Patents
Sitemap › H01 - Basic electric elements › H01J - Electric discharge tubes or discharge lamps › H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866)
10/1990
10/24/1990EP0393958A2 Method and apparatus for sputter coating stepped wafers - case a
10/24/1990EP0393957A2 Method and apparatus for sputter coating stepped wafers - case B
10/24/1990EP0393637A1 Plasma processing method
10/24/1990EP0393344A1 Targets supporting device for sputtering sources and procedure for maintaining a target in a support
10/24/1990EP0275306B1 Multipurpose gaseous detector device for electron microscopes
10/24/1990EP0221164B1 Method and apparatus for producing large volume magnetoplasmas
10/23/1990US4965862 Disk scanning apparatus for batch ion implanters
10/23/1990US4965491 Plasma generator
10/23/1990US4964968 Magnetron sputtering apparatus
10/18/1990WO1990012415A1 Process and device for monitoring assisted ion machining processes on wafers
10/18/1990WO1990012413A1 Raster scan control system for a charged-particle beam
10/18/1990WO1990010303A3 Production of ion beams by chemically enhanced sputtering of solids
10/17/1990EP0392704A1 Shuttle system for rapidly manipulating a workpiece into and out of an atmospherically controlled chamber
10/16/1990US4963823 For examination of a specimen
10/16/1990US4963748 Composite multipurpose multipole electrostatic optical structure and a synthesis method for minimizing aberrations
10/16/1990US4963737 Transmission electron microscope
10/16/1990US4963713 Cooling of a plasma electrode system for an etching apparatus
10/16/1990US4963242 Plasma etching apparatus
10/16/1990US4963239 Sputtering process and an apparatus for carrying out the same
10/16/1990US4963238 Method for removal of electrical shorts in a sputtering system
10/11/1990DE3910054A1 Ion-implantation installation
10/10/1990EP0391636A2 Method of correcting proximity effects
10/10/1990EP0391429A2 Micro-displacement detector device, piezo-actuator provided with the micro-displacement detector device and scanning probe microscope provided with the piezo-actuator
10/10/1990EP0391156A2 Improved coaxial cavity type, radiofrequency wave, plasma generating apparatus
10/10/1990EP0391040A2 Absorption microcopy and/or spectroscopy with scanning microscopy control
10/10/1990EP0231247B1 Improvements in atom probes
10/09/1990US4962516 Method and apparatus for state analysis
10/09/1990US4962313 Wien-type imaging corrector for an electron microscope
10/09/1990US4962309 Magnetic optics adaptive technique
10/09/1990US4962308 Charged particle apparatus comprising a beam discriminator
10/09/1990US4962306 Magnetically filtered low loss scanning electron microscopy
10/09/1990US4961832 Apparatus for applying film coatings onto substrates in vacuum
10/09/1990US4961812 Inhibition of sputtering from leads onto dielectric layer
10/04/1990WO1990011614A1 Method of exposure to charged beam, apparatus therefor, aperture diaphragm and method of producing the same
10/03/1990EP0390118A2 Field emission scanning electron microsope and method of controlling beam aperture angle
10/03/1990EP0390004A2 Method and device for the microwave-plasma etching
10/03/1990EP0389952A2 A photoelectron microscope
10/02/1990US4961003 Scanning electron beam apparatus
10/02/1990US4960610 Method of treating semiconductor wafers in a magnetically confined plasma at low pressure by monitoring peak to peak voltage of the plasma
10/02/1990US4960073 Microwave plasma treatment apparatus
10/02/1990US4960072 Apparatus for forming a thin film
09/1990
09/26/1990EP0389398A2 Tri-deflection electron beam system
09/26/1990EP0389342A1 Composite electromagnetic lens with a variable focal length
09/26/1990EP0389264A1 Ion implantation apparatus
09/26/1990EP0388800A2 Plasma reactor apparatus and method for treating a substrate
09/26/1990EP0388640A2 High speed waveform sampling with a tunneling microscope
09/25/1990US4958591 Apparatus for forming a functional deposited film by means of plasma chemical vapor deposition
