| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 02/13/1985 | EP0132657A1 Aperture imaging electron gun |
| 02/13/1985 | EP0132522A2 Ion beam deflecting apparatus |
| 02/12/1985 | US4498969 To deposit a thin metallic film |
| 02/12/1985 | US4498833 Wafer orientation system |
| 02/05/1985 | US4498010 Virtual addressing for E-beam lithography |
| 01/31/1985 | WO1985000466A1 Apparatus for plasma treatment of plate-shaped substrats |
| 01/30/1985 | EP0132398A1 A method and apparatus for ion beam generation |
| 01/29/1985 | US4496881 Method of cold cathode replenishment in electron beam apparatus and replenishable cold cathode assembly |
| 01/29/1985 | US4496843 Method for producing metal ions |
| 01/29/1985 | US4496450 Process for the production of a multicomponent thin film |
| 01/29/1985 | US4496449 Electron beam etching of integrated circuit structures |
| 01/29/1985 | US4496448 Method for fabricating devices with DC bias-controlled reactive ion etching |
| 01/29/1985 | US4496425 Technique for determining the end point of an etching process |
| 01/29/1985 | US4496423 Blocking plasma discharge with glass filler between porous alumiunum plugs |
| 01/23/1985 | EP0132015A2 An ion beam machining device |
| 01/23/1985 | EP0131699A1 Method and apparatus for controlling alignment and brightness of an electron beam |
| 01/23/1985 | EP0053107B1 Process for operating a high stability electron gun for the shaping of materials |
| 01/22/1985 | US4495442 Cold-cathode magnetron injection gun |
| 01/22/1985 | CA1181362A1 Cylindrical cathode for magnetically-enhanced sputtering |
| 01/16/1985 | EP0131433A2 Plasma processing apparatus |
| 01/16/1985 | EP0131160A2 Non plugging falling film plasma reactor |
| 01/15/1985 | US4494005 Beam scanning control device for ion implantation system |
| 01/15/1985 | US4494004 For writing patterns within a writing field |
| 01/15/1985 | US4494000 Image distortion-free, image rotation-free electron microscope |
| 01/15/1985 | US4493745 Monitoring change in emission intensity |
| 01/15/1985 | US4493555 High sensitivity focal sensor for electron beam and high resolution optical lithographic printers |
| 01/09/1985 | EP0130819A2 A method of positioning a beam to a specific portion of a semiconductor wafer |
| 01/09/1985 | EP0130691A2 Method of aligning two members utilizing marks provided thereon |
| 01/09/1985 | EP0130497A2 Alignment technique for a scanning beam |
| 01/09/1985 | EP0130379A2 Method of extending the lifetime of an electron beam filament |
| 01/08/1985 | US4492870 Angular limitation device in a charged particle beam system |
| 01/08/1985 | US4492845 Plasma arc apparatus for applying coatings by means of a consumable cathode |
| 01/08/1985 | US4492716 Method of making non-crystalline semiconductor layer |
| 01/08/1985 | US4492620 Plasma deposition method and apparatus |
| 01/08/1985 | US4492610 Lines of force of magnetic field perpendicular to lines of force of electric field |
| 01/08/1985 | CA1180678A1 Process and apparatus for converged fine line electron beam treatment of objects and the like |
| 01/03/1985 | WO1985000075A1 Wafer height correction system for focused beam system |
| 01/03/1985 | WO1985000071A1 Electron emission system |
| 01/02/1985 | EP0129942A1 Electron beam apparatus comprising a wire source |
| 01/02/1985 | EP0129681A2 Variable axis immerson lens electron beam projection system |
| 01/01/1985 | US4491606 Spacer for preventing shorting between conductive plates |
| 01/01/1985 | US4491509 Targets, dopes, diffusion |
| 01/01/1985 | US4491499 Monitoring, etching |
| 01/01/1985 | US4491496 Enclosure for the treatment, and particularly for the etching of substrates by the reactive plasma method |
| 12/27/1984 | EP0129490A1 Method and device for the production of a uniform plasma having a large volume, a high density and a low electron temperature |
| 12/27/1984 | EP0129111A1 Magnetic multipole having n poles |
