| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 08/20/1985 | CA1192318A1 Magnetron cathode sputtering system |
| 08/20/1985 | CA1192278A1 Radio frequency generator system |
| 08/13/1985 | US4535249 Benchmark detector |
| 08/13/1985 | US4534842 Process and device for producing a homogeneous large-volume plasma of high density and of low electronic temperature |
| 08/13/1985 | US4534816 Single wafer plasma etch reactor |
| 08/13/1985 | CA1191975A1 Glow discharge deposition apparatus including a non- horizontally disposed cathode |
| 08/07/1985 | EP0150941A1 Charged-particle optical systems |
| 08/07/1985 | EP0150885A2 Semiconductor device for producing an electron beam |
| 08/07/1985 | EP0150878A2 Process for the manufacture of a thin film strain gage system |
| 08/07/1985 | EP0150326A2 Method and device to compensate for charging up in secondary ion mass spectrometry |
| 08/06/1985 | US4533831 Non-mass-analyzed ion implantation |
| 08/06/1985 | US4532888 Electron-beam coating of very broad strips |
| 08/06/1985 | US4532816 Sample vessel |
| 07/31/1985 | EP0150129A2 Method and apparatus for lithographic rotate and repeat processing |
| 07/31/1985 | EP0150089A1 Charged-particle optical systems |
| 07/30/1985 | US4532598 Electron beam exposure system |
| 07/30/1985 | US4532426 Wafer height correction system for focused beam system |
| 07/30/1985 | US4532423 IC Tester using an electron beam capable of easily setting a probe card unit for wafers & packaged IC's to be tested |
| 07/30/1985 | US4532422 Electron holography microscope |
| 07/30/1985 | CA1191109A1 Electrode treatment for plasma patterning of polymers |
| 07/24/1985 | EP0149408A2 Method and apparatus for the deposition of a thin layer on a substrate by a reactive plasma |
| 07/24/1985 | EP0149089A2 Single electrode, multiple frequency plasma apparatus |
| 07/24/1985 | EP0149017A2 Piezoelectric X-Y positioner |
| 07/24/1985 | EP0149004A2 Process and appliance for screening the magnetic field during electron beam working |
| 07/24/1985 | EP0148898A1 Apparatus for plasma treatment of plate-shaped substrats. |
| 07/23/1985 | US4531191 Electron beam pattern generation system |
| 07/23/1985 | US4531057 Apparatus and method for adjusting optical axis of electron microscope |
| 07/17/1985 | EP0148784A2 Calibration of electron beam apparatus |
| 07/17/1985 | EP0148504A2 Method and apparatus for sputtering |
| 07/17/1985 | EP0148470A2 Planar magnetron sputtering with modified field configuration |
| 07/16/1985 | US4530100 Vaporizer crucible for vacuum vapor-deposition |
| 07/16/1985 | US4530064 Exposure method utilizing an energy beam |
| 07/16/1985 | US4529475 Dry etching apparatus and method using reactive gases |
| 07/16/1985 | US4529474 Using gas mixture of carbon tetrafluoride and oxygen |
| 07/10/1985 | EP0147890A1 Apparatus for processing articles in a controlled environment |
| 07/10/1985 | EP0147746A2 Electron beam irradiation apparatus |
| 07/10/1985 | EP0038808B1 Ion beam lithography process and apparatus using step-and repeat exposure |
| 07/09/1985 | US4528452 Alignment and detection system for electron image projectors |
| 07/09/1985 | US4528451 Gap control system for localized vacuum processing |
| 07/09/1985 | US4528438 End point control in plasma etching |
| 07/09/1985 | US4527620 Apparatus for controlling thermal transfer in a cyclic vacuum processing system |
| 07/09/1985 | CA1190329A1 Electron microscope comprising an x-ray detector |
| 07/04/1985 | WO1985002907A1 Method and apparatus for surface diagnostics |
| 07/04/1985 | WO1985002866A1 Sputter deposition |
| 07/03/1985 | EP0147132A2 Electron beam welding control |
| 07/03/1985 | EP0146595A1 Method and apparatus for introducing normally solid materials into substrate surfaces. |
| 07/02/1985 | US4527044 Apparatus for treating a sample by a pulsed electron beam |
| 07/02/1985 | US4526805 Decomposing raw gas to form molecular species, depositing thin film on substrate |
| 07/02/1985 | US4526673 Exposing negatively biased parts to ion beam from excited plasma |
| 07/02/1985 | US4526644 Treatment device utilizing plasma |
| 07/02/1985 | US4526643 Housing with anode, cathode, for etching workpiece, means for supplying etching gas, means for supplying voltage to produce plasma, means for generating magnetic field, means for moving magnets |
