| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 05/05/1981 | US4265730 Surface treating apparatus utilizing plasma generated by microwave discharge |
| 05/05/1981 | US4265729 Magnetically enhanced sputtering device |
| 05/05/1981 | CA1100564A1 Quick-acting electron-optical lenses |
| 04/30/1981 | WO1981001228A1 Device for scanning charged particle beam |
| 04/30/1981 | WO1981001220A1 Sextupole system for the correction of spherical aberration |
| 04/29/1981 | EP0027628A1 Method for the uniform illumination of planes by means of radiation |
| 04/29/1981 | EP0027578A1 Apparatus for radio frequency plasma etching provided with an improved electrode and method of etching using such an apparatus |
| 04/29/1981 | EP0027517A1 Scanning apparatus for surface analysis using vacuum-tunnel effect at cryogenic temperatures |
| 04/29/1981 | EP0027497A2 Projection system for corpuscular beams |
| 04/28/1981 | US4264822 Electron beam testing method and apparatus of mask |
| 04/28/1981 | US4264813 High intensity ion source using ionic conductors |
| 04/28/1981 | US4264711 Method of compensating for proximity effects in electron-beam lithography |
| 04/28/1981 | US4264393 Reactor apparatus for plasma etching or deposition |
| 04/28/1981 | CA1100237A1 Multiple electron beam exposure system |
| 04/22/1981 | EP0027142A1 Treating multilayer printed wiring boards. |
| 04/21/1981 | US4263514 Electron beam system |
| 04/21/1981 | US4263089 Plasma development process controller |
| 04/21/1981 | US4263088 Method for process control of a plasma reaction |
| 04/21/1981 | CA1099824A1 Scanning electron microscope with eddy-current compensation |
| 04/14/1981 | US4262194 High resolution electron microscope cold stage |
| 04/14/1981 | US4262160 Evaporator feed |
| 04/14/1981 | US4261762 Method for conducting heat to or from an article being treated under vacuum |
| 04/08/1981 | EP0026427A1 Electron gun |
| 04/08/1981 | EP0026337A2 Method of etching workpieces in a vacuum chamber |
| 04/07/1981 | US4260897 Method of and device for implanting ions in a target |
| 04/07/1981 | US4260893 Device for directing electrically charged particles towards a target |
| 04/02/1981 | WO1981000930A1 Ion beam lithography process and apparatus using step-and-repeat exposure |
| 04/02/1981 | WO1981000929A1 Electron beam apparatus and electron beam source therefor |
| 03/31/1981 | US4259724 Device comprising a circuit for making a beam exposure system effectively draw a repetitive pattern |
| 03/31/1981 | US4259678 Semiconductor device and method of manufacturing same, as well as a pick-up device and a display device having such a semiconductor device |
| 03/31/1981 | US4259145 Ion source for reactive ion etching |
| 03/25/1981 | EP0025670A1 Method and apparatus for conducting heat to or from an article being treated under vacuum |
| 03/25/1981 | EP0025579A1 Process and device for fast deflection of a corpuscular beam |
| 03/25/1981 | EP0025578A1 Process and device to control a magnetic deflection system |
| 03/24/1981 | US4258266 Ion implantation system |
| 03/24/1981 | US4258265 Electron beam exposing apparatus |
| 03/19/1981 | WO1981000784A1 Electron beam system |
| 03/18/1981 | EP0025247A1 Anti-contamination diaphragm for an electron beam apparatus |
| 03/11/1981 | EP0024884A2 Method of detecting the position of a substrate using an electron beam |
| 03/10/1981 | US4255661 Electrostatic emission lens |
| 03/03/1981 | US4254340 High current ion implanter |
| 02/24/1981 | US4252595 Etching apparatus using a plasma |
| 02/19/1981 | WO1981000420A1 High capacity etching apparatus |
| 02/17/1981 | US4251728 Compensated magnetic deflection coil for electron beam lithography system |
| 02/11/1981 | EP0023810A1 Method of electron beam exposure |
| 02/10/1981 | US4250127 Production of electron microscope grids and other micro-components |
| 02/10/1981 | CA1095637A1 Multiple crystal holder assembly for wavelength dispersive x-ray spectrometers |
| 02/04/1981 | EP0023261A1 Compensated magnetic deflection coil for electron beam lithography systems |
| 02/03/1981 | US4249077 Ion charge neutralization for electron beam devices |
