Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
12/1982
12/08/1982EP0066080A1 Single crystal lanthanum hexaboride cathode for thermionic emission of an electron beam having high brightness
12/08/1982EP0066071A1 Apparatus for contactless testing of electrical connections
12/07/1982US4362945 Chromatically corrected deflecting device for particle-beam equipment
12/07/1982US4362942 Electron beam exposure system and an apparatus for carrying out the same
12/07/1982US4362632 Gas discharge apparatus
12/07/1982US4362611 Quadrupole R.F. sputtering system having an anode/cathode shield and a floating target shield
12/07/1982US4362596 Etch end point detector using gas flow changes
11/1982
11/30/1982US4361762 Apparatus and method for neutralizing the beam in an ion implanter
11/30/1982US4361749 Uniformly cooled plasma etching electrode
11/30/1982US4361472 Sputtering method and apparatus utilizing improved ion source
11/24/1982EP0065277A1 High speed dry etching method
11/24/1982EP0065143A2 Electron beam pattern transfer device and method for aligning mask and semiconductor wafer
11/24/1982EP0065085A2 A cathode for reactive ion etching
11/17/1982EP0064639A2 Electron-beam lithographic apparatus
11/10/1982EP0064288A1 Method and apparatus for the production and utilization of activated molecular beams
11/10/1982EP0064163A2 High speed plasma etching system
11/09/1982US4358686 Plasma reaction device
11/09/1982US4358657 Sealing system for a movable vacuum chamber of a charged particle beam machine
11/09/1982US4358338 End point detection method for physical etching process
11/03/1982EP0064003A1 Device for the pulsed electron beam processing of a specimen
11/02/1982US4357540 Semiconductor device array mask inspection method and apparatus
11/02/1982US4357517 Electron beam welding with beam focus controlled responsive to absorbed beam power
11/02/1982US4357195 Switching power from continuous to pulsed mode
10/1982
10/27/1982EP0063493A2 Ion-processing method and apparatus and a product made thereby
10/27/1982EP0063429A2 An electron beam array lithography apparatus and a method of operating the same
10/27/1982EP0063273A1 Discharge system for plasma processing
10/26/1982US4356073 Magnetron cathode sputtering apparatus
10/26/1982US4355937 Low shock transmissive antechamber seal mechanisms for vacuum chamber type semi-conductor wafer electron beam writing apparatus
10/19/1982US4355262 Electric arc apparatus
10/19/1982US4355232 Apparatus for measuring specimen potential in electron microscope
10/19/1982US4354910 Method and apparatus for the partial coating of a substrate by cathode sputtering
10/13/1982EP0062302A2 End-point detection in plasma etching of phosphosilicate glass
10/12/1982US4354113 Ion sources
10/12/1982US4354111 Screen lens array system
10/12/1982CA1133424A1 Cathode for sputtering
10/07/1982EP0053620A4 Method and apparatus for material analysis.
10/06/1982EP0061906A1 A method of, and an apparatus for, processing a workpiece with energetic particles and a product processed thereby
10/05/1982US4352985 Scanning ion microscope
10/05/1982US4352974 Plasma etcher having isotropic subchamber with gas outlet for producing uniform etching
10/05/1982US4352725 Dry etching device comprising an electrode for controlling etch rate
10/05/1982US4352643 Structure for vibration isolation in an apparatus with a vacuum system
09/1982
09/29/1982EP0060917A2 Load-lock vacuum chamber for etching silicon wafers
09/28/1982US4352015 Anti-contamination diaphragm for an electron beam apparatus
09/28/1982US4351855 Noncrucible method of and apparatus for the vapor deposition of material upon a substrate using voltaic arc in vacuum
09/28/1982US4351714 Sputter-etching device
09/22/1982EP0060337A2 Electron microscope with scanning beam
09/22/1982EP0060257A1 Method for surface hardening cams.
