| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
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| 02/12/1991 | US4991542 Method of forming a thin film by plasma CVD and apapratus for forming a thin film |
| 02/12/1991 | CA1280223C Ion implantation surface charge control method and apparatus |
| 02/07/1991 | DE4006457C1 Appts. for vapour deposition of material under high vacuum - has incandescent cathode and electrode to maintain arc discharge |
| 02/07/1991 | DE3925949A1 Scanning electron microscope with synchronous back-scattered detection - consisting of retro-filled module flange mounted to side port of microscope having scintillator and fibre-optics system |
| 02/06/1991 | EP0411482A2 Electron gun arrangement for use in the electron beam evaporation process |
| 02/06/1991 | EP0411435A1 Apparatus for synthesizing diamondlike thin film |
| 02/06/1991 | EP0411359A2 Device for measuring the thickness of thin layers |
| 02/06/1991 | EP0411317A2 Method and apparatus for continuously forming functional deposited films with a large area by microwave plasma CVD |
| 02/05/1991 | US4990829 Microwave |
| 02/05/1991 | US4990778 Scanning electron microscope |
| 02/05/1991 | US4990776 Electron microscope |
| 02/05/1991 | US4990229 High density plasma deposition and etching apparatus |
| 02/05/1991 | US4989544 Apparatus for forming functional deposited films by way of hybrid excitation |
| 02/05/1991 | US4989543 Process and means for producing films for use in electronics and/or optoelectronics using plasma |
| 02/05/1991 | US4989542 Apparatus for synthesizing diamond |
| 02/05/1991 | US4989540 Apparatus for reaction treatment |
| 01/31/1991 | DE4020806A1 Scanning electron microscope charge control - using measurement of intensity of secondary electrons and adjustment of scanning rate or intensity |
| 01/30/1991 | EP0410706A2 Low-temperature plasma processor |
| 01/30/1991 | EP0410596A2 Electron beam gun |
| 01/30/1991 | EP0190251B1 Method and apparatus for the micro-analysis or imaging of samples |
| 01/29/1991 | US4989156 Method of drawing a pattern on wafer with charged beam |
| 01/29/1991 | US4988878 Support means for a particle beam position monitor |
| 01/29/1991 | US4988874 Recording medium magazine for electron microscopes |
| 01/29/1991 | US4988869 Method and apparatus for electron-induced dissociation of molecular species |
| 01/29/1991 | US4988868 Ion detector |
| 01/29/1991 | US4988844 Process for controlling the strike positions of a plurality of electron beams on a melting bath |
| 01/29/1991 | US4988422 Process and apparatus for depositing coatings of high electrical resistance by cathode sputtering |
| 01/29/1991 | US4987933 Fluid flow control method and apparatus for minimizing particle contamination |
| 01/29/1991 | CA1279732C Electron beam direct drawing device |
| 01/29/1991 | CA1279691C Dynamic electron emitter |
| 01/24/1991 | WO1991001038A1 Method of generating high-intensity electron beam |
| 01/23/1991 | EP0409572A2 Position detecting system |
| 01/23/1991 | EP0409209A2 Electron microscope |
| 01/23/1991 | EP0409208A2 Method and apparatus for generating electron channeling patterns |
| 01/22/1991 | US4987346 Particle source for a reactive ion beam etching or plasma deposition installation |
| 01/22/1991 | US4987345 Charged particle source of large current with high energy |
| 01/22/1991 | US4987311 Electron-detector diode biassing scheme for improved writing by an electron beam lithography machine |
| 01/22/1991 | US4987303 Micro-displacement detector device, piezo-actuator provided with the micro-displacement detector device and scanning probe microscope provided with the piezo-actuator |
| 01/22/1991 | US4987284 Downstream microwave plasma processing apparatus having an improved coupling structure between microwave plasma |
| 01/22/1991 | US4987005 Chemical vapor processing method for deposition or etching on a plurality of substrates |
| 01/22/1991 | US4987004 Sputtering hard carbon films |
| 01/22/1991 | US4986890 Thin film deposition system |
| 01/22/1991 | US4986214 Thin film forming apparatus |
| 01/16/1991 | EP0408009A2 Scanning tunneling spectroscope and a spectroscopic information detection method |
| 01/16/1991 | EP0407985A1 Method for preventing cross contamination during semiconductor wafer processing and shield assembly used in this method |
| 01/16/1991 | EP0407835A2 Atomic force microscope |
| 01/16/1991 | EP0407460A1 An integrated mass storage device. |
| 01/16/1991 | CN1048568A Process for continuously forming large area functional deposited film by microwave pcvd method and apparatus suitable for practicing same |
| 01/15/1991 | US4985634 Ion beam lithography |
