Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
10/1987
10/22/1987WO1987006389A1 Semiconductor dopant vaporizer
10/22/1987DE3613181A1 Process for producing trenches with adjustable steepness of the trench walls in semiconductor substrates consisting of silicon
10/22/1987DE3612721A1 Apparatus for coating panes of glass using reactive cathode sputtering
10/20/1987US4701623 Charged particle beam apparatus
10/20/1987US4701620 Electron beam exposure apparatus
10/20/1987US4701344 Film forming process
10/20/1987US4701343 Method of depositing thin films using microwave energy
10/20/1987US4701251 Apparatus for sputter coating discs
10/14/1987EP0241447A1 Sputtering cathode
10/14/1987EP0241060A1 Apparatus for energy-selective visualisation
10/13/1987US4700315 Method and apparatus for controlling the glow discharge process
10/13/1987US4700077 Ion beam implanter control system
10/13/1987US4700075 Detector for back-scattered electrons
10/13/1987US4700071 Method of recording and reproducing an electron microscope image
10/13/1987US4699689 Removing charged particles from plasma, exposing photoresist to effluent and uv rad
10/13/1987US4699555 Module positioning apparatus
10/08/1987WO1987006053A1 Plasma-anode electron gun
10/08/1987WO1987005948A1 Arc coating of refractory metal compounds
10/07/1987EP0240369A1 Improved cathode and target design for a sputter coating apparatus
10/07/1987EP0240173A2 Method and apparatus for producing neutral atomic and molecular beams
10/07/1987CN86210073U Plasma imaging device
10/06/1987US4698814 Arrangement for checking the parity of parity-bits containing bit groups
10/06/1987US4698509 For controlling charged particle beam irridation of a workpiece
10/06/1987US4698503 Focusing apparatus used in a transmission electron microscope
10/06/1987US4698502 Field-emission scanning auger electron microscope
10/06/1987US4698236 Augmented carbonaceous substrate alteration
09/1987
09/30/1987EP0239085A2 Device for micro-movement of objects
09/29/1987US4697194 Lamina recording apparatus
09/29/1987US4697086 Apparatus for implanting ion microbeam
09/23/1987EP0238397A1 Electronic cyclotron resonance ion source with coaxial injection of electromagnetic waves
09/22/1987US4695773 Field emission gun electrode geometry for improved focus stability
09/22/1987US4695732 Electron lithography apparatus
09/22/1987US4695725 Method of detecting a focus defect of an electron microscope image
09/22/1987US4695700 Dual detector system for determining endpoint of plasma etch process
09/22/1987CA1227288A1 Process for preparing semiconductor layer
09/16/1987EP0237406A2 Electron beam testing of semiconductor wafers
09/16/1987EP0237220A2 Method and apparatus for forming a film
09/16/1987EP0237165A2 Treating work pieces with electro-magnetically scanned ion beams
09/16/1987EP0237078A2 Downstream microwave plasma processing apparatus having an improved coupling structure between microwave and plasma
09/16/1987EP0236807A2 Spectrometer objective for the corpuscular beam measuring technique
09/16/1987EP0116083B1 Low voltage field emission electron gun
09/15/1987US4694457 Methods of steering and focusing ion and electron beams
09/15/1987US4694222 Ion plasma electron gun
09/15/1987US4694178 Multiple channel electron beam optical column lithography system and method of operation
09/15/1987US4694171 Electron microscope image focusing using instantaneous emission of stimulable phosphor sheet
09/15/1987US4694170 Instrument for very high resolution ionic micro-analysis of a solid sample
09/15/1987CA1226969A1 Electron image projector
09/11/1987WO1987005438A1 Masked ion beam lithography system and method
09/09/1987EP0236072A2 Ion beam implanter control system
09/09/1987EP0235770A2 Device for the plasma processing of substrates in a high frequency excited plasma discharge
09/08/1987US4692579 Electron beam lithography apparatus
09/08/1987US4692230 Switching power among several targets
09/08/1987US4691662 Dual plasma microwave apparatus and method for treating a surface
09/08/1987EP0221056A4 Ion beam implant system.
