H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof

Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
12/1988
12/01/1988	WO1988009559A1 Improved wien filter design
11/1988
11/30/1988	EP0292519A1 Process and device for generating material structures of atomic dimensions.
11/29/1988	US4788495 Method for the indirect identification of the intensity distribution of particle beam pulses generated in a particle beam measuring instrument
11/29/1988	US4788473 Plasma generating device with stepped waveguide transition
11/29/1988	US4788431 Specimen distance measuring system
11/29/1988	US4788425 Optical axis adjusting apparatus for electron microscope
11/29/1988	US4788408 Arc device with adjustable cathode
11/29/1988	EP0263815A4 Semiconductor dopant vaporizer.
11/23/1988	EP0292180A1 Method of operating an ion trap mass spectrometer
11/22/1988	US4786887 Thin-film strain gauge system and method of manufacturing same
11/22/1988	US4786844 Wire ion plasma gun
11/22/1988	US4786814 Method of reducing electrostatic charge on ion-implanted devices
11/22/1988	US4786392 Fixture for cleaning a plasma etcher
11/22/1988	US4786361 Dry etching process
11/22/1988	US4786359 Xenon enhanced plasma etch
11/22/1988	US4786352 Apparatus for in-situ chamber cleaning
11/22/1988	US4785763 Apparatus for the formation of a functional deposited film using microwave plasma chemical vapor deposition process
11/22/1988	CA1245183A1 Method and apparatus for making electrophotographic devices
11/17/1988	WO1988009051A1 Integrated charge neutralization and imaging system
11/17/1988	WO1988009049A1 Mask repair using an optimized focused ion beam system
11/17/1988	EP0291341A1 Vaporizer system for ion source
11/17/1988	EP0291279A1 System and methods for wafer charge reduction for ion implantation
11/17/1988	EP0291276A2 Locating and testing areas of interest on a workpiece
11/17/1988	EP0291185A2 Improved ion source
11/17/1988	EP0291181A2 Plasma reactor for CVD
11/17/1988	EP0290647A1 Oscillating quartz atomic force microscope
11/17/1988	EP0290620A1 Apparatus for observation using charged particle beams and method of surface observation using charged particle beams
11/17/1988	EP0290575A1 Method and apparatus for ion beam centroid location.
11/16/1988	CN88102744A Arc device with adjustable cathode
11/15/1988	US4785220 Multi-cathode metal vapor arc ion source
11/15/1988	US4785189 Method and apparatus for low-energy scanning electron beam lithography
11/15/1988	US4785188 Primary particle beam irradiation apparatus and method of irradiation thereof
11/15/1988	US4785187 Alignment device
11/15/1988	US4785182 Secondary electron detector for use in a gaseous atmosphere
11/15/1988	US4785177 Kinematic arrangement for the micro-movements of objects
11/15/1988	US4785176 Electrostatic-magnetic lens for particle beam apparatus
11/15/1988	US4785172 Secondary ion mass spectrometry system and method for focused ion beam with parallel ion detection
11/15/1988	US4784739 Reflection, oxidation
11/09/1988	EP0290218A2 Apparatus for retaining wafers
11/09/1988	EP0290046A2 Surface analyzer
11/09/1988	EP0290036A2 Plasma treatment apparatus
11/09/1988	EP0289961A2 Arc device with adjustable cathode
11/09/1988	EP0289885A1 Aperture system for production of several partical probes with changeable cross-section
11/08/1988	US4783597 Ion implant apparatus
11/08/1988	CA1244526A1 Multiple arc plasma device with continuous gas jet
11/03/1988	WO1988008659A1 Method and apparatus for processing with plasma
11/03/1988	DE3712971A1 Method and device for producing (generating) a plasma
11/02/1988	EP0289279A2 A multi-electron-beam pattern drawing apparatus
11/02/1988	EP0289278A2 A multi-electron-beam pattern drawing apparatus
