Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
09/1989
09/27/1989EP0334638A1 Improvements relating to the formation of thin films
09/27/1989EP0334564A2 Penning type cathode for sputter coating
09/27/1989EP0334347A1 Cathode sputtering device
09/27/1989EP0334334A2 Photo-cathode image projection apparatus for patterning a semiconductor device
09/27/1989EP0334204A2 Process and apparatus for coating articles
09/27/1989EP0334109A1 Process and apparatus for the production of semiconducting layers made of silicium-germanium alloys by flow discharge technics and particularly of solar cells
09/27/1989CN1035914A Ion implantation surface charge control method and apparatus
09/26/1989US4870286 Electron beam direct drawing device
09/26/1989US4870284 Ion source and method of drawing out ion beam
09/26/1989US4870283 Electric multipole lens
09/26/1989US4870276 Calibration
09/26/1989US4870245 Plasma enhanced thermal treatment apparatus
09/26/1989US4869976 High frequency glow discharges
09/26/1989US4869835 Ion source
09/21/1989WO1989008972A1 Method and apparatus for forming coherent clusters
09/20/1989EP0333240A1 Charged particle beam apparatus
09/20/1989EP0333098A2 A silicon grid as a reference and calibration standard in a particle beam lithography system
09/20/1989EP0333018A2 Objective lens for focusing charged particles
09/19/1989US4868396 Cell and substrate for electrochemical STM studies
09/19/1989US4868395 Electron beam lithography system for delineating a desired pattern on a target by means of electron beams
09/19/1989US4868394 Charged particle detector
09/19/1989CA1259710A1 Kinematic arrangement for the micro-movements of objects
09/14/1989DE3901401A1 Method for controlling a vacuum arc discharge
09/13/1989EP0332140A2 Focusing apparatus of electron microscope
09/13/1989EP0331859A2 Telecentric sub-field deflection with a variable axis immersion lens
09/13/1989EP0331718A1 Multiple electrode plasma reactor power distribution system
09/13/1989CN1035583A Postable scanning electron microscope
09/12/1989US4866464 Method and apparatus for generating a scan timing signal with diffuser and detector array
09/12/1989US4866346 Microwave plasma generator
09/12/1989US4866280 Objective lens of an electron beam apparatus
09/12/1989US4866279 Device for the reflection of a low-energy ion beam
09/12/1989US4866274 Apparatus for recording and reproducing images produced by an electron microscope
09/12/1989US4866273 Electron-microscopic image viewing system
09/12/1989US4866272 Surface analyzer for determining the energy distribution of scattered proton beams
09/12/1989US4866271 Relative displacement control apparatus
09/12/1989US4865713 Apparatus for applying thin layers onto a substrate
09/12/1989US4865712 Apparatus for manufacturing planarized aluminum films
09/12/1989US4865710 Magnetron with flux switching cathode and method of operation
09/12/1989US4865709 Magnetron sputter apparatus and method for forming films by using the same apparatus
09/12/1989US4865708 Magnetron sputtering cathode
09/11/1989EP0318539A4 Microwave plasma generator.
09/08/1989WO1989008322A1 Focused ion beam imaging and process control
09/08/1989WO1989007259A3 Integrated scanning tunneling microscope
09/08/1989WO1989007258A3 Integrated scanning tunneling microscope
09/07/1989DE3813559A1 Ion source
09/06/1989EP0331258A1 Electron beam apparatus
09/06/1989EP0330763A1 Charged particle apparatus with automatic beam set-up
09/05/1989US4864228 Electron beam test probe for integrated circuit testing
09/05/1989US4864131 Positron microscopy
09/05/1989US4864130 Photo ion spectrometer
09/05/1989US4863756 Method and equipment for coating substrates by means of a plasma discharge using a system of magnets to confine the plasma
09/05/1989US4863581 Cathode with outer graphite layer and inner one of tantalum, tungsten or lanthanum hexaboride
09/05/1989US4863576 Method and apparatus for hermetic coating of optical fibers
09/05/1989US4863549 Apparatus for coating or etching by means of a plasma
08/1989
08/30/1989EP0330445A1 Magnetron cathode for sputter coating
08/30/1989EP0330310A2 Integrated electron optical/differential pumping/imaging signal detection system for an environmental scanning electron microscope
08/29/1989US4861991 Electron storage source for electron beam testers
08/29/1989US4861563 Vacuum load lock
08/29/1989US4861419 Detecting end point traces of plasma etch reactor; forming semiconductors
08/23/1989EP0329179A2 Plasma treating apparatus and gas temperature measuring method
08/23/1989EP0329097A2 Magnetic object lens of electron beam exposure apparatus
08/23/1989EP0328869A2 Electron beam testing of electronic components
08/23/1989EP0328613A1 Metallurgical controlling method
08/22/1989US4860225 Method and apparatus for storing measured data from sub-regions of a sputter crater which is generated and analyzed in a secondary ion mass spectrometer
08/22/1989US4860224 Surface analysis spectroscopy apparatus
08/22/1989US4859908 Plasma processing apparatus for large area ion irradiation
08/22/1989US4859896 Piezoelectric precision positioning device
08/22/1989US4859857 Ion-projection apparatus and method of operating same
08/22/1989US4859856 Telecentric sub-field deflection with vail
08/22/1989US4859304 Temperature controlled anode for plasma dry etchers for etching semiconductor
08/22/1989US4859303 Method and apparatus for removing coating from substrate
08/22/1989US4859277 Method for measuring plasma properties in semiconductor processing
08/16/1989EP0328078A2 Reactive ion etching apparatus
08/16/1989EP0328076A2 Thin film forming apparatus and ion source utilizing sputtering with microwave plasma
08/16/1989EP0328033A2 Thin film forming apparatus and ion source utilizing plasma sputtering
08/15/1989US4858237 Electron beam apparatus
08/15/1989US4857809 Microwave ion source
08/15/1989US4857743 Disposable spray aperture
08/15/1989US4857742 Position detecting device using variable radiation
08/15/1989US4857730 Apparatus and method for local chemical analyses at the surface of solid materials by spectroscopy of X photoelectrons
08/15/1989US4857137 Ion beam etching
08/15/1989US4857136 Reactor monitoring system and method
08/10/1989WO1989007330A1 Scanning electron microscope
08/10/1989WO1989007259A2 Integrated scanning tunneling microscope
08/10/1989WO1989007258A2 Integrated scanning tunneling microscope
08/10/1989WO1989007256A1 An integrated mass storage device
08/09/1989EP0327406A2 Plasma processing method and apparatus for the deposition of thin films
08/09/1989EP0327253A2 Forming films, e.g. of amorphous silicon
08/09/1989EP0327192A2 Methods and apparatus for fabricating a high purity thermally-conductive polymer layer
08/09/1989EP0327167A2 In situ differential imaging and method utilizing a scanning electron microscope
08/09/1989EP0327093A2 Electron beam exposure method and apparatus
08/09/1989EP0326998A2 Microwave chemical vapor deposition apparatus
08/09/1989EP0326843A1 Coating chamber with regulated composition of the gas mixture
08/09/1989EP0326824A2 Particle source for a reactive ion beam etching or plasma deposition device
08/08/1989US4855673 Electron beam apparatus
08/08/1989US4855604 Ion Beam implant system
08/08/1989US4855033 Cathode and target design for a sputter coating apparatus
08/03/1989DE3802852A1 Device for coating a substrate with a material obtained from a plasma
08/02/1989EP0326531A2 Improved RF plasma processing apparatus
08/02/1989EP0326405A2 Plasma chemical vapour reaction apparatus
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