| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 02/11/1986 | US4569746 Magnetron sputter device using the same pole piece for coupling separate confining magnetic fields to separate targets subject to separate discharges |
| 02/11/1986 | US4569745 Sputtering apparatus |
| 02/11/1986 | US4569743 Accurate dry electrodeposition; semiconductors |
| 02/04/1986 | US4568861 Method and apparatus for controlling alignment and brightness of an electron beam |
| 02/04/1986 | US4568833 Charged-particle beam exposure device incorporating beam splitting |
| 01/29/1986 | EP0169680A1 Magnetron sputter etching system |
| 01/29/1986 | EP0169561A2 Control strategy for microlithography instrument |
| 01/29/1986 | EP0169532A2 Magnet driving method and device for same |
| 01/29/1986 | EP0169453A1 Circuit arrangement for preventing burnt-in screens of display units |
| 01/29/1986 | EP0169310A1 Alignment correction system |
| 01/28/1986 | US4567398 Liquid metal ion source |
| 01/28/1986 | US4567369 Correction of astigmatism in electron beam instruments |
| 01/28/1986 | US4567364 Method and apparatus for measuring dimension of secondary electron emission object |
| 01/28/1986 | US4566941 Reactive ion etching method |
| 01/28/1986 | US4566403 Apparatus for microwave glow discharge deposition |
| 01/22/1986 | EP0168983A1 Scanning microscope |
| 01/22/1986 | EP0168838A2 Method and apparatus for recording and reproducing electron microscope image |
| 01/22/1986 | EP0168768A1 Dry etching process and apparatus |
| 01/21/1986 | US4565601 Method and apparatus for controlling sample temperature |
| 01/21/1986 | CA1199716A1 Low voltage operation of arc discharge devices |
| 01/16/1986 | WO1986000465A1 Wire-ion-plasma electron gun employing auxiliary grid |
| 01/15/1986 | EP0168143A2 Magnetron sputtering cathode assembly and magnet assembly therefor |
| 01/15/1986 | EP0168064A1 A method for determining the optimum operative conditions of an electron gun |
| 01/15/1986 | EP0168056A2 Apparatus for ion beam work |
| 01/15/1986 | EP0167561A1 Method and apparatus for surface diagnostics. |
| 01/14/1986 | US4564764 Wafer having chips for determining the position of the wafer by means of electron beams |
| 01/14/1986 | US4564763 Process and apparatus for varying the deflection of the path of a charged particle beam |
| 01/14/1986 | US4564758 Process and device for the ionic analysis of an insulating sample |
| 01/14/1986 | US4564435 Target assembly for sputtering magnetic material |
| 01/08/1986 | EP0167360A2 Programmable ion beam patterning system |
| 01/08/1986 | EP0167255A2 High rate sputtering of exhaust oxygen sensor electrode |
| 01/08/1986 | EP0166815A1 Method and device for the spectral analysis of a signal at a measuring point |
| 01/08/1986 | EP0166814A1 Method and device for detecting and displaying a measuring point which carries a voltage of at least one certain frequency |
| 01/07/1986 | US4563610 Device for generating negative-ion beams by alkaline metal ion sputtering |
| 01/07/1986 | US4563587 Focused ion beam microfabrication column |
| 01/07/1986 | US4563367 Apparatus and method for high rate deposition and etching |
| 01/07/1986 | US4563262 Consumable cathode for electric-arc metal vaporizer |
| 01/07/1986 | US4563240 Radio frequency and microwave plasma; semiconductor intergrated circuits |
| 01/02/1986 | EP0166549A2 Method for proximity effect correction in electron beam lithography systems |
| 01/02/1986 | EP0166499A2 Precision moving mechanism |
| 01/02/1986 | EP0166399A2 Electron beam control system |
| 01/02/1986 | EP0166328A2 Method of and device for imaging an object or the diffraction diagram of an object through electron energy filtering with a transmission electron microscope |
| 01/02/1986 | EP0166308A2 Apparatus and method for narrow line width pattern fabrication |
| 01/02/1986 | EP0166119A1 Method for depositing material with nanometer dimensions |
| 01/02/1986 | EP0166004A1 Proximity effect correction method for E-beam lithography |
| 12/31/1985 | US4562352 Analyzing apparatus capable of analyzing a surface at a high resolution |
| 12/31/1985 | US4561382 Vacuum vapor deposition gun assembly |
| 12/27/1985 | EP0165772A2 Charged particle sources |
| 12/27/1985 | EP0165618A2 Glow-discharge decomposition apparatus |
| 12/27/1985 | EP0165400A1 Apparatus for plasma etching |
