Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
06/1988
06/22/1988EP0155283B1 Focused ion beam column
06/21/1988US4752686 Method and apparatus for emphasizing a specimen surface region scanned by a scanning microscope primary beam
06/21/1988US4752685 Electronic spectrometer for identifying element conditions of a sample surface by utilizing an energy spectrum of charged particles
06/21/1988US4752426 Low temperature plasma microwave activation then graft polymerization
06/21/1988CA1238415A1 Microwave ion source
06/16/1988WO1988004470A1 Process and device for generating material structures of atomic dimensions
06/15/1988EP0271341A2 Method and apparatus for ion etching
06/15/1988EP0270667A1 Dual plasma microwave apparatus and method for treating a surface.
06/15/1988EP0270589A1 Apparatus and method for the chemical analysis of solids by spectroscopy of x photoelectrons
06/15/1988CN87106755A Sphared current loop, multiple field apparatus and process for plasma processing
06/14/1988US4751393 Dose measurement and uniformity monitoring system for ion implantation
06/14/1988US4751384 Electron beam metrology system
06/14/1988CA1238121A1 Charged-particle-beam lithography
06/07/1988US4749911 Ion plasma electron gun with dose rate control via amplitude modulation of the plasma discharge
06/07/1988US4749910 Electron beam-excited ion beam source
06/07/1988US4749868 Method of processing a sample containing water under scanning electron microscope and apparatus thereof
06/07/1988US4749589 Method of surface treatment
06/07/1988US4749270 Micromanipulator for inverted-design microscope
06/07/1988US4748935 Vapor source for vacuum coating installation
06/02/1988WO1988004104A1 Apparatus for observation using charged particle beams and method of surface observation using charged particle beams
06/02/1988WO1988004103A1 Method and apparatus for ion beam centroid location
06/01/1988EP0269613A2 Device for ion beam projection lithography
06/01/1988EP0269181A2 Variable shaped spot electron beam pattern generator
06/01/1988CN87103626A Electron spectrometer
05/1988
05/31/1988US4748407 Method and apparatus for measuring time dependent signals with a particle probe
05/31/1988US4748325 Method and device to discharge samples of insulating material during ion analysis
05/31/1988US4748324 Electrostatic opposing field spectrometer for electron beam test methods
05/31/1988US4747927 Two plates oriented adjacent at one joint; back surface for support
05/31/1988US4747926 Film-forming on planar substrate, such as silicon wafer
05/31/1988US4747922 Confined ion beam sputtering device and method
05/25/1988CN87107779A Microware enhanced cvd method and apparatus
05/24/1988US4746587 Electron emissive mask for an electron beam image projector, its manufacture, and the manufacture of a solid state device using such a mask
05/24/1988US4746571 Spheres, particles, calibration
05/24/1988US4746417 Circular target plate of material to be sputtered
05/19/1988WO1988003742A1 Dynamic electron emitter
05/18/1988EP0267820A1 Electronic optical device using variable illumination and aperture limitation, and its use in an electron beam lithographic system
05/18/1988EP0267555A2 Spectrometer objective for a corpuscular beam measuring apparatus and method for examining samples.
05/18/1988EP0267513A2 Microwave enhanced CVD method and apparatus
05/18/1988EP0267481A2 Ion source for an apparatus for processing solid-state samples by means of ion beams
05/17/1988US4745362 Method and apparatus for detecting and imaging a voltage signal of at least one specific frequency at a measuring location
05/17/1988US4745360 Electron-beam probe system utilizing test device having interdigitated conductive pattern and associated method of using the test device
05/17/1988US4745338 For refining raw material
05/17/1988US4745337 Method and device for exciting a plasma using microwaves at the electronic cyclotronic resonance
05/17/1988US4745297 Specimen holder for holding specimen stubs to be coated in an ion-beam sputter coating unit
05/17/1988US4745287 Ion implantation with variable implant angle
05/17/1988US4745281 Ion beam fast parallel scanning having dipole magnetic lens with nonuniform field
05/17/1988US4745270 Photoelectric microscope using position sensitive device
05/17/1988US4745000 Method of fabricating electrostatic drums using microwave energy
05/17/1988US4744880 Anode for magnetic sputtering of gradient films
05/11/1988EP0266604A2 Anode plate for a parallel-plate reactive ion etching reactor
05/10/1988US4743806 Process and arrangement to irradiate solid state materials with ions
05/10/1988US4743767 Systems and methods for ion implantation
05/10/1988US4743766 Method of drawing a desired pattern on a target through exposure thereof with an electron beam
05/10/1988US4743757 Secondary electron emission control in electron microscopes
05/10/1988EP0216919A4 Method and target for sputter depositing thin films.
