| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
|---|
| 07/16/1991 | US5032202 Plasma generating apparatus for large area plasma processing |
| 07/16/1991 | US5031674 Fluid flow control method and apparatus for minimizing particle contamination |
| 07/16/1991 | US5031571 Apparatus for forming a thin film on a substrate |
| 07/16/1991 | CA1286427C Microwave plasma generator |
| 07/12/1991 | CA2033836A1 Microprobe, method for producing the same, and information receiving and providing apparatus utilizing the same |
| 07/11/1991 | WO1991010341A1 A low frequency inductive rf plasma reactor |
| 07/10/1991 | EP0436363A1 Regeneration of plasma initiator |
| 07/09/1991 | US5031125 Apparatus for measuring electron temperature |
| 07/09/1991 | US5030836 Method and apparatus for drawing patterns using an energy beam |
| 07/09/1991 | US5030835 Ion implantation capable of uniformly injecting an ion beam into a substrate |
| 07/09/1991 | US5029996 Microscope viewing arrangement |
| 07/03/1991 | EP0435838A2 Sputtering apparatus |
| 07/03/1991 | EP0435195A2 Electron microscope |
| 07/03/1991 | EP0435098A2 Deposition apparatus and method for enhancing step coverage and planarization of semiconductor wafers |
| 07/03/1991 | EP0434990A2 Charged-particle beam exposure method and apparatus |
| 07/03/1991 | EP0434933A2 Device for microwave plasma generation |
| 07/03/1991 | EP0434932A2 System for generating plasma |
| 07/03/1991 | EP0434797A1 Device for coating substrates by cathode sputtering. |
| 07/02/1991 | US5029250 Pattern configuration measuring apparatus |
| 07/02/1991 | US5029249 Electron microscope |
| 07/02/1991 | US5029222 Photoelectron image projection apparatus |
| 07/02/1991 | US5028837 Low energy ion trap |
| 07/02/1991 | US5028795 Ion implantation apparatus |
| 07/02/1991 | US5028780 Preparation and observation method of micro-section |
| 07/02/1991 | CA1285621C Beam position correction device |
| 06/28/1991 | CA2031926A1 Regenerating a plasma using oxygen |
| 06/27/1991 | WO1991009150A1 Method of and device for plasma treatment |
| 06/27/1991 | DE4034450A1 Gas plasma generator for welding an coating etc. - has linearly-polarised microwaves converted into circular waves using mode converter coupled via round and horn waveguides to plasma chamber |
| 06/26/1991 | EP0434370A2 Field emission electron device |
| 06/26/1991 | EP0434018A2 Electron accelerator |
| 06/26/1991 | EP0433993A2 Method and apparatus for controlling charged particle beams in charged particle beam exposure system |
| 06/26/1991 | EP0433936A2 A valve and membrane device |
| 06/26/1991 | EP0433604A2 Electrical probe incorporating scanning proximity microscope |
| 06/26/1991 | CN1052559A Optical near field microlithography process and microlithography device using it |
| 06/25/1991 | US5026997 Elliptical ion beam distribution method and apparatus |
| 06/25/1991 | US5026995 Particle beam surface analyzer |
| 06/25/1991 | US5026471 For cathode sputtering |
| 06/25/1991 | US5026470 Sputtering apparatus |
| 06/25/1991 | US5026437 Cantilevered microtip manufacturing by ion implantation and etching |
| 06/23/1991 | CA2032946A1 Valve and membrane device |
| 06/20/1991 | DE3941178A1 Quantitative potential measurement using corpuscular probe - by measuring related sec. particle energy distribution displacement with simple drift and instability compensation |
| 06/19/1991 | EP0432749A2 Electron beam exposure method and apparatus therefor |
| 06/19/1991 | EP0432488A2 Device for plasma processing semi-conductor wafers and method for utilizing such a device |
| 06/19/1991 | EP0432337A1 Delta-phi microlens for low-energy particle beams |
| 06/18/1991 | US5025194 Vapor and ion source |
| 06/18/1991 | US5025167 Ion implantation apparatus |
| 06/18/1991 | US5025165 Method for producing a semiconductor device using an electron beam exposure tool and apparatus for producing the device |
| 06/18/1991 | US5025153 Scanning tunneling spectroscope and a spectroscopic information detection method |
| 06/18/1991 | US5025135 Circuit configuration for the recognition of a plasma |
| 06/18/1991 | US5024748 Microwave plasma processing apparatus |
