Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
06/1989
06/06/1989US4837435 Tunneling scanning microscope having light source
06/06/1989US4837434 Mass spectrometry system and method employing measurement/survey scan strategy
06/06/1989US4837185 Pulsed dual radio frequency CVD process
06/06/1989US4836902 Plasma gases; by-product ultraviolet radiation absorption baffles
05/1989
05/31/1989EP0318289A2 Apparatus and method for detecting tunnel current and electro-chemical reaction
05/31/1989EP0317952A2 Device having superlattice structure, and method of and apparatus for manufacturing the same
05/31/1989EP0317620A1 Enhanced-wetting, boron-based liquid-metal ion source and method
05/30/1989US4835789 Electron-beam heated evaporation source
05/30/1989US4835438 Source of spin polarized electrons using an emissive micropoint cathode
05/30/1989US4835399 Charged particle beam apparatus
05/30/1989US4835392 Ion-projection apparatus
05/30/1989US4835385 Method of measuring sectional shape and a system therefor
05/30/1989US4834860 Magnetron sputtering targets
05/30/1989US4834855 Method for sputter depositing thin films
05/24/1989EP0317060A2 Electron-emission filament cutoff for GC/MS systems
05/24/1989EP0316523A2 Control for sputtering according to the magnetron principle
05/23/1989US4833362 Encapsulated high brightness electron beam source and system
05/23/1989US4833331 Method of holding an electrically insulating sample
05/23/1989US4833330 Anticontaminator for transmission electron microscopes
05/23/1989US4833323 Determining the composition of a solid body
05/23/1989US4832981 Vapor deposition, cleaning
05/23/1989US4832781 Methods and apparatus for thermal transfer with a semiconductor wafer in vacuum
05/23/1989US4831963 Plasma processing apparatus
05/23/1989CA1254670A1 Method and apparatus for identifying points on a specimen having a defined time-dependent signal
05/18/1989WO1989004586A2 Method and apparatus for generating particle beams
05/18/1989WO1989004546A1 Magnetron ion source without filament and process for using same
05/18/1989WO1989004493A1 Process and arrangement for measuring the variation of a signal at a measuring point of a probe
05/18/1989WO1989004382A1 Process and device for producing thin layers of a material which melts or sublimes at high temperatures on a substrate
05/18/1989WO1989004217A1 Electron cyclotron resonance plasma source
05/17/1989EP0315986A1 Filamentless magnetron ion source and its utilization process
05/16/1989US4831397 Photographic apparatus for transmission electron microscopes
05/16/1989US4831328 Measurement processing arrangement
05/16/1989US4831308 Ion beam gun wherein the needle emitter is surrounded by a tubular nozzle so as to produce an increased ion beam
05/16/1989US4831271 Ion beam dosimetry
05/16/1989US4831270 Ion implantation apparatus
05/16/1989US4831267 Detector for charged particles
05/16/1989US4831266 Detector objective for particle beam apparatus
05/16/1989US4831255 Variable-attenuation parallel detector
05/16/1989CA1254307A1 Electron beam apparatus comprising a semiconductor electron emitter
05/11/1989DE3737142A1 Erzeugung von (duennen) schichten aus hochschmelzender bzw. sublimierender materie (leitender, halbleitender und nichtleitender) und gemischen davon mit pseudofunkenelektronenstrahlen Production of (thin) layer of high-melting or sublimating matter (key, semi-conductive and non-conductive) and mixtures thereof pseudo radio with electron beams
05/11/1989DE3736340A1 Method for stroboscopically imaging a periodic process in a scanning microscope
05/10/1989EP0314947A1 Circuit allowing the magnification independant image shifting
05/10/1989EP0314918A1 Control circuit for electron beam generator
05/10/1989EP0314763A1 Secondary electron detector for use in a gaseous atmosphere.