05/10/1988CA1236595A1 Apparatus and method for displaying hole-electron pair distributions induced by electron bombardment
05/10/1988CA1236592A1 Field-emission scanning auger electron microscope
05/04/1988EP0266288A2 Vacuum processing method and apparatus
05/04/1988EP0265873A2 Holder for plastic leaded chip carrier
05/04/1988CN85104863B Analysing method and device for element state
05/03/1988US4742234 Charged-particle-beam lithography
05/03/1988US4742216 Photographic apparatus for transmission electron microscopes
05/03/1988US4741800 Microwaves, light
05/03/1988US4741620 Irradiative probe system
05/03/1988CA1236223A1 Focused ion beam processing
04/1988
04/28/1988DE3735162A1 Vapour deposition apparatus
04/28/1988DE3636524A1 Apparatus for applying coatings in a vacuum by magnetron atomisation
04/27/1988EP0265105A1 A method of etching a substrate
04/27/1988EP0264913A2 Plasma processing apparatus
04/27/1988EP0264709A2 Hollow-anode ion-electron source
04/26/1988US4740705 Axially compact field emission cathode assembly
04/26/1988US4740704 Omega-type electron energy filter
04/26/1988US4740698 Hybrid charged particle apparatus
04/26/1988US4740697 Secondary ion mass spectrometer
04/26/1988US4740694 Method and apparatus for analyzing positron extinction and electron microscope having said apparatus
04/26/1988US4740693 Electron beam pattern line width measurement system
04/26/1988US4740383 Coating with color-changing substance
04/26/1988US4740268 Magnetically enhanced plasma system
04/21/1988WO1988002926A1 Mass separator for ionized cluster beam
04/21/1988WO1988002920A1 Method and apparatus for constant angle of incidence scanning in ion beam systems
04/21/1988WO1988002791A1 Thin film formation apparatus
04/20/1988EP0263942A1 Spectrometer-detector arrangement for quantitative potential measurements
04/20/1988EP0263876A1 Ion beam scanning method and apparatus
04/20/1988EP0263849A1 Liquid metal ion source and alloy.
04/20/1988EP0263839A1 Specimen chamber for scanning electron beam instruments
04/20/1988EP0263815A1 Semiconductor dopant vaporizer
04/19/1988US4739463 High voltage source providing continuously regulated output voltage, preferably for supplying low-power ion and electron beam machining and evaporating apparatuses
04/19/1988US4739399 TV system for transmission electron microscopes
04/19/1988US4739214 Dynamic electron emitter
04/19/1988US4739169 Ion source
04/19/1988US4738761 Shared current loop, multiple field apparatus and process for plasma processing
04/14/1988DE3633386A1 Method and device for treating substrates in a vacuum
04/13/1988EP0263517A2 Lithography apparatus
04/13/1988EP0263487A2 Optical axis adjusting apparatus for electron microscope
04/13/1988CN86106604A Electronic microscope capable of extending kinds and range of samples examined and observing negative electrons
04/12/1988US4737688 Wide area source of multiply ionized atomic or molecular species
04/12/1988US4737646 Method of using an electron beam
04/12/1988US4737644 Conductive coated semiconductor electrostatic deflection plates
04/12/1988US4737640 Electron microscope
04/12/1988US4737637 Mass separator for ionized cluster beam