09/25/1990US4958590 Microwave traveling-wave diamond production device and method
09/20/1990WO1990010947A1 Process for detecting the attainment of a predetermined depth in target body erosion and target body therefor
09/20/1990WO1990010945A1 Ion gun
09/20/1990WO1990010729A1 Improved etch chamber with gas dispersing membrane
09/20/1990WO1990010547A1 Electron cyclotron resonance plasma source and method of operation
09/20/1990DE4008119A1 Cathode sputtering electromagnet control
09/20/1990DE3908252A1 Sputtering cathode employing the magnetron principle
09/20/1990DE3906954A1 Target arrangement for high-frequency sputtering of oxidic targets
09/19/1990EP0388023A2 Atomic force microscope with optional replaceable fluid cell
09/18/1990US4958079 Detector for scanning electron microscopy apparatus
09/18/1990US4958078 Large aperture ion-optical lens system
09/18/1990US4958059 Electronic bombardment evaporator equipped with means to recover backscattered electrons
09/18/1990US4957605 Magnetron
09/18/1990US4957062 Apparatus for plasma surface treating and preparation of membrane layers
09/12/1990EP0386894A2 Focussing an electron beam
09/12/1990EP0386840A1 Micromanipulator
09/12/1990EP0386666A2 Method and apparatus for detecting alignment mark of semiconductor device
09/12/1990EP0172916B1 Film forming method
09/12/1990EP0146595B1 Method and apparatus for introducing normally solid materials into substrate surfaces
09/11/1990US4956070 Sputtering apparatus
09/11/1990US4956043 Dry etching apparatus
09/07/1990WO1990010368A1 Method of cooling charged particle beam
09/07/1990WO1990010304A1 Method and apparatus for specific spectroscopic atomic imaging using complementary wavelength specific photon biasing with electronic and temperature biasing on a scanning tunneling microscope
09/07/1990WO1990010303A2 Production of ion beams by chemically enhanced sputtering of solids
09/05/1990EP0385710A2 Wafer rotation control for an ion implanter
09/05/1990EP0385709A2 Fluid flow control method and apparatus for minimizing particle contamination
09/05/1990EP0385708A2 Beam pattern control system for an ion implanter
09/05/1990EP0385707A2 Ion implanter end station
09/05/1990EP0385590A1 Sample processing method and apparatus
09/05/1990EP0385553A1 Method of detecting a marker provided on a specimen
09/05/1990EP0258383B1 Masked ion beam lithography system and method
09/04/1990US4955045 Plasma X-ray tube, in particular for X-ray preionization of gas lasers and method for produicng X-radiation with such an X-ray tube
09/04/1990US4954717 Pattern on transparent sustrate
09/04/1990US4954712 Specimen retaining ring system for an electron microscope
09/04/1990US4954711 Low-voltage source for narrow electron/ion beams
09/04/1990US4954710 Parallax-free gas detector for x-rays
09/04/1990US4954705 Method for examining a specimen in a particle beam instrument
09/04/1990US4954704 Method to increase the speed of a scanning probe microscope
09/04/1990US4954212 Semiconductors
09/04/1990US4954201 Apparatus for etching substrates with a luminous discharge
09/04/1990US4953498 Microwave plasma CVD apparatus having substrate shielding member
08/1990
08/29/1990EP0384754A2 Localized vacuum apparatus and method
08/29/1990EP0384684A2 Charged particle beam generating apparatus
08/28/1990US4952843 High current ion source
08/28/1990US4952806 Noise erasing method for stimulable phosphor sheets
08/28/1990US4952273 Plasma generation in electron cyclotron resonance
08/23/1990WO1990009681A1 Particle detector
08/23/1990DE3904991A1 Cathode sputtering device
08/22/1990EP0383570A2 Plasma etching method and apparatus
08/22/1990EP0383567A2 Microwave plasma processing method and apparatus
08/22/1990EP0383550A2 Plasma forming electrode and method of using the same
08/22/1990EP0383323A1 Tunneling acoustic microscope
08/22/1990EP0383182A2 Probe unit
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