| 01/27/1981 | US4247781 Cooled target disc for high current ion implantation method and apparatus |
| 01/27/1981 | US4247383 Cathodic system with target, for vacuum sputtering apparatus for the application of dielectric or nonmagnetic coatings to substrates |
| 01/27/1981 | CA1094668A1 Electron beam exposure system method and apparatus |
| 01/20/1981 | US4246487 Method and device for determining the focal length of a long focal length electron optical lens |
| 01/20/1981 | US4246479 Electrostatic energy analysis |
| 01/20/1981 | US4246060 Plasma development process controller |
| 01/14/1981 | EP0022356A1 Scanning electron microscope and detection configuration therefor |
| 01/14/1981 | EP0022329A1 Electron beam exposure method |
| 01/13/1981 | US4245159 Quick-acting electron-optical lenses |
| 01/13/1981 | US4245154 Apparatus for treatment with gas plasma |
| 01/13/1981 | CA1093710A1 High speed switching circuit |
| 01/13/1981 | CA1093435A1 Metallurgical treatment using a glow discharge |
| 01/07/1981 | EP0021655A1 Electron beam irradiation apparatus |
| 01/07/1981 | EP0021204A1 Ion generator |
| 01/07/1981 | EP0021140A1 Ion source in a vacuum chamber and method for its operation |
| 01/07/1981 | EP0020899A1 Ion generator |
| 01/07/1981 | EP0020873A1 Target disc for ion implantation into semiconductors and method for cooling such a disc |
| 01/07/1981 | EP0020746A1 Process and apparatus for cleaning wall deposits from a film deposition furnace tube. |
| 01/06/1981 | US4243866 Method and apparatus for forming a variable size electron beam |
| 01/06/1981 | US4243506 Plasma-etching apparatus |
| 01/06/1981 | US4243505 Magnetic field generator for use in sputtering apparatus |
| 01/06/1981 | CA1092954A1 Heating workpieces by high current intensity glow discharge |
| 12/30/1980 | USRE30466 Method and device for generating a magnetic field of a potential with electric current components distributed according to a derivative of the potential |
| 12/30/1980 | US4242586 Specimen holder for electron microscopy and electron diffraction |
| 12/23/1980 | US4241259 Scanning electron microscope |
| 12/16/1980 | US4240007 Microchannel ion gun |
| 12/16/1980 | US4239611 Magnetron sputtering devices |
| 12/16/1980 | CA1091707A1 Imbricated signature conveyance reverser and interruptor |
| 12/11/1980 | WO1980002772A1 Electron beam projecting system |
| 12/11/1980 | WO1980002771A1 Electron-optical system |
| 12/09/1980 | US4238680 Method and device for setting and correcting errors of an electron optical condenser of a microprojector |
| 12/09/1980 | US4238525 Bombardment |
| 12/09/1980 | CA1091363A1 Radiation heated acceleration |
| 12/02/1980 | CA1090557A1 Ingot gripper assembly |
| 11/26/1980 | EP0019426A1 A structure for vibration isolation in an apparatus with a vacuum system |
| 11/26/1980 | EP0019370A1 Plasma reactor apparatus and process for the plasma etching of a workpiece in such a reactor apparatus |
| 11/25/1980 | US4236178 Electron microscope with brightness/contrast indicator |
| 11/25/1980 | US4236151 Dynamically variable scaling method and apparatus for spectral displays |
| 11/25/1980 | US4236097 Ion source having fluid-cooled supply conductors |
| 11/25/1980 | US4236073 Scanning ion microscope |
| 11/25/1980 | US4236058 Regulation of electron-beam welding generators |
| 11/25/1980 | CA1090485A1 Supported plasma sputtering apparatus for high deposition rate over large area |
| 11/18/1980 | US4234797 Treating workpieces with beams |
| 11/11/1980 | US4233515 Instrument for determining the radiation parameters of a focused charged-particle beam and method |
| 11/11/1980 | US4233510 Scanning electron microscope |
| 11/11/1980 | US4233509 Ion-electron analyzer |
| 11/11/1980 | US4233109 Radio frequency and static electric field superimposed on low pressure gas to generate plasma |
| 11/04/1980 | CA1089113A1 Ion implantation apparatus for controlling the surface potential of a target surface |
| 10/30/1980 | WO1980002353A1 Treating multilayer printed wiring boards |
| 10/29/1980 | EP0018031A2 Detector for an electron microscope |
| 10/28/1980 | US4230553 Lamination, metals, dielectrics |