05/09/1989US4829550 Controlling charged particle beams
05/09/1989US4829444 Charged particle beam lithography system
05/09/1989US4829243 Electron beam testing of electronic components
05/09/1989US4829240 Secondary electron measuring circuit
05/09/1989US4829215 Discharge reaction apparatus utilizing dynamic magnetic field
05/09/1989US4829189 Apparatus for low-temperature plasma treatment of sheet material
05/09/1989US4829178 Apparatus for surface analysis
05/09/1989US4829177 Point projection photoelectron microscope with hollow needle
05/05/1989WO1989004052A1 Exposing substrates to ion beams
05/03/1989EP0314520A2 An apparatus for automatically controlling the magnification factor for a scanning electron microscope
05/03/1989EP0314216A1 Charged-particle beam apparatus
05/03/1989EP0313750A1 Magnetron sputter etching/deposition system
05/02/1989US4827184 Electron beam device and a focusing lens therefor
05/02/1989US4827137 Soft vacuum electron beam patterning apparatus and process
05/02/1989US4827127 Apparatus using charged particle beam
05/02/1989US4826585 Plasma processing apparatus
05/02/1989US4826584 Magnetron sputtering cathode
05/02/1989US4825806 Film forming apparatus
05/02/1989CA1253636A1 Spectrometer lens for particle beam metrology
04/1989
04/26/1989EP0313154A1 Method and apparatus for cleaning elongate metal substrates, substrates cleaned according to this method and polymeric objects reinforced with such substrates
04/26/1989EP0312653A1 Electron image projector
04/25/1989US4825087 System and methods for wafer charge reduction for ion implantation
04/25/1989US4825082 Electron emitting apparatus
04/25/1989US4825080 Electrical particle gun
04/25/1989US4825033 Variable shaped spot electron beam pattern generator
04/25/1989US4824544 Large area cathode lift-off sputter deposition device
04/25/1989US4824540 Method and apparatus for magnetron sputtering
04/25/1989US4824309 Vacuum processing unit and apparatus
04/25/1989CA1253196A1 Vacuum system for a charged particle beam recording system
04/20/1989WO1989003587A1 Method and apparatus for thin film formation by plasma cvd
04/20/1989WO1989003584A1 Multi-electrode vacuum processing chamber
04/20/1989DE3822099A1 Effecting accurate micro-manipulating
04/19/1989EP0312447A1 Process and element for the production, using plasma, of thin films for electronic and/or optoelectronic applications
04/19/1989EP0312225A2 Particle accelerator
04/19/1989EP0312083A2 Pattern measurement method
04/19/1989EP0312082A2 Image forming method using secondary electrons from object
04/19/1989EP0312066A2 A guard ring for a differentially pumped seal apparatus
04/19/1989EP0311976A1 Process and device for the ionic irradiation of great surfaces
04/19/1989EP0311975A1 Reflection device for low energy ions
04/19/1989EP0311697A2 Magnetically enhanced sputter source
04/19/1989EP0311696A1 Method and apparatus for processing with plasma
04/18/1989US4823358 High capacity electron beam cold hearth furnace
04/18/1989US4823013 Charged particles exposure apparatus having an optically deformable beam bounding diaphragm
04/18/1989US4823011 Ion-projection lithographic apparatus with means for aligning the mask image with the substrate
04/18/1989US4823006 Integrated electron optical/differential pumping/imaging signal detection system for an environmental scanning electron microscope
04/18/1989US4823005 Electron beam apparatus
04/18/1989US4823004 Method of interacting carriers
04/18/1989US4823003 Charged particle optical systems having therein means for correcting aberrations
04/18/1989CA1252918A1 Scanning tunneling microscope
04/13/1989DE3733037A1 Method for improving the signal-to-noise ratio in scanning electron microscopes
04/12/1989EP0310888A2 Method for the introduction of ions into the ion trap of an ion cyclotron resonance spectrometer and ion cyclotron resonance spectrometer used in this method
04/12/1989EP0310816A1 Automatic frequency following in a corpuscular beam-measuring method using a modulated primary beam
04/11/1989US4821196 High resolution automatic focus correction electronic subsystem for E-beam lithography
04/11/1989US4820977 Method and apparatus for identifying points on a specimen having a defined time-dependent signal
04/11/1989US4820928 Lithography apparatus
04/11/1989US4820927 Electron beam source employing a photo-emitter cathode