| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 05/13/1986 | US4588890 Apparatus and method for composite image formation by scanning electron beam |
| 05/13/1986 | US4588490 Etching-deposition system, high plasma density |
| 05/09/1986 | WO1986002774A1 Focused substrate alteration |
| 05/09/1986 | WO1986002581A1 Focused substrate alteration |
| 05/07/1986 | EP0180373A2 Automated single slice powered load lock plasma reactor |
| 05/07/1986 | EP0180072A1 Method for fault-analyse of integrated circuit |
| 05/07/1986 | EP0180020A2 Plasma etching system |
| 05/06/1986 | US4587464 Electron beam control system |
| 05/06/1986 | US4587458 Controlling current density |
| 05/06/1986 | US4587433 Dose control apparatus |
| 05/06/1986 | US4587432 Apparatus for ion implantation |
| 05/06/1986 | US4587431 Specimen manipulating mechanism for charged-particle beam instrument |
| 05/06/1986 | US4587430 Ion implantation source and device |
| 05/06/1986 | US4587425 Electron beam apparatus and electron collectors therefor |
| 05/06/1986 | US4587213 Hydrophilic polymer absorption layer, cultures |
| 05/06/1986 | CA1204226A1 Electron holography microscope |
| 04/30/1986 | EP0179716A2 A secondary ion mass spectrometer |
| 04/30/1986 | EP0179665A2 Apparatus and method for magnetron-enhanced plasma-assisted chemical vapor deposition |
| 04/30/1986 | EP0179610A2 Automated single slice cassette load lock plasma reactor |
| 04/30/1986 | EP0179569A2 Improved cathode for glow discharge deposition apparatus |
| 04/30/1986 | EP0179294A1 Ion microbeam apparatus |
| 04/29/1986 | US4586141 Method and apparatus for an electron beam exposure system |
| 04/29/1986 | US4585969 Precision rotary moving mechanism using piezoelectric drive elements |
| 04/29/1986 | US4585945 Process and apparatus for implanting particles in a solid |
| 04/29/1986 | US4585943 Electron beam exposure apparatus |
| 04/29/1986 | US4585942 Transmission electron microscope |
| 04/29/1986 | US4585920 Plasma reactor removable insert |
| 04/29/1986 | US4585668 Ultrahigh frequency, integrated circuits |
| 04/29/1986 | US4585541 Plasma anodization system |
| 04/29/1986 | US4585516 Variable duty cycle, multiple frequency, plasma reactor |
| 04/29/1986 | US4584965 Plasma treating apparatus |
| 04/29/1986 | CA1203905A1 Scanning electron microscope calibration apparatus and method for making precise quantitative measurements on a scanned object |
| 04/23/1986 | EP0178803A2 Systems and methods for ion implantation of semiconductor wafers |
| 04/23/1986 | EP0178672A1 Electron microscope |
| 04/23/1986 | EP0178431A1 Counterfield spectrometer for electron beam measurement |
| 04/23/1986 | EP0178425A1 Method and arrangement for localizing errors within an electrical circuit by means of light beam irradiation |
| 04/22/1986 | US4584479 Envelope apparatus for localized vacuum processing |
| 04/22/1986 | US4584079 Eliminates cusping |
| 04/22/1986 | US4583492 High rate, low temperature silicon deposition system |
| 04/22/1986 | US4583298 Auto calibration method suitable for use in electron beam lithography |
| 04/22/1986 | CA1203644A1 Automatically adjustable chip design method |
| 04/16/1986 | EP0178156A2 Method of drawing a desired pattern on a target through exposure thereof with an electron beam |
| 04/16/1986 | EP0178129A2 Apparatus for and method of regulating the shape of a focused ion beam |
| 04/16/1986 | EP0177973A2 Method of recording and reproducing images produced by an electron microscope |
| 04/16/1986 | EP0177717A1 Process for the automatic positioning of a curpuscular probe |
| 04/16/1986 | CN85202460U Liquid metal focusing ion-gun with multi-operating modes |
| 04/15/1986 | US4583077 Deflection system in an electron beam exposure device |
| 04/15/1986 | US4582720 Ionization of plasma gas by high-frequency electric energy haveing its force lines extended along vertical substrates;semiconductors; solar cells |
