Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
02/1980
02/12/1980CA1071579A1 End point control in plasma etching
02/05/1980US4187124 Process for doping semiconductors
01/1980
01/29/1980US4186305 High-temperature microscope
01/23/1980EP0007115A1 Metal piece, the surface of which can take an unwanted electrostatic charge, and its application
01/23/1980EP0006985A1 Method and device for the determination of the focal length of electrooptical lenses of long focal length
01/22/1980CA1070440A1 Electron beam collimator
01/15/1980US4184188 Substrate clamping technique in IC fabrication processes
01/15/1980US4183797 Two-sided bias sputter deposition method and apparatus
01/09/1980EP0006701A1 A process for channelling ion beams
01/09/1980EP0006475A1 Apparatus for coating workpieces by cathodic sputtering
01/09/1980EP0006437A1 Method and device for adjusting and correcting the aberrations of an electrooptical condensor in a microprojector
01/09/1980EP0006275A1 A process for the treatment of aromatic polyamide fibers, which are suitable for use in construction materials and rubbers, as well as so treated fibers and shaped articles strengthened with these fibers
01/08/1980US4182958 Method and apparatus for projecting a beam of electrically charged particles
01/01/1980US4181860 Radiant beam exposure method
12/1979
12/25/1979US4180738 Astigmatism in electron beam probe instruments
12/25/1979US4180450 Planar magnetron sputtering device
12/18/1979US4179609 Point scattering detector
12/18/1979US4179605 Cold trap for electron microscope
12/18/1979US4179604 Electron collector for forming low-loss electron images
12/18/1979US4179351 Cylindrical magnetron sputtering source
12/18/1979US4179316 Electron beam
12/18/1979US4179312 Formation of epitaxial layers doped with conductivity-determining impurities by ion deposition
12/18/1979US4178877 Apparatus for plasma treatment of semiconductor materials
12/11/1979US4178465 Processes for preparing perfluoropolyether oils of very high purity and low volatility
12/04/1979US4177404 Arc detector for glow discharges
12/04/1979US4177379 Back-scattered electron detector for use in an electron microscope or electron beam exposure system to detect back-scattered electrons
12/04/1979CA1067624A1 System for monitoring the position, intensity, uniformity and directivity of a beam of ionizing radiation
11/1979
11/28/1979EP0005641A1 Method and apparatus for monitoring and controlling sputter deposition processes
11/28/1979EP0005460A1 Apparatus for material treatment
11/20/1979US4175235 Apparatus for the plasma treatment of semiconductors
11/20/1979US4175030 Two-sided planar magnetron sputtering apparatus
11/20/1979US4175029 Apparatus for ion plasma coating of articles
11/15/1979WO1979000900A1 Low-density pattern in a photoresist
11/13/1979CA1066431A1 Semiconductor device manufacture
10/1979
10/23/1979US4172020 Method and apparatus for monitoring and controlling sputter deposition processes
10/23/1979CA1064862A1 Gas discharge apparatus
10/17/1979EP0004751A2 Electrical discharge heating device and method of heating using such
10/16/1979US4171462 Linear electron beam gun evaporator having uniform electron emission
10/16/1979CA1064540A1 Sealing device for a vacuum enclosure
10/09/1979US4170737 Top-entry transmission electron microscope
09/1979
09/25/1979US4169240 Automatic focussing systems
09/25/1979US4169230 Method of exposure by means of corpuscular beam shadow printing
09/25/1979US4169229 Apparatus for keying in electron beams
09/25/1979US4169031 Magnetron sputter cathode assembly
09/25/1979CA1063255A1 Semiconductor wafer alignment marks for use with electron beams
09/19/1979EP0004064A2 Apparatus in an ion microprobe for concentrating the primary ion beam
09/18/1979US4168434 Long focal length magnetic lens for the optical imaging of a specimen having a large surface area
09/11/1979US4167676 Variable-spot scanning in an electron beam exposure system
09/06/1979WO1979000645A1 Variable-spot scanning in an electron beam exposure system
09/04/1979US4166783 Deposition rate regulation by computer control of sputtering systems
08/1979
