Patents
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
06/1990
06/26/1990US4937206 Method and apparatus for preventing cross contamination of species during the processing of semiconductor wafers
06/26/1990US4936968 Ion-beam machining method and apparatus
06/26/1990US4936967 Method of detecting an end point of plasma treatment
06/26/1990US4936960 Method and apparatus for recovery from low impedance condition during cathodic arc processes
06/26/1990CA1270895A1 Conductive coated semiconductor electrostatic deflection plates
06/20/1990EP0374060A1 Device in a vacuum of big volume and procedure for its fabrication
06/20/1990EP0373742A2 Tunnel unit and scanning head for scanning tunneling microscope
06/20/1990EP0373656A2 Detection system for cathodoluminescence analysis
06/20/1990EP0373599A2 Method of determining the position of electron beam irradiation and device used in such method
06/20/1990EP0373399A2 Imaging corrector of the Wien type for electron microscopes
06/20/1990EP0267820B1 Electronic optical device using variable illumination and aperture limitation, and its use in an electron beam lithographic system
06/19/1990US4935661 Pulsed plasma apparatus and process
06/19/1990US4935634 Atomic force microscope with optional replaceable fluid cell
06/19/1990US4935625 Electron holography apparatus
06/19/1990US4935115 Method and apparatus for cold sputter cleaning an elongated metal substrate
06/13/1990EP0372179A1 Method of procuring high-frequency energy, and its use
06/13/1990DE3940215A1 Kathoden- und heizungsbaugruppe fuer elektronenstrahlanalagen Cathode and heater assembly for elektronenstrahlanalagen
06/12/1990US4933594 Electron collector for electron tubes
06/12/1990US4933553 Focusing apparatus of electron microscope
06/12/1990US4933552 For analyzing a sample
06/12/1990US4933064 Sputtering cathode based on the magnetron principle
06/12/1990US4933063 Sputtering device
06/12/1990CA1270133A1 Coarse approach positioning device
06/06/1990EP0371894A1 Vapour and ion source
06/06/1990EP0371252A1 Process and apparatus for etching substrates with a low-pressure discharge assisted by a magnetic field
06/05/1990US4931698 Ion source
06/05/1990US4931169 Apparatus for coating a substrate with dielectrics
06/05/1990US4931158 Deposition of films onto large area substrates using modified reactive magnetron sputtering
06/05/1990US4931135 Etching method and etching apparatus
06/05/1990CA1270071A1 Method of operating a three-dimensional ion trap with enhanced sensitivity
06/05/1990CA1269950A1 Glow-discharge decomposition apparatus
05/1990
05/31/1990WO1990005991A1 Vibration cancellation system for scanning electron microscopes
05/31/1990WO1990005990A1 Large-area uniform electron source
05/31/1990WO1990005793A1 Improved magnetron sputtering cathode
05/30/1990EP0370276A1 Device for detecting charged secondary particles
05/30/1990EP0370196A2 Process for using an electron beam measuring apparatus
05/29/1990US4929840 Wafer rotation control for an ion implanter
05/29/1990US4929839 Focused ion beam column
05/29/1990US4929838 Magnetic object lens for an electron beam exposure apparatus which processes a wafer carried on a continuously moving stage
05/29/1990US4929836 Focusing in instruments, such as SEMs and CRTs
05/29/1990US4929831 Electron beam apparatus for testing infrared detectors in a cryogenically shielded environment
05/29/1990US4929321 Arc evaporation; visual shield to deflect ions
05/29/1990US4929041 Cathodoluminescence system for use in a scanning electron microscope including means for controlling optical fiber aperture
05/29/1990CA1269719A1 Microwave apparatus for generating plasma afterglows for stripping semiconductor
05/23/1990EP0369913A1 Device for the transfer and atmospherically controlled reactions in situ of samples to be examined in transmission electron microscopy
05/23/1990EP0368945A1 Viewing optics for external-mount electron beam welders.
