Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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04/03/1984 | US4440108 Ion beam coating apparatus |
04/03/1984 | US4440107 Magnetic apparatus for reducing substrate warpage |
03/27/1984 | US4439686 Electron beam-irradiating apparatus with conical bushing seal-support |
03/27/1984 | US4439685 Corpuscular beam blanking system |
03/27/1984 | US4439681 Charged particle beam scanning device |
03/27/1984 | US4439680 Color-coded mapping system and method for identifying elements in a specimen |
03/27/1984 | US4439463 Plasma assisted deposition system |
03/27/1984 | US4438724 Grooved gas gate |
03/27/1984 | US4438557 Method of using an areal array of tubular electron sources |
03/27/1984 | CA1164409A1 Cathodic sputtering apparatus for detecting target piercing |
03/21/1984 | EP0103521A2 Substrates thinly coated with platinum oxide, devices for obtaining the so coated substrates and products obtained from substrates so coated |
03/21/1984 | EP0103502A1 Method for the time-dependent variation of trajectory of a charged-particles beam |
03/21/1984 | EP0103461A2 Plasma deposition method and apparatus |
03/20/1984 | US4438371 Source of charged particles beam |
03/20/1984 | US4438368 Plasma treating apparatus |
03/20/1984 | US4438336 Corpuscular radiation device for producing an irradiation pattern on a workpiece |
03/20/1984 | US4438332 Detector for an electron microscope |
03/20/1984 | US4438188 Glow discharge, vapor deposition |
03/20/1984 | US4438153 Method of and apparatus for the vapor deposition of material upon a substrate |
03/20/1984 | US4437966 Sputtering cathode apparatus |
03/20/1984 | US4437961 Method for sequentially processing a multi-level interconnect circuit in a vacuum chamber |
03/20/1984 | US4437324 Apparatus for treating a cloth continuously with the use of low-temperature plasma |
03/20/1984 | CA1164028A1 High vacuum compatible air bearing stage |
03/14/1984 | EP0102613A1 Method of fixing target materials existing in the form of discs or plates on cooling trays for sputtering devices |
03/13/1984 | US4437009 Scanning electron microscope or similar equipment |
03/13/1984 | US4437008 Electron beam control system |
03/13/1984 | US4436602 Spaced apart coating stations |
03/13/1984 | CA1163602A1 Quadrupole r.f. sputtering system having an anode/cathode shield and a floating target shield |
03/07/1984 | EP0101774A1 Safe electric supply glow discharge |
03/06/1984 | US4435747 High voltage supply system for medical equipment |
03/06/1984 | US4434742 Installation for depositing thin layers in the reactive vapor phase |
03/06/1984 | CA1163231A1 Reactive plating method and product |
03/01/1984 | WO1984000855A1 Low voltage operation of arc discharge devices |
02/28/1984 | US4434371 Electron beam blanking apparatus and method |
02/28/1984 | US4434367 Electron microscope |
02/28/1984 | US4434042 Planar magnetron sputtering apparatus |
02/28/1984 | US4434038 Sputtering method and apparatus utilizing improved ion source |
02/22/1984 | EP0101286A1 Grooved gas gate |
02/22/1984 | EP0101043A2 Plasma cathode electron beam generating system |
02/21/1984 | US4433384 Pattern data handling system for an electron beam exposure system |
02/21/1984 | US4433247 Beam sharing method and apparatus for ion implantation |
02/21/1984 | US4433243 Chrysene, triphenylene, p-terphenyl, heating, dissolving, 1,2,4-trichlorobenzene, precipitation, heptane |
02/21/1984 | US4433228 Microwave plasma source |
02/21/1984 | US4432853 Masking microtubes, placing in vacuum, exposure to ion beam to perforate ends |
02/16/1984 | WO1984000610A1 Low voltage field emission electron gun |
02/15/1984 | EP0100634A2 Method and apparatus for handling a charged particle beam |
02/15/1984 | EP0100611A1 Reduced capacitance electrode assembly |
02/15/1984 | EP0100525A2 Alignment assembly |
02/15/1984 | EP0100396A1 Determination of true electrical channel length of surface FET |
02/14/1984 | US4431923 Alignment process using serial detection of repetitively patterned alignment marks |
