| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 02/06/1990 | CA1265574A1 Flat electron control device utilizing a uniform space-charge cloud of free electrons as a virtual cathode |
| 01/31/1990 | EP0352740A2 Laser interferometer system for monitoring and controlling IC processing |
| 01/31/1990 | EP0352552A2 Process for illuminating an object in a transmission electron microscope and electron microscope suitable for that process |
| 01/31/1990 | CN1039324A Integrated electronic optical / differential pumping / imaging signal detection system for environmental scanning electron |
| 01/30/1990 | US4897579 Method of processing materials using an inductively coupled plasma |
| 01/30/1990 | US4897552 Multi-electron-beam pattern drawing apparatus |
| 01/30/1990 | US4897545 Electron detector for use in a gaseous environment |
| 01/30/1990 | US4897285 Method and apparatus for PCVD internal coating a metallic pipe by means of a microwave plasma |
| 01/30/1990 | US4897281 Process for the formation of a functional deposited film by way of microwave plasma CVD method |
| 01/30/1990 | US4897172 Sputtering chamber structure for high-frequency bias sputtering process |
| 01/30/1990 | US4896813 Sputter etching to remove surface oxides, then joining by pressing sufficiently to reduce thickness of softer metal |
| 01/25/1990 | WO1990000849A1 A real-time signal processing circuit |
| 01/25/1990 | WO1990000810A1 A charged particle energy filter |
| 01/25/1990 | WO1990000809A1 A device for energy filtering an imaging beam of charged particles |
| 01/24/1990 | EP0352085A2 Electron Microscope |
| 01/24/1990 | EP0351444A1 Method for making self-aligned apertures |
| 01/23/1990 | US4896045 Electron beam head and patterning apparatus including detection of secondary or reflected electrons |
| 01/23/1990 | US4896036 Detector objective for scanning microscopes |
| 01/23/1990 | US4895631 Process and apparatus for controlling the reactive deposit of coatings on substrates by means of magnetron cathodes |
| 01/23/1990 | CA1264873A1 Electrostatic-magnetic lens for particle beam apparatus |
| 01/18/1990 | DE3823911A1 Method and device for determining the deviation of the energy of a particle probe from the neutral point energy |
| 01/17/1990 | EP0350815A2 Process to operate a secondary ion mass spectrometer |
| 01/17/1990 | EP0350539A1 Electron beam micro structure formation |
| 01/16/1990 | US4894611 System for measuring characteristics of electron emitting sources |
| 01/16/1990 | US4894549 Apparatus for demagnification or full-size ion projection lithography |
| 01/16/1990 | US4894541 Apparatus utilizing charged-particle beam |
| 01/16/1990 | US4894540 Image forming method using secondary electrons from object for noise elimination |
| 01/16/1990 | US4894538 Scanning device for scanning tunneling microscope |
| 01/16/1990 | US4894510 Apparatus for uniformly distributing plasma over a substrate |
| 01/16/1990 | US4894132 Sputtering method and apparatus |
| 01/16/1990 | US4893980 Device for moving objects within a sealed chamber |
| 01/16/1990 | US4893584 Large area microwave plasma apparatus |
| 01/11/1990 | WO1990000308A1 Apparatus and method relating to plasma treatment |
| 01/10/1990 | EP0350397A1 Electron bombardment evaporator with back scattered electron recuparating means |
| 01/10/1990 | EP0350357A1 Superconductor device for electron injection into an electronic tube |
| 01/10/1990 | EP0349911A2 Micromanipulator |
| 01/10/1990 | EP0349556A1 Process and device for the surface treatment of semiconductors by particle bombardment. |
| 01/10/1990 | EP0349555A1 High-frequency ion source. |
| 01/10/1990 | CN1038673A Microwave plasma treating apparatus |
| 01/09/1990 | US4893103 Superconducting PYX structures |
| 01/09/1990 | US4893019 Ion current generator system for thin film formation, ion implantation, etching and sputtering |
| 01/09/1990 | US4893009 Scanning electron microscope and the like apparatus |
| 01/09/1990 | US4892752 Focused ion beams, alloy melt |
| 01/09/1990 | US4892633 Magnetron sputtering cathode |
| 01/08/1990 | EP0306491A4 Arc coating of refractory metal compounds. |
| 01/03/1990 | EP0349414A1 Method for restoring locally detiorated articles, particularly anti cathodes |
| 01/03/1990 | EP0348992A2 Apparatus and method of pattern detection based on a scanning transmission electron microscope |