09/21/1982US4350578 Cathode for etching
09/16/1982WO1982003139A1 Screen lens array system
09/16/1982WO1982003126A1 Reregistration system for a charged particle beam exposure system
09/14/1982US4349409 Method and apparatus for plasma etching
09/14/1982US4349242 Specimen observation apparatus including an optical microscope and a scanning electron microscope
09/14/1982CA1131795A1 Cold cathode semiconductor device
09/02/1982WO1982002979A1 A method of fabricating screen lens array plates
09/02/1982WO1982002906A1 Consumable cathode for electric-arc evaporator of metal
09/01/1982EP0058820A1 Radio frequency generator system
08/1982
08/25/1982EP0058560A2 Sputtering apparatus
08/24/1982US4346330 Laser generated high electron density source
08/24/1982US4346325 Having a cathode of a single crystal of lanthanum hexaboride
08/24/1982US4346301 Ion implantation system
08/24/1982US4345968 Plasma etching of integrated circuits
08/19/1982WO1982002796A1 In situ operating scanning electronic microscope assembly
08/19/1982WO1982002725A1 Magnetron cathode sputtering apparatus
08/18/1982EP0058103A1 Tridimensional visualization method and device starting from video signals, especially for electronic microscopy
08/17/1982US4345152 Magnetic lens
08/11/1982EP0057646A2 Scanning electron microscope for use in situ
08/11/1982EP0027142A4 Treating multilayer printed wiring boards.
08/10/1982US4343993 Scanning tunneling microscope
08/05/1982WO1982002624A1 Emission-electron microscope
08/05/1982WO1982002623A1 Parallel charged particle beam exposure system
08/04/1982EP0056899A1 Gas ion source
08/03/1982US4342918 Ion-nitriding apparatus
08/03/1982US4342901 Plasma etching electrode
08/03/1982US4342900 Vacuum shield device of an electron beam welding apparatus
08/03/1982CA1128896A1 Treating multilayer printed wiring boards
07/1982
07/27/1982US4341947 Glow discharge heating apparatus
07/27/1982US4341616 Portion of passageway of etchant has protective coating
07/27/1982US4341582 Load-lock vacuum chamber
07/21/1982EP0056179A1 Process and apparatus for converged fine line electron beam treatment of objects
07/20/1982US4340815 Preparation of material for examination by transmission electron microscopy techniques
07/20/1982US4340462 Adjustable electrode plasma processing chamber
07/20/1982US4340461 Modified RIE chamber for uniform silicon etching
07/13/1982US4339656 Glow discharge heating apparatus
07/08/1982WO1982002235A1 Planar vacuum seal for isolating an air bearing
07/07/1982EP0055479A1 Electron beam pattern generation system
07/07/1982EP0055326A1 System and method for deflecting and focusing a broad plasma beam
07/06/1982US4338548 Unipotential lens assembly for charged particle beam tubes and method for applying correction potentials thereto
07/06/1982US4338508 Inscribing apparatus and methods
06/1982
06/30/1982EP0054710A1 Positioning and controlling procedure of a workpiece provided with patterns, for example of a mask for manufacturing semi-conductor elements
06/30/1982EP0054624A1 Elevator drive mechanism
06/30/1982EP0054623A1 Antechamber mechanism for electron beam writing apparatus
06/30/1982EP0054621A1 High temperature ion beam source
06/30/1982EP0054615A1 Digitally controlled electron beam exposure system with high speed data interface buffer
06/29/1982US4337422 Field emission gun with noise compensation
06/29/1982CA1126880A1 Ion-electron source
06/23/1982EP0054201A2 Dry etching device and method
06/22/1982US4336597 Method and system for measuring the diameter of an electron beam
06/16/1982EP0054016A2 Apparatus for electron-beam irradiation of surfaces
06/16/1982EP0053620A1 Method and apparatus for material analysis.
06/15/1982US4335314 Generator for pulsed electron beams
1 ... 450 451 452 453 454 455 456 457 458 459 460 461 462 463 464 465 466 467 468 469