11/02/1988	EP0289277A2 An electron beam head
11/01/1988	US4782304 Systems and methds for ion beam acceleration
11/01/1988	US4781520 Polar-coordinate manipulator for vacuum application
10/1988
10/26/1988	EP0287774A2 Thermionic hair-needle cathode
10/26/1988	EP0287630A1 Method and apparatus for constant angle of incidence scanning in ion beam systems
10/25/1988	US4780669 Method and arrangement for evaluating a test voltage by means of a bandwidth-limited evaluation circuit
10/25/1988	US4780642 Electron cyclotron resonance ion source with coaxial injection of electromagnetic waves
10/25/1988	US4780190 Sputtering cathode
10/25/1988	US4780169 Non-uniform gas inlet for dry etching apparatus
10/25/1988	CA1243782A1 Method and apparatus for low-energy scanning electron beam lithography
10/19/1988	EP0286656A1 Ion implantation
10/18/1988	US4779113 Film handling apparatus
10/18/1988	US4779046 Electron beam integrated circuit tester
10/18/1988	US4778975 Electrical supply circuit for electron beam evaporators
10/18/1988	US4778974 Electron beam line evaporator
10/18/1988	US4778561 Electron cyclotron resonance plasma source
10/18/1988	CA1243426A1 Glow discharge deposition apparatus having confined plasma region
10/12/1988	EP0286472A1 Device for vacuum evaporation of materials
10/12/1988	EP0286191A1 Vacuum arc ion source
10/12/1988	EP0286132A2 Plasma generating apparatus
10/12/1988	EP0286086A2 Electron beam drawing method
10/12/1988	EP0285846A1 Vacuum chamber for the treatment of surfaces, especially of substrates or the like, with ionized gases
10/12/1988	EP0285668A1 Thin film formation apparatus
10/12/1988	EP0285630A1 Mass separator for ionized cluster beam.
10/11/1988	US4777523 Electron microscope with television observation apparatus
10/11/1988	US4777372 Right angle driving
10/11/1988	US4777371 Glass ceramic with high quartz structure
10/11/1988	US4777370 Electron gun operating by secondary emission under ionic bombardment
10/11/1988	US4777369 Electron beam lithographic method
10/11/1988	US4776923 Plasma product treatment apparatus and methods and gas transport systems for use therein
10/11/1988	US4776918 Plasma processing apparatus
10/11/1988	CA1242992A1 Cathode assembly with localized profiling capabilities
10/11/1988	CA1242991A1 Magnetron sputter coating source for both magnetic and nonmagnetic target materials
10/11/1988	CA1242989A1 Apparatus for and method of controlling sputter coating
10/05/1988	EP0284867A2 Dry etching apparatus using surface magnetic field confinement of plasma
10/05/1988	EP0284693A2 Low temperature, plasma method of making plasma deposited coatings
10/05/1988	EP0284683A2 Apparatus for surface analysis
10/04/1988	US4775818 Vaporized alloy
10/04/1988	US4775796 Treating workpieces with beams
10/04/1988	US4775790 Transmission electron microscope
10/04/1988	US4775789 Method and apparatus for producing neutral atomic and molecular beams
10/04/1988	CA1242817A1 Low-abberation spectrometer objective with high secondary electron acceptance
09/1988
09/28/1988	EP0284436A2 Substrate-treating apparatus
09/28/1988	EP0283519A1 Ion generation apparatus, thin film formation apparatus using the ion generation apparatus, and ion source
09/28/1988	EP0270667A4 Dual plasma microwave apparatus and method for treating a surface.
09/28/1988	EP0148898B1 Apparatus for plasma treatment of plate-shaped substrats
09/27/1988	US4774460 Stroboscopic type potential measurement device
09/27/1988	US4774437 Inverted re-entrant magnetron ion source
09/27/1988	US4774433 Apparatus for generating metal ions
09/27/1988	US4774414 Liquid metal ion source
09/27/1988	US4774413 Ion emmissive head and ion beam irradiation device incorporating the same

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