Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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11/19/1986 | CN86201415U 平行场空心阴极电子枪 Field parallel hollow cathode electron gun |
11/19/1986 | CN85103601A New structure for contact between metal and nonmetal in glow discharge cathode transmission |
11/18/1986 | US4623836 Sampling method for fast potential determination in electron beam mensuration |
11/18/1986 | US4623794 Particle beam blanking system |
11/18/1986 | US4623783 Method of displaying diffraction pattern by electron microscope |
11/18/1986 | US4623441 Paired electrodes for plasma chambers |
11/18/1986 | US4623417 Magnetron plasma reactor |
11/18/1986 | CA1214253A1 Upstream cathode assembly |
11/12/1986 | EP0200952A2 Monitoring technique for plasma etching |
11/12/1986 | EP0200893A1 Method for accentuating a portion of an object on a specimen surface scanned with the primary beam of a scanning microscope, and arrangements for carrying it out |
11/12/1986 | EP0118465B1 Low voltage operation of arc discharge devices |
11/12/1986 | CA1213852A Method of and apparatus for the coating of a substrate with material electrically transformed into a vapor phase |
11/11/1986 | US4622453 Electron beam gun mounting on a work chamber |
11/11/1986 | US4622122 Sputering |
11/11/1986 | US4622121 Apparatus for coating materials by cathode sputtering |
11/11/1986 | US4622094 Method of controlling dry etching by applying an AC voltage to the workpiece |
11/06/1986 | WO1986006416A1 Method and target for sputter depositing thin films |
11/05/1986 | EP0200651A1 Triode-type ion source with a single high frequency ionization chamber and with multiple magnetic confinement |
11/05/1986 | EP0200333A2 Ion beam processing method and apparatus |
11/05/1986 | EP0200133A2 Plasma etching reactor |
11/05/1986 | EP0200083A2 Apparatus for low-energy scanning electron beam lithography |
11/05/1986 | EP0200035A2 Electron beam source |
11/04/1986 | US4621371 Method of forming by projection an integrated circuit pattern on a semiconductor wafer |
11/04/1986 | US4620913 Electric arc vapor deposition method and apparatus |
11/04/1986 | US4620898 Ion beam sputter etching |
11/04/1986 | US4620893 Apparatus for the plasma treatment of disk-shaped substrates |
10/29/1986 | EP0199585A2 Apparatus for depositing electrically conductive and/or electrically insulating material on a workpiece |
10/29/1986 | EP0199575A2 A vacuum system for a charged particle beam recording system |
10/29/1986 | EP0199573A2 Electronic mosaic imaging process |
10/29/1986 | EP0199167A2 Compound flow plasma reactor |
10/29/1986 | EP0198908A1 Focused substrate alteration |
10/29/1986 | EP0198907A1 Focused substrate alteration |
10/28/1986 | US4620103 Sample holder for mass analysis |
10/28/1986 | US4620102 Electron-impact type of ion source with double grid anode |
10/28/1986 | US4620081 Self-contained hot-hollow cathode gun source assembly |
10/28/1986 | US4619755 Sputtering system for cathode sputtering apparatus |
10/28/1986 | US4619030 Temperature control |
10/23/1986 | WO1986006210A1 Manufacture of liquid metal ion source |
10/22/1986 | EP0198604A1 Glow discharge deposition apparatus having confined plasma region |
10/22/1986 | EP0198459A2 Thin film forming method through sputtering and sputtering device |
10/22/1986 | EP0197936A1 Sputter deposition |
10/21/1986 | US4618767 Low-energy scanning transmission electron microscope |
10/21/1986 | US4618766 Automatically adjustable electron microscope |
10/21/1986 | US4618477 Uniform plasma for drill smear removal reactor |
10/15/1986 | EP0197770A2 Planar penning magnetron sputtering device |
10/15/1986 | EP0197668A2 External plasma gun |
10/15/1986 | EP0197579A1 Electron beam apparatus comprising an integrated anode/beam blanking unit |
10/15/1986 | EP0197362A1 Method making use of a scanning microscope to determine the points on a sample conducting a signal of a predetermined frequency |
10/14/1986 | US4617203 Corrosion resistant wetting |
10/14/1986 | US4617079 Improved low frequency etching, uniformity |
10/14/1986 | US4616597 Apparatus for making a plasma coating |
