Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
04/1984
04/03/1984US4440108 Ion beam coating apparatus
04/03/1984US4440107 Magnetic apparatus for reducing substrate warpage
03/1984
03/27/1984US4439686 Electron beam-irradiating apparatus with conical bushing seal-support
03/27/1984US4439685 Corpuscular beam blanking system
03/27/1984US4439681 Charged particle beam scanning device
03/27/1984US4439680 Color-coded mapping system and method for identifying elements in a specimen
03/27/1984US4439463 Plasma assisted deposition system
03/27/1984US4438724 Grooved gas gate
03/27/1984US4438557 Method of using an areal array of tubular electron sources
03/27/1984CA1164409A1 Cathodic sputtering apparatus for detecting target piercing
03/21/1984EP0103521A2 Substrates thinly coated with platinum oxide, devices for obtaining the so coated substrates and products obtained from substrates so coated
03/21/1984EP0103502A1 Method for the time-dependent variation of trajectory of a charged-particles beam
03/21/1984EP0103461A2 Plasma deposition method and apparatus
03/20/1984US4438371 Source of charged particles beam
03/20/1984US4438368 Plasma treating apparatus
03/20/1984US4438336 Corpuscular radiation device for producing an irradiation pattern on a workpiece
03/20/1984US4438332 Detector for an electron microscope
03/20/1984US4438188 Glow discharge, vapor deposition
03/20/1984US4438153 Method of and apparatus for the vapor deposition of material upon a substrate
03/20/1984US4437966 Sputtering cathode apparatus
03/20/1984US4437961 Method for sequentially processing a multi-level interconnect circuit in a vacuum chamber
03/20/1984US4437324 Apparatus for treating a cloth continuously with the use of low-temperature plasma
03/20/1984CA1164028A1 High vacuum compatible air bearing stage
03/14/1984EP0102613A1 Method of fixing target materials existing in the form of discs or plates on cooling trays for sputtering devices
03/13/1984US4437009 Scanning electron microscope or similar equipment
03/13/1984US4437008 Electron beam control system
03/13/1984US4436602 Spaced apart coating stations
03/13/1984CA1163602A1 Quadrupole r.f. sputtering system having an anode/cathode shield and a floating target shield
03/07/1984EP0101774A1 Safe electric supply glow discharge
03/06/1984US4435747 High voltage supply system for medical equipment
03/06/1984US4434742 Installation for depositing thin layers in the reactive vapor phase
03/06/1984CA1163231A1 Reactive plating method and product
03/01/1984WO1984000855A1 Low voltage operation of arc discharge devices
02/1984
02/28/1984US4434371 Electron beam blanking apparatus and method
02/28/1984US4434367 Electron microscope
02/28/1984US4434042 Planar magnetron sputtering apparatus
02/28/1984US4434038 Sputtering method and apparatus utilizing improved ion source
02/22/1984EP0101286A1 Grooved gas gate
02/22/1984EP0101043A2 Plasma cathode electron beam generating system
02/21/1984US4433384 Pattern data handling system for an electron beam exposure system
02/21/1984US4433247 Beam sharing method and apparatus for ion implantation
02/21/1984US4433243 Chrysene, triphenylene, p-terphenyl, heating, dissolving, 1,2,4-trichlorobenzene, precipitation, heptane
02/21/1984US4433228 Microwave plasma source
02/21/1984US4432853 Masking microtubes, placing in vacuum, exposure to ion beam to perforate ends
02/16/1984WO1984000610A1 Low voltage field emission electron gun
02/15/1984EP0100634A2 Method and apparatus for handling a charged particle beam
02/15/1984EP0100611A1 Reduced capacitance electrode assembly
02/15/1984EP0100525A2 Alignment assembly
02/15/1984EP0100396A1 Determination of true electrical channel length of surface FET
02/14/1984US4431923 Alignment process using serial detection of repetitively patterned alignment marks
02/14/1984US4431915 Electron beam apparatus
02/14/1984US4431898 Of semiconductor devices
02/14/1984US4431505 High rate magnetron sputtering of high permeability materials
02/14/1984US4431499 Texturing a target with a seed to lower reflectance; process control
02/14/1984US4431473 RIE Apparatus utilizing a shielded magnetron to enhance etching
02/08/1984EP0100206A1 Apparatus for treating an article in a vacuum chamber
02/07/1984US4430571 Method and apparatus for exposing multi-level registered patterns interchangeably between stations of a multi-station electron-beam array lithography (EBAL) system
02/07/1984US4430570 Electron beam exposing apparatus
02/07/1984US4430547 Cleaning device for a plasma etching system
02/07/1984US4430361 Glow discharges, ferromagnetism, backings, plates, velocities, joining
02/07/1984US4430190 Holder is a metal powder or foil
02/07/1984US4430184 Targets, cathodes, migration, random, confining, rings
02/07/1984US4430151 Method of monitoring status of a silicon layer by detecting, emission spectra variable during etching
02/07/1984US4430138 Microwave plasma etching apparatus having fan-shaped discharge
02/02/1984WO1984000443A1 Electron beam apparatus and electron collectors therefor
02/01/1984EP0099778A1 Mechanically scanned target holder
02/01/1984EP0099725A2 High pressure, non-local thermal equilibrium arc plasma generating apparatus for deposition of coatings upon substrates
02/01/1984EP0099708A1 Magnetic apparatus for reducing substrate warpage
02/01/1984EP0099479A2 Deflection structure for a particle beam blanking system
01/1984
01/31/1984US4429401 Molten-metal liquid level sensor
01/31/1984US4429222 Transmission electron microscope
01/31/1984US4428816 Focusing magnetron sputtering apparatus
01/31/1984US4428811 Initiation by bombardment of target with ionized inert gas
01/31/1984US4428810 Method and apparatus for depositing conducting oxide on a substrate
01/24/1984US4427891 Variable temperature stage device for electron microscope
01/24/1984US4427886 Low voltage field emission electron gun
01/24/1984US4427524 Magnetron cathode sputtering system
01/24/1984US4427516 Apparatus and method for plasma-assisted etching of wafers
01/17/1984US4426597 Ionized gas generator at very high temperature and very high pressure
01/17/1984US4426584 Method of compensating the proximity effect in electron beam projection systems
01/17/1984US4426583 Electron beam potential switching apparatus
01/17/1984US4426582 Charged particle beam apparatus and method utilizing liquid metal field ionization source and asymmetric three element lens system
01/17/1984US4426577 Electron microscope of scanning type
01/17/1984US4426275 Confining heated plasma
01/17/1984US4426274 Reactive ion etching apparatus with interlaced perforated anode
01/17/1984US4426264 Method and means for controlling sputtering apparatus
01/12/1984EP0086816A4 Plasma etching apparatus and method including end point detection.
01/11/1984EP0098177A2 Scanning electron-beam exposure system
01/11/1984EP0097903A2 Method of electron beam exposure
01/10/1984US4425508 Electron beam lithographic apparatus
01/10/1984US4425507 Specimen chamber of electron probe instrument
01/10/1984US4425218 Gas distribution system for sputtering cathodes
01/10/1984US4425210 Plasma desmearing apparatus and method
01/10/1984EP0079931A4 Focused ion beam microfabrication column.
01/04/1984EP0097535A2 Crossed-field velocity filter and ion-beam processing system
01/04/1984EP0097417A2 Electron beam lithography
01/03/1984US4424450 Hybrid moving stage and rastered electron beam lithography system employing approximate correction circuit
01/03/1984US4424448 Electron beam apparatus
01/03/1984US4424104 Single axis combined ion and vapor source
01/03/1984US4424103 Thin film deposition