05/23/1990DE3839153A1 Method of detoxifying process exhaust gases in plasma etching
05/22/1990US4928018 Thermo-enhanced electron image projector
05/22/1990US4928016 Magazine for accommodating recording medium for electron microscope
05/22/1990US4928010 Observing a surface using a charged particle beam
05/22/1990US4927785 Controlling reactive ion etching by measurement of reflection of laser beam
05/22/1990US4927515 For uniform and radial sputtering
05/22/1990US4927513 Sputtering
05/22/1990US4927485 Laser interferometer system for monitoring and controlling IC processing
05/22/1990US4926791 Microwave plasma apparatus employing helmholtz coils and ioffe bars
05/16/1990EP0368579A2 Probe unit, driving method thereof, and scanning device for detecting tunnel current having said probe unit
05/16/1990EP0368037A1 Process for controlling the distribution of the evaporation rate of an electron beam
05/15/1990US4926439 Process for preventing contamination of high temperature melts
05/15/1990US4926055 Field emission electron gun
05/15/1990US4926054 Objective lens for focusing charged particles in an electron microscope
05/15/1990US4925542 Plasma plating apparatus and method
05/15/1990CA1269181A1 Mass spectrometer for positive and negative ions
05/14/1990CA2002898A1 Magnetron sputtering cathode
05/14/1990CA2002735A1 Vibration cancellation system for scanning electron microscopes
05/10/1990DE3929735A1 Finely controlling point of scanning tunnelling microscope - exerting electrostatic forces on metallised oxide diaphragm deflected vertically by tensions in two directions
05/09/1990EP0367568A1 Use of plasma in ashing processes
05/09/1990EP0367496A2 Charged particle beam lithography system and a method thereof
05/09/1990EP0367289A2 Plasma chemical vapor deposition apparatus
05/09/1990EP0366851A1 Low-voltage source for narrow electron/ion beams
05/09/1990EP0366746A1 A variable temperature scanning tunneling microscope
05/09/1990CN1042029A Improved electron detector for use in gaseous environment
05/08/1990US4924138 Device comprising a vacuum ion arc source
05/08/1990US4924136 Holders located immediately under emitting tip
05/08/1990US4924135 Electrode for vapor deposition and vapor-deposition method using same
05/08/1990US4924104 Ion beam apparatus and method of modifying substrate
05/08/1990US4924101 Charged particle source
05/08/1990US4924089 Method and apparatus for the accumulation of ions in a trap of an ion cyclotron resonance spectrometer, by transferring the kinetic energy of the motion parallel to the magnetic field into directions perpendicular to the magnetic field
05/08/1990CA1268864A1 End-hall ion source
05/04/1990CA2002322A1 Method and apparatus for etching substrates with a magnetic-field supported low-pressure discharge
05/02/1990EP0366367A2 Charged particle beam exposure method
05/01/1990US4922106 Ion beam scanning method and apparatus
05/01/1990US4922098 Electron microscope
05/01/1990US4922097 Potential measurement device
05/01/1990US4921724 Process for coating a substrate with an organic coating having gradated hardness
05/01/1990US4920917 Reactor for depositing a layer on a moving substrate
04/1990
04/26/1990DE3835153A1 Apparatus for etching substrates by a glow discharge
04/25/1990EP0365249A2 Method and apparatus for sputtering
04/25/1990EP0364929A2 Fabrication method of semiconductor devices and transparent mask for charged particle beam
04/25/1990EP0262219B1 Liquid metal ion source and alloy for ion emission of multiple ionic species
04/24/1990US4919783 Intereaction of a magnetic field, an electron magnetic wave; a predetermined gas
04/24/1990US4919780 Bombarding foils with ions at a narrowly confined area; sputtering
04/24/1990US4919745 Apparatus and method for plasma treatment of resin material
04/24/1990CA1268214A1 Method and apparatus for analyzing errors in integrated circuits
04/19/1990WO1990004261A1 Improved electron detector for use in a gaseous environment
04/18/1990EP0364215A2 Plasma etching apparatus
04/17/1990US4918358 Apparatus using charged-particle beam
04/17/1990US4918318 Electronic optics device with variable illumination and aperture limitation, and application thereof to an electron beam lithographic system
04/17/1990US4918316 Method of and apparatus for irradiating large surfaces with ions
04/17/1990US4918309 Method for investigating surfaces at nanometer and picosecond resolution and laser-sampled scanning tunneling microscope for performing said method
04/17/1990US4918031 Anisotropic plasma etching; low gas pressure