| 12/24/1985 | US4560907 Ion source |
| 12/24/1985 | US4560880 Apparatus for positioning a workpiece in a localized vacuum processing system |
| 12/24/1985 | US4560879 Method and apparatus for implantation of doubly-charged ions |
| 12/24/1985 | US4560878 Electron and ion beam-shaping apparatus |
| 12/24/1985 | US4560872 Method and apparatus for image formation |
| 12/24/1985 | US4560854 Electron beam welder control |
| 12/24/1985 | US4559901 Ion beam deposition apparatus |
| 12/18/1985 | EP0165140A1 Surface ionisation-type ion source, particularly for the realisation of an ionic probe |
| 12/18/1985 | EP0165055A2 Method and apparatus for exposing photoresist by using an electron beam and controlling its voltage and charge |
| 12/18/1985 | EP0164934A2 Room temperature metal vapour laser |
| 12/18/1985 | EP0164715A2 Microwave ion source |
| 12/17/1985 | US4559450 Quantitative compositional analyser for use with scanning electron microscopes |
| 12/17/1985 | US4559125 Confinement ring surrounding target and covering permeable ring |
| 12/17/1985 | US4559121 Surrounding target with confinement ring having low secondary emission ratio |
| 12/17/1985 | US4559100 Microwave plasma etching apparatus |
| 12/17/1985 | US4559099 High frequency generator located near chemical reactor;dry etching |
| 12/17/1985 | US4559096 Acceleration beam of ions using electric field, impacting selected area of outer surface of workpiece |
| 12/17/1985 | CA1198084A1 Rapid rate reactive sputtering of a group ivb metal |
| 12/11/1985 | EP0163745A1 Quadrupole particle accelerator |
| 12/10/1985 | US4558225 Target body position measuring method for charged particle beam fine pattern exposure system |
| 12/10/1985 | US4557819 System for igniting and controlling a wafer processing plasma |
| 12/10/1985 | CA1197928A1 Low voltage field emission electron gun |
| 12/05/1985 | WO1985005492A1 Apparatus for generating electron beam |
| 12/04/1985 | EP0163446A1 Apparatus for and method of controlling magnetron sputter device having separate confining magnetic fields to separate targets subject to separate discharges |
| 12/04/1985 | EP0163445A1 Magnetron sputter device having planar and concave targets |
| 12/04/1985 | EP0162842A1 Gas distribution system for sputtering cathodes |
| 12/03/1985 | US4556823 Multi-function charged particle apparatus |
| 12/03/1985 | US4556798 Focused ion beam column |
| 12/03/1985 | US4556797 Method and apparatus for detecting edge of fine pattern on specimen |
| 12/03/1985 | US4556794 Secondary ion collection and transport system for ion microprobe |
| 12/03/1985 | US4556471 Mounting assembly for source plate |
| 12/03/1985 | CA1197493A1 High pressure, non-local thermal equilibrium arc plasma generating apparatus for deposition of coating upon substrates |
| 11/27/1985 | EP0162643A1 Sputter coating source having plural target rings |
| 11/27/1985 | EP0162642A1 Magnetron sputter device using the same pole piece for coupling separate confining magnetic field to separate targets subject to separate discharges |
| 11/27/1985 | EP0162468A1 Ion microbeam implanter |
| 11/26/1985 | US4555612 Plasma jet cleaning apparatus and method |
| 11/26/1985 | US4555611 Method and apparatus for uniformly heating articles in a vacuum container |
| 11/21/1985 | EP0161723A2 Electron lithography apparatus |
| 11/21/1985 | EP0161612A1 Ion microbeam apparatus |
| 11/19/1985 | US4554564 Semiconductor device and method of manufacturing same, as well as a pick-up device and a display device having such a semiconductor device |
| 11/19/1985 | US4554458 Electron beam projection lithography |
| 11/19/1985 | US4554457 Magnetic lens to rotate transverse particle momenta |
| 11/19/1985 | US4554455 Potential analyzer |
| 11/19/1985 | US4554452 Method and apparatus for handling charged particle beam |
| 11/19/1985 | US4554047 Downstream apparatus and technique |
| 11/13/1985 | EP0161088A1 Apparatus for plasma-assisted deposition of thin films |
| 11/12/1985 | US4553069 Wafer holding apparatus for ion implantation |
| 11/12/1985 | US4553030 Method for automatic analysis of electron beam diffraction pattern |
| 11/12/1985 | US4552639 Magnetron sputter etching system |
| 11/12/1985 | CA1196604A1 Substrate shield for preventing the deposition of nonhomogeneous films |