| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 01/27/1987 | US4639602 System for deflecting a beam of charged particles |
| 01/27/1987 | US4639597 Auger electron spectrometer capable of attaining a high resolution |
| 01/27/1987 | US4639301 Focused ion beam processing |
| 01/21/1987 | EP0209469A1 Method and apparatus for microwave excitation of a plasma at the electron cyclotron resonance |
| 01/21/1987 | EP0209432A1 Electron beam tester for integrated circuits |
| 01/21/1987 | EP0209236A1 Electron beam testing of integrated circuits |
| 01/21/1987 | EP0209109A2 Method of and apparatus for forming film by utilizing low-temperature plasma |
| 01/21/1987 | EP0208851A1 Fabricating a semiconductor device by means of molecular beam epitaxy |
| 01/20/1987 | US4638217 Fused metal ion source with sintered metal head |
| 01/20/1987 | US4638216 Electron cyclotron resonance ion source |
| 01/20/1987 | US4638209 Ion beam generating apparatus |
| 01/20/1987 | US4638142 Machine for electron-beam internal butt welding of tubes |
| 01/20/1987 | US4637853 Hollow cathode enhanced plasma for high rate reactive ion etching and deposition |
| 01/20/1987 | US4637342 Vacuum processing apparatus |
| 01/14/1987 | EP0208308A2 A method for forming patterns by using a high-current-density electron beam |
| 01/14/1987 | EP0208100A2 Reverse field electrostatic spectrometer for electron beam measuring techniques |
| 01/13/1987 | US4636968 Method of positioning a beam to a specific portion of a semiconductor wafer |
| 01/08/1987 | DE3614398A1 Arrangement for the treatment of workpieces using an evacuatable chamber |
| 01/07/1987 | EP0207801A2 Cathode/ground shield arrangement in a target for a sputter coating apparatus |
| 01/07/1987 | EP0207772A2 Electron source of lanthanum hexaboride and method of constructing same |
| 01/07/1987 | EP0207767A2 Pulsed plasma apparatus and process |
| 01/07/1987 | CN86104429A Improved cathode/ground shield arrangement in a sputter coating apparatus target |
| 01/07/1987 | CN85104968A Glow discharge decomposing device |
| 01/06/1987 | US4634931 Ion implanter |
| 01/06/1987 | US4634874 Electron lithography apparatus |
| 01/06/1987 | US4634871 Method and apparatus for spot shaping and blanking a focused beam |
| 01/06/1987 | US4634331 Wafer transfer system |
| 01/06/1987 | US4633812 Alumina ceramic |
| 01/06/1987 | US4633809 Causing glow discharge in gaseous silicon compound |
| 01/02/1987 | DE3613801A1 Arrangement for cooling surfaces |
| 12/31/1986 | CN86201075U High-energy and broad beam divergent field koufmen ion gun for surface modification |
| 12/31/1986 | CN85104863A Analysing method and device for element state |
| 12/30/1986 | US4633208 Magnetic multi-pole arrangement of the nth order |
| 12/30/1986 | US4633138 Ion implanter |
| 12/30/1986 | US4633129 Hollow cathode |
| 12/30/1986 | US4633090 Method and apparatus for particle irradiation of a target |
| 12/30/1986 | US4633085 Transmission-type electron microscope |
| 12/30/1986 | US4633084 High efficiency direct detection of ions from resonance ionization of sputtered atoms |
| 12/30/1986 | US4632719 Two concentric ring of magnets |
| 12/30/1986 | US4632624 Vacuum load lock apparatus |
| 12/30/1986 | US4632059 Evaporator device for the evaporation of several materials |
| 12/30/1986 | EP0206016A2 Apparatus and method for displaying hole-electron pair distributions induced by electron bombardment |
| 12/30/1986 | EP0205917A2 Sputtering apparatus |
| 12/30/1986 | EP0205874A2 Sputter device |
| 12/30/1986 | EP0205476A1 Triode plasma reactor with magnetic enhancement |
| 12/23/1986 | US4631581 Method and apparatus for microphotometering microscope specimens |
| 12/23/1986 | US4631448 Ion source |
| 12/23/1986 | US4631438 Multicharged ion source with several electron cyclotron resonance zones |
| 12/23/1986 | US4631106 Reducing space required for movement of means to establish magnetic filed |
| 12/23/1986 | US4631105 Plasma etching apparatus |
| 12/23/1986 | US4630568 Apparatus for coating substrates by plasma polymerization |
