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 06/27/1984 | EP0111707A2 Methods of forming exposure patterns |
| 06/20/1984 | EP0111129A2 Ion beam source |
| 06/20/1984 | EP0111032A1 Vibration damping arrangement |
| 06/19/1984 | US4455563 System and film gate for accurately imaging information on a film by a charged particle beam |
| 06/19/1984 | US4455501 Precision rotation mechanism |
| 06/19/1984 | US4455486 Method and apparatus for detecting magnetism by means of electron spin polarization measurements through dielectronic transition |
| 06/19/1984 | CA1169467A1 Cylindrical magnetron sputtering cathode, as well as sputtering apparatus provided with such cathode |
| 06/13/1984 | EP0110301A2 Method and apparatus for measuring dimension of secondary electron emission object |
| 06/13/1984 | EP0110042A2 Electron beam lithograph proximity correction method |
| 06/12/1984 | US4454453 Power source device for ion sources |
| 06/12/1984 | US4454407 For electron beam welding |
| 06/05/1984 | US4453127 Determination of true electrical channel length of surface FET |
| 06/05/1984 | US4453080 Temperature control of a workpiece under ion implantation |
| 06/05/1984 | US4453078 Ion source |
| 06/05/1984 | US4452686 Arc plasma generator and a plasma arc apparatus for treating the surfaces of work-pieces, incorporating the same arc plasma generator |
| 05/30/1984 | EP0109808A2 An improved apparatus for the manufacture of photovoltaic devices |
| 05/30/1984 | EP0109524A1 Method of and arrangement for processing a work piece with a focused electron beam |
| 05/29/1984 | US4451738 Microcircuit fabrication |
| 05/29/1984 | US4451737 Electron beam control device for electron microscopes |
| 05/29/1984 | US4451349 Electrode treatment for plasma patterning of polymers |
| 05/29/1984 | US4450787 Glow discharge plasma deposition of thin films |
| 05/29/1984 | US4450786 Grooved gas gate |
| 05/23/1984 | EP0109148A2 Substrate shield for preventing the deposition of nonhomogeneous films |
| 05/23/1984 | EP0109147A2 Charged particle beam lithography machine incorporating localized vacuum envelope |
| 05/22/1984 | US4450357 Electron lens equipped with three magnetic pole pieces |
| 05/22/1984 | US4450355 Electron microscope comprising an X-ray detector |
| 05/22/1984 | US4450062 Sputtering apparatus and methods |
| 05/22/1984 | US4450031 Ion shower apparatus |
| 05/22/1984 | US4449373 For pumping water vapor and inert gases |
| 05/22/1984 | CA1167982A1 Semiconductor processing involving ion implantation |
| 05/16/1984 | EP0108497A1 Irradiative probe system |
| 05/16/1984 | EP0108206A2 Vacuum Chamber |
| 05/15/1984 | US4449051 Dose compensation by differential pattern scanning |
| 05/15/1984 | US4448802 For vapor deposition coating |
| 05/15/1984 | US4448799 Arc-initiating trigger apparatus and method for electric arc vapor deposition coating systems |
| 05/15/1984 | US4448659 Method and apparatus for evaporation arc stabilization including initial target cleaning |
| 05/15/1984 | US4448653 Cathode arrangement for sputtering material from a target in a cathode sputtering unit |
| 05/15/1984 | US4448652 Device for the cathode sputtering of a metal |
| 05/15/1984 | US4448149 Apparatus for removably mounting and supplying mechanical and electrical energy to a vacuum chamber substrate holder |
| 05/08/1984 | US4447731 Exterior view examination apparatus |
| 05/08/1984 | US4447374 Preparing replica film of specimen for electron microscopy |
| 05/08/1984 | CA1167114A1 Ionized gas generator with supersonic homogeneous flow |
| 05/02/1984 | EP0107510A2 Process gas introduction, confinement and evacuation system for glow discharge deposition apparatus |
| 05/02/1984 | EP0107414A2 Frictionless supporting apparatus |
| 05/02/1984 | EP0107320A2 Improvements relating to ion-beam apparatus |
| 05/02/1984 | EP0107034A2 Flying spot scanner for light-microscopic studies in a scanning electron microscope, and operating process |
| 05/02/1984 | EP0107032A1 Process for suppressing a disturbance while measuring signals with a corpuscular probe, and device for carrying out such a process |
| 05/02/1984 | EP0107004A1 Mask for corpuscular lithography, method for its manufacture and of using it |
| 05/02/1984 | EP0106869A1 Low temperature stage for microanalysis. |
