| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 04/22/1987 | EP0218920A2 Omega-type electron energy filter |
| 04/22/1987 | EP0218829A2 Arrangement for the detection of secondary and/or back-scattering electrons in an electron beam apparatus |
| 04/22/1987 | EP0113983B1 Fabricating a semiconductor device by means of molecular beam epitaxy |
| 04/22/1987 | EP0069750B1 Emission-electron microscope |
| 04/22/1987 | CN86105616A Method and apparatus for clearing short-circuited, high-voltage cathodes in a sputtering chamber |
| 04/21/1987 | US4659449 Apparatus for carrying out dry etching |
| 04/21/1987 | US4659413 Automated single slice cassette load lock plasma reactor |
| 04/21/1987 | CA1220879A1 Method and apparatus for surface diagnostics |
| 04/15/1987 | EP0218105A2 Mounting arrangement for a spiral-shaped wire cathode |
| 04/15/1987 | CN85107255A Controlling form of the electron-beam unit |
| 04/14/1987 | US4658143 Ion source |
| 04/14/1987 | US4658138 Scanning electron microscope |
| 04/14/1987 | US4658137 Electron detector |
| 04/14/1987 | US4658136 Secondary electron detecting apparatus |
| 04/14/1987 | US4657654 Targets for magnetron sputter device having separate confining magnetic fields to separate targets subject to separate discharges |
| 04/14/1987 | US4657620 Automated single slice powered load lock plasma reactor |
| 04/14/1987 | US4657619 Semiconductor production |
| 04/14/1987 | US4657618 Powered load lock electrode/substrate assembly including robot arm, optimized for plasma process uniformity and rate |
| 04/14/1987 | US4657617 Anodized aluminum substrate for plasma etch reactor |
| 04/08/1987 | EP0217616A2 Substrate processing apparatus |
| 04/08/1987 | EP0217361A2 Ion source |
| 04/08/1987 | EP0217210A2 Electron beam gun with directly and indirectly heated cathodes |
| 04/08/1987 | EP0216919A1 Method and target for sputter depositing thin films. |
| 04/02/1987 | DE3532888A1 Arrangement for controlling the deflection of an electron beam |
| 04/01/1987 | EP0216750A1 Ion beam apparatus and process for realizing modifications, especially corrections, on substrates, using an ion beam apparatus |
| 04/01/1987 | EP0216603A2 Microwave apparatus for generating plasma afterglows |
| 03/31/1987 | US4654506 Method and apparatus for detecting and regulating position of welding electron beam |
| 03/31/1987 | US4654106 Semiconductors; processing one slice at a time |
| 03/31/1987 | CA1219975A1 Plasma etching reactor with reduced plasma potential |
| 03/26/1987 | WO1987001865A1 Ion beam apparatus and method of modifying substrates |
| 03/26/1987 | WO1987001738A1 Method and device for chemical treatment, particularly thermochemical treatment and chemical deposition in a large volume homogeneous plasma |
| 03/25/1987 | EP0215679A2 Semiconductor etching apparatus with magnetic array and vertical shield |
| 03/25/1987 | EP0215626A2 Systems and methods for ion source control in ion implanters |
| 03/25/1987 | EP0215618A2 Ion sources |
| 03/25/1987 | EP0215532A2 An electron emissive mask for an electron beam image projector, its manufacture, and the manufacture of a solid state device using such a mask |
| 03/24/1987 | US4652795 External plasma gun |
| 03/24/1987 | US4652762 Electron lithography mask manufacture |
| 03/24/1987 | US4652753 Mass spectrometer capable of analyzing an insulator |
| 03/24/1987 | US4652358 Sputtering cathode |
| 03/17/1987 | US4651220 Method of recording and reproducing images produced by an electron microscope |
| 03/17/1987 | US4651171 Vacuum system for a charged particle beam recording system |
| 03/17/1987 | US4651052 Device for picking up or displaying images having an externally-mounted semiconductor cathode |
| 03/17/1987 | US4651003 For use in a beam generating system |
| 03/17/1987 | CA1219240A1 Method of making amorphous semiconductor alloys and devices using microwave energy |
| 03/12/1987 | WO1987001452A1 Mass spectroscope |
| 03/12/1987 | DE3629054A1 Apparatus for plasma etching of printed circuit boards or the like |
| 03/11/1987 | EP0213922A2 Planar magnetron sputtering device with combined circumferential and radial movement of magnetic fields |
| 03/11/1987 | EP0213920A2 Method of drawing a pattern on wafer with charged beam |
| 03/11/1987 | EP0213871A1 Strobo electron beam apparatus |