09/02/1987EP0234225A1 Method and arrangement for detecting secondary particles emitted from a specimen hit by a primary corpuscular beam
09/01/1987US4691103 Microscope for non-differentiated phase image formation
09/01/1987US4690744 Method of ion beam generation and an apparatus based on such method
08/1987
08/27/1987WO1987005150A1 Specimen chamber for scanning electron beam instruments
08/25/1987US4689555 Method for the determination of points on a specimen carrying a specific signal frequency by use of a scanning microscope
08/25/1987US4689112 Stripping or etching photoresist; supplying plasma gases uniformly
08/25/1987CA1226075A1 Method and apparatus for exposing photoresist by using an electron beam and controlling its voltage and charge
08/19/1987EP0233123A2 An improved apparatus for pulsing electron beams
08/19/1987EP0233083A2 Ion beam arrangement
08/19/1987EP0232790A1 Process and arrangement for measuring time-dependent signals with a corpuscular beam probe
08/18/1987US4687940 Hybrid focused-flood ion beam system and method
08/18/1987US4687939 Method and apparatus for forming film by ion beam
08/18/1987US4687938 Ion source
08/18/1987US4687931 Scanning electron microscope
08/18/1987US4687930 Ion beam apparatus
08/18/1987US4687902 Electron-beam welding apparatus
08/18/1987US4687544 Method and apparatus for dry processing of substrates
08/18/1987CA1225756A1 Automatically adjustable electron microscope
08/13/1987WO1987004852A1 Variable frequency rfq linear accelerator
08/13/1987WO1987004846A1 Electron beam memory system with ultra-compact, high current density electron gun
08/13/1987DE3603726A1 Arrangement for etching or dusting a substrate
08/12/1987EP0232056A2 Controlling charged particle beams
08/12/1987EP0231247A1 Improvements in atom probes.
08/11/1987US4686531 Capacitance height gage applied in reticle position detection system for electron beam lithography apparatus
08/11/1987US4686466 Method for automatically setting the voltage resolution in particle beam measuring devices and apparatus for implementation thereof
08/11/1987US4686414 Enhanced wetting of liquid metal alloy ion sources
08/11/1987US4686113 Plasma confinement in a low pressure electrically grounded R.F. heated reactor and deposition method
08/11/1987US4685999 Apparatus for plasma assisted etching
08/11/1987CA1225364A1 Magnetron cathode sputtering apparatus
08/11/1987CA1225229A1 Alloys for liquid metal ion sources
08/05/1987EP0231164A2 Device for ion-projection apparatuses
08/05/1987EP0231094A2 Charged particle beam generation
08/05/1987EP0230652A1 Apparatus for creating a vacuum deposited alloy or composition and application of such an apparatus
08/04/1987US4684848 Broad-beam electron source
08/04/1987US4684809 Method of adjusting optical column in energy beam exposure system
08/04/1987US4684808 Scanning system for a particle beam scanning apparatus
08/04/1987US4684782 Control system for a charged particle beam apparatus
08/04/1987US4684315 Frictionless supporting apparatus
08/04/1987US4683838 Plasma treatment system
07/1987
07/30/1987EP0146595A4 Method and apparatus for introducing normally solid materials into substrate surfaces.
07/29/1987EP0230290A2 Extraction grid for an ion source and method of manufacturing the same
07/29/1987EP0229873A1 Conductive coated semiconductor electrostatic deflection plates
07/28/1987US4683378 Apparatus for ion beam work
07/28/1987US4683376 Opposing field spectrometer for electron beam mensuration technology
07/28/1987US4683366 All electrostatic electron optical sub-system for variable electron beam spot shaping and method of operation
07/28/1987US4682566 Evacuated equipment