Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
06/1982
06/15/1982US4335309 Method and device for the rapid deflection of a particle beam
06/15/1982US4335189 Resolution standard for scanning electron microscope comprising palladium spines on a metal substrate
06/15/1982US4334844 Replica film of specimen for electron microscopy apparatus
06/15/1982CA1125863A1 Sliding vacuum seal means with air inrush reducing seals
06/09/1982EP0053225A1 Electron beam system and method
06/09/1982EP0053107A1 Process for operating a high stability electron gun for the shaping of materials.
06/08/1982US4334156 Method of shadow printing exposure
06/08/1982US4334139 Apparatus for writing patterns in a layer on a substrate by means of a beam of electrically charged particles
06/08/1982US4333814 Controllable self-bias
06/08/1982CA1125441A1 Electron beam exposure system and an apparatus for carrying out the same
06/02/1982EP0052621A1 Brightness analyser
06/01/1982US4333035 Areal array of tubular electron sources
06/01/1982CA1124890A1 Correction for polychromatic aberration in ct images
05/1982
05/27/1982WO1982001787A1 Method for engraving by means of an electron beam
05/25/1982US4331875 Shadow casting electron-beam system
05/25/1982US4331856 Control system and method of controlling ion nitriding apparatus
05/25/1982US4331505 Masking, etching, lithography
05/19/1982EP0051733A1 Electron beam projection system
05/19/1982EP0051635A1 Sputter target and glow discharge coating apparatus.
05/18/1982US4330709 Electronic optical objective
05/18/1982US4330708 Electron lens
05/18/1982US4330707 Scanning electron microscope
05/18/1982US4330182 Method of forming semiconducting materials and barriers
05/11/1982US4329563 Glow discharge heating apparatus
05/04/1982US4328324 Plasma treated
05/04/1982US4328258 Method of forming semiconducting materials and barriers
05/04/1982US4328081 Sulfided nickel, tungsten catalyst
05/04/1982US4328068 Method for end point detection in a plasma etching process
05/04/1982CA1123120A1 Defining a low-density pattern in a photoresist with an electron beam exposure system
04/1982
04/27/1982US4327292 Alignment process using serial detection of repetitively patterned alignment marks
04/27/1982US4327273 Method of treating a workpiece with electron beams and apparatus therefor
04/21/1982EP0049872A2 Electron beam exposure system
04/13/1982US4325084 Semiconductor device and method of manufacturing same, as well as a pick-up device and a display device having such a semiconductor device
04/07/1982EP0048864A2 Particle beam blanking system
04/07/1982EP0048858A1 Signal processing device for electron beam measuring apparatus
04/07/1982EP0048857A1 Arrangement for the stroboscopic measuring of a potential with an electron beam measuring apparatus, and method of operating such an apparatus
04/07/1982EP0048856A2 Beam blanking electrode for an electron beam generating system
04/06/1982US4323589 Fabrication of intergrated circuits
04/01/1982WO1982001016A1 Method and apparatus for surface hardening cams
03/1982
03/31/1982EP0012765B1 Method of operating a raster-scan electron beam lithographic system
03/30/1982US4322626 Method of electron beam exposure
03/24/1982EP0047989A2 Electron beam exposure system
03/23/1982US4321510 Electron beam system
03/23/1982US4321470 Electron flood exposure apparatus
03/23/1982US4321468 Method and apparatus for correcting astigmatism in scanning electron microscopes and similar equipment
03/18/1982WO1982000920A1 Electron microscope
03/17/1982EP0047663A2 Microwave plasma etching
03/17/1982EP0047395A2 System for reactive ion etching
03/17/1982EP0009049B1 Apparatus and method for fabricating microminiature devices
03/16/1982CA1120153A1 Two-sided planar magnetron sputtering apparatus
03/10/1982EP0047104A1 An electron beam exposure method
03/10/1982EP0047002A2 Plasma etching apparatus
03/10/1982EP0046945A1 Method and apparatus for treating fluorescent substance
03/09/1982CA1119554A1 Deposition process monitoring and control system
03/03/1982EP0039688A4 Sextupole system for the correction of spherical aberration.