| 12/23/1986 | US4630566 Microwave or UHF plasma improved apparatus |
| 12/23/1986 | CA1215678A1 Planar magnetron sputtering device |
| 12/18/1986 | WO1986007391A1 An apparatus for coating substrates by plasma discharge |
| 12/17/1986 | EP0205185A2 Objective with spectrometer in the electron beam measuring technique |
| 12/17/1986 | EP0205184A2 Low aberration spectrometer objective with a high secondary electrons acceptance |
| 12/17/1986 | EP0205092A2 Method and apparatus for analyzing positron extinction and electron microscope having said apparatus |
| 12/17/1986 | EP0205028A1 Apparatus for depositing thin layers on a substrate |
| 12/17/1986 | EP0204855A1 Method and apparatus for state analysis |
| 12/16/1986 | US4629931 Liquid metal ion source |
| 12/16/1986 | US4629899 Deflection lens system for generating a beam of neutral particles of variable cross section |
| 12/16/1986 | US4629898 Electron and ion beam apparatus and passivation milling |
| 12/16/1986 | US4629889 Potential analyzer |
| 12/16/1986 | US4629548 Vacuum coating with magnetic materials |
| 12/16/1986 | CA1215481A1 Electron lithography mask manufacture |
| 12/10/1986 | EP0204297A2 Charged particle emission source structure |
| 12/10/1986 | EP0204169A1 Support material for electron beam devices |
| 12/09/1986 | US4628226 Method and arrangement for preventing cathode damage when switching on field emission electron guns |
| 12/09/1986 | US4628209 Particle implantation apparatus and method |
| 12/09/1986 | US4627989 Method and system for a vacuum evaporative deposition process |
| 12/09/1986 | US4627904 Magnetron sputter device having separate confining magnetic fields to separate targets and magnetically enhanced R.F. bias |
| 12/04/1986 | WO1986007189A1 Apparatus for scanning a high current ion beam with a constant angle of incidence |
| 12/04/1986 | WO1986007188A1 A device for providing an energy filtered charged particle image |
| 12/03/1986 | EP0203754A2 Coating apparatus |
| 12/03/1986 | EP0203573A2 Electron beam-excited ion beam source |
| 12/03/1986 | EP0203560A1 Plasma trench etch |
| 12/02/1986 | US4627009 Microscope stage assembly and control system |
| 12/02/1986 | US4626690 Apparatus for chopping a charged particle beam |
| 12/02/1986 | US4626689 Electron beam focusing system for electron microscope |
| 12/02/1986 | US4626447 Plasma confining apparatus |
| 12/02/1986 | US4626336 Two part magnetic layer having a radial coercivity gradient on substrate |
| 12/02/1986 | US4626312 Splitting the voltage; insulated chuck and counter electrodes |
| 12/02/1986 | US4625678 Apparatus for plasma chemical vapor deposition |
| 12/02/1986 | CA1214751A1 Baffle system for glow discharge deposition apparatus |
| 11/26/1986 | EP0202937A2 Surface analysis spectroscopy apparatus |
| 11/26/1986 | EP0202685A2 Liquid metal ion source |
| 11/26/1986 | EP0202540A1 Electron beam mask |
| 11/25/1986 | US4625121 Method of electron beam exposure |
| 11/25/1986 | US4624833 Liquid metal ion source and apparatus |
| 11/25/1986 | US4624767 Sputter etching apparatus having a second electrically floating electrode and magnet means |
| 11/25/1986 | US4624738 Continuous gas plasma etching apparatus and method |
| 11/25/1986 | US4624214 Dry-processing apparatus |
| 11/25/1986 | CA1214577A1 Focused ion beam column |
| 11/25/1986 | CA1214489A1 Device for picking up or displaying images and semiconductor device for use in such a device |
| 11/20/1986 | WO1986006923A1 Method and apparatus for producing large volume magnetoplasmas |
| 11/20/1986 | WO1986006875A1 Ion implant using alkali or alkaline earth metal tetrafluoroborate as boron ion source |
| 11/20/1986 | WO1986006874A1 Ion beam implant system |
| 11/20/1986 | EP0201858A2 Electron beam substrate height sensor |
| 11/20/1986 | EP0201721A1 Method of manufacturing a semiconductor device using ion implantation |
| 11/20/1986 | EP0201692A1 Method and device making use of it for the processing of a measured voltage with a band-limited processing circuit |