| Patents for H01J 37 - Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof (46,866) |
|---|
| 01/15/1992 | EP0270667B1 Dual plasma microwave apparatus and method for treating a surface |
| 01/14/1992 | US5081398 Resonant radio frequency wave coupler apparatus using higher modes |
| 01/14/1992 | US5081354 Method of determining the position of electron beam irradiation and device used in such method |
| 01/14/1992 | US5081353 Combined scanning electron and scanning tunnelling microscope apparatus and method |
| 01/14/1992 | US5080772 Method of improving ion flux distribution uniformity on a substrate |
| 01/08/1992 | EP0464917A1 Electron beam apparatus for topographical detection |
| 01/08/1992 | EP0464537A2 Method for temporarily stable marking of isolated atoms or groups of atoms on a solid state body surface and use of the same for storing information units at an atomic level |
| 01/08/1992 | EP0464383A2 Plasma neutralisation cathode |
| 01/07/1992 | US5079481 Plasma-assisted processing magneton with magnetic field adjustment |
| 01/07/1992 | US5079428 Electron microscope with an asymmetrical immersion lens |
| 01/07/1992 | US5079112 Device manufacture involving lithographic processing |
| 01/07/1992 | US5079031 Apparatus and method for forming thin films |
| 01/07/1992 | US5078950 Multihole anode structure to enlarge ion beam extraction |
| 01/07/1992 | US5078851 Cooling |
| 01/07/1992 | US5078848 Procedure and apparatus for the coating of materials by means of a pulsating plasma beam |
| 01/07/1992 | US5078823 Plasma reactor |
| 01/07/1992 | CA1294066C Guard ring for a differentially pumped seal apparatus |
| 01/07/1992 | CA1294065C Apparatus for preselecting and maintaining a fixed gap between a workpiece and a vacuum seal apparatus in particle beam lithography systems |
| 01/04/1992 | CA2046065A1 Time-stable labeling of individual atoms or groups of atoms in the surface of a solid, and the storage of information units in the atomic range |
| 01/02/1992 | EP0463829A2 Electron beam evaporation source |
| 01/02/1992 | EP0463303A2 Apparatus for ion-plasma machining workpiece surfaces |
| 01/02/1992 | EP0463230A1 Device for coating substrates |
| 01/02/1992 | EP0463227A1 Cathodic sputtering device |
| 01/02/1992 | EP0463167A1 Method of making electrode |
| 01/02/1992 | EP0463137A1 Method and device for treating a substrate with a plasma |
| 01/02/1992 | DE4020158A1 Appts. for thin film coating of metallic substrates - comprises vacuum chamber, rotating substrate carrier, plasma generator and electron beam vaporiser |
| 12/31/1991 | CA1293825C Silicon grid as a reference and calibration standard in a particle beam lithography system |
| 12/27/1991 | EP0462554A2 Charged particle beam apparatus |
| 12/27/1991 | EP0462377A2 Ion source |
| 12/27/1991 | EP0462303A1 Vacuum arc vapor deposition device having electrode switching means |
| 12/27/1991 | EP0462209A1 Electron cyclotron resonance plasma source and method of operation |
| 12/27/1991 | EP0462165A1 Ion gun. |
| 12/27/1991 | EP0177566B1 Method for precision sem measurements |
| 12/26/1991 | WO1991020091A1 Metallizing apparatus |
| 12/25/1991 | CN1057363A Installation for study or transformation of surface of samples placed in vacuum or in controlled atmosphere |
| 12/24/1991 | US5075548 Tunnel current probe moving mechanism having parallel cantilevers |
| 12/24/1991 | US5075532 Spatter-free electron beam welding apparatus with spatter catching device associated therewith |
| 12/24/1991 | US5074985 Film forming apparatus |
| 12/24/1991 | US5074456 Composite electrode for plasma processes |
| 12/19/1991 | DE4117005A1 Application of light beam in discharge chamber - using external light source and transmission window to start electrical discharge or effect process |
| 12/18/1991 | EP0461683A2 Apparatus and method for plasma treatment of resin material |
| 12/18/1991 | EP0461525A1 Method and device for substrate coating using a magnetron cathode |
| 12/18/1991 | EP0461442A2 Particle beam apparatus |
| 12/18/1991 | EP0461393A1 Scanning tunnel microscope |
| 12/18/1991 | EP0461366A2 Thermally stable magnetic deflection assembly and method of making same |
| 12/17/1991 | US5073804 Method of forming semiconductor materials and barriers |
| 12/17/1991 | US5073716 Apparatus comprising an electrostatic wafer cassette |
| 12/17/1991 | US5073245 Slotted cylindrical hollow cathode/magnetron sputtering device |
| 12/17/1991 | US5073232 Diluting with anhydrous inert gas, dry treatment, corrosion resistance |
| 12/17/1991 | CA1293337C Secondary electron detector for use in a gaseous atmosphere |
| 12/12/1991 | DE4107215A1 Laser PVD process control - by film prodn. and observation within particle beam microscope |
| 12/11/1991 | EP0461035A1 Rotating cathode |