| 07/02/1985 | US4526132 Evaporator |
| 07/02/1985 | CA1189767A1 End-point detection in plasma etching of phosphosilicate glass |
| 07/01/1985 | EP0088074A4 Plasma reactor and method therefor. |
| 06/26/1985 | EP0146446A2 Process and apparatus for plasma treatment of semiconductor materials |
| 06/25/1985 | US4525652 Auxiliary-voltage source for supplying electric circuits which are at a high potential |
| 06/25/1985 | US4525629 Deflective focusing system for charged particle beam |
| 06/25/1985 | US4525264 Cylindrical post magnetron sputtering system |
| 06/25/1985 | US4525262 Magnetron reactive bias sputtering method and apparatus |
| 06/25/1985 | US4524717 Electron beam strip-coating apparatus |
| 06/19/1985 | EP0145586A2 Multicharged ion source with several electron cyclotron resonance regions |
| 06/19/1985 | EP0145120A1 Apparatus for ion implantation |
| 06/19/1985 | EP0145119A1 Apparatus for ion implantation |
| 06/19/1985 | EP0145089A2 Automatically adjustable electron microscope |
| 06/19/1985 | EP0145015A2 Dry etching method and apparatus |
| 06/19/1985 | EP0144838A2 Magnetron cathode for the sputtering of ferromagnetic targets |
| 06/19/1985 | EP0144572A2 Magnetron-cathodes for the sputtering of ferromagnetic targets |
| 06/18/1985 | US4524278 Charged particle beam exposure device incorporating beam splitting |
| 06/18/1985 | US4524277 Charged particle beam apparatus |
| 06/18/1985 | US4524261 Localized vacuum processing apparatus |
| 06/18/1985 | US4523971 Programmable ion beam patterning system |
| 06/18/1985 | US4523544 Apparatus for glow discharge deposition of a thin film |
| 06/18/1985 | CA1189198A1 Beam scanning method and apparatus for ion implantation |
| 06/18/1985 | CA1189174A1 Magnetic apparatus for reducing substrate warpage |
| 06/11/1985 | US4523098 Electron beam exposure apparatus |
| 06/11/1985 | US4523094 Evaluation device for electron-optical images |
| 06/11/1985 | US4522674 Surface treatment apparatus |
| 06/10/1985 | EP0120089A4 Automatically adjustable chip design method. |
| 06/06/1985 | WO1985002489A1 Quadrupole particle accelerator |
| 06/06/1985 | WO1985002418A1 Gas distribution system for sputtering cathodes |
| 06/05/1985 | EP0143479A1 Plasma-stimulated chemical vapour deposition device and, in particular, a substrate supporting and electrode disposition and associated components |
| 06/05/1985 | EP0143146A1 Process and device for storing measuring data from sub-domains of a sputter crater produced and analyzed in a secondary ion mass spectrometer |
| 06/04/1985 | US4521719 Ion beam gun |
| 06/04/1985 | US4521717 Apparatus for producing a microwave plasma for the treatment of substrates, in particular for the plasma-polymerization of monomers thereon |
| 06/04/1985 | US4521287 High rate sputtering of exhaust oxygen sensor electrode |
| 06/04/1985 | US4521286 Hollow cathode sputter etcher |
| 06/04/1985 | US4520757 Process gas introduction, confinement and evacuation system for glow discharge deposition apparatus |
| 06/04/1985 | US4520570 Piezoelectric x-y-positioner |
| 06/04/1985 | CA1188399A1 Reduced capacitance electrode assembly |
| 05/28/1985 | US4520421 Specimen supporting device |
| 05/28/1985 | US4520269 Electron beam lithography proximity correction method |
| 05/28/1985 | US4520268 Method and apparatus for introducing normally solid materials into substrate surfaces |
| 05/28/1985 | US4520264 Electron microscope |
| 05/28/1985 | US4519885 Method and apparatus for changing sputtering targets in a magnetron sputtering system |
| 05/22/1985 | EP0142450A2 Device for manufacturing thin dielectric layers on the surfaces of solid bodies |
| 05/22/1985 | EP0142269A1 Method and apparatus for fabricating devices using reactive ion etching |
| 05/22/1985 | EP0142106A1 Process and device for determining the focusing state of an imaging optical apparatus |
| 05/21/1985 | CA1187543A1 Multiple sextupole system for the correction of third and higher order aberration |
| 05/15/1985 | EP0141417A2 Apparatus for forming film by ion beam |
| 05/15/1985 | EP0141272A1 Apparatus for processing solid state samples with ion beams |