02/14/1984 | US4431915 Electron beam apparatus |
02/14/1984 | US4431898 Of semiconductor devices |
02/14/1984 | US4431505 High rate magnetron sputtering of high permeability materials |
02/14/1984 | US4431499 Texturing a target with a seed to lower reflectance; process control |
02/14/1984 | US4431473 RIE Apparatus utilizing a shielded magnetron to enhance etching |
02/08/1984 | EP0100206A1 Apparatus for treating an article in a vacuum chamber |
02/07/1984 | US4430571 Method and apparatus for exposing multi-level registered patterns interchangeably between stations of a multi-station electron-beam array lithography (EBAL) system |
02/07/1984 | US4430570 Electron beam exposing apparatus |
02/07/1984 | US4430547 Cleaning device for a plasma etching system |
02/07/1984 | US4430361 Glow discharges, ferromagnetism, backings, plates, velocities, joining |
02/07/1984 | US4430190 Holder is a metal powder or foil |
02/07/1984 | US4430184 Targets, cathodes, migration, random, confining, rings |
02/07/1984 | US4430151 Method of monitoring status of a silicon layer by detecting, emission spectra variable during etching |
02/07/1984 | US4430138 Microwave plasma etching apparatus having fan-shaped discharge |
02/02/1984 | WO1984000443A1 Electron beam apparatus and electron collectors therefor |
02/01/1984 | EP0099778A1 Mechanically scanned target holder |
02/01/1984 | EP0099725A2 High pressure, non-local thermal equilibrium arc plasma generating apparatus for deposition of coatings upon substrates |
02/01/1984 | EP0099708A1 Magnetic apparatus for reducing substrate warpage |
02/01/1984 | EP0099479A2 Deflection structure for a particle beam blanking system |
01/31/1984 | US4429401 Molten-metal liquid level sensor |
01/31/1984 | US4429222 Transmission electron microscope |
01/31/1984 | US4428816 Focusing magnetron sputtering apparatus |
01/31/1984 | US4428811 Initiation by bombardment of target with ionized inert gas |
01/31/1984 | US4428810 Method and apparatus for depositing conducting oxide on a substrate |
01/24/1984 | US4427891 Variable temperature stage device for electron microscope |
01/24/1984 | US4427886 Low voltage field emission electron gun |
01/24/1984 | US4427524 Magnetron cathode sputtering system |
01/24/1984 | US4427516 Apparatus and method for plasma-assisted etching of wafers |
01/17/1984 | US4426597 Ionized gas generator at very high temperature and very high pressure |
01/17/1984 | US4426584 Method of compensating the proximity effect in electron beam projection systems |
01/17/1984 | US4426583 Electron beam potential switching apparatus |
01/17/1984 | US4426582 Charged particle beam apparatus and method utilizing liquid metal field ionization source and asymmetric three element lens system |
01/17/1984 | US4426577 Electron microscope of scanning type |
01/17/1984 | US4426275 Confining heated plasma |
01/17/1984 | US4426274 Reactive ion etching apparatus with interlaced perforated anode |
01/17/1984 | US4426264 Method and means for controlling sputtering apparatus |
01/12/1984 | EP0086816A4 Plasma etching apparatus and method including end point detection. |
01/11/1984 | EP0098177A2 Scanning electron-beam exposure system |
01/11/1984 | EP0097903A2 Method of electron beam exposure |
01/10/1984 | US4425508 Electron beam lithographic apparatus |
01/10/1984 | US4425507 Specimen chamber of electron probe instrument |
01/10/1984 | US4425218 Gas distribution system for sputtering cathodes |
01/10/1984 | US4425210 Plasma desmearing apparatus and method |
01/10/1984 | EP0079931A4 Focused ion beam microfabrication column. |
01/04/1984 | EP0097535A2 Crossed-field velocity filter and ion-beam processing system |
01/04/1984 | EP0097417A2 Electron beam lithography |
01/03/1984 | US4424450 Hybrid moving stage and rastered electron beam lithography system employing approximate correction circuit |
01/03/1984 | US4424448 Electron beam apparatus |
01/03/1984 | US4424104 Single axis combined ion and vapor source |
01/03/1984 | US4424103 Thin film deposition |