| 03/11/1987 | EP0213839A2 Flat electron control device utilizing a uniform space-charge cloud of free electrons as a virtual cathode |
| 03/11/1987 | EP0213716A2 Method and apparatus for removing short-circuiting deposits from high-voltage cathodes in a sputtering chamber |
| 03/11/1987 | EP0213664A1 Beam of charged particles divided up into thin component beams |
| 03/11/1987 | EP0213438A2 Method and arrangement for operating a scanning microscope |
| 03/11/1987 | EP0079931B1 Focused ion beam microfabrication column |
| 03/11/1987 | CN86105020A Arc ignition device |
| 03/10/1987 | US4649316 Ion beam species filter and blanker |
| 03/10/1987 | US4648952 Nitriding |
| 03/10/1987 | US4648348 Plasma CVD apparatus |
| 03/04/1987 | EP0212924A2 Plasma processing apparatus |
| 03/03/1987 | US4647818 Nonthermionic hollow anode gas discharge electron beam source |
| 03/03/1987 | US4647782 Charged particle beam exposure apparatus |
| 03/03/1987 | CA1218709A1 Electron beam welder control |
| 03/02/1987 | EP0198908A4 Focused substrate alteration. |
| 02/26/1987 | DE3530087A1 Appliance for high-capacity cathode sputtering |
| 02/26/1987 | DE3530074A1 Appliance for producing a plurality of successive layers by high-capacity cathode sputtering |
| 02/25/1987 | EP0211413A2 Arc ignition device |
| 02/25/1987 | EP0211412A2 Planar magnetron sputtering apparatus and its magnetic source |
| 02/25/1987 | EP0211403A1 Electron-beam welding apparatus |
| 02/25/1987 | EP0211057A1 Sputtering installation for reactive coating of a substrate with hard materials. |
| 02/25/1987 | EP0211002A1 Method and apparatus for spot shaping and blanking a focused beam. |
| 02/24/1987 | US4645981 Process and apparatus for the surface treatment of workpieces by glow discharge |
| 02/24/1987 | US4645977 Vapor deposition using vacuum enclosure, accelerating means, and second vacuum chamber where accelerated plasma forms uniform film; |
| 02/24/1987 | US4645929 Method and apparatus for the compensation of charges in secondary ion mass spectrometry (SIMS) of specimens exhibiting poor electrical conductivity |
| 02/24/1987 | US4645895 Method and apparatus for surface-treating workpieces |
| 02/24/1987 | CA1218473A1 Process and apparatus for changing the energy of charged particles contained in a gaseous medium |
| 02/18/1987 | CN86105201A Flat electron control device utilizing uniform space-charge cloud of free electrons as virtual cathode |
| 02/17/1987 | US4644170 Method of electron beam exposure |
| 02/12/1987 | EP0174977A4 Controlled vacuum arc material deposition, method and apparatus. |
| 02/12/1987 | DE3620908A1 Target plate for cathode sputtering |
| 02/10/1987 | US4642522 Wire-ion-plasma electron gun employing auxiliary grid |
| 02/10/1987 | US4642518 Installation of electron beam metalworking |
| 02/10/1987 | US4642468 Position detecting method for detecting the relative positions of the first and second members |
| 02/10/1987 | US4642467 Electron beam irradiation apparatus |
| 02/10/1987 | US4642461 Field emission type electron microscope using a multi-stage acceleration tube |
| 02/10/1987 | US4642438 Workpiece mounting and clamping system having submicron positioning repeatability |
| 02/10/1987 | US4642243 Electrode ionization |
| 02/04/1987 | EP0210858A2 Reactive ion etching deposition apparatus and method of using it |
| 02/04/1987 | EP0210631A2 Method and apparatus for charged particle beam exposure |
| 02/04/1987 | EP0210605A2 Plasma processing method and apparatus |
| 02/04/1987 | EP0210473A2 Sputtering cathode according to the magnetron principle |
| 02/03/1987 | US4641313 Room temperature metal vapour laser |
| 02/03/1987 | US4641034 Ion implantation apparatus and method for maskless processing |
| 02/03/1987 | US4641002 Titanium and zirconium nitride |
| 02/03/1987 | US4640845 Semiconductor photoelectric conversion devices; solar cells |
| 02/03/1987 | US4640756 Method of making a piezoelectric shear wave resonator |
| 02/03/1987 | CA1217532A1 Ion beam machining device |
| 01/31/1987 | CN85101374A Glow-discharge tube for analysis |
| 01/29/1987 | WO1987000682A1 Improvements in atom probes |
| 01/28/1987 | EP0209969A2 Ion-implanting method and apparatus with improved ion-dose accuracy |
| 01/28/1987 | EP0086816B1 Plasma etching apparatus and method including end point detection |