| 04/10/1986 | WO1986002024A1 Multiple arc plasma device with continuous gas jet |
| 04/09/1986 | EP0176745A1 Device and method to measure lengths in a scanning corpuscular microscope |
| 04/08/1986 | US4581537 Method for generating inspection patterns |
| 04/08/1986 | US4581534 Image display system for a stroboscopic scanning electron microscope |
| 04/08/1986 | US4581118 Shaped field magnetron electrode |
| 04/08/1986 | US4581100 Mixed excitation plasma etching system |
| 04/08/1986 | US4580619 Components for evacuated equipment |
| 04/02/1986 | EP0176295A2 Eliminating unwanted material from a gas flow line |
| 04/02/1986 | EP0175933A1 Scanning lens system without deflection chromatic defects for corpuscular beam treatment of material |
| 04/02/1986 | EP0175807A1 Apparatus for the sputtered neutral mass spectrometry |
| 04/01/1986 | US4580058 Scanning treatment apparatus |
| 04/01/1986 | US4579639 Method of sensing the amount of a thin film deposited during an ion plating process |
| 04/01/1986 | US4579623 Method and apparatus for surface treatment by plasma |
| 04/01/1986 | US4579618 Plasma reactor apparatus |
| 03/26/1986 | EP0175223A1 Method of making amorphous semiconductor alloys |
| 03/26/1986 | EP0174977A1 Controlled vacuum arc material deposition, method and apparatus |
| 03/25/1986 | US4578663 Magnetic assembly |
| 03/25/1986 | US4578589 Apparatus and methods for ion implantation |
| 03/25/1986 | US4578587 Error-corrected corpuscular beam lithography |
| 03/25/1986 | US4578559 Plasma etching method |
| 03/19/1986 | EP0174363A1 Scan controller for ion implanter device |
| 03/18/1986 | US4577111 Apparatus for electron beam lithography |
| 03/18/1986 | US4576884 Semiconductor fabrication |
| 03/18/1986 | US4576698 Plasma etch cleaning in low pressure chemical vapor deposition systems |
| 03/12/1986 | EP0174058A2 Hall accelerator with preionization discharge |
| 03/12/1986 | EP0174052A2 Charged particle beam apparatus |
| 03/11/1986 | US4574733 Substrate shield for preventing the deposition of nonhomogeneous films |
| 03/11/1986 | CA1201818A1 Electron-emitting semiconductor device |
| 03/05/1986 | EP0173583A1 Discharge apparatus |
| 03/05/1986 | EP0173465A2 Glow discharge electron beam method and apparatus for the surface recrystallization of solid substances |
| 03/05/1986 | EP0173164A1 Microwave assisting sputtering |
| 03/05/1986 | EP0172916A1 Film forming method |
| 03/04/1986 | US4574216 Cathode-ray tube and semiconductor device for use in such a cathode-ray tube |
| 03/04/1986 | US4574179 Ion beam machining device |
| 03/04/1986 | US4574178 Electron gun |
| 03/04/1986 | EP0160034A4 Method and apparatus for fabricating devices using reactive ion etching. |
| 02/27/1986 | WO1986001335A1 Method and apparatus for the micro-analysis or imaging of samples |
| 02/26/1986 | EP0172675A1 Apparatus for ion implantation |
| 02/26/1986 | EP0172635A2 Temperature control in vacuum |
| 02/26/1986 | EP0172477A2 Method and apparatus for recording particles or quantums using a detector |
| 02/26/1986 | EP0172470A1 Method and device for the detection and mapping of measuring points corresponding to a signal of a specific shape |
| 02/25/1986 | US4573181 X-Ray fluorescence analyzers |
| 02/25/1986 | US4572957 Means for creating an electron curtain |
| 02/25/1986 | US4572956 Electron beam pattern transfer system having an autofocusing mechanism |
| 02/25/1986 | US4572842 Method and apparatus for reactive vapor deposition of compounds of metal and semi-conductors |
| 02/25/1986 | US4572776 Magnetron cathode for sputtering ferromagnetic targets |
| 02/25/1986 | US4572759 For dry plasma processing semiconductor wafers |
| 02/25/1986 | US4572021 Motion transmission system |
| 02/19/1986 | EP0171949A2 Microwave plasma etching apparatus |
| 02/12/1986 | EP0171109A1 Microscope for non-differentiated phase image formation |
| 02/11/1986 | US4570072 Electromagnetic lens polepiece structure |
| 02/11/1986 | US4570070 Ion-beam monitor |