10/14/1986 | CA1212783A1 Suppression of molecular ions in secondary ion mass spectra |
10/08/1986 | EP0196958A2 Electron beam test probe for integrated-circuit testing |
10/08/1986 | EP0196710A1 Electron beam apparatus comprising an anode which is included in the cathode/Wehnelt cylinder unit |
10/08/1986 | EP0196534A1 Method and device making use of it to determine the signal frequencies at at least one point of a sample with the use of a scanning microscope |
10/08/1986 | EP0196531A1 Method for indirectly determining the intensity distribution of pulsed particle beams produced in a particle beam measuring instrument |
10/07/1986 | US4616363 Electron-beam furnace with magnetic stabilization |
10/07/1986 | US4615905 Method of depositing semiconductor films by free radical generation |
10/07/1986 | US4615761 Method of and apparatus for detecting an end point of plasma treatment |
10/07/1986 | US4615756 Dry etching apparatus |
10/07/1986 | US4615755 Wafer cooling and temperature control for a plasma etching system |
10/07/1986 | US4615299 Plasma CVD apparatus for making photoreceptor drum |
10/07/1986 | US4615298 Method of making non-crystalline semiconductor layer |
10/07/1986 | CA1212486A1 Method and apparatus for introducing normally solid materials into substrate surfaces |
10/07/1986 | CA1212356A1 Process gas introduction, confinement and evacuation system for glow discharge deposition apparatus |
10/01/1986 | EP0196252A1 Transport box |
10/01/1986 | EP0053620B1 Method and apparatus for material analysis |
09/30/1986 | US4614872 Charged particle deflection |
09/30/1986 | US4614639 Electrode containing bore and sidewall each supply gas with radial flow |
09/30/1986 | CA1212169A1 Apparatus for the manufacture of photovoltaic devices |
09/24/1986 | EP0195349A2 Low-energy scanning transmission electron microscope |
09/24/1986 | EP0195052A1 A method of stabilising a plasma column produced by a multi-cathode generator |
09/23/1986 | US4613981 Method and apparatus for lithographic rotate and repeat processing |
09/23/1986 | CA1211867A1 Method and apparatus for fabricating devices with dc bias-controlled reactive ion etching |
09/17/1986 | EP0194570A2 Scanning corpuscular microscope with reduced Boersch effect |
09/17/1986 | EP0194323A1 Scanning tunneling microscope |
09/16/1986 | US4612432 Etching plasma generator diffusor and cap |
09/16/1986 | US4612077 Electrode for plasma etching system |
09/09/1986 | US4611330 Electron beam vaporizer |
09/09/1986 | US4611121 Magnet apparatus |
09/09/1986 | US4611120 Suppression of molecular ions in secondary ion mass spectra |
09/09/1986 | US4611119 Method of emphasizing a subject area in a scanning microscope |
09/09/1986 | US4610948 Lithography and photoprinting, positive resists |
09/09/1986 | US4610775 Method and apparatus for clearing short-circuited, high-voltage cathodes in a sputtering chamber |
09/09/1986 | US4610774 Target for sputtering |
09/09/1986 | US4610770 Microwaves, magnetism, plasma generation |
09/02/1986 | US4609809 Method and apparatus for correcting delicate wiring of IC device |
09/02/1986 | US4609564 High speed vapor deposition from electrode |
09/02/1986 | US4609428 Method and apparatus for microwave plasma anisotropic dry etching |
09/02/1986 | US4609426 Spectral emittance of gas plasma |
09/02/1986 | US4608943 Cathode assembly with localized profiling capabilities |
09/02/1986 | CA1210824A1 Apparatus and method for evaporation arc stabilization |
08/27/1986 | EP0192478A2 Lamina recording apparatus |
08/27/1986 | EP0192294A1 Electron beam apparatus comprising a semiconductor electron emitter |
08/26/1986 | US4608493 Controlling the generation and focus of an electron beam |
08/26/1986 | US4608491 Electron beam instrument |
08/26/1986 | US4608332 Electron lithography mask manufacture |
08/26/1986 | US4607593 Apparatus for processing articles in a controlled environment |
08/20/1986 | EP0191440A1 Lithography apparatus for producing microstructures |
08/20/1986 | EP0191439A1 Linearly structured multiple aperture and beam blanking electrodes for the production of a multiplicity of individually blankable corpuscular beam probes in a lithography apparatus |