| 12/27/1984 | EP0128971A1 Vibration filter |
| 12/27/1984 | EP0033345B1 High capacity etching apparatus |
| 12/27/1984 | CA1179972A Consumable cathode for electric-arc metal vaporizer |
| 12/25/1984 | US4490408 Method and device for metallizing the internal surface of a hollow object |
| 12/19/1984 | EP0128242A2 Method for polymer film patterning in a plasma etching apparatus. |
| 12/18/1984 | US4489241 Exposure method with electron beam exposure apparatus |
| 12/18/1984 | US4489041 Radiation barrier |
| 12/18/1984 | US4488956 High-power cathode system for producing multilayers |
| 12/18/1984 | CA1179637A1 Magnetron cathode sputtering apparatus |
| 12/18/1984 | CA1179535A1 Apparatus for the point-by-point scanning of an object |
| 12/12/1984 | EP0127919A2 Electron lithography mask manufacture |
| 12/11/1984 | US4488045 Metal ion source |
| 12/11/1984 | US4488043 Tomographic marking device |
| 12/11/1984 | US4487678 Dry-etching apparatus |
| 12/11/1984 | US4487675 Heating, targets, curie temperatures, demagnetization |
| 12/11/1984 | US4487162 Magnetoplasmadynamic apparatus for the separation and deposition of materials |
| 12/06/1984 | WO1984004761A1 Method and apparatus for introducing normally solid materials into substrate surfaces |
| 12/05/1984 | EP0127523A1 Electron-cyclotron resonance ion source |
| 12/05/1984 | EP0127272A2 Focusing magnetron sputtering apparatus |
| 12/05/1984 | EP0127188A1 Dry etching apparatus and method using reactive gas |
| 12/04/1984 | US4486684 Single crystal lanthanum hexaboride electron beam emitter having high brightness |
| 12/04/1984 | US4486665 Negative ion source |
| 12/04/1984 | US4486664 Arrangement and process for adjusting imaging systems |
| 12/04/1984 | US4486660 Electron beam testing device for stroboscopic measurement of high-frequency, periodic events |
| 12/04/1984 | US4486659 Emisson-electron microscope |
| 12/04/1984 | US4486289 Cathode with magnetic permeable housing |
| 12/04/1984 | US4486287 Cross-field diode sputtering target assembly |
| 11/27/1984 | US4485000 Sputtering target supporting device |
| 11/20/1984 | US4484077 Exposure system and method using an electron beam |
| 11/20/1984 | US4483883 Upstream cathode assembly |
| 11/20/1984 | US4483737 Multipole surface magnetic field |
| 11/14/1984 | EP0124829A1 Beam heating evaporation apparatus for the vapour coating of several materials |
| 11/13/1984 | US4482838 Thermionic emission cathode |
| 11/13/1984 | US4482810 Electron beam exposure system |
| 11/13/1984 | US4482796 Energy-beam welding machine |
| 11/13/1984 | US4482419 Dry etching apparatus comprising etching chambers of different etching rate distributions |
| 11/13/1984 | CA1177901A1 Apparatus for electron beam irradiation of the objects |
| 11/13/1984 | CA1177782A1 Multi-planar electrode plasma etching |
| 11/07/1984 | EP0124201A1 Dry etching apparatus using reactive ions |
| 11/07/1984 | EP0124075A1 Sputtering target supporting device |
| 11/07/1984 | EP0123693A1 Planar biaxial micropositioning stage |
| 11/06/1984 | US4481062 Plasma containment |
| 11/06/1984 | US4481042 Ion implantation method |
| 10/31/1984 | EP0123553A1 Process and apparatus for changing the energy of charged particles contained in a gaseous medium |
| 10/30/1984 | US4480220 Electron energy analyzing apparatus |
| 10/30/1984 | US4480188 Method and device to determine interplanar distances in electron diffraction images |
| 10/30/1984 | US4480010 Controlling bombardment by varying potentials |
| 10/30/1984 | US4479848 Optical image reflected from pattern onto substrate |
| 10/25/1984 | WO1984004203A1 Sample holder transporting device |
| 10/25/1984 | WO1984004202A1 Alloy containing liquid metal ion species |
| 10/23/1984 | US4479060 Apparatus for irradiation with charged particle beams |
| 10/23/1984 | US4478703 Sputtering system |
| 10/23/1984 | US4478702 Producing uniform coatings |
| 10/23/1984 | US4478701 For sputter deposition of thin films |