08/28/1979US4166018 Sputtering process and apparatus
08/28/1979CA1061477A1 Electron microscope
08/28/1979CA1061416A1 Method for varying the diameter of a beam of charged particles
08/22/1979EP0003659A2 Apparatus for and method of analysing materials by means of a beam of charged particles
08/22/1979EP0003527A2 Method and apparatus for focusing a beam of charged particles onto semiconductor chips
08/21/1979US4165395 Process for forming a high aspect ratio structure by successive exposures with electron beam and actinic radiation
08/21/1979CA1061008A1 Electron projection microfabrication system
08/14/1979US4164658 Charged-particle beam optical apparatus for imaging a mask on a specimen
08/14/1979US4164640 Method and apparatus for positioning a charged particle beam
08/07/1979US4163900 Composite electron microscope grid suitable for energy dispersive X-ray analysis, process for producing the same and other micro-components
08/07/1979US4163889 Device for the simultaneous operation of a number of gas discharge electron guns
07/1979
07/31/1979US4163168 Two-directional piezoelectric driven fine adjusting device
07/31/1979US4163155 Defining a low-density pattern in a photoresist with an electron beam exposure system
07/31/1979US4163153 Ion beam means
07/31/1979US4162954 Uniformity of cathode erosion
07/31/1979CA1059656A1 Charged particle beam apparatus
07/31/1979CA1059465A1 Vacuum sputtering apparatus and method
07/25/1979EP0003073A1 Electron beam welding machine
07/25/1979EP0003038A2 Method for overlay measurement using an electronic beam system as a measuring tool
07/24/1979US4162403 Method and means for compensating for charge carrier beam astigmatism
07/24/1979US4162401 Electron microscopes
07/24/1979US4162391 Sliding vacuum seal means
07/12/1979WO1979000413A1 Electric arc apparatus and method for treating a flow of material by an electric arc
07/11/1979EP0002990A1 Device for implanting strong-current ions, comprising electrostatic deflection plates and magnetic refocussing means
07/11/1979EP0002957A2 Electron beam exposure apparatus
07/11/1979EP0002832A1 Method and apparatus for sputtering photoconductive coating on endless flexible belts or cylinders
07/11/1979EP0002726A2 Process and apparatus for reactive ion etching
07/11/1979EP0002688A1 Apparatus for irradiation of a target with ions
07/10/1979US4160905 Electron microscopes
07/10/1979US4160690 Gas etching method and apparatus
07/03/1979US4160162 Method for the pictorial display of a diffraction image in a transmission-type, scanning, corpuscular-beam microscope
07/03/1979US4160150 Method and apparatus for energy beam welding
07/03/1979US4159909 Cathode target material compositions for magnetic sputtering
06/1979
06/27/1979EP0002623A1 Electric arc apparatus and method for treating a flow of material by an electric arc
06/27/1979EP0002472A2 Device and method for growing doped semiconductor material layers on the surface of a semiconductor substrate
06/26/1979US4159423 Chemical ionization ion source
06/26/1979US4159421 Method and apparatus for suppressing electron generation in a vapor source for isotope separation
06/26/1979CA1057422A1 Ion implantation apparatus
06/19/1979US4158589 Negative ion extractor for a plasma etching apparatus
06/13/1979EP0002409A1 Arrangement for the programmed inscription of patterns having different configurations by bombarding a target by a beam of particles
06/13/1979EP0002407A1 Mobile extraction electrode for an ion source
06/13/1979EP0002406A1 Ion source, in particular for an ion implantation device
06/13/1979EP0002383A1 Method and apparatus for depositing semiconductor and other films
06/12/1979US4158141 Process for channeling ion beams
06/12/1979US4158140 Electron beam exposure apparatus
05/1979
05/30/1979EP0001985A1 Ion implantation device with a device for maintaining the vacuum condition
05/29/1979CA1055264A1 Multiple stage cryogenic pump and method of pumping
05/22/1979US4155825 Integrated sputtering apparatus and method
05/22/1979CA1055104A1 Apparatus for measuring the beam current of charged particle beam
05/16/1979EP0001889A1 Method for surface hardening metals