03/02/1982US4317983 Setting the electron gun cathode heating current of an electron beam machine
02/1982
02/24/1982EP0046154A1 Apparatus for coating substrates by high-rate cathodic sputtering, as well as sputtering cathode for such apparatus
02/23/1982US4317022 Electron beam welding machine
02/23/1982US4316791 Device for chemical dry etching of integrated circuits
02/23/1982CA1118715A1 Assembly and method to extend useful life of sputtering targets
02/17/1982EP0045858A2 Plasma etching electrode
02/17/1982EP0045844A1 Arrangement for focusing a beam of charged particles with variable focus
02/17/1982EP0045822A1 Cylindrical magnetron sputtering cathode
02/16/1982US4316090 Microwave plasma ion source
02/16/1982US4316087 Method of photographing electron microscope images on a single photographic plate and apparatus therefor
02/16/1982CA1118180A1 Process of and apparatus for cold-cathode electron-beam generation for sterilization of surfaces and similar applications
02/09/1982US4315195 High-voltage supply for power electron-beam guns
02/09/1982US4315152 Electron beam apparatus
02/09/1982US4315131 Electron discharge heating devices
02/09/1982CA1118055A1 Method and apparatus for controlling an electron beam welding generator
02/03/1982EP0044926A1 Resolution standard for scanning electron microscope and method of producing such a standard
02/02/1982US4314182 System for controlling the power of a high-voltage electron beam generator
02/02/1982CA1117609A1 Glow discharge heating apparatus
01/1982
01/26/1982US4313056 Scanning electron microscope with a chamber which can be broken down, particularly for observing pieces of relatively large dimensions
01/26/1982US4312732 Method for the optical monitoring of plasma discharge processing operations
01/26/1982US4312731 Magnetically enhanced sputtering device and method
01/26/1982EP0038808A4 Ion beam lithography process and apparatus using step-and repeat exposure.
01/20/1982EP0043863A1 Process for compensating the proximity effect in electron beam projection devices
01/13/1982EP0043789A2 Method for the chemical-discharge treatment of sensitive workpieces by means of a glow discharge
01/12/1982US4310764 Electron beam irradiation apparatus
01/12/1982US4310743 Hydroscopic salt particles; emergency breating cannisters for mineers
01/07/1982WO1982000075A1 Vacuum arc plasma device
01/06/1982EP0043351A2 Electrostatic blanking system for one particle beam moving in a plane or a plurality of static particle beams arranged in a plane
01/05/1982US4309589 Method and apparatus for electron beam welding
01/05/1982US4309267 Reactive sputter etching apparatus
01/05/1982US4309266 For producing uniform thin films
01/05/1982US4308756 Vacuum sample introduction unit
12/1981
12/29/1981US4308457 Device for the detection of back-scattered electrons from a sample in an electron microscope
12/24/1981WO1981003707A1 Method and apparatus for material analysis
12/22/1981US4307283 Plasma etching apparatus II-conical-shaped projection
12/15/1981US4306149 Electron microscope (comprising an auxiliary lens)
12/15/1981US4305591 Inflatable seals
12/10/1981WO1981003592A1 Brightness analyser
12/10/1981WO1981003580A1 Sample chamber for electron-sounding instrument
12/10/1981WO1981003579A1 High stability electron gun for the shaping of materials
12/09/1981EP0041228A2 Manufacturing process of an electron beam output window
12/08/1981US4305000 Process of and apparatus for cold-cathode electron-beam generation for sterilization of surfaces and similar applications
12/08/1981US4304983 Plasma etching device and process
12/08/1981US4304979 Method and apparatus for electron beam welding at elevated pressures
12/08/1981CA1113757A1 Device for material machining using electromagnetic or corpuscular beams