| 12/11/1991 | EP0461014A1 Equipment for high-rate cathodic sputtering |
| 12/11/1991 | EP0460337A2 Plasma reactor and process with ceramic chamber |
| 12/11/1991 | EP0460305A1 Method for observing microscopic surface structure |
| 12/11/1991 | EP0442939A4 Improved magnetron sputtering cathode |
| 12/10/1991 | US5072125 Ion implanter |
| 12/10/1991 | US5072116 Microprobe preparation thereof and electronic device by use of said microprobe |
| 12/10/1991 | US5071381 Process for the manufacture of straw tube drift chambers |
| 12/10/1991 | US5070811 Apparatus for applying dielectric or metallic materials |
| 12/05/1991 | DE4017112A1 Control method for plasma discharge coating - uses unbalanced magnetron cathode and discharge voltage regulation by field coil current |
| 12/04/1991 | EP0459460A2 Exposure data forming method, pattern forming method, pattern exposure method and pattern exposure apparatus |
| 12/04/1991 | EP0459392A2 Method and apparatus for processing a minute portion of a specimen |
| 12/04/1991 | EP0459255A2 Method for suppression of electrification |
| 12/04/1991 | EP0459177A2 Solid state microwave generating array material, each element of which is phase controllable, and plasma processing systems |
| 12/04/1991 | EP0459137A2 Device for coating of substrates |
| 12/04/1991 | EP0459047A1 Electron-optical system for making a pseudoparallel micro electron-beam |
| 12/03/1991 | US5070275 Ion implantation device |
| 12/03/1991 | US5069928 Microwave chemical vapor deposition apparatus and feedback control method |
| 12/03/1991 | US5069772 Apparatus for coating substrates by means of a magnetron cathode |
| 12/03/1991 | US5069770 Sputtering process employing an enclosed sputtering target |
| 11/28/1991 | WO1991018412A1 Process and device for monitoring and controlling etching operations |
| 11/28/1991 | WO1991018411A1 Method of controlling an electron beam in an electron accelerator and an electron accelerator |
| 11/28/1991 | WO1991018283A1 Interference removal |
| 11/28/1991 | WO1991018126A1 Sputter target design |
| 11/27/1991 | EP0458498A2 Charged particle energy analysers |
| 11/27/1991 | EP0458422A2 Apparatus for scanning wafers |
| 11/27/1991 | EP0458324A2 Multi-channel plasma discharge endpoint detection system and method |
| 11/27/1991 | EP0458222A2 High voltage lead-through for corpuscular ray device |
| 11/27/1991 | EP0458205A2 Plasma etch apparatus with conductive coating on inner metal surfaces of chamber to provide protection from chemical corrosion and method of forming same |
| 11/27/1991 | EP0458085A1 Plasma CVD apparatus |
| 11/26/1991 | US5068539 Ion implantation apparatus |
| 11/21/1991 | EP0457632A2 Blanking aperture array and method of producing same |
| 11/21/1991 | EP0457339A2 Method and apparatus for the production of circuit boards |
| 11/21/1991 | EP0457321A2 Method and apparatus for measuring ion beam collimation, shaping the ion beam and controlling scanning thereof |
| 11/21/1991 | EP0457317A1 Electron microscope and method for observing microscopic image |
| 11/21/1991 | EP0457253A2 Cantilever stylus for use in an atomic force microscope and method of making same |
| 11/21/1991 | EP0457168A2 Method for the temporary stable marking of individual atoms or atom groups as well as utilisation of this method for storing information units in the atomic domain |
| 11/21/1991 | DE4016211A1 Verfahren zur ueberwachung und steuerung eines aetzvorgangs und vorrichtung hierfuer Method for monitoring and controlling of etching and device for here |
| 11/21/1991 | DE4016108A1 Swivelable mass spectrometer to measure properties of particle stream - provides in-situ measurement of mass-, energy-and angular-distribution e.g. for integrated circuit |
| 11/21/1991 | DE4016087A1 Arc coating unit eliminating droplets or spray on substrate - by using centrifugal force of rotating cathode to divert them into wall encircling the cathode |
| 11/20/1991 | CN2089208U Microscope body for scanning tunnel |
| 11/20/1991 | CN1014849B Electronic microscope capable of extending kinds and range of samples examined and observing negative electrons |
| 11/19/1991 | US5066858 Scanning tunneling microscopes with correction for coupling effects |
| 11/17/1991 | CA2042078A1 Time-stable labeling of individual atoms or groups of atoms in the surface of a solid, and the storage of information units in the atomic range |
| 11/14/1991 | WO1991017562A1 Plasma reaction chamber having conductive diamond-coated surfaces |
| 11/14/1991 | WO1991017561A1 Apparatus for-plasma treatment of continuous material |
| 11/14/1991 | WO1991017429A1 Installation for the study or transformation of sample surfaces in a vacuum or controlled atmosphere |
| 11/14/1991 | WO1991016948A1 Selective radiation of pathological material |
| 11/13/1991 | EP0456219A2 Electron optical measurement apparatus |