| 05/01/1984 | US4446548 Apparatus for the point-by-point scanning of an object |
| 05/01/1984 | US4446403 Compact plug connectable ion source |
| 05/01/1984 | US4446373 Process and apparatus for converged fine line electron beam treatment objects |
| 05/01/1984 | US4445997 Rotatable sputtering apparatus |
| 05/01/1984 | CA1166766A1 Method and apparatus for forming a variable size electron beam |
| 04/26/1984 | WO1984001660A1 Planar biaxial micropositioning stage |
| 04/25/1984 | EP0106623A2 Sputtering apparatus |
| 04/25/1984 | EP0106589A2 Method of cold cathode replenishment in electron beam apparatus and replenishable cold cathode assembly |
| 04/25/1984 | EP0106521A2 Baffle system for glow discharge deposition apparatus |
| 04/25/1984 | EP0106511A2 Gap control system for localized vacuum processing |
| 04/25/1984 | EP0106510A2 Envelope apparatus for localized vacuum processing |
| 04/25/1984 | EP0106497A2 Ion shower apparatus |
| 04/25/1984 | EP0106154A2 Deflecting objective for neutral particle beams of variable shape, and method of operating it |
| 04/25/1984 | EP0035556B1 Electron beam system |
| 04/24/1984 | US4445041 Electron beam blanker |
| 04/24/1984 | US4445040 Shaping aperture for a charged particle forming system |
| 04/24/1984 | US4445039 High throughput/high resolution particle beam system |
| 04/24/1984 | US4444805 Vacuum deposition of carbon from hydrocarbon gases, frequencies |
| 04/24/1984 | US4444643 A moving magnetic source |
| 04/24/1984 | US4444635 Sputtering |
| 04/24/1984 | CA1166362A1 Method and apparatus for exposing multi-level registered patterns interchangeably between stations of a multi-station electron-beam array lithography (ebal) system |
| 04/18/1984 | EP0105711A2 Determining the position of a wafer by means of electron beams |
| 04/18/1984 | EP0105694A2 Charged particle beam exposure apparatus |
| 04/18/1984 | EP0105440A2 Spectrometer objective for particle-beam measuring techniques |
| 04/18/1984 | EP0105439A2 Spectrometer objective with parallel objective and spectrometer fields for use in the potential measuring technique |
| 04/18/1984 | EP0105409A2 Thin film deposition by sputtering |
| 04/18/1984 | EP0105407A2 A sputtering cathode apparatus |
| 04/18/1984 | EP0105403A1 Device and method for the direct measuring of signal variations at several measuring points with high time resolution |
| 04/17/1984 | US4443843 DC High voltage generator for a dental X-ray photographing apparatus |
| 04/17/1984 | US4443704 Method of electron beam exposure |
| 04/17/1984 | US4443703 Method and apparatus of deflection calibration for a charged particle beam exposure apparatus |
| 04/17/1984 | US4443318 Cathodic sputtering apparatus |
| 04/12/1984 | WO1984001454A1 Automatically adjustable chip design method |
| 04/11/1984 | EP0105214A2 Method and Apparatus for writing large lithographic patterns |
| 04/11/1984 | EP0105185A1 Target body position measuring method for charged particle beam fine pattern exposure system |
| 04/10/1984 | US4442361 System and method for calibrating electron beam systems |
| 04/10/1984 | US4442355 Device for detecting secondary electrons in a scanning electron microscope |
| 04/10/1984 | US4442338 Plasma etching apparatus |
| 04/10/1984 | US4442067 Material for semiconductor holder in electron beam writing apparatus |
| 04/10/1984 | US4441974 Magnetron sputtering apparatus |
| 04/04/1984 | EP0104922A2 Electron beam exposure system |
| 04/04/1984 | EP0104917A2 Deflection system in an electron beam exposure device |
| 04/04/1984 | EP0104907A2 Method of making amorphous semiconductor alloys and devices using microwave energy |
| 04/04/1984 | EP0104818A2 Ion implantation device |
| 04/04/1984 | EP0104763A2 An electron beam pattern transfer system having an autofocusing mechanism |
| 04/04/1984 | EP0104593A2 Enhancing process of an area of an object in a scanning electron microscope |
| 04/04/1984 | EP0104496A2 Electron emitter assembly |
| 04/04/1984 | EP0104331A2 Controllable dry etching technique, and apparatus |
| 04/04/1984 | EP0104235A1 Electron beam-optical hybrid lithographic resist process |
| 04/03/1984 | US4440618 Gas discharge device comprising a pressure controller for controlling a pressure over a wide range |
| 04/03/1984 | US4440475 Electron probe microanalyzer comprising an observation system having double magnification |