| 06/18/1991 | US5024716 Plasma processing apparatus for etching, ashing and film-formation |
| 06/13/1991 | DE4034421A1 Particle beam intensity modulator - has inductance transformer deflecting beam to=and=fro with deflection system forming resonant circuit |
| 06/12/1991 | EP0431951A2 An atmospheric plasma reaction method and a device therefor |
| 06/12/1991 | EP0431864A2 Method of detecting and adjusting exposure conditions of charged particle exposure system |
| 06/12/1991 | EP0431757A2 Ion implanter scanning mechanism |
| 06/12/1991 | EP0431592A2 A sputtering apparatus |
| 06/12/1991 | EP0431289A2 Apparatus for testing samples using charged particles |
| 06/12/1991 | EP0431253A2 Cathodic sputtering device |
| 06/11/1991 | US5023462 Photo-cathode image projection apparatus for patterning a semiconductor device |
| 06/11/1991 | US5023458 Ion beam control system |
| 06/11/1991 | US5023457 Electron beam device |
| 06/11/1991 | US5023453 Apparatus for preparation and observation of a topographic section |
| 06/11/1991 | US5023109 Deposition of synthetic diamonds |
| 06/11/1991 | US5023056 Plasma generator utilizing dielectric member for carrying microwave energy |
| 06/11/1991 | US5022979 Noncontamination, durability |
| 06/11/1991 | US5022978 Water resistance, sensitivity; construction materials |
| 06/11/1991 | US5022977 Ion generation apparatus and thin film forming apparatus and ion source utilizing the ion generation apparatus |
| 06/06/1991 | DE3939456A1 Exposing workpiece by electron beam lithography - separating structure elements into surface elements in predetermined window area of pattern |
| 06/05/1991 | EP0430812A2 Charged particle convergence device |
| 06/05/1991 | EP0430229A2 Process and apparatus for forming stoichiometric layer of metal compound by closed loop voltage controlled reactive sputtering |
| 06/05/1991 | EP0429809A2 Method and apparatus for etching semiconductor materials |
| 06/05/1991 | EP0429773A1 Atomic photo-absorption force microscope |
| 06/05/1991 | EP0429501A1 Device for plasma processing with an anode |
| 06/04/1991 | US5022061 An image focusing means by using an opaque object to diffract x-rays |
| 06/04/1991 | US5021702 Electron beam apparatus including a plurality of ion pump blocks |
| 06/04/1991 | US5021670 Multipole element |
| 06/04/1991 | US5021669 Process and system for the control of the focusing of a beam of monopolar charged particles |
| 06/04/1991 | US5021139 Cathode sputtering apparatus |
| 06/04/1991 | US5021114 Apparatus for treating material by using plasma |
| 05/30/1991 | WO1991007521A1 Rotating cylindrical magnetron structure for large area coating |
| 05/30/1991 | CA2069328A1 Rotating cylindrical magnetron structure for large area coating |
| 05/29/1991 | EP0429251A2 Reactive ion etching |
| 05/29/1991 | EP0429122A1 Contamination monitor for measuring a degree of contamination in an evacuatable charged particle beam system |
| 05/29/1991 | EP0428906A2 Particle beam apparatus |
| 05/29/1991 | EP0428867A2 Procedure for protecting an aperture during the production of electron beam pulses |
| 05/29/1991 | EP0428787A1 Industrial vacuum furnace |
| 05/29/1991 | EP0428682A1 Magnetic structure for electron-beam heated evaporation source. |
| 05/28/1991 | US5019712 Production of focused ion cluster beams |
| 05/28/1991 | US5019707 High speed waveform sampling with a tunneling microscope |
| 05/28/1991 | US5019139 For A Mass Spectrometer |
| 05/28/1991 | US5019117 Plasma apparatus |
| 05/28/1991 | CA1284537C Multipurpose gaseous detector device for electron microscope |
| 05/22/1991 | EP0428319A2 Elliptical ion beam distribution method and apparatus |
| 05/22/1991 | EP0428161A2 Dry process system |
| 05/21/1991 | US5017836 Electronic feeder for an ion pump |
| 05/21/1991 | US5017835 High-frequency ion source |
| 05/21/1991 | US5017789 Raster scan control system for a charged-particle beam |
| 05/21/1991 | US5017404 Plasma CVD process using a plurality of overlapping plasma columns |
| 05/21/1991 | US5017266 Piezoelectric transducer |
| 05/21/1991 | US5016565 Microwave plasma chemical vapor deposition apparatus for forming functional deposited film with means for stabilizing plasma discharge |