| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 09/22/1988 | WO1988007262A1 Process and device for the surface treatment of semiconductors by particle bombardment |
| 09/22/1988 | WO1988007261A1 Molecular beam etching system and method |
| 09/22/1988 | WO1988007259A1 High-frequency ion source |
| 09/22/1988 | WO1988006978A1 Method and apparatus for ion etching and deposition |
| 09/21/1988 | EP0283256A2 Scanning optical microscope |
| 09/21/1988 | EP0282836A2 Process and apparatus for depositing of high ohmic resistance layers by cathodic sputtering |
| 09/21/1988 | EP0282835A2 Process and device for controlling the reactive coating of substrates with layers, using magnetron cathodes |
| 09/21/1988 | EP0282677A1 Multi-cathode metal arc ion source |
| 09/21/1988 | EP0151588B1 Electron emission system |
| 09/20/1988 | US4772821 Apparatus for introducing oxygen gas |
| 09/20/1988 | US4772817 Cathode mounting a high-frequency piezoelectric chip |
| 09/20/1988 | CA1242165A1 Method and apparatus for plasma-assisted deposition of thin films |
| 09/14/1988 | EP0281743A2 Detector objective for a scanning microscope |
| 09/13/1988 | US4771235 Method and apparatus for detecting and imaging measuring points that have a defined signal progression |
| 09/13/1988 | US4771178 Goniometer stage |
| 09/07/1988 | EP0281549A2 Device for ion projection lithography on a reduced or a 1 to 1 scale |
| 09/07/1988 | EP0281413A2 Mass spectrometer for positive and negative ions |
| 09/07/1988 | EP0280714A1 Beam position correction device. |
| 09/06/1988 | US4769543 Spectrometer lens for particle beam apparatus |
| 09/06/1988 | US4769533 Circuit arrangement for a position-sensitive radiation detector |
| 09/06/1988 | US4769101 Apparatus for surface-treating workpieces |
| 09/06/1988 | US4768911 Device for moving objects within and between sealed chambers |
| 09/01/1988 | DE3703028A1 Scanning microscope |
| 08/31/1988 | EP0280375A1 Continuously variable microdiaphragm |
| 08/31/1988 | EP0280074A2 Plasma reactor |
| 08/31/1988 | EP0280044A2 Plasma apparatus |
| 08/31/1988 | EP0279952A1 Charged particle source |
| 08/31/1988 | EP0279895A2 Device for producing a plasma and for treating substrates in said plasma |
| 08/30/1988 | US4767931 Ion beam apparatus |
| 08/30/1988 | US4767926 Electron beam metrology system |
| 08/30/1988 | US4767641 High frequency discharge between two electrodes |
| 08/30/1988 | US4767496 Measuring electrical resistance and erosion on substrate; transmission by pulse-code-modulation and electromagnetic radiation |
| 08/25/1988 | DE3705361A1 Device for nondestructive image production and position-selective surface treatment in focused ion beam systems |
| 08/24/1988 | EP0279685A2 Glow discharge unit |
| 08/24/1988 | EP0279240A2 Charged-particles detector |
| 08/24/1988 | EP0279172A2 High resolutionautomatic focus correction electronic subsystem for e-beam lithography |
| 08/23/1988 | US4766465 Carry device for fine movement |
| 08/23/1988 | US4766372 Electron beam tester |
| 08/23/1988 | US4766340 Semiconductor device having a cold cathode |
| 08/23/1988 | US4766320 Apparatus for ion implantation |
| 08/23/1988 | US4766313 Apparatus for quantitative secondary ion mass spectrometry |
| 08/23/1988 | US4766312 Methods and apparatus for detecting negative ions from a mass spectrometer |
| 08/23/1988 | US4766311 Method and apparatus for precision SEM measurements |
| 08/23/1988 | CA1241128A1 Plasma reactor with voltage transformer |
| 08/23/1988 | CA1240952A1 High rate sputtering of exhaust oxygen sensor electrode |
| 08/17/1988 | EP0278494A2 Hollow cathode gun and deposition device for ion plating process |
| 08/17/1988 | EP0278250A1 Method for the final-stage control of etching processes brought about by plasma-activated ions, radical and/or neutral particles and carried out on electrically insulating layers, especially those of highly integrated semiconductor circuits |
| 08/17/1988 | EP0278034A1 Detector of charged particles |
| 08/16/1988 | US4764674 High time resolution electron microscope |
| 08/16/1988 | US4764673 Electric electron energy analyzer |
| 08/16/1988 | US4764394 Method and apparatus for plasma source ion implantation |