| 01/03/1990 | EP0348785A2 Electron beam-measuring apparatus |
| 01/03/1990 | EP0348611A2 Fibre optic photocathode |
| 01/03/1990 | EP0271543B1 Process for verifying the energy of an ion beam |
| 01/03/1990 | CN2050657U Sample table for observing electron beam induced current |
| 01/02/1990 | US4891821 Magnetic correcting fence for adjacent e-guns |
| 01/02/1990 | US4891560 Magnetron plasma apparatus with concentric magnetic means |
| 01/02/1990 | US4891526 X-Y-θ-Z positioning stage |
| 01/02/1990 | US4891525 SKM ion source |
| 01/02/1990 | US4891524 Charged particle beam exposure system and method of compensating for eddy current effect on charged particle beam |
| 01/02/1990 | US4891523 Circuit for image displacement in a particle beam apparatus independently of magnification |
| 01/02/1990 | US4891516 Device for axially and angularly positioning a beam or the like in a sealed chamber |
| 01/02/1990 | US4891488 Processing apparatus and method |
| 01/02/1990 | US4891118 Plasma processing apparatus |
| 01/02/1990 | US4891095 Method and apparatus for plasma treatment |
| 01/02/1990 | US4891087 Isolation substrate ring for plasma reactor |
| 12/28/1989 | WO1989012908A1 Process and device for supplying processing gas to a reactor located in a zone subjected to intense electric and/or electromagnetic fields |
| 12/28/1989 | WO1989012907A1 Wafer handling system with bernoulli pick-up |
| 12/28/1989 | WO1989012818A1 Method and apparatus for the examination of structures on membrane surfaces |
| 12/28/1989 | WO1989012702A1 Modular sputtering apparatus |
| 12/28/1989 | EP0331718A4 Multiple electrode plasma reactor power distribution system. |
| 12/27/1989 | EP0348239A1 Scanning tunneling microscope |
| 12/27/1989 | EP0347739A2 Scanning tunneling microscope and surface topographic observation method |
| 12/27/1989 | EP0347717A2 Circuit for determining the presence of a plasma |
| 12/27/1989 | EP0347567A2 Device for coating a substrate with a dielectric |
| 12/26/1989 | US4890294 Plasma apparatus |
| 12/26/1989 | US4890029 Electron beam apparatus including plurality of ion pump blocks |
| 12/26/1989 | US4889995 Apparatus for analysis employing electron |
| 12/26/1989 | US4889990 Method and apparatus for recording and reproducing electron microscope image |
| 12/26/1989 | US4889988 Feedback control for scanning tunnel microscopes |
| 12/26/1989 | US4889588 Plasma etch isotropy control |
| 12/21/1989 | DE3820549A1 Verfahren und vorrichtung zur untersuchung von membranoberflaechen Method and device for investigation of membranoberflaechen |
| 12/20/1989 | EP0346738A1 Method and apparatus for the interior coating of metal tubes by PCVD using a microwave plasma |
| 12/20/1989 | EP0346599A1 Target for magnetron sputtering apparatuses |
| 12/20/1989 | EP0210182B1 Secondary ion collection and transport system for ion microprobe |
| 12/19/1989 | US4888088 Ignitor for a microwave sustained plasma |
| 12/14/1989 | WO1989012315A1 Variable dispersion mass spectrometer |
| 12/14/1989 | DE3819684A1 Method for determining the end point in a planarising plasma etch-back process |
| 12/13/1989 | EP0346168A1 Plasma reactor |
| 12/13/1989 | EP0346131A2 Dry etching apparatus |
| 12/13/1989 | EP0346055A2 Method for causing plasma reaction under atmospheric pressure |
| 12/13/1989 | EP0345772A2 Pattern configuration measuring apparatus |
| 12/13/1989 | EP0345529A2 Electronic dosing balance |
| 12/13/1989 | EP0314763A4 Secondary electron detector for use in a gaseous atmosphere. |
| 12/13/1989 | EP0051635B1 Sputter target and glow discharge coating apparatus |
| 12/12/1989 | US4887031 Method and apparatus for detecting and imaging measuring points that have a defined signal progression |
| 12/12/1989 | US4887005 Multiple electrode plasma reactor power distribution system |
| 12/12/1989 | US4886971 Ion beam irradiating apparatus including ion neutralizer |
| 12/12/1989 | US4886565 Negative electrode, cooler; high speed, nondeforming; semiconductors |
| 12/06/1989 | EP0345006A2 Radio frequency linear accelerator control system |
| 12/06/1989 | EP0344969A1 Electron cyclotron resonance ion source |
| 12/06/1989 | EP0344918A1 Compensated scan wave form generator for ion implantation equipment |
| 12/06/1989 | EP0344646A2 Ion beam lithography introduction |
| 12/06/1989 | EP0344515A2 Process for producing a beam-forming aperture for a lithography apparatus |