| 01/15/1991 | US4985628 Inspection apparatus incorporating digital electron detection |
| 01/15/1991 | US4985627 Spin-polarized scanning tunneling microscope |
| 01/15/1991 | US4985109 Apparatus for plasma processing |
| 01/15/1991 | CA1279130C Differentially pumped seal apparatus |
| 01/10/1991 | WO1991000679A1 Toroidal electron cyclotron resonance reactor |
| 01/10/1991 | WO1991000613A1 A method and arrangement for treating silicon plates |
| 01/10/1991 | WO1991000378A1 Device for coating substrates by cathode sputtering |
| 01/10/1991 | WO1991000374A1 Process and device for coating substrates |
| 01/10/1991 | DE3921179A1 Raster electron microscope for integrated circuit examination - has single pole shoe lens for focussing beam at rear of examined sample |
| 01/09/1991 | EP0407169A2 Electron cyclotron resonance (ECR) plasma etching process and ECR plasma etching apparatus |
| 01/09/1991 | EP0406691A2 Process for continuously forming a large area functional deposited film by microwave PCVD method and an apparatus suitable for practicing the same |
| 01/09/1991 | EP0406690A2 Process for continuously forming a large area functional deposited film by microwave PCVD method and an apparatus suitable for practicing the same |
| 01/08/1991 | US4983864 Electronic beam drawing apparatus |
| 01/08/1991 | US4983850 Ion implantation device |
| 01/08/1991 | US4983845 Apparatus operating with contact ionization for the production of a beam of accelerated ions |
| 01/08/1991 | US4983833 Device for the detecting of charged secondary particles |
| 01/08/1991 | US4983832 Scanning electron microscope |
| 01/08/1991 | US4983831 Time-of-flight analysis method with continuous scanning and analyzer to implement this method |
| 01/08/1991 | US4983830 Focused ion beam apparatus having charged particle energy filter |
| 01/08/1991 | US4983806 Method and device for cooling electron beam gun |
| 01/08/1991 | US4983540 Ultrafine ion beam, semiconductors, optoelectronic integrated circuits |
| 01/08/1991 | US4983269 Monitoring physical value, detectors, signals, discontinuity, cathode |
| 01/08/1991 | US4983253 Magnetically enhanced RIE process and apparatus |
| 01/08/1991 | CA1278773C Method and apparatus for arc evaporating large area targets |
| 01/08/1991 | CA1278767C Downstream etching of substrates separated from plasma |
| 01/03/1991 | DE4008850A1 Focal spot control - for vacuum arc vaporiser with floating plasma potential sonde adjusting the direction of the magnetic field |
| 01/03/1991 | DE3920772A1 Geraet zur beschichtung von substraten durch kathodenzerstaeubung Device for coating substrates by cathode sputtering |
| 01/02/1991 | EP0405973A1 Scanning tunnelling microscope in combination with an optical microscope |
| 01/02/1991 | EP0405855A2 Ion implanting apparatus and process for fabricating semiconductor integrated circuit device by using the same apparatus |
| 01/02/1991 | EP0405668A1 Vacuum system |
| 01/02/1991 | EP0405343A2 Controlling procedure of an evaporation process |
| 01/02/1991 | EP0404973A1 Process and apparatus for coating substrates |
| 01/02/1991 | EP0404799A1 Integrated scanning tunneling microscope. |
| 01/01/1991 | US4982138 Semiconductor wafer treating device utilizing a plasma |
| 01/01/1991 | US4982099 Aperture diaphragm for a lithography apparatus |
| 01/01/1991 | US4982091 Electron beam apparatus and method for detecting secondary electrons |
| 01/01/1991 | US4982090 Method and apparatus for the quantitative, depth differential analysis of solid samples with the use of two ion beams |
| 01/01/1991 | US4981566 Arrangement for measuring the thickness of thin layers |
| 12/27/1990 | EP0404742A2 Method of making and using a high resolution lithographic mask |
| 12/27/1990 | EP0404608A2 Blanking aperture array, method of producing blanking aperture array, charged particle beam exposure apparatus and charged particle beam exposure method |
| 12/27/1990 | EP0403985A1 Transparent plastic substrate pre-treating process for vacuum coating and device for implementing this process |
| 12/27/1990 | EP0211002B1 Method and apparatus for spot shaping and blanking a focused beam |
| 12/26/1990 | CN2068235U Ion stripping sputtering instrument |
| 12/26/1990 | CN1010979B Electron spectrometer |
| 12/25/1990 | US4980615 Electron beam control circuit in electron beam evaporators with alternating acceleration voltages |
| 12/25/1990 | US4980610 Plasma generators |
| 12/25/1990 | US4980567 Charged particle beam exposure system using line beams |
| 12/25/1990 | US4980562 Method and apparatus for high efficiency scanning in an ion implanter |
| 12/25/1990 | US4980558 Electron beam generator |
| 12/25/1990 | US4980019 Covering with metallic foil |
| 12/25/1990 | US4979467 Thin film formation apparatus |