| 08/10/1988 | EP0277460A1 Restoring process of a metallic structure in a metallic object's degraded surface, its use and device for carrying it out |
| 08/10/1988 | EP0277341A2 Device for the application of an arc |
| 08/09/1988 | US4763005 Rotating field electron beam apparatus and method |
| 08/09/1988 | US4763004 Calibration method for electron beam exposer |
| 08/09/1988 | US4762996 Coarse approach positioning device |
| 08/09/1988 | US4762975 Method and apparatus for making submicrom powders |
| 08/03/1988 | EP0276962A1 Cooling device for a sputter target and source |
| 08/03/1988 | EP0276731A2 Method for electron beam guidance with energy selection, and electron spectrometer |
| 08/02/1988 | US4761560 Measurement of proximity effects in electron beam lithography |
| 08/02/1988 | US4761559 Ion beam implantation display method and apparatus |
| 08/02/1988 | US4761219 Electrode pair opposed in a vaccum vessel and radio frequency power source |
| 08/02/1988 | US4761218 Circular magnetron; concentric rings; separate magnetic field generators and controllable power supply; thin film deposition |
| 08/02/1988 | US4761199 Charged particles, wheet-like electrode and voltage source; semiconductors |
| 08/02/1988 | CA1240075A1 Particle detector |
| 07/27/1988 | EP0275965A2 Plasma operation apparatus |
| 07/27/1988 | EP0275611A2 Electron beam device and a focusing lens therefor |
| 07/27/1988 | EP0148856B1 Wafer height correction system for focused beam system |
| 07/26/1988 | US4760584 Hearth support arrangement |
| 07/26/1988 | US4760262 Ion source |
| 07/26/1988 | US4760261 Alpha-type electron energy filter |
| 07/26/1988 | US4760238 Charged particle beam generation |
| 07/20/1988 | EP0275188A2 Improved plasma stripper with multiple contact point cathode |
| 07/20/1988 | EP0275021A2 Sputtering process and an apparatus for carrying out the same |
| 07/20/1988 | EP0274622A1 Detector assembly with detector objective for corpuscular ray instruments |
| 07/20/1988 | CN87214469U Multifunctional specimen-loading support for electronic scanning microscope |
| 07/20/1988 | CN87106497A Description ion beam implanter scan control system |
| 07/19/1988 | US4758723 Electron spectrometer |
| 07/19/1988 | US4758304 Method and apparatus for ion etching and deposition |
| 07/14/1988 | WO1988005205A1 X-y--z positioning stage |
| 07/14/1988 | DE3700014A1 Electron beam outlet window |
| 07/13/1988 | EP0273942A1 Fine-positioning piezoelectric device |
| 07/12/1988 | US4757208 Masked ion beam lithography system and method |
| 07/12/1988 | US4756810 Depositing substance on surface from gas phase, exposing to plasma, applying radiofrequency excitation |
| 07/12/1988 | CA1239217A1 Method for operating a microscopical mapping system |
| 07/06/1988 | EP0273741A2 Plasma apparatus |
| 07/06/1988 | EP0273685A1 Method of producing a thin film by sputtering and an opposed target type sputtering apparatus |
| 07/06/1988 | EP0273550A1 Deposition of planarizing methods and apparatus |
| 07/06/1988 | EP0273351A2 Apparatus for repairing a pattern film |
| 07/06/1988 | EP0273251A1 Method for controlling and checking an etch-process made by a plasma with active ions, radicals and/or neutral particles specially used for very high integrated semiconductor circuits |
| 07/05/1988 | US4755749 Strobo electron beam apparatus |
| 07/05/1988 | US4755685 Ion micro beam apparatus |
| 07/05/1988 | US4755047 Photometric stereoscopic shape measuring method |
| 06/30/1988 | WO1988004599A1 Apparatus for translational manipulating an element such as a shaft |
| 06/28/1988 | US4754200 Systems and methods for ion source control in ion implanters |
| 06/28/1988 | US4753598 Pivoting electrical contact |
| 06/22/1988 | EP0272178A1 Spin-polarized electron source using a multiple microtip emission cathode, use in electron matter or electron particle interaction physics, plasma physics, electron microscopy |
| 06/22/1988 | EP0272142A2 Magnetic field enhanced plasma etch reactor |
| 06/22/1988 | EP0271682A1 Vacuum vapour deposition assembly with a rectangular vaporizer crucible and several elektron beam guns |
| 06/22/1988 | EP0271543A1 Process for verifying the energy of an ion beam. |